CN106062258B - 晶体培养用坩埚、具备该晶体培养用坩埚的晶体培养装置以及晶体培养方法 - Google Patents

晶体培养用坩埚、具备该晶体培养用坩埚的晶体培养装置以及晶体培养方法 Download PDF

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CN106062258B
CN106062258B CN201480076252.0A CN201480076252A CN106062258B CN 106062258 B CN106062258 B CN 106062258B CN 201480076252 A CN201480076252 A CN 201480076252A CN 106062258 B CN106062258 B CN 106062258B
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crystal
crucible
mentioned
crystal growth
distillate
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CN106062258A (zh
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神田乔之
小南信也
上野雄郎
上野雄一郎
石津崇章
清野知之
高桥勋
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Hitachi Ltd
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    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/08Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
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    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
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    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G15/00Compounds of gallium, indium or thallium
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    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/002Crucibles or containers for supporting the melt
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    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/007Mechanisms for moving either the charge or the heater
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/14Crucibles or vessels
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/16Heating of the molten zone
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    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/12Halides
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    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/46Sulfur-, selenium- or tellurium-containing compounds
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    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002Crucibles or containers
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    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/007Apparatus for preparing, pre-treating the source material to be used for crystal growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/42Gallium arsenide
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    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/46Sulfur-, selenium- or tellurium-containing compounds
    • C30B29/48AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
CN201480076252.0A 2014-02-27 2014-10-08 晶体培养用坩埚、具备该晶体培养用坩埚的晶体培养装置以及晶体培养方法 Expired - Fee Related CN106062258B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014-036375 2014-02-27
JP2014036375A JP6162625B2 (ja) 2014-02-27 2014-02-27 結晶育成用るつぼおよびそれを備えた結晶育成装置ならびに結晶育成方法
PCT/JP2014/077016 WO2015129091A1 (ja) 2014-02-27 2014-10-08 結晶育成用るつぼおよびそれを備えた結晶育成装置ならびに結晶育成方法

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CN106062258B true CN106062258B (zh) 2018-05-29

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US (1) US20160348270A1 (enExample)
EP (1) EP3112503A4 (enExample)
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WO (1) WO2015129091A1 (enExample)

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WO2018039583A1 (en) * 2016-08-26 2018-03-01 Northwestern University Methods for the synthesis, purification and crystal growth of inorganic crystals for hard radiation detectors
CN106191785B (zh) * 2016-09-27 2018-09-18 京东方科技集团股份有限公司 坩埚、蒸镀装置及蒸镀系统
CN116516461A (zh) * 2018-11-22 2023-08-01 北京滨松光子技术股份有限公司 一种溴化铊半导体单晶的生长方法及设备

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DE1143644B (de) * 1960-10-12 1963-02-14 Knapsack Ag Verfahren zur Gewinnung von Magnesium durch elektrothermische Reduktion von Dolomit
JPS55121999A (en) * 1979-03-15 1980-09-19 Shiro Sakuragi Preparing high-purity metal halide
JPS61201690A (ja) * 1985-03-04 1986-09-06 Nippon Telegr & Teleph Corp <Ntt> 化合物半導体単結晶の育成方法および育成装置
JPH0791059B2 (ja) * 1987-05-26 1995-10-04 三菱マテリアル株式会社 ガリウムの回収方法
JPH0710674A (ja) * 1993-06-23 1995-01-13 Mitsubishi Chem Corp 無機化合物単結晶成長方法
JP2002286847A (ja) * 2001-03-22 2002-10-03 Reitekku:Kk 半導体放射線検出装置
JP4187236B2 (ja) * 2002-08-12 2008-11-26 スガイ化学工業株式会社 アダマンタノンの精製方法
JP5143440B2 (ja) * 2007-02-01 2013-02-13 森田化学工業株式会社 フッ化水素酸、塩酸およびケイフッ化水素酸を含有する廃液から酸成分を分離・回収する方法およびその装置
CN100516319C (zh) * 2007-12-19 2009-07-22 华中科技大学 一种无籽晶垂直气相生长溴化铊单晶方法
CN100516318C (zh) * 2007-12-19 2009-07-22 华中科技大学 一种自发成核生长溴化铊单晶方法
JP2009256119A (ja) * 2008-04-14 2009-11-05 Hitachi Chem Co Ltd 原料蒸留用器具、及び、シンチレータ用結晶の製造方法
JP2011225742A (ja) * 2010-04-21 2011-11-10 Hitachi Chem Co Ltd 原料精製装置およびシンチレータ用単結晶の製造方法
DE102010044017B4 (de) * 2010-11-17 2013-06-20 Carl Zeiss Smt Gmbh Verfahren zur Herstellung von Alkali- oder Erdalkalifluorid-Kristallen und nach dem Verfahren hergestellte Kristalle
US8512470B2 (en) * 2011-04-08 2013-08-20 China Crystal Technologies Co. Ltd System and methods for growing high-resistance single crystals

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EP3112503A4 (en) 2017-08-23
WO2015129091A1 (ja) 2015-09-03
JP6162625B2 (ja) 2017-07-12
JP2015160771A (ja) 2015-09-07
CN106062258A (zh) 2016-10-26
EP3112503A1 (en) 2017-01-04
US20160348270A1 (en) 2016-12-01

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