CN104952765B - Substrate board treatment, nozzle and substrate processing method using same - Google Patents
Substrate board treatment, nozzle and substrate processing method using same Download PDFInfo
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- CN104952765B CN104952765B CN201510055024.1A CN201510055024A CN104952765B CN 104952765 B CN104952765 B CN 104952765B CN 201510055024 A CN201510055024 A CN 201510055024A CN 104952765 B CN104952765 B CN 104952765B
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- substrate
- blowing unit
- nozzle
- ejiction opening
- liquid
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- 239000000758 substrate Substances 0.000 title claims abstract description 249
- 238000003672 processing method Methods 0.000 title claims abstract description 5
- 239000007788 liquid Substances 0.000 claims abstract description 163
- 239000012530 fluid Substances 0.000 claims abstract description 70
- 238000011144 upstream manufacturing Methods 0.000 claims abstract description 27
- 238000007664 blowing Methods 0.000 claims description 64
- 239000007921 spray Substances 0.000 claims description 47
- 238000012545 processing Methods 0.000 claims description 32
- 238000000034 method Methods 0.000 claims description 22
- 230000008569 process Effects 0.000 claims description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 22
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 238000005507 spraying Methods 0.000 claims description 5
- 230000007723 transport mechanism Effects 0.000 claims description 5
- 238000011010 flushing procedure Methods 0.000 abstract description 114
- 238000005516 engineering process Methods 0.000 abstract description 5
- 230000032258 transport Effects 0.000 abstract description 4
- 238000011161 development Methods 0.000 description 25
- 230000018109 developmental process Effects 0.000 description 25
- 238000004064 recycling Methods 0.000 description 11
- 238000001035 drying Methods 0.000 description 10
- 238000004140 cleaning Methods 0.000 description 9
- 230000002411 adverse Effects 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000011068 loading method Methods 0.000 description 5
- 238000004080 punching Methods 0.000 description 5
- 239000006210 lotion Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000011218 segmentation Effects 0.000 description 3
- 229910021642 ultra pure water Inorganic materials 0.000 description 3
- 239000012498 ultrapure water Substances 0.000 description 3
- 230000033228 biological regulation Effects 0.000 description 2
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- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
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- 229910000831 Steel Inorganic materials 0.000 description 1
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- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000012295 chemical reaction liquid Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
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- 238000005530 etching Methods 0.000 description 1
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- 210000002435 tendon Anatomy 0.000 description 1
Landscapes
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
- Nozzles (AREA)
Abstract
The present invention provides a kind of substrate board treatment, nozzle and substrate processing method using same, and there is provided the technology equably handled using treatment fluid the substrate for being attached with pretreatment liquid.Substrate board treatment transports the substrate for being attached with developer solution by multiple carrying rollers from the upstream side of conveyance direction (third direction) towards downstream；Air nozzle supplies the air of curtain shape to the surface of the substrate transported towards downstream, so as to remove the developer solution being deposited on substrate；The configuration of covering liquid nozzle is rinsed in the downstream of air nozzle, flushing liquor is sprayed from the ejiction opening formed in lower surface to substrate；The flushing liquor sprayed from flushing covering liquid nozzle towards substrate is contacted to substrate and lower surface, and is spread in the gap of substrate and lower surface；The downstream of covering liquid nozzle is being rinsed in the configuration of liquid cutter nozzle, and the flushing liquor of film-form is sprayed to substrate.
Description
Technical field
Located the present invention relates to a kind of using other treatment fluids to enter line replacement to the substrate for being attached with pretreatment liquid
The technology of reason.
Background technology
So far, it was also proposed that cross and the substrate for being attached with other treatment fluids is replaced into new treatment fluid and the substrate is entered
The technology (such as patent document 1) of row processing.
The raffinate removal device disclosed in patent document 1 possesses following structure, i.e.,：For manufacturing the against corrosion of liquid crystal panel
In agent (resist) peel-off device, the stripper (old liquid) for being fed to glass substrate is replaced into new stripper (new liquid).More
Specifically, raffinate removal device removes the air that liquid part is blown curtain (curtain) shape towards mobile glass substrate from the 1st,
To remove stripper (old liquid).Then, new stripper (new liquid) is supplied to glass substrate by new liquid supply part.Separately
Outside, in the raffinate removal device, then again from the 2nd except liquid part is blown the air of curtain shape to substrate, so that it is (new to remove stripper
Liquid).Thus, suppression remains in the resist on substrate and is brought into next process chamber.
Prior art literature
Patent document
Patent document 1：Japanese Patent Laid-Open 2005-103434 publications
[invention problem to be solved]
In the raffinate removal device of patent document 1, the 1st comes to glass base except liquid part is directed towards the upstream side of conveyance direction
Plate is blown the air of curtain shape.Now, the removed position of stripper is set in upstream side compared with the 1st except the position of liquid part.And
And, approached even if making the position of new liquid supply part remove liquid part with the 1st as far as possible, from the removed position of stripper to supply
Distance untill the position of new liquid is still longer.Therefore, glass substrate is possible to local desiccation, it is possible to new liquid can not be utilized
Equably to be handled.In order to avoid the problem, for example, consider to constitute as follows, i.e. under the 1st removes liquid part direction just
The air of curtain shape to be blown glass substrate in side or the downstream of conveyance direction.But, in these cases, it is possible to can be because
The air and upset along substrate width extension new liquid liquid level., it is impossible to be supplied uniformly across new liquid, therefore have can then
Substrate can not can be equably handled using new liquid.
The content of the invention
Therefore, it is an object of the invention to provide it is a kind of using treatment fluid come equably to being attached with the substrate of pretreatment liquid
The technology handled.
[technological means for solving problem]
In order to solve described problem, the 1st scheme is a kind of substrate board treatment, including：Transport mechanism, from conveyance direction
Upstream side transports the substrate for being attached with pretreatment liquid towards downstream；Air nozzle, to described by transport mechanism direction
The surface of the substrate of downstream conveyance supplies the air of curtain shape, so as to remove the pretreatment liquid for being attached to the substrate；The
One blowing unit, configures in the downstream of the air nozzle, is handled from the first ejiction opening of slit to the substrate ejection
Liquid, the first ejiction opening formation of the slit first blowing unit lower surface, and along orthogonal with the conveyance direction
Orthogonal direction extends；And second blowing unit, configuration extends in the downstream of first blowing unit from along the orthogonal direction
The second ejiction opening of slit spray treatment fluid, to supply the treatment fluid of film-form to the substrate, wherein from described the
One blowing unit is contacted to the substrate and the lower surface, and in the substrate towards the treatment fluid that the substrate sprays
And spread in the gap of the lower surface.
Moreover, the 2nd scheme is the substrate board treatment according to the 1st scheme, wherein, second blowing unit is towards under described
Trip side spray goes out the treatment fluid.
Moreover, the 3rd scheme is the substrate board treatment according to the 2nd scheme, wherein, second blowing unit is described second
Position below ejiction opening, with the inclined plane being downwardly inclined towards the downstream.
Moreover, the 4th scheme is the substrate board treatment according to the 3rd scheme, wherein, second blowing unit includes：Body
Portion, forms second ejiction opening；And dip member, the inclined plane is formed, and be installed on the body.
Moreover, the 5th scheme is the substrate board treatment according to the 4th scheme, wherein, the dip member is relative to described
Body portion is removably disposed.
Moreover, the 6th scheme is the substrate board treatment according to the 1st scheme either a program into the 5th scheme, wherein, it is described
First blowing unit includes first component and second component, and the first component and second component form institute by being connected to each other
State the first ejiction opening and the blank part connected with first ejiction opening, second blowing unit includes the second component and the
Three components, the second component and the 3rd component form second ejiction opening and sprayed with described second by being connected to each other
The blank part of outlet.
Moreover, the 7th scheme is the substrate board treatment according to the 1st scheme either a program into the 4th scheme, it includes：The
One processing nozzle for liquid, configuration constitutes first blowing unit in the downstream of the air nozzle；And second processing liquid
Nozzle, configures in the downstream of the described first processing nozzle for liquid, constitutes second blowing unit.
Moreover, the 8th scheme is the substrate board treatment according to the 1st scheme either a program into the 7th scheme, wherein, it is described
The amount that first blowing unit sprays the time per unit of the treatment fluid is less than the every of second blowing unit ejection treatment fluid
The amount of unit interval.
Moreover, the 9th scheme is the substrate board treatment according to the 1st scheme either a program into the 8th scheme, wherein, it is described
The width of first ejiction opening is more than the width of second ejiction opening.
Moreover, the 10th scheme is the substrate board treatment according to the 1st scheme either a program into the 9th scheme, wherein, it is described
Pretreatment liquid is alkalescence, and the substrate board treatment also includes：Carbonated water supply unit, carbonic acid is supplied to first blowing unit
Water.
Moreover, the 11st scheme is a kind of nozzle, it sprays treatment fluid, including：First blowing unit, with along a direction extend
The first smooth lower surface, and in first lower surface, be formed with the slit along one to extension first sprays
Mouthful；And second blowing unit, the interval relative to first ejiction opening, from of the slit along one to extension
Two ejiction openings spray treatment fluid, to supply the treatment fluid of curtain shape.
Moreover, the 12nd scheme is a kind of substrate processing method using same, including：(a) process is transported, from the upstream side court of conveyance direction
Downstream side is attached with the substrate of pretreatment liquid to transport；(b) removing step, to the substrate by the conveyance process conveyance
Surface supply curtain shape air, so as to remove the pretreatment liquid for being attached to the substrate；(c) the first treatment fluid sprays work
Sequence, after the removing step, sprays from the first ejiction opening of slit towards the substrate by the conveyance process conveyance
Treatment fluid, the first ejiction opening formation of the slit the first blowing unit lower surface, and along orthogonal with the conveyance direction
Direction extends；And (d) second processing liquid sprays process, after first treatment fluid sprays process, direction is removed by described
The substrate for sending process to transport sprays the treatment fluid of film-form, wherein, in first treatment fluid sprays process, from described
The treatment fluid that first ejiction opening sprays towards the substrate is contacted to the substrate and the lower surface, and in the substrate
And spread in the gap of the lower surface.
The effect of invention
Turn into according to the substrate board treatment of the 1st scheme, between the lower surface and substrate of the first blowing unit and sprayed from first
Go out the state that the treatment fluid of portion's ejection is filled up.Therefore, it is possible to suppress the side that treatment fluid is upset because of the air that air nozzle is supplied
The situation on boundary.Therefore, it is possible to equably handle substrate using treatment fluid.
Moreover, according to the substrate board treatment of the 2nd scheme, the treatment fluid adverse current that can reduce the ejection of the second blowing unit is supreme
Swim the phenomenon of side.Therefore, it is possible to equably handle substrate using treatment fluid.
Moreover, according to the substrate board treatment of the 3rd scheme, can make by inclined plane at the ejection of the second ejiction opening
Liquid is managed to flow towards downstream.
Moreover, according to the substrate board treatment of the 4th scheme, the dip member for forming inclined plane is set to forming ejiction opening
Body independence component so that the manufacture of the second blowing unit becomes easy.
Moreover, according to the substrate board treatment of the 5th scheme, by enabling dip member to be dismantled from body, so that the
The maintenance (maintenance) of two ejiction openings becomes easy.
Moreover, according to the substrate board treatment of the 6th scheme, by by first, second and the 3rd component be combined, energy
It is enough to form the nozzle with first and second opening portion.The first spray that liquid-tight seal is formed between the nozzle and substrate can be made
The second blowing unit for going out the treatment fluid of portion and supply curtain shape is approached.Therefore, it is possible to more uniformly handle base using treatment fluid
Plate.
Moreover, according to the substrate board treatment of the 7th scheme, by making the width of the first ejiction opening relatively large, so as to
The flow velocity of enough treatment fluids for suppressing to spray from the first ejiction opening.Therefore, it is possible to suppress treatment fluid adverse current to upstream side.Moreover, energy
Enough reduce the generation that the dirt at the first ejiction opening is blocked.Therefore, it is possible to equably handle substrate using treatment fluid.
Moreover, according to the substrate board treatment of the 8th scheme, treatment fluid can be suppressed compared with the first blowing unit adverse current to upstream
Side.
Moreover, according to the substrate board treatment of the 9th scheme, by making the width of the first ejiction opening relatively large, so as to
The flow velocity of enough treatment fluids for suppressing to spray from the first ejiction opening.Therefore, it is possible to suppress treatment fluid adverse current to upstream side.Moreover, energy
Enough reduce the generation that the dirt at the first ejiction opening is blocked.Therefore, it is possible to equably handle substrate using treatment fluid.
Moreover, according to the substrate board treatment of the 10th scheme, can effectively be stopped using carbonated water logical peralkaline
Reaction solution and the reaction carried out.
Brief description of the drawings
Fig. 1 is the general view for representing to possess the base plate processing system of substrate board treatment.
Fig. 2 is the summary lateral view of the structure for the substrate board treatment for representing the 1st embodiment.
Fig. 3 is the boundary member amplification table by the development section in the substrate board treatment of the 1st embodiment and rinse part
The summary lateral view shown.
Fig. 4 is the general plan for representing the flushing covering liquid nozzle (rinse puddle nozzle) from lower face side
Figure.
Fig. 5 is the schematic diagram illustrated for the stream to the supply flushing liquor in rinse part.
Fig. 6 is by the development section in the substrate board treatment of the 2nd embodiment, the boundary member enlarged representation of rinse part
Summary lateral view.
Fig. 7 is the summary section of the nozzle of the 2nd embodiment.
Fig. 8 is the summary section for the nozzle for representing the 1st variation.
Fig. 9 is the summary section for the nozzle for representing the 2nd variation.
Figure 10 is the summary section for the nozzle for representing the 3rd variation.
Description of reference numerals：
1、1A：Substrate board treatment；
10：Loading unit；
11：Cleaning part；
12：Split baking portion；
13：Coating part；
14：It is dried under reduced pressure portion；
15：Prebake conditions portion；
16：Exposure portion；
17：Main baking portion；
18：Moving section；
20：Development section；
21：Developer solution (pretreatment liquid)；
22：Nozzle；
24：Air nozzle；
30、30A：Rinse part
31：Flushing liquor (treatment fluid)；
32：Rinse covering liquid nozzle (the first processing nozzle for liquid)；
32A：First blowing unit；
33：Liquid cutter nozzle (second processing nozzle for liquid)；
33A、33B、33C、33D：Second blowing unit；
34：Shower nozzle；
35a、35b：Air nozzle；
36、36A、36B、36C：Nozzle；
40：Framework；
41、410：Demarcation strip；
42：Move into mouth；
43：Take out of mouth；
50：Carrying roller (transport mechanism)；
61：First recycling can；
63：Second recycling can；
65：Filter；
70：Tank (carbonated water supply unit)；
71：Pipe arrangement (carbonated water supply unit)；
81：First component；
82、82A、82B：Second component；
83、83A：3rd component；
90：Substrate；
100：Base plate processing system；
300：Drying section；
301：Upstream region；
302：Midstream region；
303：Downstream area；
320、320A、320B：Lower surface；
321、321A：Ejiction opening (the first ejiction opening)；
323、333、333A：Blank part；
331、331A、331B：Ejiction opening (the second ejiction opening)；
335、335A、335B：Inclined plane；
411：Path mouthful；
511：Rotary shaft；
513：Runner；
811、812：Distance piece；
821：Body；
823：Dip member；
D1：First direction；
D2：Second direction；
D3：Third direction (conveyance direction)；
D4：Emission direction；
H1、H2：Highly；
W1：Width (width of the first ejiction opening)；
θ：Angle.
Embodiment
<1. the 1st embodiment>
<The structure and function of substrate board treatment 1>
Fig. 1 is the general view for representing to possess the base plate processing system 100 of substrate board treatment 1.
100 pairs of base plate processing system is used for square glass substrate (the following letter for manufacturing the picture panel of liquid crystal display device
Referred to as substrate) 90 handled.
Base plate processing system 100 possesses loading unit 10, cleaning part 11, segmentation baking (divide bake) portion 12, coating part
13rd, portion 14 and prebake conditions (pre-bake) portion 15 are dried under reduced pressure.Loading unit 10 is to receive to be used in base plate processing system 100
The part of the substrate 90 handled.The substrate 90 that 11 pairs of cleaning part is moved into by loading unit 10 is cleaned and purifying.Segmentation
The substrate 90 that 12 pairs of baking portion is attached with cleaning fluid in cleaning part 11 is dried.
The surface coating process liquid (being herein resist) for the substrate 90 that coating part 13 is dried in segmented baking portion 12.Subtract
Pressure drying section 14 dries the treatment fluid being coated with by coating part 13.Prebake conditions portion 15 consolidates treatment fluid by heating substrate 90
Change, the film for the treatment of fluid is formed on substrate 90.
As shown in figure 1, loading unit 10, cleaning part 11, segmentation baking portion 12, coating part 13, being dried under reduced pressure portion 14 and pre-
Baking portion 15 is configured in the way of order is linearly abutted along a direction (first direction D1) according to this.
Moreover, base plate processing system 100 possesses exposure portion 16, the exposure portion 16 is for being formed with the base of the film for the treatment of fluid
The surface of plate 90, exposes into required circuit pattern (pattern) shape.Exposure portion 16 is along the direction orthogonal with the 1st direction
(second direction D2) extends.The part of the entrance side of exposure portion 16 is adjacent to prebake conditions portion 15, the portion of the outlet side of exposure portion 16
Divide and be adjacent to substrate board treatment 1.
Substrate board treatment 1 possesses：Development section 20, developer solution 21 is immersed in by exposed substrate 90 in exposure portion 16
In (pretreatment liquid), unnecessary treatment fluid is removed；Rinse part 30, it is subjected to development to rinse using flushing liquor 31 (treatment fluid)
Substrate 90, so as to stop development treatment；And drying section 300, the flushing liquor 31 on substrate 90 is removed, and dry substrate 90.
Moreover, base plate processing system 100 possesses main baking (host bake) portion 17 and moving section 18.Main baking portion 17
By being heated to substrate 90, and remove the flushing liquor for being attached to substrate 90.Moving section 18 is by base plate processing system 100
In complete the substrate 90 of processing and take out of to outside part.Substrate board treatment 1, main baking portion 17 and moving section 18 are with edge
And configured with first direction D1 for the mode that the direction (third direction D3) of opposite side is linearly abutted.In processing substrate
In system 100, substrate 90 by exposure portion 16 into u turn (turn) in the way of, its direct of travel from first direction D1 become
More third direction D3.
Fig. 2 is the summary lateral view of the structure for the substrate board treatment 1 for representing the 1st embodiment.Fig. 3 is implemented the 1st
The summary lateral view of the boundary member enlarged representation of development section 20, rinse part 30 in the substrate board treatment 1 of mode.
As shown in Fig. 2 substrate board treatment 1 possesses：Development section 20, configures the conveyance direction (third direction in substrate 90
D3 upstream side)；Rinse part 30, is configured in downstream compared with development section 20；And drying section 300, configured compared with rinse part 30 under
Swim side.In the following description, as long as not specified, then the upstream side of the conveyance direction of substrate 90 is referred to as " upstream side ",
Its opposite side is referred to as in " downstream ".
Substrate board treatment 1 possesses 1 framework 40.By the demarcation strip 41,410 for the pars intermedia for being arranged on the framework 40,
Framework 40 is divided into development section 20, rinse part 30 and drying section 300.Demarcation strip 41 by development section 20 and rinse part 30 it
Between separated, demarcation strip 410 will be separated between rinse part 30 and drying section 300.
In the upstream-side-end of framework 40, it is provided with and moves into mouth 42, this is moved into mouth 42 and handled for moving into exposed portion 16
Substrate 90.Moreover, in the end of downstream side of framework 40, being provided with and taking out of mouth 43, this, which takes out of mouth 43, is used to that development will to be completed
The substrate 90 in portion 20, rinse part 30 and the processing in drying section 300 is taken out of to main baking portion 17.Moreover, in demarcation strip 41
Pars intermedia, is formed with path mouthful 411, and path mouthful 411 is used to pass through the substrate 90 for completing the processing in development section 20.
In substrate board treatment 1, interval of the substrate 90 needed for separated on third direction D3 and multiple removing for arranging
Roller 50 is sent to be transported (conveyance process).Carrying roller 50 is included：Rotary shaft 511, along the level side orthogonal with third direction D3
Extend to (hereinafter referred to as orthogonal direction)；And multiple runners 513, central part is fixed in the rotary shaft, in that orthogonal direction
Separate required interval and arrange.Rotary shaft 511 can be by drive motor (motor) come rotation driving.Substrate 90 is supported
In the upper end of multiple runners 513, rotated and transported along third direction D3 by multiple runners 513.
Development section 20 possesses：The nozzle 22 of developer solution 21 is supplied to the upper surface of substrate 90, and to the upper table of substrate 90
The air nozzle 24 of face blows air.Nozzle 22 is arranged on the inner side of framework 40 and is moving into the vicinity of mouth 42.Moreover, air
Nozzle 24 is fixed in the one side of the upstream side of demarcation strip 41.
Nozzle 22 extends along orthogonal direction, in the lower surface of said nozzle 22, is formed with along orthogonal direction and slenderly extends
Slit ejiction opening.By spraying developer solution 21 from each ejiction opening, so as to supply developer solution 21 to the surface of substrate 90.Pass through
Make substrate 90 by nozzle 22 under accumulated using surface tension so that the whole upper surface of substrate 90 turns into and have developer solution 21
State (state for being formed with the covering liquid (puddle) of developer solution 21).
Air nozzle 24 is the nozzle of air knife (air knife) formula for possessing the air ejiction opening extended along orthogonal direction.
Air nozzle 24 is blown the width side than substrate 90 for the substrate 90 transported by multiple carrying rollers 50 from the top of substrate 90
To the air of fully long curtain shape (film-form or banding).Thus, developer solution 21 of the accumulation (attachment) on substrate 90 is by substantially
Remove.That is, the removal of the developer solution 21 carried out by air nozzle 24 is equivalent to removing step.The developer solution removed from substrate 90
21 are recovered, and are optionally recycled or discarded.
So, the air supplied by air nozzle 24, before substrate 90 is transported to rinse part 30, is deposited in base
The almost all of developer solution 21 on plate 90 is removed.Rinse part 30 is brought into by suppressing developer solution 21, so as to improve punching
The cleaning performance for the substrate 90 washed in portion 30.
Rinse part 30 possess flushing covering liquid nozzle 32 (first processing nozzle for liquid) that flushing liquor 31 is supplied to substrate 90 and
Liquid cutter nozzle 33 (second processing nozzle for liquid).Moreover, rinse part 30, which possesses from the top of substrate 90, supplies the multiple of flushing liquor 31
Shower nozzle (shower nozzle) 34.Drying section 300 possesses a pair of air nozzles 35a, 35b, the pair of air nozzle
35a, 35b supply the air of curtain shape by the upper surface and lower surface to substrate 90, are deposited in so as to remove on substrate 90
Flushing liquor 31 and dry substrate 90.A pair of air nozzles 35a, 35b are arranged on taking out of near mouth 43 in drying section 300.
Rinse covering liquid nozzle 32 and liquid cutter nozzle 33 is arranged near the downstream of the demarcation strip 41 in framework 40.Punching
Covering liquid nozzle 32 is washed to configure in the position of upstream side compared with liquid cutter nozzle 33.
Fig. 4 is the general view for representing the flushing covering liquid nozzle 32 from the side of lower surface 320.Rinse covering liquid nozzle 32
It is lower surface 320 with the tabular surface parallel with the upper surface of substrate 90.On the lower surface 320 of covering liquid nozzle 32 is rinsed, if
It is equipped with the ejiction opening 321 (the first ejiction opening) of the slit extended along orthogonal direction.Covering liquid nozzle 32 is rinsed to spray from the ejiction opening 321
Go out flushing liquor 31 and supply to substrate 90.The length of ejiction opening 321 is longer than the width of substrate 90.Therefore, covering liquid nozzle 32 is rinsed
Flushing liquor 31 can be supplied uniformly across to the width of the substrate 90 transported by multiple carrying rollers 50.Rinse covering liquid nozzle 32
The process that treatment fluid is sprayed to substrate 90 sprays process equivalent to the first treatment fluid.
Rinse covering liquid nozzle 32 to be configured to, rinse the ejiction opening 321 of covering liquid nozzle 32 close to the upper surface of substrate 90.Cause
This, rinses the flushing liquor 31 of the ejection of covering liquid nozzle 32 after substrate 90 is encountered, encounters close to the flushing covering liquid nozzle above it
32 lower surface 320.In other words, the flushing liquor 31 for rinsing the ejection of covering liquid nozzle 32 is drenched after substrate 90, is drenched close to substrate
The lower surface 320 of the flushing covering liquid nozzle 32 of 90 tops.That is, the flushing liquor 31 of ejection is contacted to substrate 90 and lower surface 320,
And spread in the gap of substrate 90 and lower surface 320.Therefore, the state of the ejection flushing liquor 31 of covering liquid nozzle 32 is being rinsed
Under, as shown in figure 3, rinsing the gap quilt of the lower surface 320 on the periphery of ejiction opening 321 of covering liquid nozzle 32 and the upper surface of substrate 90
The flushing liquor 31 that flushing covering liquid nozzle 32 is sprayed is filled up.That is, form liquid-tight close between substrate 90 and lower surface 320
Envelope.In other words, the lower surface 320 for rinsing covering liquid nozzle 32 is maintained state (the flushing liquor contact shape contacted with flushing liquor 31
State).Thus, the air relatively flushing covering liquid nozzle 32 for suppressing to blow out from air nozzle 24 is invaded to downstream.That is, covering liquid spray is rinsed
Mouth 32 blocks the path of air and carries out water shutoff (or water seal).By so as carry out water shutoff, so as to throughout width
Flushing liquor is supplied uniformly across to substrate 90, therefore, it is possible to be effectively reduced the generation that development is uneven.
Ejiction opening 321 is arranged to and is piled up in the upper surface of the flushing liquor 31 on substrate 90 apart from the height H1 of substrate 90
The identical or lower than it height of height.If for example, the thickness for setting the flushing liquor 31 being deposited on substrate 90 sprays as 4mm
The configuration of mouth 321 separates 2mm~4mm height in the upper surface from substrate 90.In present embodiment, ejiction opening 321 is apart from substrate
90 height H1 is less than height H2 of the ejiction opening 331 (the second ejiction opening) apart from substrate of liquid cutter nozzle 33 described later.
It is also desirable to, the lower surface 320 for rinsing covering liquid nozzle 32 is parallel relative to the upper surface of substrate 90, but
Also can may not be parallel.That is, as long as in the downstream part for the ejiction opening 321 for rinsing covering liquid nozzle 32, with being supplied to substrate
The face that 90 flushing liquor 31 is encountered.
Liquid cutter nozzle 33 has the ejiction opening 331 of the slit longer than the width of substrate 90.Such as Fig. 3 institutes of liquid cutter nozzle 33
Show, flushing liquor 31 is obliquely sprayed to substrate 90.More specifically, curtain shape (film-form is sprayed from ejiction opening 331 towards downstream
Or banding) flushing liquor 31.The emission direction D4 of the flushing liquor 31 of the liquid cutter nozzle 33 and upper surface angulation θ of substrate 90
More than 20 ° and less than 40 ° are set to, more than 25 ° and less than 35 ° are more preferably set to.Liquid cutter nozzle 33 is towards by multiple carrying rollers 50
The process that the substrate 90 transported sprays flushing liquor 31 sprays process equivalent to second processing liquid.
That is, one side of substrate 90 is transported, while the lower section by rinsing covering liquid nozzle 32 and liquid cutter nozzle 33, by
This, the whole upper surface of substrate 90, which turns into, is accumulated the state for having flushing liquor 31 using surface tension and (is formed with flushing liquor 31
Covering liquid state).In this way, in present embodiment, by air nozzle 24, covering liquid nozzle 32 and liquid cutter nozzle 33 are rinsed,
The developer solution 21 that will attach to the surface of substrate 90 is replaced into flushing liquor 31.
By spraying flushing liquor 31 from liquid cutter nozzle 33 towards downstream, so as to suppress to be supplied to rushing for substrate 90
Washing lotion 31 cross flushing covering liquid nozzle 32 and adverse current to upstream side.Assuming that flushing liquor adverse current is to than rinsing the more upstream of covering liquid nozzle 32
Side, then can produce disorder, so as to be difficult to the width throughout substrate 90 to be supplied uniformly across flushing on the border of flushing liquor 31
Liquid 31, it is possible to produce development is uneven.Therefore, by suppressing the adverse current of flushing liquor 31, the uneven generation of development can be suppressed.
In addition, liquid cutter nozzle 33 also can be erected and emission direction D4 and substrate 90 upper surface angulation θ is set to
90 °, so as to supply the flushing liquor 31 of curtain shape as the crow flies to the upper surface of substrate 90.Moreover, liquid cutter nozzle 33 is towards upstream side spray
Even going out flushing liquor 31.
The liquid measure for rinsing the time per unit for the flushing liquor 31 that covering liquid nozzle 32 is supplied to substrate 90 is also smaller than liquid cutter spray
The liquid measure of the time per unit for the flushing liquor 31 that mouth 33 is supplied to substrate 90.Specifically, rinse what covering liquid nozzle 32 was supplied
Flushing liquor 31 that flushing liquor 31 can also be supplied relative to liquid cutter nozzle 33 and few 20%~30% or so.
Flushing liquor 31 can also be sprayed always by rinsing covering liquid nozzle 32 and liquid cutter nozzle 33.But, biography for example can also be used
Sensor (sensor) detects the front end or rear end of substrate 90 by the situation of assigned position, with from rinsing covering liquid nozzle 32 or liquid
Knife nozzle 33 starts the ejection of flushing liquor 31.Moreover, sensor can also be used to detect that the front end or rear end of substrate 90 pass through rule
Situation about putting is positioned, to stop flushing liquor 31 from the ejection for rinsing covering liquid nozzle 32 or liquid cutter nozzle 33.Thereby, it is possible to suppress punching
The unnecessary consumption of washing lotion 31.
Rinse covering liquid nozzle 32 and first supply flushing liquor 31 for the completed substrate of development treatment 90.Therefore, in order to suppress
The generation for inequality of developing, it is generally desirable to, rinse covering liquid nozzle 32 and be supplied uniformly across flushing liquor throughout the width of substrate 90
31.If occurring dirt in the part for rinsing the ejiction opening 321 of covering liquid nozzle 32 to block, it will be unable to from the part normal supply punching
Washing lotion 31, so as to be difficult to equably spray treatment fluid.As a result, flushing liquor 31 can not be utilized throughout the width of substrate 90
Uniformly handled, it is possible to produce the development of the tendon shape extended along conveyance direction (third direction D3) is uneven.
Therefore, by increasing the width for the ejiction opening 321 for rinsing covering liquid nozzle 32 as far as possible, (opening in conveyance direction is wide
Degree) W1, so as to reduce the generation of dirt blocking.Moreover, the width by increasing ejiction opening 321, can be reduced from flushing
The flow velocity for the flushing liquor 31 that covering liquid nozzle 32 sprays.Thereby, it is possible to suppress rinsing in gap of the covering liquid nozzle 32 with substrate 90
The adverse current of flushing liquor 31 spread is to upstream side.
In present embodiment, the width for rinsing the ejiction opening 321 of covering liquid nozzle 32 is more than the ejiction opening 331 of liquid cutter nozzle 33
Width.For example, the width for rinsing the ejiction opening 321 of covering liquid nozzle 32 is set to 2mm~4mm or 0.5mm~2mm, liquid cutter nozzle
The width of 33 ejiction opening 331 is set to 0.2mm~0.5mm.
Liquid cutter nozzle 33 along emission direction D4 as shown in figure 3, slightly extend.Because, it is generally desirable in liquid cutter nozzle
33 inside installation space (space), the space is used to make supply uniform along orthogonal direction to the flushing liquor 31 of liquid cutter nozzle 33
Ground spreads, and is equably sprayed from ejiction opening 331 along emission direction D4.Therefore, present dynasty downstream side sprays curtain shape
During flushing liquor 31, as shown in figure 3, the length of the conveyance direction of liquid cutter nozzle 33.Thus, it is supposed that eliminating flushing covering liquid
In the case of nozzle 32, then it is difficult to make air nozzle 24 approach with liquid cutter nozzle 33, therefore substrate 90 is possible to meeting drying.And
And, it is assumed that in the case where eliminating and rinsing covering liquid nozzle 32, it is also contemplated that erect liquid cutter nozzle 33 as the crow flies and by ejection side
90 ° are set to the upper surface angulation θ of D4 and substrate 90.But, now, rinsed because of the air from air nozzle 24
The liquid level meeting multilated of liquid 31, it is thereby possible to be difficult to be supplied uniformly across flushing liquor 31.Therefore, based on these viewpoints, extremely have
Effect is also to set to rinse covering liquid nozzle 32, equably to handle substrate 90 using flushing liquor 31.
Fig. 5 is the schematic diagram illustrated for the stream to the supply flushing liquor 31 in rinse part 30.In rinse part 30
In, in upstream region (area) 301, midstream region 302 and downstream area 303, the flushing liquor 31 supplied to substrate 90 it is pure
Degree is different.
More specifically, multiple shower nozzles 34 of downstream area 303, supply purity highest flushing liquor 31 are pointed to.
For example, when being used as flushing liquor 31 using ultra-pure water, from being provided with storage set in the workshop of substrate board treatment 1
Have in the tank (tank) of ultra-pure water, convey ultra-pure water (straight water) using pump (pump) etc., and supply to rinse part 30.
The flushing liquor 31 supplied to the downstream area 303 of rinse part 30 is supplied to substrate 90 by shower nozzle 34.Also,
The flushing liquor 31 overflowed from substrate 90 falls and the first recycling can 61 is recycled to by the discharge outlet in device.It is recovered to
Flushing liquor 31 in one recycling can 61 has been used for the cleaning of substrate 90, therefore compared with the flushing liquor 31 of script, purity declines.
The flushing liquor 31 being recovered in the first recycling can 61 is sent to the shower spraying positioned at midstream region 302 by pumped
Mouth 34, and supply to substrate 90.Also, the flushing liquor 31 overflowed from substrate 90 falls and is recycled to by discharge outlet second time
In closed cans 63.The flushing liquor 31 being recovered in the second recycling can 63 makes in downstream area 303 and midstream region 302
With, therefore purity declines compared with the flushing liquor 31 being recovered in the first recycling can 61.
The flushing that the flushing liquor 31 being recovered in the second recycling can 63 is sent to positioned at upstream region 301 by pumped is covered
Nozzle for liquid 32 and liquid cutter nozzle 33, and supply to substrate 90.In addition, also can be by being linked to flushing from the second recycling can 63
Filter (filter) 65 is installed in the midway of the pipe arrangement of covering liquid nozzle 32 and liquid cutter nozzle 33, so as to be removed from flushing liquor 31
The foreign matters such as particle (particle).The flushing liquor 31 used in upstream region 301 is suitably discarded.
In this way, by recycling flushing liquor 31, so as to still maintain the cleaning performance in rinse part 30, and suppressing to rinse
The consumption of liquid 31.
In addition, it is also contemplated that flushing liquor 31 is possessed the function for the reaction for stopping developer solution 21.For example, being in developer solution 21
In the case of the alkaline reaction liquid such as TMAH (tetramethylammonium hydroxide, TMAH), by
The carbonated water of acidity is mixed in flushing liquor 31, stops reaction well so as to efficiency.Now, as shown in figure 5, storage is had
The tank 70 of carbonated water is connected to the pipe arrangement for being linked to from the second recycling can 63 and rinsing covering liquid nozzle 32 and liquid cutter nozzle 33.By
This, to supplying carbonated water towards the flushing liquor 31 for rinsing covering liquid nozzle 32 and liquid cutter nozzle 33.
Tank 70 and link tank 70 are supplied with rinsing the pipe arrangement 71 of covering liquid nozzle 32 or liquid cutter nozzle 33 equivalent to carbonated water
Portion.Misalign the supply carbonated water of shower nozzle 34 of trip region 302 or downstream area 303.Therefore, it is possible in the midstream region
302 and downstream area 303 remove carbonated water.
In addition, also can be only to rinsing any one of covering liquid nozzle 32 and liquid cutter nozzle 33 supply carbonated water.As above institute
State, the substrate 90 after development treatment is supplied to flushing liquor 31 from flushing covering liquid nozzle 32 first.By being mixed in the flushing liquor 31
Carbonated water is closed, so as to more effectively stop reaction.Therefore, it is possible to more effectively suppress the generation that development is uneven.
<2. the 2nd embodiment>
The substrate board treatment 1 of the embodiment possess in rinse part 30 2 nozzles (rinse covering liquid nozzle 32 and
Liquid cutter nozzle 33).However, it is possible to consider to constitute this 2 nozzles by 1 nozzle.In addition, in explanation after this, for tool
Have with it is stated that component be said function component, mark same-sign or the symbol for being added with alphabetical (alphabet) have
When detailed description will be omitted.
Fig. 6 is to put development section 20, the rinse part 30A boundary member in the substrate board treatment 1A of the 2nd embodiment
The summary lateral view represented greatly.It is as shown in fig. 6, substrate board treatment 1A is different from the part of substrate board treatment 1, substitution punching
Wash covering liquid nozzle 32 and liquid cutter nozzle 33 and possess 1 nozzle 36.
Nozzle 36 has：First blowing unit 32A, is formed with ejiction opening 321A (the first ejiction opening)；And second blowing unit
33A, is formed with ejiction opening 331A (the second ejiction opening).
Fig. 7 is the summary section of the nozzle 36 of the 2nd embodiment.First blowing unit 32A comprising first component 81 and
Second component 82.First component 81 and second component 82 by being connected to each other in conveyance direction (third direction D3) so that
The blank part for forming the ejiction opening 321A of the slit extended along the width of substrate 90 and being connected with ejiction opening 321A
323.Being sandwiched between first component 81 and second component 82 has distance piece (spacer) 811, by the shape of the distance piece 811
Shape comes the shape of regulation blank part 323 and ejiction opening 321A A/F.Blank part 323 forms the flushing supplied from tank 70
The stream of liquid 31.Preferably, the lower surface 320B formation of the lower surface 320A of first component 81 and second component 82 and substrate
The parallel smooth tabular surface (the first lower surface) in 90 upper surface.
Flushing liquor 31 from ejiction opening 321A ejections is in the upper surface of substrate 90 and lower surface 320A or substrate 90 upper table
Spread between face and lower surface 320B.Therefore, the upper surface of substrate 90 and lower surface 320A or substrate 90 upper surface and following table
Turn into liquid-tight seal between the 320B of face by flushing liquor 31, so as to be able to water shutoff.In this way, the first blowing unit 32A possesses and the 1st
The identical function of flushing covering liquid nozzle 32 of embodiment.As long as in addition, can be in lower surface 320A and lower surface 320B
Water shutoff is carried out at least one.It is preferred, therefore, that at least one of lower surface 320A and lower surface 320B are smooth.
As long as moreover, lower surface 320A, 320B can carry out water shutoff, being then not necessarily required to parallel with the upper surface of substrate 90.
Second blowing unit 33A includes the component 83 of second component 82 and the 3rd, the component 83 of second component 82 and the 3rd
By being connected to each other in conveyance direction (third direction D3), so as to form ejiction opening 331A and be connected with ejiction opening 331A
Blank part 333.Between the component 83 of second component 82 and the 3rd, double team has distance piece 812, by the distance piece 812
Shape comes the shape of regulation blank part 333 and ejiction opening 331A A/F.Blank part 333 is formed from rushing that tank 70 is supplied
The stream of washing lotion 31.
Preferably, ejiction opening 321A A/F is more than ejiction opening 331A A/F.By increasing ejiction opening
321A A/F, is blocked so as to reduce the dirt at ejiction opening 321A.Thereby, it is possible to from ejiction opening 321A equably
Spray treatment fluid.
On second component 82 in the second blowing unit 33A, the position below ejiction opening 331A, with towards conveyance direction
Downstream and the inclined plane 335 being downwardly inclined.The flushing liquor 31 sprayed downward from ejiction opening 331A is along the direction of inclined plane 335
Down and towards the compound direction flowing in conveyance direction downstream, and it is configured to curtain shape (film-form or banding) and supplies to substrate
90.In this way, the second blowing unit 33A possesses the identical function of liquid cutter nozzle 33 with the 1st embodiment.
Also it is smaller than spraying from ejiction opening 331A from the spray volume of the time per unit of the ejiction opening 321A flushing liquors 31 sprayed
The spray volume of the time per unit of the flushing liquor 31 gone out.It is desirable that by increasing flushing liquor 31 from ejiction opening 331A ejection
Amount, so as to supply sufficient flushing liquor 31 to substrate 90.
According to the substrate board treatment 1A of present embodiment, replace the flushing covering liquid nozzle 32 and liquid of the 1st embodiment
The use of knife nozzle 33, and the liquid-tight seal of flushing liquor 31 is formed between substrate 90 by single nozzle 36, and energy
Enough flushing liquors 31 that curtain shape is supplied to substrate 90.Therefore, it is possible to shorten from the forming position of liquid-tight seal to the flushing liquor of curtain shape
Length untill 31 supply position.Dried thereby, it is possible to suppress substrate 90, or the flushing liquor 31 on substrate 90 is not enough shows
As so as to more uniformly handle substrate 90.Therefore, it is possible to effectively suppress the generation that development is uneven.
<1st variation of nozzle 36>
Fig. 8 is the summary section for the nozzle 36A for representing the 1st variation.Nozzle 36A the second blowing unit 33B is extended to
Untill the lower surface 320B identical height of liquid-tight seal being formed with second component 82A inclined plane 335A.Therefore, from ejiction opening
331A spray flushing liquor 31 flow on inclined plane 335A, and by with formation liquid-tight seal flushing liquor 31 contact in the way of and
Supply.That is, in nozzle 36A, flushing liquor 31 is formed as curtain shape (film-form or banding) on inclined plane 335A, and in lower surface
320B downstream section of bus.
When using nozzle 36A, the flushing liquor 31 of curtain shape can be smoothly supplied to the flushing liquor 31 of liquid-tight seal state.
Thereby, it is possible to effectively suppress the generation that development is uneven.
<2nd variation of nozzle 36>
Fig. 9 is the summary section for the nozzle 36B for representing the 2nd variation.In nozzle 36B, possess in first component 81
And the 3rd second component 82B for constituting the second blowing unit 33C between component 83.Also, second component 82B possesses body
821 and the dip member 823 of tabular.Dip member 823 is via fixed components such as bolts (bolt), relative to body 821
Bottom and releasably install.The raw material of dip member 823 are not particularly limited, for example the easiness in view of processing or
The viewpoint of intensity etc., it is preferred that by stainless steel (Steel Use Stainless, SUS) formation dip member 823.
Dip member 823 has：The part of overlapping fixation in the vertical direction relative to body 821；And from originally
Body portion 821 protrudes towards conveyance direction downstream and extended downward, so as to form inclined plane 335B part.Inclined plane 335B is
Extended in the same manner as inclined plane 335 along the width of substrate 90, make to be configured to curtain from the flushing liquor 31 that ejiction opening 331A sprays
Shape and supply to substrate 90.
According to the nozzle 36B of the 2nd variation, make the inclination that inclined plane 335B is included with second component 82B is individual member
Component 823.Therefore, second component 82B is easily formed.Moreover, as shown in figure 9, dip member 823 is with from second component 82B
Second component 82B is installed on towards the part of the conveyance direction downstream protrusion mode opposite with ejiction opening 331A.Therefore, when adopting
During with nozzle 36B, have the following advantages that, i.e. by dismantling dip member 823, so as to easily carry out ejiction opening 331A maintenance
Operation, the operation for for example removing the foreign matter for being blocked in ejiction opening 331A.In addition, the removal of foreign matter at ejiction opening 331A is for example
It can be realized by dismantling dip member 823 and inserting thin plate into ejiction opening 331A.
<3rd variation of nozzle 36>
Figure 10 is the summary section for the nozzle 36C for representing the 3rd variation.Nozzle 36C structure is approximately similar to nozzle
In 36B structure, but the 3rd component 83A with second component 82B (being specifically body 821) is opposite extends partially into
Untill near the installation site of dip member 823 in body 821.Therefore, the body 821 in second component 82B is formed
Untill blank part 333A between the 3rd component 83A is extended near the installation site of dip member 823.Therefore, ejiction opening
331B formation with inclined plane 335B close proximity.
In this way, by making ejiction opening 723 close to the inclined plane 335B of dip member 823, so as in flow velocity relatively
In the state of big, flushing liquor 31 is set to flow to the downstream of conveyance direction.Therefore, even if reducing to a certain extent from ejiction opening
The spray volume of the time per unit for the flushing liquor that 331B sprays also can make flushing liquor 31 be configured to curtain shape and supply.Therefore, root
According to nozzle 36C, the usage amount of flushing liquor 31 can be suppressed.
More than, embodiment is illustrated, but the present invention is not limited to person as described above, can carry out various changes
Shape.
For example, in the embodiment, the developer solution 21 (pretreatment liquid) that will attach to substrate 90 is replaced into and is different from
The flushing liquor 31 (treatment fluid) of species.But, new treatment fluid of the same race is replaced into the pretreatment liquid that will attach to substrate 90
In the case of, the present invention is also effective.
Moreover, in the embodiment, be illustrated in case of enumerating progress development treatment, but this is only this
One of invention.For example, in other processing substrates such as (etching) processing or lift-off processing are etched, the present invention is also effective.
Although the present invention is described in detail, described explanation is considered in all respects only as illustrating, and the present invention is not
It is defined in this.It is believed that the infinite variety example not illustrated can be expected without departing from the scope of the present invention.Moreover, implementing described
Each structure illustrated in mode can be appropriately combined in reconcilable scope each other.
Claims (12)
1. a kind of substrate board treatment, it is characterised in that including：
Transport mechanism, the substrate for being attached with pretreatment liquid is transported from the upstream side of conveyance direction towards downstream；
Air nozzle, the surface of the substrate to being transported by the transport mechanism towards the downstream supplies the sky of curtain shape
Gas, so as to remove the pretreatment liquid for being attached to the substrate；
First blowing unit, configuration is led in the downstream of the air nozzle from the first ejiction opening of slit in upstream side
The surface for crossing the downstream of the substrate of the air nozzle removal pretreatment liquid sprays treatment fluid, the slit
The formation of the first ejiction opening in the lower surface of first blowing unit, and prolong along the orthogonal direction orthogonal with the conveyance direction
Stretch；And
Second blowing unit, is configured in the downstream of first blowing unit, from the second of the slit extended along the orthogonal direction
Ejiction opening sprays treatment fluid, to supply the treatment fluid of film-form to the substrate,
The pretreatment liquid is removed by the air nozzle in the upstream side of the substrate, and passes through second blowing unit
When supplying treatment fluid to the downstream of the substrate, the institute sprayed from first blowing unit towards the surface of the substrate
Treatment fluid is stated to contact to the substrate and the lower surface, and in the surface of the substrate and first blowing unit
Spread in the gap of the lower surface, and the surface of the substrate and first blowing unit the lower surface it
Between form liquid-tight seal,
First blowing unit is configured to：First ejiction opening apart from the substrate height and be piled up on the substrate
The identical or lower than it height of the height of the upper surface of the treatment fluid.
2. substrate board treatment according to claim 1, it is characterised in that
Second blowing unit sprays the treatment fluid towards the downstream.
3. substrate board treatment according to claim 2, it is characterised in that
Position of second blowing unit below second ejiction opening, with towards the downstream and inclining for being downwardly inclined
Inclined-plane.
4. substrate board treatment according to claim 3, it is characterised in that
Second blowing unit includes：
Body, forms second ejiction opening；And
Dip member, forms the inclined plane, and be installed on the body.
5. substrate board treatment according to claim 4, it is characterised in that
The dip member is removably disposed relative to the body.
6. substrate board treatment according to any one of claim 1 to 5, it is characterised in that
First blowing unit include first component and second component, the first component and second component by being connected to each other,
And first ejiction opening and the blank part connected with first ejiction opening are formed,
Second blowing unit includes the second component and the 3rd component, and the second component and the 3rd component by connecting each other
Connect, and form second ejiction opening and the blank part connected with second ejiction opening.
7. substrate board treatment according to any one of claim 1 to 4, it is characterised in that including：
First processing nozzle for liquid, configuration constitutes first blowing unit in the downstream of the air nozzle；And
Second processing nozzle for liquid, configures in the downstream of the described first processing nozzle for liquid, constitutes second blowing unit.
8. substrate board treatment according to any one of claim 1 to 5, it is characterised in that
The amount that first blowing unit sprays the time per unit of the treatment fluid is less than second blowing unit ejection place
Manage the amount of the time per unit of liquid.
9. substrate board treatment according to any one of claim 1 to 5, it is characterised in that
The width of first ejiction opening is more than the width of second ejiction opening.
10. substrate board treatment according to any one of claim 1 to 5, it is characterised in that
The pretreatment liquid is alkalescence,
The substrate board treatment also includes：
Carbonated water supply unit, carbonated water is supplied to first blowing unit.
11. a kind of nozzle, it is to the substrate for being attached with pretreatment liquid that is transported from the upstream side of conveyance direction towards downstream
Treatment fluid is sprayed, the nozzle is characterised by including：
First blowing unit, configuration is in the upstream side, with the smooth of the direction extension along the surface with the substrate in opposite directions
The first lower surface, and in first lower surface, be formed with the first ejiction opening of the slit along one to extension；And
Second blowing unit, is set relative to first ejiction opening in the downstream interval, with described along spraying
The second ejiction opening from the one for the treatment of fluid to the slit of extension, and make from the second ejiction opening spray the treatment fluid stream
Under downside and the inclined inclined plane in the downstream, second blowing unit supplies curtain shape to the surface of the substrate
The treatment fluid,
Pass through the treatment fluid between the surface of the substrate and first lower surface by first blowing unit
Liquid-tight seal is formed, the treatment fluid is supplied by second blowing unit in the downstream of the liquid-tight seal,
First blowing unit is configured to：First ejiction opening apart from the substrate height and be piled up on the substrate
The identical or lower than it height of the height of the upper surface of the treatment fluid.
12. a kind of substrate processing method using same, it is characterised in that including：
(a) process is transported, the substrate for being attached with pretreatment liquid is transported from the upstream side of conveyance direction towards downstream；
(b) removing step, supplies the air of curtain shape, so as to remove attached to the surface of the substrate by the conveyance process conveyance
The pretreatment liquid in the substrate；
(c) the first treatment fluid sprays process, when performing the removing step, is removed from the first ejiction opening direction of slit by described
The surface in the downstream of the substrate of process conveyance is sent to spray treatment fluid, first ejiction opening of the slit is formed
Extend in the lower surface of the first blowing unit, and along the direction orthogonal with the conveyance direction；And
(d) second processing liquid sprays process, when performing the first treatment fluid ejection process, is removed towards by the conveyance process
The surface in the downstream of the substrate sent sprays the treatment fluid of film-form,
When performing the removing step and the second processing liquid sprays process, in first treatment fluid sprays process,
From first ejiction opening towards the surface of the substrate spray treatment fluid contact to the surface of the substrate with
And the lower surface of first blowing unit, and described in the surface of the substrate and first blowing unit
Spread in the gap of lower surface, and the shape between the lower surface of the surface of the substrate and first blowing unit
Into liquid-tight seal,
First blowing unit is configured to：First ejiction opening apart from the substrate height and be piled up on the substrate
The identical or lower than it height of the height of the upper surface of the treatment fluid.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014-063434 | 2014-03-26 | ||
| JP2014063434 | 2014-03-26 | ||
| JP2014164247A JP6527674B2 (en) | 2014-03-26 | 2014-08-12 | Substrate processing apparatus, nozzle and substrate processing method |
| JP2014-164247 | 2014-08-12 |
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| Publication Number | Publication Date |
|---|---|
| CN104952765A CN104952765A (en) | 2015-09-30 |
| CN104952765B true CN104952765B (en) | 2017-10-03 |
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| CN108074835A (en) * | 2016-11-09 | 2018-05-25 | 盟立自动化股份有限公司 | Wet process device |
| WO2019043947A1 (en) * | 2017-09-04 | 2019-03-07 | シャープ株式会社 | Etching device, and method for manufacturing display device |
| JP6873015B2 (en) * | 2017-09-22 | 2021-05-19 | 株式会社Ｓｃｒｅｅｎホールディングス | Coating equipment and coating method |
| KR102045828B1 (en) * | 2018-07-04 | 2019-11-18 | 주식회사 디엠에스 | Substrate processing apparatus |
| KR102399869B1 (en) * | 2019-09-12 | 2022-05-20 | 키오시아 가부시키가이샤 | substrate processing equipment |
| CN114200791B (en) * | 2020-09-17 | 2023-12-08 | 株式会社斯库林集团 | Developing device and developing method |
| CN114100881B (en) * | 2021-11-19 | 2022-07-22 | 苏州晶洲装备科技有限公司 | Double-edge liquid knife and liquid injection device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR20020093577A (en) * | 2001-06-08 | 2002-12-16 | 수미도모 프리시젼 프로덕츠 캄파니 리미티드 | Substrate processing device |
| JP2007266545A (en) * | 2006-03-30 | 2007-10-11 | Dainippon Screen Mfg Co Ltd | Substrate treatment equipment |
| JP2010186974A (en) * | 2009-02-13 | 2010-08-26 | Tokyo Electron Ltd | Liquid treatment device, liquid treatment method, and storage medium |
| KR101099612B1 (en) * | 2009-09-21 | 2011-12-29 | 세메스 주식회사 | swing nozzle unit and apparatus for treating substrate with the swing nozzle unit |
| JP5732376B2 (en) * | 2011-06-21 | 2015-06-10 | 東京エレクトロン株式会社 | Two-fluid nozzle, substrate liquid processing apparatus, and substrate liquid processing method |
| JP2013080808A (en) * | 2011-10-04 | 2013-05-02 | Tokyo Electron Ltd | Substrate processing apparatus and substrate processing method |
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