CN106292179B - A kind of mask plate cleaning device - Google Patents
A kind of mask plate cleaning device Download PDFInfo
- Publication number
- CN106292179B CN106292179B CN201610819424.XA CN201610819424A CN106292179B CN 106292179 B CN106292179 B CN 106292179B CN 201610819424 A CN201610819424 A CN 201610819424A CN 106292179 B CN106292179 B CN 106292179B
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- China
- Prior art keywords
- panel
- mask plate
- cleaning device
- support plate
- mask
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
Abstract
The embodiment of the present invention provides a kind of mask plate cleaning device, is related to mask plate maintenance field, can remove dust or other fine particles on mask plate and support plate.It is cleaned for the support plate to mask plate to be cleaned and placement mask plate to be cleaned, including the first panel and second panel being oppositely arranged, there is gap between first panel and second panel, for mask plate to be cleaned to be set between first panel and second panel, and second panel is set between mask plate to be cleaned and support plate and carries out clean operation；The side of second panel is provided with multiple gas outlets in first panel；The side of first panel is at least provided with multiple gas outlets in second panel；The gas source being connected with gas outlet is additionally provided on mask plate cleaning device.
Description
Technical field
The present invention relates to mask plate maintenance field more particularly to a kind of mask plate cleaning devices.
Background technique
(Thin Film Transistor Liquid Crystal Display, Thin Film Transistors-LCD are aobvious by TFT-LCD
Show device) it is used as a kind of panel display apparatus, because it is relatively low with small size, low power consumption, no radiation and cost of manufacture
Feature, and be applied in high-performance display field more and more.
Thin film transistor-liquid crystal display is made of box array substrate and color membrane substrates.In array substrate and color film base
In the manufacturing process of plate, such as source electrode, the drain electrode etc. of production TFT are required to through the patterning processes specific implementation such as exposure etching,
Light performs etching the film layer to be processed being placed on the substrate below mask plate through preset light-transparent pattern on mask plate
Exposure, to form specific pattern on substrate.
Mask plate has composition pattern, with screen PPI (Pixels Per Inch, the pixel number possessed in per inch
Mesh) increase, the fining of composition area of the pattern on mask plate, in the case, when in the composition pattern of mask plate once fall
When falling with adhesive dust or other fine particles, the quality of mask plate can be made to be easy to be affected, even result in and pass through exposure mask
The substrate that version is patterned manufacturing process is reprocessed or is scrapped due to pattern error.
It is provided in the support plate 02 of support frame 03 as shown in Figure 1, mask plate 01 is typically placed in surrounding when not in use,
So that the mask pattern of mask plate 01 does not contact vacantly with any surface, a possibility that reducing collsion damage, and in mask plate
01 top adds cover board 04, and cover board 04 and support plate 02 form sealing space to reduce mask plate 04 by extraneous dust or particle
A possibility that pollution.
Mask plate 01 needs to open cover board 04 before use and does cleannes inspection, blows off removal 01 table of mask plate by air gun
After face dust or particle, the sealing of cover board 04 is covered again, after being transported to workbench by cart, will entirely be supported by mobile manipulator
The airtight box body that plate 02 and cover board 04 form grabs and in the confined space that is put into exposure machine, according to the journey set in exposure machine
Sequence takes out mask plate 01 in exposure machine and using progress mask exposure.
Since the space between 01 lower surface of mask plate and support plate 02 is smaller, air gun not can be removed to be deposited in support plate 02
Dust or particle, take in the confined space in exposure machine mask plate 01 when, may cause and be deposited in support plate 02
Dust or particle are fallen under the drive of air-flow on mask plate 01, to influence the essence of the mask exposure pattern of substrate to be processed
True property.
Summary of the invention
The embodiment of the present invention provides a kind of mask plate cleaning device, can remove dust on mask plate and support plate or
Other fine particles.
In order to achieve the above objectives, the embodiment of the present invention adopts the following technical scheme that
The one side of the embodiment of the present invention provides a kind of mask plate cleaning device, for mask plate to be cleaned and placement
The support plate of mask plate to be cleaned is cleaned, including the first panel and second panel being oppositely arranged, first panel and second
There is gap, for mask plate to be cleaned to be set between first panel and second panel, and by second panel between panel
It is set between mask plate to be cleaned and support plate and carries out clean operation；It is provided in first panel close to the side of second panel
Multiple gas outlets；The side of first panel is at least provided with multiple gas outlets in second panel；In mask plate cleaning device
On be additionally provided with the gas source being connected with gas outlet.
Preferably, it is all provided with away from the side of first panel and second panel close to the side of first panel in second panel
It is equipped with multiple gas outlets.
Further, mask plate cleaning device of the invention further includes limiting section, and limiting section is strip, the fixation of limiting section
End be fixedly connected on mask plate cleaning device, side of the second panel close to support plate is arranged in positive stop end, for cover
Film version cleaning device leans after being put into cleaning station with support plate side.
Further, mask plate cleaning device of the invention further includes fixed part, the positive stop end phase of fixed part and limiting section
It is mutually perpendicular to even and with limiting section, the upper surface of fixed part and the lower surface of support plate are located in same level, and fixed part is used
In mask plate cleaning device be put into cleaning station after connect and fix with the lower surface of support plate.
Preferably, limiting section and fixed part are structure as a whole.
Preferably, second panel is provided with synkinesia part close to support plate on one side, and synkinesia part will be for that will cover
When film version cleaning device is put into cleaning station, reduce the frictional resistance relatively moved between second panel and support plate.
Further, synkinesia part includes multiple rolling members.
Further, rolling member includes the axis of rolling and the roller that is interspersed on the axis of rolling, the center line of the axis of rolling and
It is vertical that the lower surface of two panels is put into the cleaning direction of motion of station in parallel and with second panel.
Preferably, rolling member includes mounting groove and the ball that is arranged in mounting groove, and the opening size of mounting groove is less than rolling
The diameter of pearl.
Further, cleaning is put into mask plate cleaning device when support plate is provided with close to the side of mask plate to be cleaned
When the parallel track in the direction of station, synkinesia part include be arranged in second panel close to support plate side and orbital position
Corresponding sliding block；Alternatively, synkinesia part includes setting when support plate is provided with sliding block close to the side of mask plate to be cleaned
In second panel close to the track corresponding with slide position of support plate side, direction and the mask plate cleaning device of track are put into
The direction for cleaning station is parallel.
The present invention provides a kind of mask plate cleaning device, for mask plate to be cleaned and placing mask plate to be cleaned
Support plate is cleaned, including the first panel and second panel being oppositely arranged, between having between first panel and second panel
Second panel for mask plate to be cleaned to be set between first panel and second panel, and is set to cleaning exposure mask by gap
Clean operation is carried out between version and support plate；The side of second panel is provided with multiple gas outlets in first panel；At least
The side of first panel is provided with multiple gas outlets in second panel；It is additionally provided on mask plate cleaning device and outlet
The gas source that mouth is connected.When clean operation, mask plate to be cleaned is located at below first panel, and first panel is close to second panel
Side setting multiple gas outlets supply gas body to the upper surface blown of mask plate to be cleaned to remove mask plate to be cleaned
The dust or particle of upper surface.Meanwhile support plate is located at the lower section of second panel, deviates from the side of first panel in second panel
The multiple gas outlets being arranged are mentioned to the upper surface blown of support plate body of supplying gas with removing the dust or particle of the upper surface of support plate
The surface cleanness of high mask plate promotes the quality of mask plate, improves the yields of the substrate of production.
Detailed description of the invention
In order to more clearly explain the embodiment of the invention or the technical proposal in the existing technology, to embodiment or will show below
There is attached drawing needed in technical description to be briefly described, it should be apparent that, the accompanying drawings in the following description is only this
Some embodiments of invention for those of ordinary skill in the art without creative efforts, can be with
It obtains other drawings based on these drawings.
Fig. 1 is a kind of storage configuration figure of mask plate provided by the invention；
Fig. 2 is a kind of structural schematic diagram of mask plate cleaning device provided by the invention；
Fig. 3 is that a kind of mask plate cleaning device provided by the invention in the upper surface of second panel is also equipped with gas outlet
Structural schematic diagram；
Fig. 4 is the structural schematic diagram that a kind of mask plate cleaning device provided by the invention is provided with limiting section；
Fig. 5 is the structural schematic diagram that a kind of mask plate cleaning device provided by the invention is provided with fixed part；
Fig. 6 is the structural schematic diagram that a kind of mask plate cleaning device provided by the invention is provided with synkinesia part；
Fig. 7 is that a kind of synkinesia part of mask plate cleaning device provided by the invention is the top view of sliding block；
Fig. 8 is a kind of top view of mask plate cleaning device provided by the invention；
Fig. 9 is the bottom view of second panel in Fig. 8；
Figure 10 is the top view of another mask plate cleaning device provided by the invention；
Figure 11 is the bottom view of second panel in Figure 10.
Appended drawing reference:
01- mask plate；011- transparent substrate；012- mask pattern；013- transparent thin film layer；02- support plate；03- support
Frame；04 cover board；11- first panel；12- second panel；13- gas source；The first control valve of 131-；The second control valve of 132-；14- limit
Position portion；15- fixed part；16- synkinesia part；161- rolling member；The 1611- axis of rolling；1612- roller；1613- mounting groove；
1614- ball；162- track；163- sliding block；Gap between a- first panel and second panel；The gas outlet b-；L- two is collateral
The spacing of support；The width of W- second panel.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
The embodiment of the present invention provides a kind of mask plate cleaning device, as shown in Fig. 2, for treat clean mask plate 01 with
And the support plate 02 of placement mask plate 01 is cleaned, including the first panel 11 and second panel 12 being oppositely arranged, the first face
Between plate 11 and second panel 12 have gap a, using mask plate cleaning device of the invention treat clean mask plate 01 with
And before placing the progress clean operation of support plate 02 of mask plate 01, first by mask plate cleaning device along mask plate to be cleaned
01 side is slowly inserted into, and mask plate 01 to be cleaned is set between first panel 11 and second panel 12, and by second
Panel 12 is set between mask plate 01 and support plate 02 to be cleaned, then carries out clean operation；It is close in first panel 11
The side of second panel 12 is provided with multiple gas outlet b；At least it is provided in second panel 12 away from the side of first panel 11
Multiple gas outlet b；The gas source 13 being connected with gas outlet b is additionally provided on mask plate cleaning device.
It should be noted that first, the gap a having between first panel 11 and second panel 12, for of the invention
When cleaning station, first panel 11 is located on the upper surface of mask plate 01 to be cleaned mask plate cleaning device, and to clear
The upper surface of clean mask plate 01 maintains a certain distance, meanwhile, second panel 12 is inserted into mask plate 01 and support to be cleaned
Between plate 02 and the upper and lower surfaces of second panel 12 respectively with 01 lower surface of mask plate to be cleaned and support plate 02
Upper surface between maintain a certain distance so that the multiple gas outlet b being arranged in first panel and second panel 12 with to
There is the space that can guarantee gas flowing between cleaning position.Make to keep gap a between first panel 11 and second panel 12
Distance, can at least be realized by following two mode.For example, as shown in Fig. 2, by connector by first panel 11 and the
Two panels 12 are connected, alternatively, as shown in figure 4, being also possible to first panel 11 and second panel 12 is the U-shaped knot being linked together
Structure.
Second, the side of first panel 11 is at least provided with that multiple gas outlet b refer in second panel 12 can be with
For as shown in Fig. 2, be only provided with multiple gas outlet b away from the side of first panel 11 in second panel 12, for support plate
02 blows gas, in addition, further including that the side of first panel 11 is provided with the same of multiple gas outlet b in second panel 12
When, it is also equipped with gas outlet b in other sides of second panel 12, for example, as shown in figure 3, in second panel 12 close to first
The side of panel 11 is also equipped with multiple gas outlet b, can second panel 12 away from first panel 11 side it is multiple go out
While port b send dedusting to 02 upper surface blown of support plate, dedusting is blowed to the lower surface of mask plate 01, to improve
Cleaning efficiency, in another example, the left and right side of second panel 12 is provided with multiple gas outlet b, for blowing gas outward, with
Guide the gas of gas outlet b blowout of the second panel 12 close to first panel 11 and on the side of first panel 11 to the
Region flowing other than two panels 12, avoids the effect due to air-flow vortex, the dust blown afloat or particle is fallen into exposure mask again
The surface of version 01 and support plate 02.
In addition, the gas source 13 being connected with gas outlet b is additionally provided on mask plate cleaning device, for gas in the present invention
The setting position in source 13 and quantity are not particularly limited, and gas source 13 can be set to one, as shown in Fig. 2, being distinguished by pipeline
Multiple gas outlet b of multiple gas outlet b and second panel 12 to first panel 11 convey gas, or first panel 11
It is connect respectively with gas source 13 with second panel 12.
In the description of the present invention, it is to be understood that, the side of the instructions such as term " on ", "lower", "left", "right" "horizontal"
Position or positional relationship are the orientation or positional relationship placed in support plate 02 based on mask plate 01, are merely for convenience of description originally
Invention and simplified description, rather than the device or element of indication or suggestion meaning must have a particular orientation, with specific side
Position construction and operation, therefore be not considered as limiting the invention.
The present invention provides a kind of mask plate cleaning device, for mask plate to be cleaned and placing mask plate to be cleaned
Support plate is cleaned, including the first panel and second panel being oppositely arranged, between having between first panel and second panel
Second panel for mask plate to be cleaned to be set between first panel and second panel, and is set to cleaning exposure mask by gap
Clean operation is carried out between version and support plate；The side of second panel is provided with multiple gas outlets in first panel；At least
The side of first panel is provided with multiple gas outlets in second panel；It is additionally provided on mask plate cleaning device and outlet
The gas source that mouth is connected.When clean operation, mask plate to be cleaned is located at below first panel, and first panel is close to second panel
Side setting multiple gas outlets supply gas body to the upper surface blown of mask plate to be cleaned to remove mask plate to be cleaned
The dust or particle of upper surface.Meanwhile support plate is located at the lower section of second panel, deviates from the side of first panel in second panel
The multiple gas outlets being arranged are mentioned to the upper surface blown of support plate body of supplying gas with removing the dust or particle of the upper surface of support plate
The surface cleanness of high mask plate promotes the quality of mask plate, improves the yields of the substrate of production.
With the continuous development of field of display technology, display panel is also more and more diversified according to different customer demands,
Production for PPI (Pixels Per Inch, the number of pixels possessed in per inch) higher display panel, it is necessary to make
It is nanoscale fine mask version with composition pattern.The mask plate 01 fine for such composition pattern, as shown in Fig. 2, its structure
Figure pattern is formed on mask pattern 012, and in order to protect mask pattern 012, mask pattern 012 is usually attached at transparent substrate
011 lower surface avoids dust or particle from falling into inside mask pattern 012 from top, and since transparent substrate 011 is usual
For with certain thickness hard plate, the upper surface that mask pattern 012 can be effectively protected is not collided or because external force is made
At damage, in order to protect the lower surface of mask pattern 012, avoids contacting generation oxidation with air or cause corrosion-damaged, pasting
Attached 012 lower surface of mask pattern attaches transparent thin film layer 013, and transparent thin film layer 013 can also prevent dust or micro- simultaneously
Grain is fallen into inside mask pattern 012 by the lower surface of mask pattern 012.
It will be of the invention equal close to the side of first panel 11 and away from the side of first panel 11 in second panel 12
When being provided with the structure of multiple venthole b applied to the mask plate 01 progress cleaning fine to composition pattern, due to setting
It is relatively thin in the thickness of the transparent thin film layer 013 on 012 lower surface of mask pattern, by second panel 12 close to first panel 11
The air velocity that the gas outlet b of side setting blows to fine 01 lower surface of mask plate is larger, may be by transparent thin film layer
013 blows brokenly, so as to cause mask pattern 012 lower surface directly and contacting external air, cause mask pattern 012 to corrode or make
Dust or particle enter inside mask pattern 012, and the pollution of mask plate 01 is caused not to be available；Or since the effect of its stream makes to cover
The movement that position occurs on transparent substrate 011 for film figure 012 even falls off.
When using above-mentioned equal close to the side of first panel 11 and away from the side of first panel 11 in second panel 12
When being provided with the mask plate cleaning device structures of multiple gas outlets and carrying out clean operation to the mask plate 01 of fining, it is preferred that
As shown in figure 3, second panel 12 is provided with the first control at the Inlet Position of multiple gas outlet b of the side of first panel 11
Valve 131 processed, control are also equipped with the stream of multiple gas outlet b output gas by second panel 12 close to the side of first panel 11
Speed；Second panel 12 is provided with the second control valve at the Inlet Position of multiple gas outlet b of the side of first panel 11
132, control is by second panel 12 away from the flow velocity of multiple gas outlet b output gas of the side of first panel 11.
So, as shown in figure 3, when second panel 12 is also equipped with multiple gas outlets close to the side of first panel 11
When b, can by the first control valve 131, individually control blow to the air-flow velocity of 01 lower surface of mask plate, will be under mask plate 01
The air-flow velocity that surface blows adjusts smaller, avoids blowing brokenly the transparent thin film layer being set on 012 lower surface of mask pattern
013, or make the mobile offset of the appearance position on transparent substrate 01 under the blowing of air-flow of mask pattern 012 even because attaching
It is insecure and fall.Second control valve 132 is set as normally blowing down the air velocity of dust or particle, on the one hand to covering
Film version 01 and support plate 02 are cleaned, on the other hand also can be avoided air-flow it is excessive when, due to air-flow vortex effect make
Stream of bringing about the desired sensation is tipping up, to 01 lower surface of mask plate for protecting the transparent thin film layer 013 of mask pattern 012 to cause breakage.
In addition, phase also can be set at the Inlet Position for multiple gas outlet b that 12 side of second panel is arranged to first panel 11
The control valve (not shown) answered, and gas source 13 is not shown in figure, the multiple gas outlet b for being set to three different surfaces can be with
A gas source 13 is shared, gas source 13 can also be individually connected, be not specifically limited herein.
Further, multiple gas outlet b in heretofore described first panel 11 and second panel 12 are equal
Even distribution, for example, can be distributed for as shown in Figure 9 in matrix form, to improve mask plate cleaning device of the invention to covering
The surface of film version 01 and support plate 02 blows the uniformity of gas, improves the removal effect of dust or particle, goes out in the present invention
The shape of port b is not specifically limited, and can be circle as shown in Figure 9, or other shapes.
Further, as shown in figure 4, mask plate cleaning device of the invention further includes limiting section 14, limiting section 14 is item
Shape, the fixing end of limiting section 14 are fixedly connected on mask plate cleaning device, and positive stop end setting is in second panel 12 close to support
The side of plate 02, for mask plate cleaning device be put into cleaning station after lean with 02 side of support plate.
It should be noted that setting limiting section 14 is used for when mask plate cleaning device is put into cleaning station, to mask plate
The position that is put into of cleaning device is defined, and avoiding being put into position excessively deeply leads to first panel 11 and second panel 12
Link position collides with mask plate 01, and mask plate 01 is caused to damage.
As shown in figure 4, the fixing end of limiting section 14 can be set on the lower surface of second panel 12, or can also set
The link position in first panel 11 and second panel 12 is set, is not specifically limited herein, the positive stop end of limiting section 14 is stretched downwards
Out, the length of stretching at least guarantees beyond below 02 upper surface of support plate.So, in mask plate cleaning device to cleaner
When being put into position, side of the limiting section 14 also gradually to support plate 02 is close, until being moved to limiting section 14 and support plate 02
The position that side leans reaches scheduled cleaning station, mask plate cleaning device is by limiting section 14 and support plate at this time
02 power to offset cannot be further continued for moving forward, and it is too deep and collide in mask plate 01 to avoid being put into position.
As shown in figure 4, due on 12 lower surface multiple gas outlet b and second panel on 11 lower surface of first panel
Multiple gas outlet b are to blow gas (in the direction shown by the arrow in Figure 4) downwards, and the gas impact of gas outlet b blowout is being covered
01 upper surface of film version and the upper surface of support plate 02 and retroeflection, the active force of air-flow reflection will push first panel 11 and the
Two panels 12 move up, since the spacing between mask plate 01 and support plate 02 is smaller, the model that second panel 12 moves up
Enclose it is slightly larger may can 01 lower surface of damaged in collision mask plate mask pattern 012.
On this basis, further, as shown in figure 5, mask plate cleaning device of the invention further includes fixed part 15, Gu
Determine portion 15 to be connected with the positive stop end of limiting section 14 and be mutually perpendicular to limiting section 14, upper surface and the support plate 02 of fixed part 15
Lower surface is located in same level, fixed part 15 be used for mask plate cleaning device be put into cleaning station after with support plate 02
Lower surface connect and fix.
Since mask plate 01 and the support plate 02 for placing mask plate 01 are placed on artificial fork as shown in Figure 5 before use
Operating position is pushed on vehicle and by artificial fork truck, it, will when needing to be cleaned using mask plate cleaning device of the invention
The idler wheel of fork truck bottom is checked, and mask plate cleaning device is put into cleaning station and carries out clean operation, due to support plate
02 is arranged on fork truck, has a certain distance space between support plate 02 and ground, therefore can be realized and be put into fixed part 15
02 lower surface of support plate is simultaneously connected and fixed with the lower surface of support plate 02.
So, when mask plate cleaning device is put into cleaning station, it is arranged on 14 positive stop end of limiting section
Fixed part 15 gradually protrudes into the lower surface of support plate 02 and is clamped with the lower surface of support plate 02.In mask plate cleaning device pair
When mask plate 01 and support plate 02 are cleaned, since fixed part 15 and the lower surface of support plate 02 connect and fix, so that first
The position of panel 11 and second panel 12 is fixed, and the active force of air-flow reflection can not push second panel 12 to move up, to covering
The mask pattern 012 of 02 lower surface of film version plays the role of protection.
First panel 11 and second panel 12 is pushed to move up further, since fixed part 15 needs to bear air-flow reflection
Therefore power reflects the size of motive force according to air-flow, fixed part 15 can be strip or plate, and fixed part 15 protrudes into support plate
The distance of 02 lower surface can also be specifically arranged according to the size that air-flow reflects motive force, if air-flow velocity is larger, air-flow reflection
Motive force is also larger, then sets plate for fixed part 15, and protrude into 02 lower surface of support plate distance setting it is longer, with protect
Demonstrate,prove fixed stability.
In order to save cost, it is preferred that as shown in fig. 6, limiting section 14 and fixed part 15 are structure as a whole.
In addition, fixed part 15 can also be provided separately within other sides of mask plate cleaning device, it is not arranged in limiting section
Under 14 positive stop end, the present invention is not specifically limited in this embodiment.
When mask plate cleaning device of the invention is put into cleaning station, if second panel 12 is directly inserted into mask plate
Between 01 and support plate 02, since the gap between mask plate 01 and support plate 02 is smaller, manually it is difficult the steady of control insertion
Property, when insertion the careless slightly mask pattern 012 for most probably colliding 01 lower surface of mask plate, and second panel 12 is placed on
Gradually push-in cleans station in support plate 02, can be avoided and collides mask pattern 012, but the lower surface of second panel 12 and branch
Frictional resistance is larger between the upper surface of fagging 02, and Reusability will increase the surface abrasion of second panel 12 and support plate 02.
It is to solve the above-mentioned problems preferred, as shown in fig. 6, second panel 12 is auxiliary close to being provided on one side for support plate 02
Help movement parts 16, synkinesia part 16 is used for when mask plate cleaning device is put into cleaning station, reduce second panel 12 with
The frictional resistance relatively moved between support plate 02.
The shape of synkinesia part 16, setting position and the course of work are specifically described below.
For example, (Fig. 7 is the top view of mask plate cleaning device of the invention, wherein for the ease of display as shown in Figure 7
Clear, first panel 11 and mask plate 01 are not shown), when support plate 02 close to the side of mask plate 01 to be cleaned be provided with
When mask plate cleaning device is put into the parallel track 162 in direction of cleaning station, synkinesia part 16 includes being arranged in the second face
With track 162 position corresponding sliding block 163 of the plate 12 close to 02 side of support plate.
So, as shown in fig. 7, sliding block 163 of the second panel 12 close to 02 side of support plate, which is arranged in, is put into exposure mask
The track 162 of 01 corresponding position of version, when direction shown in arrow is put into cleaning station to mask plate cleaning device along figure, sliding block
163 slide in track 162, reduce the frictional resistance relatively moved between second panel 12 and support plate 02.
Alternatively, when support plate 02 is provided with sliding block 163 close to the side of mask plate 01 to be cleaned, synkinesia part 16
Including with sliding block 163 position corresponding track 162 of the second panel 12 close to 02 side of support plate, the side of track 162 is arranged in
It is parallel to the cleaning direction of station is put into mask plate cleaning device.
Specific introduction has been done to the relative movement mode between sliding block 163 and track 162 above, it is no longer superfluous herein
It states.
Wherein, the setting quantity of track 162 and sliding block 163 corresponding with track 162 does not do specific limit in the present invention
System, it is two groups at least as shown in Figure 7, stablizing for second panel 12 can be supported mobile.
In another example as shown in fig. 6, synkinesia part 16 is multiple rolling members 161.
So, after second panel 12 being placed in support plate 02, mask plate cleaning device is gradually pushed into cleaning
During station, multiple rolling members 161 roll in support plate 02, and sliding friction is changed into rolling friction, reduce
The frictional resistance relatively moved between two panels 12 and support plate 02, reduces the surface abrasion of second panel 12 and support plate 02
Loss.
The size relationship between first panel 11 and second panel 12 and mask plate 01 is not limited in the present invention, with
Under be illustrated by cleaning mode of the concrete example to mask plate cleaning device.
For example, be two support frames, 03 spacing of second panel 12 being dimensioned slightly smaller than in support plate 02 in this example, first
Panel 11 is identical as 01 size of mask plate.
As shown in Figure 8 (Fig. 8 is the top view of mask plate cleaning device of the invention, wherein it is clear for the ease of showing,
First panel 11 is not shown), in this example, the width W of second panel 12 is as big as possible less than two support frames, 03 spacing L
Size, make it possible to second panel 12 be put between two support frames 03 and be moved to cleaning station, first panel 11 (figure
In be not shown) width and mask plate 01 it is of same size.
Since first panel 11 is identical as 01 size of mask plate, the width of second panel 12 is also that can be put into two support frames
Therefore maximum width between 03 can be moved no longer, first after this exemplary mask plate cleaning device is put into cleaning station
Multiple gas outlet b of 11 lower surface of panel can uniformly blow gas to the upper surface of entire mask plate 01, remove entire exposure mask
The dust or particle of the upper surface of version 01.Because being normally supported frame 03 is that placement mentions mask plate 01 along the edge of mask plate 01
For support, so the air-flow that multiple gas outlet b of 12 lower surface of second panel are blown out is it is also assumed that entire support can be covered
The upper surface of plate 02, to remove the dust or particle of the upper surface of entire support plate 02.
During in gas outlet, b blow gas carries out clean to mask plate 01 and support plate 02, around mask plate 01
Air-flow flowing can be generated, first panel 11 is identical as 01 size of mask plate can also be to 01 upper surface of mask plate during cleaning
It plays a protective role, the dust flowed due to air-flow by ambient air or particle is avoided to fall to the upper surface of mask plate 01,
Lead to the secondary pollution on 01 surface of mask plate.
(bottom view that Fig. 9 is second panel 12 in Fig. 8) as shown in Figure 9, positioned at second panel 12 close to support plate 02
Rolling member 161 on one side includes the axis of rolling 1611 and the roller 1612 that is interspersed on the axis of rolling 1611, in the axis of rolling 1611
Heart line is parallel with the lower surface of second panel 12 and the direction of motion (the arrow in such as Fig. 7 of cleaning station is put into second panel 12
Shown in direction) it is vertical.
So, during mask plate cleaning device is put into cleaning station, second panel 12 is put into first
Between two support frames 03, and adjust the direction of motion of second panel 12 and device to be put into the cleaning direction of motion of station identical.So
Mask plate cleaning device is pushed to move into cleaning station afterwards, roller 1612 slides on the axis of rolling 1611, roller 1612 and branch
It is rolling friction between fagging 02.
After the completion of cleaning, this exemplary mask plate cleaning device is exited along the opposite direction for being put into cleaning station, is covered rapidly
Mask plate 01 is encapsulated into the enclosed box body that support plate 02 is formed with cover board 04, avoids polluting again by closing lid plate 04.
In another example being 1/5~1/4 that the width of second panel 12 is 01 width of mask plate, first panel 11 in this example
It is identical as 12 size of second panel.
(Figure 10 is the top view of mask plate cleaning device of the invention, wherein clear for the ease of showing as shown in Figure 10
Chu, first panel 11 and mask plate 01 are not shown), in this example, 11 (not shown) of first panel and second panel 12
Size it is identical, the width W of first panel 11 is about the 1/5~1/4 of 01 width of mask plate, so, can easily by
Second panel 12 is put between mask plate 01 and support plate 02, then mask plate cleaning device is pushed to move inwardly into cleaning station
Position.
Since the width W of first panel 11 and second panel 12 is only the 1/5~1/4 of 01 width of mask plate, to exposure mask
When version 01 and 02 surface blow flow of support plate remove dust and particle, 02 table of entire mask plate 01 and support plate cannot be covered
Face.Therefore, when this exemplary mask plate cleaning device is cleaning station and carries out clean operation, need to push first panel 11 with
Second panel 12 is mobile back and forth horizontally in the width direction, dust with circulation to 02 surface of entire mask plate 01 and support plate and
Particle is blown down.
In addition, this exemplary mask plate cleaning device is saved since first panel 11 and the width of second panel 12 are smaller
Material cost, and device own wt mitigates, conveniently moving when use.
For this exemplary mask plate cleaning device, due to needing first panel 11 and second panel 12 in clean operation
It is mobile back and forth horizontally in the width direction, therefore, as shown in figure 11 (bottom view that Figure 11 is second panel 12 in Figure 10), this example
The middle rolling member 161 that 12 lower surface of second panel is arranged in includes mounting groove 1613 and the ball being arranged in mounting groove 1613
1614, the opening size of mounting groove 1613 is less than the diameter of ball 1614.
So, it can be cleaned along arbitrary directional rolling by mask plate in mounting groove 1613 due to ball 1614
During device is put into cleaning station, ball 1614 is put into the direction of motion rolling of cleaning station in mounting groove 1613 along device
It is dynamic.When cleaning station to mask plate 01 and the progress clean operation of support plate 02, pushing meanss are along first panel 11 and the second face
The width direction of plate 12 moves back and forth horizontally.The opening size of mounting groove 1613 is less than the diameter of ball 1614, can guarantee to roll
Pearl 1614 rolls in mounting groove 1613 always, does not fall out.
Due in this exemplary mask plate cleaning device other connection relationships and working method in a upper example
It is described in detail, details are not described herein again.
The above description is merely a specific embodiment, but scope of protection of the present invention is not limited thereto, any
In the technical scope disclosed by the present invention, any changes or substitutions that can be easily thought of by those familiar with the art, all answers
It is included within the scope of the present invention.Therefore, protection scope of the present invention should be with the scope of protection of the claims
It is quasi-.
Claims (9)
1. a kind of mask plate cleaning device, for mask plate to be cleaned and place the support plate of the mask plate to be cleaned into
Row cleaning, which is characterized in that including the first panel and second panel being oppositely arranged, the first panel and the second panel
Between there is gap, for mask plate to be cleaned to be set between the first panel and the second panel, and will be described
Second panel is set between the mask plate to be cleaned and the support plate and carries out clean operation；
The side of the second panel is provided with multiple gas outlets in the first panel；
The side of the first panel is at least provided with multiple gas outlets in the second panel；
The gas source being connected with the gas outlet is additionally provided on the mask plate cleaning device；
It further include limiting section, the limiting section is strip, and the fixing end of the limiting section is fixedly connected on the mask plate cleaning
On device, the second panel is arranged in close to the side of the support plate, in the mask plate sanitizer cartridge in positive stop end
It leans after putting cleaning station with the support plate side.
2. mask plate cleaning device according to claim 1, which is characterized in that deviate from described first in the second panel
The side of panel and the second panel are provided with multiple gas outlets close to the side of the first panel.
3. mask plate cleaning device according to claim 1, which is characterized in that further include fixed part, the fixed part with
The positive stop end of the limiting section is connected and is mutually perpendicular to the limiting section, the upper surface of the fixed part and the support plate
Lower surface is located in same level, and the fixed part is used for after the mask plate cleaning device is put into the cleaning station
It is connected and fixed with the lower surface of the support plate.
4. mask plate cleaning device according to claim 3, which is characterized in that the limiting section and the fixed part are one
Body structure.
5. mask plate cleaning device according to claim 1, which is characterized in that the second panel is close to the support plate
Be provided with synkinesia part on one side, the synkinesia part is for being put into cleaning station for the mask plate cleaning device
When, reduce the frictional resistance relatively moved between the second panel and the support plate.
6. mask plate cleaning device according to claim 5, which is characterized in that the synkinesia part includes multiple rollings
Part.
7. mask plate cleaning device according to claim 6, which is characterized in that the rolling member includes the axis of rolling and wears
The roller being inserted on the axis of rolling, the center line of the axis of rolling are parallel with the lower surface of the second panel and with described
The direction of motion that two panels are put into the cleaning station is vertical.
8. mask plate cleaning device according to claim 6, which is characterized in that the rolling member includes mounting groove and setting
Ball in the mounting groove, the opening size of the mounting groove are less than the diameter of the ball.
9. mask plate cleaning device according to claim 5, which is characterized in that when the support plate is close to described to be cleaned
The side of mask plate is provided with when being put into the cleaning parallel track in the direction of station with the mask plate cleaning device, described
Synkinesia part includes the sliding block corresponding with the orbital position that the second panel is arranged in close to the support plate side；
Alternatively, when the support plate is provided with sliding block close to the side of the mask plate to be cleaned, the synkinesia part packet
Include the track corresponding with the slide position that the second panel is set close to the support plate side, the side of the track
It is parallel to the cleaning direction of station is put into the mask plate cleaning device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610819424.XA CN106292179B (en) | 2016-09-12 | 2016-09-12 | A kind of mask plate cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610819424.XA CN106292179B (en) | 2016-09-12 | 2016-09-12 | A kind of mask plate cleaning device |
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| CN106292179A CN106292179A (en) | 2017-01-04 |
| CN106292179B true CN106292179B (en) | 2019-09-10 |
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| CN201610819424.XA Active CN106292179B (en) | 2016-09-12 | 2016-09-12 | A kind of mask plate cleaning device |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107600687A (en) * | 2017-09-26 | 2018-01-19 | 武汉华星光电技术有限公司 | Automatically cleaning box for photomask |
| CN108008604B (en) * | 2018-01-03 | 2023-06-27 | 苏州赛森电子科技有限公司 | Prevent scraping mask version marginal equipment |
| CN109240045A (en) * | 2018-10-18 | 2019-01-18 | 上海华力微电子有限公司 | A kind of mask plate transmission device and mask plate dust removal method |
| CN110127375B (en) * | 2019-04-28 | 2021-09-03 | 武汉华星光电技术有限公司 | Light shield taking and placing device |
| CN116494270B (en) * | 2023-06-29 | 2023-09-12 | 苏州安田丰科技有限公司 | Unloading manipulator is washd with going up to photomask version |
| CN116880137A (en) * | 2023-07-31 | 2023-10-13 | 苏州天准科技股份有限公司 | Mask supporting device and non-contact exposure equipment |
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| CN106292179A (en) | 2017-01-04 |
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