CN106292179A - A kind of mask plate cleaning device - Google Patents
A kind of mask plate cleaning device Download PDFInfo
- Publication number
- CN106292179A CN106292179A CN201610819424.XA CN201610819424A CN106292179A CN 106292179 A CN106292179 A CN 106292179A CN 201610819424 A CN201610819424 A CN 201610819424A CN 106292179 A CN106292179 A CN 106292179A
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- China
- Prior art keywords
- panel
- mask plate
- cleaning device
- gripper shoe
- cleaned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004140 cleaning Methods 0.000 title claims abstract description 131
- 238000005096 rolling process Methods 0.000 claims description 28
- 239000000428 dust Substances 0.000 abstract description 22
- 239000010419 fine particle Substances 0.000 abstract description 3
- 238000012423 maintenance Methods 0.000 abstract description 2
- 239000004531 microgranule Substances 0.000 description 18
- 239000010409 thin film Substances 0.000 description 9
- 239000003570 air Substances 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 7
- 239000010408 film Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 239000013039 cover film Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035807 sensation Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Cleaning In General (AREA)
Abstract
The embodiment of the present invention provides a kind of mask plate cleaning device, relates to mask plate maintenance field, it is possible to remove the dust in mask plate and gripper shoe or other fine particles.For to mask plate to be cleaned and place the gripper shoe of mask plate to be cleaned and be cleaned, including the first panel being oppositely arranged and the second panel, between first panel and the second panel, there is gap, for mask plate to be cleaned is arranged between the first panel and the second panel, and the second panel is arranged between mask plate to be cleaned and gripper shoe be cleaned operation；At the first panel, the side of the second panel is provided with multiple gas outlet；At least deviate from the side of the first panel at the second panel and be provided with multiple gas outlet；Mask plate cleaning device is additionally provided with the source of the gas being connected with gas outlet.
Description
Technical field
The present invention relates to mask plate maintenance field, particularly relate to a kind of mask plate cleaning device.
Background technology
(Thin Film Transistor Liquid Crystal Display, TFT-LCD shows TFT-LCD
Show device) as a kind of panel display apparatus, have that volume is little, low in energy consumption, radiationless because of it and cost of manufacture is relatively low etc.
Feature, and be applied to more and more in the middle of high-performance display field.
Box is made up of by thin film transistor-liquid crystal display array base palte and color membrane substrates.At array base palte and color film base
In the manufacturing process of plate, such as, make the source electrode of TFT, drain electrode etc. and be required to be implemented by patterning processes such as exposure etchings,
The thin layer to be processed that light is opposite on the substrate below mask plate through the light-transparent pattern preset on mask plate performs etching
Exposure, to form specific pattern on substrate.
Mask plate has composition pattern, along with screen PPI (Pixels Per Inch, the pixel count having in per inch
Mesh) increase, the composition area of the pattern on mask plate becomes more meticulous, in the case, when once falling in the composition pattern of mask plate
When falling with adhesive dust or other fine particles, the quality of mask plate can be made to be easily subject to impact, even result in and pass through mask
Version is patterned the substrate of manufacturing process and makes mistakes due to pattern and reprocess or scrap.
It is provided with in the gripper shoe 02 of bracing frame 03 as it is shown in figure 1, mask plate 01 is typically placed in surrounding when not in use,
Do not contact with any surface so that the mask pattern of mask plate 01 is unsettled, reduce the probability of collsion damage, and at mask plate
Adding cover plate 04 above in the of 01, cover plate 04 and gripper shoe 02 composition seal space to reduce mask plate 04 by extraneous dust or microgranule
The probability polluted.
Mask plate 01 needs to open cover plate 04 before use and does cleannes inspection, is blown off by air gun and removes mask plate 01 table
After face dust or microgranule, again cover cover plate 04 and seal, go-cart after being transported to workbench, by mobile manipulator by whole support
The airtight box body of plate 02 and cover plate 04 composition captures and puts in the confined space of exposure machine, according to the journey set in exposure machine
Sequence takes out mask plate 01 in exposure machine and use carries out mask exposure.
Owing to the space between mask plate 01 lower surface and gripper shoe 02 is less, air gun cannot be removed and deposit in gripper shoe 02
Dust or microgranule, the confined space in exposure machine is taken mask plate 01 time, may cause being deposited in gripper shoe 02
Dust or microgranule fall on mask plate 01 in the drive of air-flow, thus have influence on the essence of the mask exposure pattern of substrate to be processed
Really property.
Summary of the invention
Embodiments of the invention provide a kind of mask plate cleaning device, it is possible to remove the dust in mask plate and gripper shoe or
Other fine particles.
For reaching above-mentioned purpose, embodiments of the invention adopt the following technical scheme that
The one side of the embodiment of the present invention provides a kind of mask plate cleaning device, for mask plate to be cleaned and placement
The gripper shoe of mask plate to be cleaned is cleaned, including the first panel being oppositely arranged and the second panel, the first panel and second
There is gap, for being arranged between the first panel and the second panel by mask plate to be cleaned, and by the second panel between panel
It is arranged between mask plate to be cleaned and gripper shoe and is cleaned operation；It is provided with near the side of the second panel at the first panel
Multiple gas outlets；At least deviate from the side of the first panel at the second panel and be provided with multiple gas outlet；At mask plate cleaning device
On be additionally provided with the source of the gas being connected with gas outlet.
Preferably, the side of the first panel is deviated from and the second panel is all provided with near the side of the first panel at the second panel
It is equipped with multiple gas outlet.
Further, the mask plate cleaning device of the present invention also includes limiting section, and limiting section is strip, fixing of limiting section
End be fixedly connected on mask plate cleaning device, positive stop end is arranged on second panel side near gripper shoe, for cover
Film version cleaning device leans with gripper shoe side after putting into cleaning station.
Further, the mask plate cleaning device of the present invention also includes fixed part, the positive stop end phase of fixed part and limiting section
Even and being mutually perpendicular to limiting section, the upper surface of fixed part and the lower surface of gripper shoe are positioned in same level, and fixed part is used
In mask plate cleaning device put into cleaning station after connect and fix with the lower surface of gripper shoe.
Preferably, limiting section and fixed part are structure as a whole.
Preferably, the second panel is provided with assisted movement part near the one side of gripper shoe, and assisted movement part will be for covering
When film version cleaning device puts into cleaning station, reduce the frictional resistance of relative movement between the second panel and gripper shoe.
Further, assisted movement part includes multiple rolling member.
Further, rolling member includes the axis of rolling and the roller being interspersed on the axis of rolling, the centrage of the axis of rolling and
The lower surface of two panels parallel and put into the second panel cleaning station the direction of motion vertical.
Preferably, rolling member includes mounting groove and the ball being arranged in mounting groove, and the opening size of mounting groove is less than rolling
The diameter of pearl.
Further, cleaning is put into when gripper shoe is provided with near the side of mask plate to be cleaned with mask plate cleaning device
During the parallel track in the direction of station, assisted movement part include being arranged on the second panel near gripper shoe side and orbital position
Corresponding slide block；Or, when gripper shoe is provided with slide block near the side of mask plate to be cleaned, assisted movement part includes arranging
At second panel track corresponding with slide position near gripper shoe side, the direction of track is put into mask plate cleaning device
The direction of cleaning station is parallel.
The present invention provides a kind of mask plate cleaning device, is used for mask plate to be cleaned and places mask plate to be cleaned
Gripper shoe is cleaned, including the first panel being oppositely arranged and the second panel, between having between the first panel and the second panel
Gap, for being arranged between the first panel and the second panel by mask plate to be cleaned, and is arranged at cleaning mask by the second panel
Operation it is cleaned between version and gripper shoe；At the first panel, the side of the second panel is provided with multiple gas outlet；At least
The side deviating from the first panel at the second panel is provided with multiple gas outlet；Mask plate cleaning device is additionally provided with and gives vent to anger
The source of the gas that mouth is connected.During clean operation, mask plate to be cleaned is positioned at the first lower panels, and the first panel is near the second panel
Multiple gas outlets of arranging, side supply gas body to remove mask plate to be cleaned to the upper surface blown of mask plate to be cleaned
The dust of upper surface or microgranule.Meanwhile, gripper shoe is positioned at the lower section of the second panel, deviates from the side of the first panel at the second panel
Supplying gas body to the upper surface blown of gripper shoe in the multiple gas outlets arranged, to remove dust or the microgranule of the upper surface of gripper shoe, carries
The surface cleanness of high mask plate, promotes the quality of mask plate, improves the yields of the substrate made.
Accompanying drawing explanation
In order to be illustrated more clearly that the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing
In having technology to describe, the required accompanying drawing used is briefly described, it should be apparent that, the accompanying drawing in describing below is only this
Some embodiments of invention, for those of ordinary skill in the art, on the premise of not paying creative work, it is also possible to
Other accompanying drawing is obtained according to these accompanying drawings.
The storage configuration figure of a kind of mask plate that Fig. 1 provides for the present invention；
The structural representation of a kind of mask plate cleaning device that Fig. 2 provides for the present invention；
A kind of mask plate cleaning device that Fig. 3 provides for the present invention is also equipped with gas outlet at the upper surface of the second panel
Structural representation；
Fig. 4 is provided with the structural representation of limiting section for a kind of mask plate cleaning device that the present invention provides；
Fig. 5 is provided with the structural representation of fixed part for a kind of mask plate cleaning device that the present invention provides；
Fig. 6 is provided with the structural representation of assisted movement part for a kind of mask plate cleaning device that the present invention provides；
The top view that assisted movement part is slide block of a kind of mask plate cleaning device that Fig. 7 provides for the present invention；
The top view of a kind of mask plate cleaning device that Fig. 8 provides for the present invention；
Fig. 9 is the upward view of the second panel in Fig. 8；
The top view of the another kind of mask plate cleaning device that Figure 10 provides for the present invention；
Figure 11 is the upward view of the second panel in Figure 10.
Reference:
01-mask plate；011-transparency carrier；012-mask pattern；013-transparent thin film layer；02-gripper shoe；03-supports
Frame；04 cover plate；11-the first panel；12-the second panel；13-source of the gas；131-the first control valve；132-the second control valve；14-limits
Position portion；15-fixed part；16-assisted movement part；161-rolling member；The 1611-axis of rolling；1612-roller；1613-mounting groove；
1614-ball；162-track；163-slide block；Gap between a-the first panel and the second panel；B-gas outlet；L-two is collateral
The spacing of support；The width of W-the second panel.
Detailed description of the invention
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Describe, it is clear that described embodiment is only a part of embodiment of the present invention rather than whole embodiments wholely.Based on
Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under not making creative work premise
Embodiment, broadly falls into the scope of protection of the invention.
The embodiment of the present invention provides a kind of mask plate cleaning device, as in figure 2 it is shown, for mask plate 01 to be cleaned with
And the gripper shoe 02 placing mask plate 01 is cleaned, including the first panel 11 and the second panel 12 being oppositely arranged, first
There is between plate 11 and the second panel 12 gap a, use the mask plate cleaning device of the present invention to mask plate 01 to be cleaned with
And before the gripper shoe 02 placing mask plate 01 is cleaned operation, first by mask plate cleaning device along mask plate to be cleaned
The side of 01 is slowly inserted, and is arranged at by mask plate 01 to be cleaned between first panel 11 and the second panel 12, and by second
Panel 12 is arranged between mask plate 01 to be cleaned and gripper shoe 02, is then cleaned operation；Close at the first panel 11
The side of the second panel 12 is provided with multiple gas outlet b；At least deviate from the side of the first panel 11 at the second panel 12 to be provided with
Multiple gas outlet b；Mask plate cleaning device is additionally provided with the source of the gas 13 being connected with gas outlet b.
It should be noted that the gap a having between the first, the first panel 11 and the second panel 12, for the present invention's
Mask plate cleaning device is when cleaning station, and the first panel 11 is positioned on the upper surface of mask plate 01 to be cleaned, with treat clear
The upper surface of clean mask plate 01 maintains a certain distance, and meanwhile, the second panel 12 inserts mask plate 01 to be cleaned and supports
Between plate 02 and the second panel 12 upper and lower surface respectively with mask plate 01 lower surface to be cleaned and gripper shoe 02
Upper surface between maintain a certain distance so that the multiple gas outlet b arranged on the first panel and the second panel 12 with treat
There is between cleaning position the space that ensure that gas flows.Make to keep between the first panel 11 and the second panel 12 gap a
Distance, at least can be realized by following two mode.Such as, as in figure 2 it is shown, by connector by the first panel 11 and the
Two panels 12 are connected, or, as shown in Figure 4, it is also possible to be the first panel 11 and the second panel 12 is the U-shaped knot being connected as a single entity
Structure.
Second, at least deviate from the side of the first panel 11 at the second panel 12 and be provided with multiple gas outlet b and refer to permissible
For as in figure 2 it is shown, only deviate from the side of the first panel 11 at the second panel 12 to be provided with multiple gas outlet b, for gripper shoe
02 blows gas, deviates from the side of the first panel 11 be provided with the same of multiple gas outlet b additionally, be additionally included in the second panel 12
Time, gas outlet b it is also equipped with in other sides of the second panel 12, such as, as it is shown on figure 3, at the second panel 12 near first
The side of panel 11 is also equipped with multiple gas outlet b, it is possible to deviate from the second panel 12 first panel 11 side multiple go out
QI KOU b is while gripper shoe 02 upper surface blown send dedusting, and the lower surface to mask plate 01 blows dedusting, to improve
Cleaning efficiency, the most such as, is provided with multiple gas outlet b in the left and right side of the second panel 12, for outwards blowing gas, with
Guide the second panel 12 near the first panel 11 and deviate from the first panel 11 side on the gas of gas outlet b blowout to the
Region flowing beyond two panels 12, it is to avoid due to the effect of air-flow vortex, the dust blown afloat or microgranule are fallen into mask again
Version 01 and the surface of gripper shoe 02.
Additionally, be additionally provided with the source of the gas 13 being connected with gas outlet b on mask plate cleaning device, for gas in the present invention
Source 13 position is set and quantity is not particularly limited, source of the gas 13 could be arranged to one, as in figure 2 it is shown, by pipeline respectively
Gas is carried, it is also possible to be the first panel 11 to multiple gas outlet b of the first panel 11 and multiple gas outlet b of the second panel 12
It is connected with source of the gas 13 respectively with the second panel 12.
In describing the invention, it is to be understood that term " on ", D score, the side of the instruction such as "left", "right" " level "
Position or position relationship are the orientation or position relationship placed in gripper shoe 02 based on mask plate 01, are for only for ease of description originally
Invention and simplification describe rather than indicate or imply that the device of indication or element must have specific orientation, with specific square
Position structure and operation, be therefore not considered as limiting the invention.
The present invention provides a kind of mask plate cleaning device, is used for mask plate to be cleaned and places mask plate to be cleaned
Gripper shoe is cleaned, including the first panel being oppositely arranged and the second panel, between having between the first panel and the second panel
Gap, for being arranged between the first panel and the second panel by mask plate to be cleaned, and is arranged at cleaning mask by the second panel
Operation it is cleaned between version and gripper shoe；At the first panel, the side of the second panel is provided with multiple gas outlet；At least
The side deviating from the first panel at the second panel is provided with multiple gas outlet；Mask plate cleaning device is additionally provided with and gives vent to anger
The source of the gas that mouth is connected.During clean operation, mask plate to be cleaned is positioned at the first lower panels, and the first panel is near the second panel
Multiple gas outlets of arranging, side supply gas body to remove mask plate to be cleaned to the upper surface blown of mask plate to be cleaned
The dust of upper surface or microgranule.Meanwhile, gripper shoe is positioned at the lower section of the second panel, deviates from the side of the first panel at the second panel
Supplying gas body to the upper surface blown of gripper shoe in the multiple gas outlets arranged, to remove dust or the microgranule of the upper surface of gripper shoe, carries
The surface cleanness of high mask plate, promotes the quality of mask plate, improves the yields of the substrate made.
Along with the development in Display Technique field, display floater is more and more diversified according to different customer demands,
Making for display floater higher for PPI (Pixels Per Inch, the number of pixels having in per inch), it is necessary to make
It is nano level fine mask version with composition pattern.For the mask plate 01 that this type of composition pattern is fine, as in figure 2 it is shown, its structure
Figure pattern is formed on mask pattern 012, in order to protect mask pattern 012, generally mask pattern 012 is attached at transparency carrier
The lower surface of 011, it is to avoid it is internal that dust or microgranule fall into mask pattern 012 from top, and owing to transparency carrier 011 is usual
For having certain thickness hard plate, it is possible to the upper surface being effectively protected mask pattern 012 is not collided or because external force is made
Become damage, in order to protect the lower surface of mask pattern 012, it is to avoid with air contact, oxidation occur or cause corrosion-damaged, in patch
Attached mask pattern 012 lower surface attaches transparent thin film layer 013, and transparent thin film layer 013 also is able to prevent dust or micro-simultaneously
It is internal that grain is fallen into mask pattern 012 by the lower surface of mask pattern 012.
By the present invention at the second panel 12, near the side of the first panel 11 and to deviate from the side of the first panel 11 equal
It is provided with the structure of multiple venthole b when being applied to that the mask plate 01 that composition pattern is fine is cleaned work, owing to arranging
The thickness of the transparent thin film layer 013 on mask pattern 012 lower surface is relatively thin, by the second panel 12 near the first panel 11
The air velocity that the gas outlet b that side is arranged blows to fine mask plate 01 lower surface is relatively big, may be by transparent thin film layer
013 blows brokenly, thus causes the lower surface of mask pattern 012 directly and contacting external air, causes mask pattern 012 corrode or make
It is internal that dust or microgranule enter mask pattern 012, and causing mask plate 01 to pollute cannot use；Or owing to its effect flowed makes to cover
Film figure 012 occurs the movement of position even to come off on transparency carrier 011.
When using, above-mentioned at the second panel 12, near the side of the first panel 11 and to deviate from the side of the first panel 11 equal
It is provided with the mask plate cleaning device structure of multiple gas outlet time the mask plate 01 become more meticulous is cleaned operation, it is preferred that
As it is shown on figure 3, the second panel 12 is provided with the first control at the Inlet Position of multiple gas outlet b of the side of the first panel 11
Valve 131 processed, controls to be also equipped with near the side of the first panel 11 stream of multiple gas outlet b output gas by the second panel 12
Speed；It is provided with the second control valve at the Inlet Position of multiple gas outlet b that the second panel 12 deviates from the side of the first panel 11
132, control to be deviated from the flow velocity of multiple gas outlet b output gas of the side of the first panel 11 by the second panel 12.
So, as it is shown on figure 3, work as the second panel 12 to be also equipped with multiple gas outlet near the side of the first panel 11
During b, it is possible to individually controlled to blow to the air-flow velocity of mask plate 01 lower surface by the first control valve 131, will be to mask plate 01 time
It is less that the air-flow velocity that surface blows adjusts, it is to avoid blows brokenly the transparent thin film layer being arranged on mask pattern 012 lower surface
013, or make mask pattern 012 the mobile skew of position occur under the blowing of air-flow on transparency carrier 01 even because attaching
Insecure and drop.Second control valve 132 is set to can blow down normally the air velocity of dust or microgranule, on the one hand to covering
Film version 01 and gripper shoe 02 are cleaned, when also on the other hand being able to avoid air-flow excessive, owing to the vortex effect of air-flow makes
Stream of bringing about the desired sensation is tipping up, and mask plate 01 lower surface is used for protecting the transparent thin film layer 013 of mask pattern 012 cause breakage.
Additionally, phase can also be arranged at the Inlet Position of the multiple gas outlet b arranged near the second panel 12 side to the first panel 11
The control valve (not shown) answered, and in figure, source of the gas 13 is not shown, the multiple gas outlet b being arranged at three different surfaces are permissible
Share a source of the gas 13, it is also possible to individually connect source of the gas 13, be not specifically limited herein.
Further, the multiple gas outlet b on the first heretofore described panel 11 and the second panel 12 are all
Even distribution, for example, it is possible to be the distribution in matrix form as shown in Figure 9, to improve the mask plate cleaning device of the present invention to covering
The surface of film version 01 and gripper shoe 02 blows the uniformity of gas, improves dust or the removal effect of microgranule, goes out in the present invention
The shape of QI KOU b is not specifically limited, and can be circle as shown in Figure 9, it is also possible to for other shapes.
Further, as shown in Figure 4, the mask plate cleaning device of the present invention also includes that limiting section 14, limiting section 14 are bar
Shape, the fixing end of limiting section 14 is fixedly connected on mask plate cleaning device, and positive stop end is arranged on the second panel 12 near supporting
The side of plate 02, for mask plate cleaning device put into cleaning station after lean with gripper shoe 02 side.
It should be noted that arrange limiting section 14 for mask plate cleaning device put into cleaning station time, to mask plate
The position of putting into of cleaning device is defined, it is to avoid puts into position and excessively deeply causes the first panel 11 and the second panel 12
Link position collides with mask plate 01, causes mask plate 01 to damage.
As shown in Figure 4, the fixing end of limiting section 14 can be arranged on the lower surface of the second panel 12, or can also set
Putting at the first panel 11 and link position of the second panel 12, be not specifically limited herein, the positive stop end of limiting section 14 is stretched downwards
Going out, the length stretched out at least ensures below beyond gripper shoe 02 upper surface.So, at mask plate cleaning device to cleaner
When putting in Wei, limiting section 14 is gradually the most close to the side of gripper shoe 02, until moving to limiting section 14 and gripper shoe 02
The position that side leans, i.e. reaches predetermined cleaning station, and now mask plate cleaning device is by limiting section 14 and gripper shoe
02 power offseted can not be further continued for moving forward, it is to avoid puts into position and crosses deep and collide in mask plate 01.
As shown in Figure 4, due on the multiple gas outlet b on the first panel 11 lower surface and the second panel 12 lower surface
Multiple gas outlet b are and blow downwards gas (direction as shown by the arrows in Figure 4), and the gas impact of gas outlet b blowout is being covered
Film version 01 upper surface and the upper surface of gripper shoe 02 retroeflection, the active force of air-flow reflection can promote the first panel 11 and the
Two panels 12 move up, owing to the spacing between mask plate 01 and gripper shoe 02 is less, and the model that the second panel 12 moves up
Enclose slightly larger it is possible to understand the mask pattern 012 of damaged in collision mask plate 01 lower surface.
On this basis, further, as it is shown in figure 5, the mask plate cleaning device of the present invention also includes fixed part 15, Gu
Determine portion 15 be connected with the positive stop end of limiting section 14 and be mutually perpendicular to limiting section 14, the upper surface of fixed part 15 and gripper shoe 02
Lower surface is positioned in same level, fixed part 15 for mask plate cleaning device put into cleaning station after with gripper shoe 02
Lower surface connect and fix.
Owing to the gripper shoe 02 of mask plate 01 and placement mask plate 01 is placed on artificial fork as shown in Figure 5 before use
Operating position is pushed on car and by artificial fork truck, when needing to use the mask plate cleaning device of the present invention to be cleaned, will
Roller bottom fork truck is checked, and mask plate cleaning device is put into cleaning station be cleaned operating, due to gripper shoe
02 is arranged on fork truck, has a certain distance space between gripper shoe 02 and ground, therefore, it is possible to realize putting into fixed part 15
Gripper shoe 02 lower surface the lower surface with gripper shoe 02 connect and fix.
So, when mask plate cleaning device is put in cleaning station, it is arranged on limiting section 14 positive stop end
Fixed part 15 the most gradually stretch into gripper shoe 02 lower surface and with the lower surface clamping of gripper shoe 02.At mask plate cleaning device pair
When mask plate 01 and gripper shoe 02 are cleaned, owing to the lower surface of fixed part 15 with gripper shoe 02 connects and fixes so that first
The position of panel 11 and the second panel 12 is fixed, and the active force of air-flow reflection cannot promote the second panel 12 to move up, to covering
The mask pattern 012 of film version 02 lower surface plays the effect of protection.
The first panel 11 and the second panel 12 is promoted to move up additionally, due to fixed part 15 needs to bear air-flow reflection
Power, therefore, according to the size of air-flow reflection motive force, fixed part 15 can be strip or tabular, and fixed part 15 stretches into gripper shoe
The distance of 02 lower surface specifically can also be arranged according to the size of air-flow reflection motive force, if air-flow velocity is relatively big, air-flow reflects
Motive force is the biggest, then fixed part 15 is set to tabular, and the distance stretching into gripper shoe 02 lower surface arrange longer, to protect
The stability that card is fixing.
In order to cost-effective, it is preferred that as shown in Figure 6, limiting section 14 and fixed part 15 are structure as a whole.
Additionally, fixed part 15 can also be provided separately within other sides of mask plate cleaning device, it is not arranged in limiting section
Under the positive stop end of 14, this is not specifically limited by the present invention.
When the mask plate cleaning device of the present invention being put into cleaning station, if directly the second panel 12 being inserted mask plate
Between 01 and gripper shoe 02, owing to the space between mask plate 01 and gripper shoe 02 is less, artificial being difficult to controls the steady of insertion
Property, the careless slightly mask pattern 012 colliding mask plate 01 lower surface most probably during insertion, and the second panel 12 is placed on
Gradually push cleaning station in gripper shoe 02, it is possible to collision free mask pattern 012, but the lower surface of the second panel 12 with
Between the upper surface of fagging 02, frictional resistance is relatively big, and Reusability can increase the second panel 12 and the surface abrasion of gripper shoe 02.
Preferred in order to solve the problems referred to above, as shown in Figure 6, the second panel 12 is provided with auxiliary near the one side of gripper shoe 02
Help movement parts 16, assisted movement part 16 for when mask plate cleaning device being put into cleaning station, reduce the second panel 12 with
The frictional resistance of relative movement between gripper shoe 02.
Below to the shape of assisted movement part 16, position is set and work process is specifically described.
Such as, (Fig. 7 is the top view of mask plate cleaning device of the present invention, wherein, for the ease of display as shown in Figure 7
Clear, the first panel 11 and mask plate 01 are not shown), when gripper shoe 02 be provided with near the side of mask plate 01 to be cleaned with
When mask plate cleaning device puts into the parallel track 162 in direction of cleaning station, assisted movement part 16 includes being arranged on second
Plate 12 is near the slide block 163 corresponding with track 162 position of gripper shoe 02 side.
So, as it is shown in fig. 7, be arranged on second panel 12 slide block 163 near gripper shoe 02 side to put into mask
The track 162 of version 01 correspondence position, when cleaning station is put in mask plate cleaning device direction shown in arrow along figure, slide block
163 slide in track 162, reduce the frictional resistance of relative movement between the second panel 12 and gripper shoe 02.
Or, when gripper shoe 02 is provided with slide block 163 near the side of mask plate 01 to be cleaned, assisted movement part 16
Including being arranged on second panel 12 track 162 corresponding with slide block 163 position near gripper shoe 02 side, the side of track 162
Parallel to the direction putting into cleaning station with mask plate cleaning device.
Below the relative movement mode between slide block 163 and track 162 has been done concrete introduction, the most superfluous
State.
Wherein, the quantity that arranges of track 162 and the slide block 163 corresponding with track 162 does not the most do concrete limit
System, two groups the most as shown in Figure 7, it is possible to support the stable movement of the second panel 12.
The most such as, as shown in Figure 6, assisted movement part 16 is multiple rolling members 161.
So, after being placed in gripper shoe 02 by the second panel 12, mask plate cleaning device is gradually pushed cleaning
During station, multiple rolling members 161 roll in gripper shoe 02, and sliding friction is changed into rolling friction, reduce
The frictional resistance of relative movement between two panels 12 and gripper shoe 02, reduces the second panel 12 and the surface abrasion of gripper shoe 02
Loss.
The present invention is not construed as limiting for the size relationship between the first panel 11 and the second panel 12 and mask plate 01, with
Under by concrete example, the cleaning mode of mask plate cleaning device is illustrated.
Such as, this example is two bracing frame 03 spacing being dimensioned slightly smaller than in gripper shoe 02 of the second panel 12, first
Panel 11 is equivalently-sized with mask plate 01.
As shown in Figure 8 (Fig. 8 is the top view of mask plate cleaning device of the present invention, wherein, clear for the ease of display,
First panel 11 is not shown), in this example, the width W of the second panel 12 is the biggest less than two bracing frame 03 spacing L
Size, enabling the second panel 12 is put between two bracing frames 03 and mobile to cleaning station, and the first panel 11 (is schemed
Not shown in) width identical with the width of mask plate 01.
Owing to the first panel 11 is identical with mask plate 01 size, the width of the second panel 12 is also for can put into two bracing frames
Breadth Maximum between 03, therefore, can no longer move, first after the mask plate cleaning device of this example puts into cleaning station
Multiple gas outlet b of panel 11 lower surface can uniformly blow gas to the upper surface of whole mask plate 01, removes whole mask
The dust of the upper surface of version 01 or microgranule.Because be normally supported frame 03 be along mask plate 01 edge place mask plate 01 is carried
For supporting, so the air-flow of multiple gas outlet b blowout of the second panel 12 lower surface is it is also assumed that whole support can be covered
The upper surface of plate 02, to remove dust or the microgranule of the upper surface of whole gripper shoe 02.
During mask plate 01 and gripper shoe 02 are cleaned by gas outlet b blow gas, around mask plate 01
Can produce air current flow, the first panel 11 is identical with mask plate 01 size can also be to mask plate 01 upper surface during cleaning
Play a protective role, it is to avoid owing to the dust in ambient air or microgranule are fallen to the upper surface of mask plate 01 by air current flow,
Cause the secondary pollution on mask plate 01 surface.
As shown in Figure 9 (Fig. 9 is the upward view of the second panel 12 in Fig. 8), it is positioned at the second panel 12 near gripper shoe 02
The rolling member 161 of one side includes the axis of rolling 1611 and the roller 1612 being interspersed on the axis of rolling 1611, in the axis of rolling 1611
Heart line is parallel with the lower surface of the second panel 12 and puts into the direction of motion of cleaning station (such as arrow in Fig. 7 with the second panel 12
Shown direction) vertical.
So, during mask plate cleaning device is put into cleaning station, first the second panel 12 is put into
Between two bracing frames 03, and the direction of motion adjusting the second panel 12 put into device cleaning station the direction of motion identical.So
Rear promotion mask plate cleaning device moves in cleaning station, and roller 1612 slides on the axis of rolling 1611, roller 1612 with prop up
For rolling friction between fagging 02.
After having cleaned, the mask plate cleaning device of this example is exited along the opposite direction putting into cleaning station, covers rapidly
Closing lid plate 04, is encapsulated into mask plate 01 in the enclosed box body that gripper shoe 02 and cover plate 04 form, it is to avoid again pollute.
The most such as, this example is width is mask plate 01 width the 1/5～1/4 of the second panel 12, the first panel 11
Equivalently-sized with the second panel 12.
(Figure 10 is the top view of mask plate cleaning device of the present invention, wherein, clear for the ease of display as shown in Figure 10
Chu, the first panel 11 and mask plate 01 are not shown), in this example, the first panel 11 (not shown) and the second panel 12
Size identical, the width W of the first panel 11 is about the 1/5～1/4 of mask plate 01 width, so, it is possible to easily will
Second panel 12 is put between mask plate 01 and gripper shoe 02, then promotes mask plate cleaning device to move inwardly into cleaning station
Position.
Owing to the width W of the first panel 11 and the second panel 12 is only the 1/5～1/4 of mask plate 01 width, to mask
When version 01 and gripper shoe 02 surface blow flow dust out and microgranule, it is impossible to cover whole mask plate 01 and gripper shoe 02 table
Face.Therefore, when the mask plate cleaning device of this example is when cleaning station and being cleaned operation, need to promote the first panel 11 with
Second panel 12 horizontal reciprocating in the width direction moves, with circulation the dust to whole mask plate 01 and gripper shoe 02 surface and
Microgranule blows down.
Additionally, the mask plate cleaning device of this example is less with the width of the second panel 12 due to the first panel 11, save
Material cost, and device own wt alleviates, conveniently moving during use.
For the mask plate cleaning device of this example, owing to needing the first panel 11 and the second panel 12 when clean operation
Horizontal reciprocating moves in the width direction, therefore, and (Figure 11 is the upward view of the second panel 12 in Figure 10), this example as shown in figure 11
In be arranged on the rolling member 161 of the second panel 12 lower surface and include mounting groove 1613 and the ball being arranged in mounting groove 1613
1614, the opening size of mounting groove 1613 is less than the diameter of ball 1614.
So, owing to mask plate can cleaned in mounting groove 1613 by ball 1614 along arbitrary directional rolling
During device puts into cleaning station, the direction of motion rolling of cleaning station put in mounting groove 1613 by ball 1614 along device
Dynamic.When cleaning station and mask plate 01 and gripper shoe 02 being cleaned operation, pushing means is along the first panel 11 and second
The width horizontal reciprocating of plate 12 moves.The opening size of mounting groove 1613 is less than the diameter of ball 1614, it is possible to ensure rolling
Pearl 1614 rolls all the time in mounting groove 1613, does not falls out.
Due to other annexations in the mask plate cleaning device of this example and working method in a upper example
Being described in detail, here is omitted.
The above, the only detailed description of the invention of the present invention, but protection scope of the present invention is not limited thereto, and any
Those familiar with the art in the technical scope that the invention discloses, the change that can readily occur in or replacement, all answer
Contain within protection scope of the present invention.Therefore, protection scope of the present invention should be with described scope of the claims
Accurate.
Claims (10)
1. a mask plate cleaning device, for mask plate to be cleaned and place the gripper shoe of described mask plate to be cleaned and enter
Row cleaning, it is characterised in that include the first panel and the second panel being oppositely arranged, described first panel and described second panel
Between there is gap, for being arranged between described first panel and described second panel by mask plate to be cleaned, and by described
Second panel is arranged between described mask plate to be cleaned and described gripper shoe and is cleaned operation；
At described first panel, the side of described second panel is provided with multiple gas outlet；
At least deviate from the side of described first panel at described second panel and be provided with multiple gas outlet；
Described mask plate cleaning device is additionally provided with the source of the gas being connected with described gas outlet.
Mask plate cleaning device the most according to claim 1, it is characterised in that deviate from described first at described second panel
Side and described second panel of panel are provided with multiple gas outlet near the side of described first panel.
Mask plate cleaning device the most according to claim 1, it is characterised in that also include that limiting section, described limiting section are
Strip, the fixing end of described limiting section is fixedly connected on described mask plate cleaning device, and positive stop end is arranged on described second
Plate is near the side of described gripper shoe, with described gripper shoe side after putting into cleaning station at described mask plate cleaning device
Face leans.
Mask plate cleaning device the most according to claim 3, it is characterised in that also include fixed part, described fixed part with
The positive stop end of described limiting section is connected and is mutually perpendicular to described limiting section, the upper surface of described fixed part and described gripper shoe
Lower surface is positioned in same level, and described fixed part is for after described mask plate cleaning device puts into described cleaning station
Connect and fix with the lower surface of described gripper shoe.
Mask plate cleaning device the most according to claim 4, it is characterised in that described limiting section and described fixed part are one
Body structure.
Mask plate cleaning device the most according to claim 1, it is characterised in that described second panel is near described gripper shoe
One side be provided with assisted movement part, described assisted movement part is for putting into cleaning station by described mask plate cleaning device
Time, reduce the frictional resistance of relative movement between described second panel and described gripper shoe.
Mask plate cleaning device the most according to claim 6, it is characterised in that described assisted movement part includes multiple rolling
Part.
Mask plate cleaning device the most according to claim 7, it is characterised in that described rolling member includes the axis of rolling and wears
Being inserted in the roller on the described axis of rolling, the centrage of the described axis of rolling is parallel with the lower surface of described second panel and with described
The direction of motion that described cleaning station put into by two panels is vertical.
Mask plate cleaning device the most according to claim 7, it is characterised in that described rolling member includes mounting groove and setting
Ball in described mounting groove, the opening size of described mounting groove is less than the diameter of described ball.
Mask plate cleaning device the most according to claim 6, it is characterised in that treat clear described in close when described gripper shoe
The side of clean mask plate is provided with when putting into the parallel track in the direction of described cleaning station with described mask plate cleaning device, institute
State the cunning corresponding with described orbital position that assisted movement part includes being arranged on described second panel near described gripper shoe side
Block；
Or, when described gripper shoe is provided with slide block near the side of described mask plate to be cleaned, described assisted movement part bag
Include the track corresponding with described slide position being arranged on described second panel near described gripper shoe side, the side of described track
Parallel to the direction putting into described cleaning station with described mask plate cleaning device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610819424.XA CN106292179B (en) | 2016-09-12 | 2016-09-12 | A kind of mask plate cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610819424.XA CN106292179B (en) | 2016-09-12 | 2016-09-12 | A kind of mask plate cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106292179A true CN106292179A (en) | 2017-01-04 |
| CN106292179B CN106292179B (en) | 2019-09-10 |
Family
ID=57711122
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610819424.XA Expired - Fee Related CN106292179B (en) | 2016-09-12 | 2016-09-12 | A kind of mask plate cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106292179B (en) |
Cited By (6)
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| CN107600687A (en) * | 2017-09-26 | 2018-01-19 | 武汉华星光电技术有限公司 | Automatically cleaning box for photomask |
| CN108008604A (en) * | 2018-01-03 | 2018-05-08 | 苏州赛森电子科技有限公司 | Equipment for preventing edge of mask from being scraped |
| CN109240045A (en) * | 2018-10-18 | 2019-01-18 | 上海华力微电子有限公司 | A kind of mask plate transmission device and mask plate dust removal method |
| CN110127375A (en) * | 2019-04-28 | 2019-08-16 | 武汉华星光电技术有限公司 | Photomask picking and placing device |
| CN116494270A (en) * | 2023-06-29 | 2023-07-28 | 苏州安田丰科技有限公司 | Unloading manipulator is washd with going up to photomask version |
| CN116880137A (en) * | 2023-07-31 | 2023-10-13 | 苏州天准科技股份有限公司 | Mask supporting device and non-contact exposure equipment |
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| US20010055104A1 (en) * | 2000-06-27 | 2001-12-27 | Shigeo Irie | Exposure method and apparatus |
| US20020083957A1 (en) * | 2001-01-04 | 2002-07-04 | Reid Paul B. | Method and apparatus for in-situ lithography mask cleaning |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107600687A (en) * | 2017-09-26 | 2018-01-19 | 武汉华星光电技术有限公司 | Automatically cleaning box for photomask |
| CN108008604A (en) * | 2018-01-03 | 2018-05-08 | 苏州赛森电子科技有限公司 | Equipment for preventing edge of mask from being scraped |
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| CN109240045A (en) * | 2018-10-18 | 2019-01-18 | 上海华力微电子有限公司 | A kind of mask plate transmission device and mask plate dust removal method |
| CN110127375A (en) * | 2019-04-28 | 2019-08-16 | 武汉华星光电技术有限公司 | Photomask picking and placing device |
| CN116494270A (en) * | 2023-06-29 | 2023-07-28 | 苏州安田丰科技有限公司 | Unloading manipulator is washd with going up to photomask version |
| CN116494270B (en) * | 2023-06-29 | 2023-09-12 | 苏州安田丰科技有限公司 | Unloading manipulator is washd with going up to photomask version |
| CN116880137A (en) * | 2023-07-31 | 2023-10-13 | 苏州天准科技股份有限公司 | Mask supporting device and non-contact exposure equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106292179B (en) | 2019-09-10 |
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Granted publication date: 20190910 |