CN105568224A - Shielding device used for evaporation and evaporation equipment - Google Patents
Shielding device used for evaporation and evaporation equipment Download PDFInfo
- Publication number
- CN105568224A CN105568224A CN201610059917.8A CN201610059917A CN105568224A CN 105568224 A CN105568224 A CN 105568224A CN 201610059917 A CN201610059917 A CN 201610059917A CN 105568224 A CN105568224 A CN 105568224A
- Authority
- CN
- China
- Prior art keywords
- evaporation
- substrate
- occlusion device
- radical occlusion
- barrier structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008020 evaporation Effects 0.000 title claims abstract description 34
- 238000001704 evaporation Methods 0.000 title claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 28
- 239000000758 substrate Substances 0.000 claims description 37
- 230000004888 barrier function Effects 0.000 claims description 25
- 239000004744 fabric Substances 0.000 claims description 21
- 230000000903 blocking effect Effects 0.000 claims description 9
- 238000007740 vapor deposition Methods 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 230000000274 adsorptive effect Effects 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 238000010521 absorption reaction Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 230000009286 beneficial effect Effects 0.000 abstract description 3
- 230000002035 prolonged effect Effects 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000003245 working effect Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a shielding device used for evaporation and is used for preventing the pollution of materials to evaporation equipment during evaporation. The shielding device comprises a shielding base plate and a shielding structure, wherein the shielding structure is used for increasing the roughness of the surface of the shielding base plate and arranged on the shielding base plate. The shielding device used for evaporation and the evaporation equipment have the beneficial effects that the service life of the shielding device is prolonged, and the pollution of vacuum chambers is prevented.
Description
Technical field
The present invention relates to LCD product manufacture technology field, particularly relate to a kind of evaporation radical occlusion device and evaporated device.
Background technology
Using evaporation coating method to make OLED product is the making method comparing main flow at present.What evaporation generally adopted is that vacuum chamber adds evaporation source, by material disperse in vacuum chamber, realizes film forming.Adopt this making method, also can be deposited on the chamber wall of vacuum chamber at the process in which materials of film forming, cause the pollution to chamber wall, cause product yield to decline.The terms of settlement of current main flow is in vacuum cavity, increase material blocks device.The radical occlusion device of present main flow is exactly that the cated plank of apparatus blocks, and because plank face is flat, the limited material that can pin, so want frequent carrying out to change.
Summary of the invention
In order to solve the problems of the technologies described above, the invention provides a kind of evaporation radical occlusion device and evaporated device, adding the duration of service of radical occlusion device, decrease the pollution of evaporated material to cavity.
In order to achieve the above object, the technical solution used in the present invention is: a kind of evaporation radical occlusion device, and during for preventing evaporation, material is to the pollution of evaporated device, comprising:
One blocks substrate;
For increasing the described barrier structure blocking the irregularity degree on the surface of substrate, block on substrate described in described barrier structure is arranged at.
Further, the surface of blocking substrate described in arranges concaveconvex structure to form described barrier structure.
Further, described barrier structure is the fenestral fabric that multiple hollow cylinder structure is connected to form.
Further, the cross-sectional shape of described hollow cylinder structure is circle, tetragon or hexagon.
Further, described fenestral fabric is dismountable be connected to described in block on substrate.
Further, described fenestral fabric magnetic absorption blocks on substrate in described.
Further, block substrate described in and adopt iron work, described fenestral fabric employing magneticsubstance or magnetisable material making.
Further, described fenestral fabric comprises multiple subnet grating texture.
Further, block substrate described in and the one side connecting described barrier structure is provided with adsorptive coating for adsorbing the material that evaporation goes out.
The embodiment of the present invention also provides a kind of evaporated device, comprises vapor deposition source, vacuum cavity and is arranged at the above-mentioned evaporation radical occlusion device in described vacuum cavity.
The invention has the beneficial effects as follows: in the work-ing life increasing radical occlusion device, prevent the pollution of vacuum cavity.
Accompanying drawing explanation
Fig. 1 represents radical occlusion device structural representation of the present invention;
Fig. 2 represents radical occlusion device local structure schematic diagram of the present invention.
Embodiment
Be described in detail to characteristic sum principle of the present invention below in conjunction with accompanying drawing, illustrated embodiment, only for explaining the present invention, not limits protection scope of the present invention with this.
As shown in Figure 1, the present embodiment provides a kind of evaporation radical occlusion device, and during for preventing evaporation, material is to the pollution of evaporated device, comprising:
One blocks substrate 1;
For increasing the described barrier structure 2 blocking the irregularity degree on the surface of substrate 1, block on substrate 1 described in described barrier structure 2 is arranged at.
The planeness on the surface of substrate 1 is blocked described in the setting of described barrier structure 2 adds, described barrier structure 2 is used in combination with the described substrate 1 that blocks, add the sticking power of the material of vapor deposition source volatilization, add the work-ing life of radical occlusion device, relative to the radical occlusion device only arranging plank in prior art, the radical occlusion device in the present embodiment need not be changed frequently, uses manpower and material resources sparingly, and radical occlusion device more effectively carries the material of vapor deposition source volatilization, prevents the pollution of vacuum cavity.
In the present embodiment, described barrier structure 2 can be an one-piece construction with the described substrate 1 that blocks, the specific form of described barrier structure 2 can have multiple, as long as block the irregularity degree of substrate 1 described in realization increases, coordinate the material that effectively can carry vapor deposition source and volatilize with the described substrate 1 that blocks, in one embodiment of the invention, described surface of blocking substrate 1 arranges concaveconvex structure to form described barrier structure 2, and this concaveconvex structure can with described to block substrate 1 one-body molded.
Described concaveconvex structure can be rule, conforming structure, also can be erratic structure.
Will have certain degree of depth to carry barrier structure 2 described in more material, in the present embodiment, described barrier structure 2 is the fenestral fabric that multiple hollow cylinder structure is connected to form.The material of vapor deposition source volatilization to be effectively fixed in fenestral fabric and not easily to drop, the degree of depth of described hollow cylinder structure should not too dark, the degree of depth too conference affect entering of the material that vapor deposition source volatilizees, preferably, the degree of depth of the hollow cylinder structure in the present embodiment is: 1mm-3mm.
After deposition material deposits on fenestral fabric, situation as shown in Figure 2, the schematic diagram of what Fig. 2 represented an is hollow cylinder structure, drop on the material blocked on 1 less, drop on the material blocking substrate 1 and column structure intersection more, due to the existence of fenestral fabric, material has well been fixed in radical occlusion device, not easily drop, in addition, because hollow cylinder structure exists certain degree of depth, therefore, it is possible to hold more evaporation material.
The shape in the cross section of described hollow cylinder can be geometrical shape or irregular non-geometrically, and in the present embodiment, the cross-sectional shape of described hollow cylinder structure is circle, tetragon or hexagon.
Preferably, described fenestral fabric and describedly block the split type setting of substrate 1, namely described fenestral fabric is dismountable be connected to described in block on substrate 1, be convenient to clean and maintenance.
Described fenestral fabric and described mode of connection of blocking substrate 1 can have multiple, as long as realize described barrier structure 2 to block that substrate 1 is two-part split typely to be arranged with described, in the present embodiment, described fenestral fabric magnetic absorption blocks on substrate 1 in described.The mode of connection of magnetic absorption makes described barrier structure 2 effectively be connected with the described substrate 1 that blocks, the space eliminating barrier structure 2 and block between substrate 1.
Preferably, described in block substrate 1 and adopt iron work, described fenestral fabric adopts magneticsubstance or magnetisable material to make, and is beneficial to described barrier structure 2 and described separation of blocking between substrate 1.
Further, as shown in Figure 1, described fenestral fabric comprises multiple subnet grating texture 21.Form fenestral fabric being divided into multiple subnet grating texture 21 facilitates described barrier structure 2 and described assembling of blocking between pole plate.
Further, block substrate 1 described in and the one side connecting described barrier structure 2 is provided with adsorptive coating for adsorbing the material that evaporation goes out.The setting of adsorptive coating improves the adsorptive power of radical occlusion device to the material that vapor deposition source is volatilized.
The embodiment of the present invention also provides a kind of evaporated device, comprises vapor deposition source, vacuum cavity and is arranged at the above-mentioned evaporation radical occlusion device in described vacuum cavity.
The above uses novel preferred embodiment for this; it should be noted that to those skilled in the art, under the prerequisite not departing from principle of the present invention; can also make following amendment and retouching, these amendments and retouching also should be considered as scope.
Claims (10)
1. an evaporation radical occlusion device, during for preventing evaporation, material is to the pollution of evaporated device, it is characterized in that, comprising:
One blocks substrate;
For increasing the described barrier structure blocking the irregularity degree on the surface of substrate, block on substrate described in described barrier structure is arranged at.
2. evaporation radical occlusion device according to claim 1, is characterized in that, described in block substrate surface concaveconvex structure is set to form described barrier structure.
3. evaporation radical occlusion device according to claim 1, is characterized in that, described barrier structure is the fenestral fabric that multiple hollow cylinder structure is connected to form.
4. evaporation radical occlusion device according to claim 3, is characterized in that, the cross-sectional shape of described hollow cylinder structure is circle, tetragon or hexagon.
5. evaporation radical occlusion device according to claim 3, is characterized in that, described fenestral fabric is dismountable be connected to described in block on substrate.
6. evaporation radical occlusion device according to claim 4, is characterized in that, described fenestral fabric magnetic absorption blocks on substrate in described.
7. evaporation radical occlusion device according to claim 6, is characterized in that, described in block substrate and adopt iron work, described fenestral fabric adopts magneticsubstance or magnetisable material to make.
8. evaporation radical occlusion device according to claim 3, is characterized in that, described fenestral fabric comprises multiple subnet grating texture.
9. evaporation radical occlusion device according to claim 1, is characterized in that, described in block substrate the one side connecting described barrier structure be provided with adsorptive coating for adsorbing the material that evaporation goes out.
10. an evaporated device, is characterized in that, comprises vapor deposition source, vacuum cavity and is arranged at the evaporation radical occlusion device described in any one of claim 1-9 in described vacuum cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610059917.8A CN105568224B (en) | 2016-01-28 | 2016-01-28 | Vapor deposition radical occlusion device and evaporated device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610059917.8A CN105568224B (en) | 2016-01-28 | 2016-01-28 | Vapor deposition radical occlusion device and evaporated device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105568224A true CN105568224A (en) | 2016-05-11 |
| CN105568224B CN105568224B (en) | 2018-09-21 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610059917.8A Expired - Fee Related CN105568224B (en) | 2016-01-28 | 2016-01-28 | Vapor deposition radical occlusion device and evaporated device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105568224B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106978589A (en) * | 2017-04-20 | 2017-07-25 | 京东方科技集团股份有限公司 | Retaining device and evaporated device for evaporated device |
| CN107227443A (en) * | 2017-08-04 | 2017-10-03 | 京东方科技集团股份有限公司 | Adsorb radical occlusion device and the evaporated device with the device |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106978589A (en) * | 2017-04-20 | 2017-07-25 | 京东方科技集团股份有限公司 | Retaining device and evaporated device for evaporated device |
| CN106978589B (en) * | 2017-04-20 | 2019-03-08 | 京东方科技集团股份有限公司 | Retaining device and evaporated device for evaporated device |
| CN107227443A (en) * | 2017-08-04 | 2017-10-03 | 京东方科技集团股份有限公司 | Adsorb radical occlusion device and the evaporated device with the device |
| CN107227443B (en) * | 2017-08-04 | 2019-07-02 | 京东方科技集团股份有限公司 | Adsorb radical occlusion device and the evaporated device with the device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105568224B (en) | 2018-09-21 |
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Granted publication date: 20180921 |
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