CN109570075A - Cleaning device and the spray equipment for using the cleaning device - Google Patents
Cleaning device and the spray equipment for using the cleaning device Download PDFInfo
- Publication number
- CN109570075A CN109570075A CN201811272658.2A CN201811272658A CN109570075A CN 109570075 A CN109570075 A CN 109570075A CN 201811272658 A CN201811272658 A CN 201811272658A CN 109570075 A CN109570075 A CN 109570075A
- Authority
- CN
- China
- Prior art keywords
- slide plate
- nozzle
- cleaning device
- sliding rail
- spout
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 55
- 239000007921 spray Substances 0.000 title claims abstract description 38
- 239000007788 liquid Substances 0.000 claims description 19
- 238000007789 sealing Methods 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 14
- 238000000034 method Methods 0.000 description 14
- 239000000758 substrate Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 7
- 230000000903 blocking effect Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000012538 light obscuration Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/16—Rigid blades, e.g. scrapers; Flexible blades, e.g. wipers
- B08B1/165—Scrapers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
Abstract
The present invention provides a kind of cleaning device and the spray equipment using the cleaning device, it is an advantage of the current invention that can effectively remove photoresist residual using the nozzle of cleaning device cleaning spray device, avoid spray nozzle clogging.
Description
Technical field
The present invention relates to display device preparation field more particularly to a kind of cleaning device and using the spray of the cleaning device
Device.
Background technique
Recently, it as social stepped into information is oriented to society, handles and the display field of display bulk information is sent out rapidly
Exhibition, and correspondingly, various FPD (FPD) devices have been developed and have attracted a large amount of attentions.The example of FPD device
Including LCD device, plasma display panel (PDP) device, field emission display (FED) device, electroluminance display (ELD) dress
It sets, Organic Light Emitting Diode (OLED) display device etc..FPD device has the excellent performance such as thin, light, low-power consumption, therefore,
The application field of FPD device constantly expands.Especially in most of electronic devices or mobile device, FPD device is used as one
Kind user interface.
In the preparation process of various FPD (FPD) device, it usually needs pass through photoresistance exposure, the method system of development
Standby basic structure.For example, being transferred into progress light blockage coating at apparatus for coating after cleaning and drying before substrate is coated；It applies
After the completion of cloth, the substrate for being coated with photoresist, which is transferred at exposure device, to be exposed, and the substrate after exposure is transferred into aobvious again
Develop at image device, forms exposure mask on substrate.Wherein in developing process, developer solution and exposed photoresist
Reaction is learned, and then the photoresist is washed off.Due to developer solution (TMAH) higher cost, to guarantee that developer solution can reuse,
It is currently that all developer solutions are recycled in developer solution holding tank.The concentration of developer solution is by development stoste in developer solution holding tank
(concentration 25%) and water are adjusted to 2.38% (except PLN processing procedure is 0.4%) jointly.
Fig. 1 is developing apparatus schematic diagram.Referring to Fig. 1, developing apparatus includes one first aobvious in the developing process stage
Shadow slot 10, one second developing trough 11 and a third developing trough 12.One first developing nozzle 13 and one second developing nozzle 14 are to
Developer solution is sprayed in one developing trough 10,18 upper surface of substrate is made to be sprayed-on developer solution 19.The portion that 18 upper surface of substrate carries
Developer solution 19 is divided to react when flowing through second developing trough 11 and the third developing trough 12 with photoresist, wherein to be arranged in institute
It states the third developing nozzle 15 of 11 top of the second developing trough and the 4th developing nozzle of 12 top of third developing trough is set
16 property of can choose are opened, to enhance developing function.It is described when the substrate 18 is transferred out from the third developing trough 12
The developer solution that 18 upper surface of substrate carries can the air knife 17 of developed outlet blow back the third developing trough 12, cocurrent time developer solution
Holding tank 100, so that the developer solution rate of recovery be made to reach 95% or more.Wherein, the development reacted with the photoresist on the substrate 18
Liquid is mainly the developer solution 19 that 18 upper surface of substrate carries, because the developer solution is washed off by photoresist from the substrate 18
Increase photoresist concentration in development liquor, there are a large amount of light obscuration particles in the development liquor reacted at this time, can flow back
To developer solution holding tank 100.
Above-mentioned developing process can there are the following problems: (1) photoresist concentration increases in developer solution holding tank 100, when this part
Developer solution extended stationary periods are in the first developing nozzle 13, the second developing nozzle 14, third developing nozzle 15, four developing nozzles 16
(when board does not work), photoresist solidification may result in the first developing nozzle 13, the second developing nozzle 14, third developing nozzle
15, the 4th developing nozzle 16 blocking (only 150 μm of the width of jet hole)；(2) first developing troughs 10, the second developing trough 11 and third
Photoresist residue is more in developing trough 12, and long-term volatilization also results in the first developing nozzle 13, the second developing nozzle 14, third development
Nozzle 15, the blocking of the 4th developing nozzle 16；(3) because developing apparatus is there are continual exhaust system (exhaust), can also accelerate
Rest on the first developing trough 10,12 bottom of one second developing trough 11 and third developing trough photoresist residue volatilization, and then cause
First developing nozzle 13, the second developing nozzle 14, third developing nozzle 15, the blocking of the 4th developing nozzle 16.And the blocking of nozzle
It is the main reason for causing development related uneven (mura).
Therefore, it is necessary to a kind of cleaning device be provided, to avoid spray nozzle clogging.
Summary of the invention
The technical problem to be solved by the invention is to provide a kind of cleaning device and using the spray dress of the cleaning device
It sets, photoresist residual can be effectively removed, avoid spray nozzle clogging.
To solve the above-mentioned problems, the present invention provides a kind of cleaning device, including a bracket, an actuator and one are sliding
Piece, the actuator is fixed on the bracket, and the slide plate can extend into the inside for being intended to clean device, the drive
Moving part is connect with the slide plate, to drive the slide plate to be intended to move in clean device described.
In one embodiment, the cleaning device further includes a sliding rail and a sliding block, and the sliding rail is connect with the bracket
Or be intended to clean device with described and connect, the sliding rail extends along the moving direction of the slide plate, the sliding block and the cunning
Piece connection, and the sliding block is moved along the sliding rail to drive the slide plate to move along the sliding rail.
In one embodiment, the bracket is a liftable support.
In one embodiment, the cleaning device further includes a limiting device, and the starting that the slide plate slides is arranged in
End and terminal, to limit the shift position of the slide plate.
It is described the present invention also provides a kind of spray equipment, including a nozzle and a cleaning device as described in claim 1
Slide plate is inserted into the nozzle, and in the nozzle, the slide plate can be moved along the length direction of the nozzle.
In one embodiment, the nozzle further includes a spout and a top opposite with the spout, the top tool
There is a slit, the slide plate extends to the spout from the slit, and the cleaning device further includes a sliding rail and a sliding block, institute
It states sliding rail to be arranged on the top, and extends along the length direction of the nozzle, the sliding block is connect with the slide plate, and described
Sliding block can be moved along the sliding rail, to drive the slide plate to move along the sliding rail.
In one embodiment, the width of the slide plate is less than the width of the spout, and the slide plate extends from the slit
To the spout and protrude from the spout.
In one embodiment, on the top, the two sides of the slit are arranged in a sealing structure, to avoid liquid from institute
State slit ejection.
In one embodiment, at least one side wall of the nozzle is provided with multiple inlets, a liquid by it is described into
Liquid mouth is sent in the nozzle, and is sprayed through the spout.
In one embodiment, the cleaning device further includes a limiting device, and the limiting device is arranged in the nozzle
Both ends, to limit the shift position of the slide plate.
It is an advantage of the current invention that it is residual photoresist can be effectively removed using the nozzle of cleaning device cleaning spray device
It stays, avoids spray nozzle clogging.
Detailed description of the invention
The existing developing apparatus schematic diagram of Fig. 1；
Fig. 2 is the structural schematic diagram of cleaning device of the present invention；
Fig. 3 is the side structure schematic view of spray equipment of the present invention；
Fig. 4 is the present invention looks up structural representation of spray equipment of the present invention；
Fig. 5 is the structural schematic diagram on the top of nozzle.
Specific embodiment
The specific reality of spray equipment to cleaning device provided by the invention and using the cleaning device with reference to the accompanying drawing
The mode of applying elaborates.
Fig. 2 is the structural schematic diagram of cleaning device of the present invention.Referring to Fig. 2, the cleaning device 2 include a bracket 20,
One actuator 21 and a slide plate 22.
The bracket 20 is used to support other components of the cleaning device 2.Specifically, the bracket 20 mainly plays branch
Support effect, can be used for supporting the actuator 21.Wherein, the bracket 20, which can be fixed on, is intended on clean device, or
The bracket 20 is fixed in other external structures, and the invention does not limit this.Further, 20 liftable of bracket,
To drive other component liftings of the cleaning device 2.Wherein, the bracket with liftable function is the conventional knot of this field
Structure, repeats no more herein.
The actuator 21 is fixed on the bracket 20.The i.e. described bracket 20 supports the actuator 21.The driving
Part 21 can drive other components of the cleaning device mobile, for example, the actuator 21 drives the slide plate 22 mobile.Institute
Stating actuator 21 is conventional structure, and specifically it is the technological means that automation field usually uses, for example, cylinder.
The slide plate 22 is directly or indirectly connect with the actuator 21.Specifically, the slide plate 22 can directly connect
It is connected in the movement parts (not being painted in attached drawing) of the actuator 21 or the slide plate 22 is connected indirectly by a connection piece
To the movement parts of the actuator 21.The movement parts of the actuator 21 move and then drive the slide plate 22 mobile.It is described
Slide plate 22 can be used mode well known to those skilled in the art with the actuator 21 and connect.For example, in the present embodiment, it is described
Actuator 21 is cylinder, then the slide plate 22 is connected to the piston rod of the cylinder by a connection piece 200, and the piston rod is past
It is multiple mobile, and then the slide plate 22 is driven to move back and forth.Wherein, the slide plate 22 includes but is not limited to ceramic sheet, is had
Certain rigidity, and the performance for the liquid for being intended to the subsequent ejection of clean device will not be had an impact.
The slide plate 22 can extend into the inside for being intended to clean device (nozzle 3 in such as Fig. 3).For example, described
Slide plate 22 is inserted into the inside for being intended to clean device.Under the driving of the actuator 21, the slide plate 22 can be described
It is intended to move in clean device.In Fig. 2, the moving direction of the slide plate 22 is as shown by the directional arrows a in the diagram, for example, the slide plate
22 can move back and forth in the horizontal direction.In the moving process of the slide plate 22, the impurity for being intended to clean device is blocked
It is scraped by the slide plate 22, and then plays the cleaning purpose for being intended to clean device.The width of the slide plate 22 is less than described
It is intended to the width of the position for allowing slide plate to be inserted into of clean device, so that the slide plate 22 is when moving, is not intended to clearly with described
Each section component of clean device interferes.In addition, in the present invention, the common controlling party of automatic field can also be used
Method sets the travel frequency of slide plate 22, so as to realize the automatically working of cleaning device.
Further, the cleaning device 3 further includes a sliding rail 23 and a sliding block 24.The sliding rail 23 is along the slide plate 21
Moving direction extends.The sliding rail 23 can be connect with the bracket 20, could be secured to described be intended on clean device.The cunning
Block 24 is connect with the slide plate 22.Specifically, the sliding block 24 be do not extend intoed with the slide plate 22 it is described be intended to it is clean
One end connection in device, for example, in the present embodiment, the sliding block 24 is connect with the top of the slide plate 22, the slide plate
22 top does not extend into described be intended in clean device.The sliding block 24 can be moved along the sliding rail 23, and then band
The slide plate 22 is moved to move along the sliding rail 23.The sliding rail 23 is used cooperatively with the sliding block 24, can make 22 edge of slide plate
Its moving direction steadily moves.Wherein, the sliding rail 23 and the sliding block 24 be sliding rail well known to those skilled in the art and
Slide block structure repeats no more.
Further, the cleaning device 3 further includes a limiting device 25.The limiting device 25 is arranged in the slide plate 22
The starting point slided and terminal, to limit the shift position of the slide plate 22.Specifically, in the present embodiment, the limit
Device 25 is two limit sensors that starting point and terminal that the slide plate 22 slides is arranged in, the limit sensors induction
The position of the slide plate 22, and the actuator 21 will be sent to after the position information process, and then control the actuator 21
Driving process, to avoid the slide plate 22 hit other components.Wherein, the limiting device 25 is conventional structure, specifically
It says, for the technological means that automation field usually uses, details are not described herein.
The present invention also provides a kind of spray equipments.Fig. 3 is the side structure schematic view of spray equipment of the present invention, and Fig. 4 is this
The present invention looks up structural representation of invention spray equipment.Fig. 3 and Fig. 4 is please referred to, the spray equipment includes that a nozzle 3 and one is above-mentioned
Cleaning device 3.
The nozzle 3 includes a spout 30, and the spout 30 includes but is not limited to develop for spraying liquid, the liquid
Liquid.In spray equipment work, the spout 30 is towards sample to be sprayed.Specifically, in the present embodiment, the spray
Mouth 30 is the slit spout of this field routine, and length and width can be configured according to practice.
The slide plate 22 is inserted into the nozzle 3, and in the nozzle 3, and the slide plate 22 can be along the nozzle 3
Length direction is mobile.In fig. 3, in order to clearly illustrate technical solution of the present invention, the slide plate 22 is blocked by the nozzle 3
Part is painted using dotted line.Specifically, the slide plate 22 can be moved to its terminal run from its starting point W1 run
W2.The slide plate 22 may pass through the spout 30, then when the slide plate 22 is mobile, can remove the blocking at the spout 30
Object, and then clean the spout 30.In the present embodiment, the nozzle 3 has a top 31 opposite with the spout 30, institute
Top 31 is stated with a slit 33.Fig. 5 is the structural schematic diagram on the top 31 of the nozzle 3.Fig. 3, Fig. 4 and Fig. 5 are please referred to, institute
It states slide plate 22 to be inserted into 3 inside of nozzle across the slit 33 and extend to the spout 30, and the slide plate 22 protrudes from
The spout 30, in order to effectively being cleaned inside the nozzle 3.Wherein, the width of the slide plate 22 is less than the spray
Mouthfuls 30 width can then be convenient for the movement of the slide plate 22, and can be avoided and lead to other portions due to movement because of the slide plate 22
The case where part damages.
The sliding rail 23 of the cleaning device 3 is arranged on the top 31.Specifically, it can be solid with the top 31
Determine or is detachably connected.The sliding rail 23 extends along the length direction of the nozzle 3.In the present embodiment, the sliding rail 23 from
The starting point W1 that the slide plate 22 is run extends to the terminal W2 that the slide plate 22 is run.The sliding block 24 connects with the slide plate 22
It connects, specifically, the sliding block 24 is fixed or is detachably connected with the slide plate 22.Wherein the detachable island Lian Ji advantage exists
In being conveniently replaceable the damaged slide plate 22.The sliding block 24 can be moved along the sliding rail 23, to drive 22 edge of slide plate
The sliding rail 23 is mobile.
The both ends of the spray equipment are arranged in the limiting device 25 of the cleaning device 3, to limit the slide plate 22
Shift position.Specifically, the limit positioned at terminal W2 fills when the slide plate 22 is run from the starting point W1 to terminal W2
The signal for detecting the slide plate 22 is set, by the signal after a microprocessor processes, control actuator 21 is converted to and subtracts
The signal of speed operation, and the signal is passed into the actuator 21, so that the actuator 21 drives the slide plate 22
Slow down；When the slide plate 22 is from the terminal W2 inverted running to starting point W1, the limiting device positioned at starting point W1 is detected
To the signal of the slide plate 22, by the signal after a microprocessor (not being painted in attached drawing) processing, is converted to control and drives
The signal that moving part 21 runs slowly, and the signal is passed into the actuator 21, so that the actuator 21 drives institute
State the deceleration of slide plate 22.The limiting device 25, the actuator 21 and the microprocessor are the normal of automation control area
Structure is advised, is repeated no more.
Further, please continue to refer to Fig. 2 and Fig. 5, on the top 31, the slit 33 is arranged in a sealing structure 4
Two sides spray to avoid liquid from the slit 33.Wherein, in other embodiments, the sealing structure 4 can also surround institute
Marginal position of the nozzle 3 in addition to spout 30 is stated, is revealed to avoid liquid from the region except the spout 30 of nozzle 3.
Further, the side wall of the nozzle 3 is provided with multiple inlets 32.The liquid that the spray equipment needs passes through
The inlet 32 is sent in the nozzle 3, and is sprayed through the spout 30, and the liquid includes but is not limited to developer solution.
The inlet 32 is connected to liquid storaging device (not being painted in attached drawing) by outside liquid delivery line 5.The inlet
32 are arranged in the side wall of the nozzle 3, so that the cleaning device 2 be avoided to interfere with each other with the outside liquid delivery line 5.
Spray equipment of the present invention has the cleaning device 3, can be set using the common control method of automatic field
The travel frequency of slide plate 22 and the time of starting are determined, so as to realize the automatically working of cleaning device, for example, control can be passed through
The driving frequency of the actuator 21 of the cleaning device 3 is made to control the travel frequency of the cleaning device 3, or described in control
The starting time of actuator 21, so that the start by set date of slide plate 22 is realized, so as to realize the automatically working of cleaning device.
In addition, the slide plate 22 is in except effective spraying zone of the nozzle 3, will not influence liquid in the nozzle 3 work
Spray.
The cleaning process of spray equipment of the present invention is exemplified below.
(1) when spray equipment work long period or spray equipment stop working the long period, system opens nozzle
Cleaning function；
(2) motor equal power device drives the running of the actuators such as cylinder, and slide plate moves to the other side from nozzle side and carries out
Scrape examination；
(3) after what slide plate arrival was set scrapes examination number, it is moved to the inactive area of nozzle, nozzle carries out liquid and spues in advance,
Complete the cleaning process of nozzle.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
Member, various improvements and modifications may be made without departing from the principle of the present invention, these improvements and modifications also should be regarded as
Protection scope of the present invention.
Claims (10)
1. a kind of cleaning device, which is characterized in that including a bracket, an actuator and a slide plate, the actuator is fixed on institute
It states on bracket, the slide plate can extend into the inside for being intended to clean device, and the actuator is connect with the slide plate, with
The slide plate is driven to be intended to move in clean device described.
2. cleaning device according to claim 1, which is characterized in that the cleaning device further includes that a sliding rail and one are sliding
Block, the sliding rail connect with the bracket or are intended to clean device with described and connect, and the sliding rail is moved along the slide plate
Direction extends, and the sliding block is connect with the slide plate, and the sliding block is moved along the sliding rail to drive the slide plate described in
Sliding rail is mobile.
3. cleaning device according to claim 1, which is characterized in that the bracket is a liftable support.
4. cleaning device according to claim 1, which is characterized in that the cleaning device further includes a limiting device,
The starting point and terminal that the slide plate slides are set, to limit the shift position of the slide plate.
5. a kind of spray equipment, which is characterized in that including a nozzle and a cleaning device as described in claim 1, the cunning
Piece is inserted into the nozzle, and in the nozzle, the slide plate can be moved along the length direction of the nozzle.
6. spray equipment according to claim 5, which is characterized in that the nozzle further include a spout and one with the spray
The opposite top of mouth, the top have a slit, and the slide plate extends to the spout, the cleaning device from the slit
It further include a sliding rail and a sliding block, the sliding rail is arranged on the top, and extends along the length direction of the nozzle, the cunning
Block is connect with the slide plate, and the sliding block can be moved along the sliding rail, to drive the slide plate to move along the sliding rail.
7. spray equipment according to claim 6, which is characterized in that the width of the slide plate is less than the width of the spout
Degree, the slide plate extend to the spout from the slit and protrude from the spout.
8. spray equipment according to claim 6, which is characterized in that on the top, a sealing structure is arranged described
The two sides of slit spray to avoid liquid from the slit.
9. spray equipment according to claim 6, which is characterized in that be provided in at least one side wall of the nozzle multiple
Inlet, a liquid are sent in the nozzle by the inlet, and are sprayed through the spout.
10. spray equipment according to claim 5, which is characterized in that the cleaning device further includes a limiting device, institute
The both ends that the nozzle is arranged in limiting device are stated, to limit the shift position of the slide plate.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811272658.2A CN109570075A (en) | 2018-10-30 | 2018-10-30 | Cleaning device and the spray equipment for using the cleaning device |
| PCT/CN2019/096020 WO2020087984A1 (en) | 2018-10-30 | 2019-07-15 | Cleaning device and spraying device using same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811272658.2A CN109570075A (en) | 2018-10-30 | 2018-10-30 | Cleaning device and the spray equipment for using the cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109570075A true CN109570075A (en) | 2019-04-05 |
Family
ID=65921236
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201811272658.2A Pending CN109570075A (en) | 2018-10-30 | 2018-10-30 | Cleaning device and the spray equipment for using the cleaning device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN109570075A (en) |
| WO (1) | WO2020087984A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020087984A1 (en) * | 2018-10-30 | 2020-05-07 | 武汉华星光电技术有限公司 | Cleaning device and spraying device using same |
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|---|---|---|---|---|
| CN201776282U (en) * | 2010-08-12 | 2011-03-30 | 宝山钢铁股份有限公司 | Self-cleaning scraper type roll surface cleaning device |
| CN202909970U (en) * | 2012-11-12 | 2013-05-01 | 京东方科技集团股份有限公司 | Knife edge cleaning device and knife |
| CN103962335A (en) * | 2014-04-14 | 2014-08-06 | 京东方科技集团股份有限公司 | Cleaning device and transfer print system |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020087984A1 (en) * | 2018-10-30 | 2020-05-07 | 武汉华星光电技术有限公司 | Cleaning device and spraying device using same |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2020087984A1 (en) | 2020-05-07 |
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Application publication date: 20190405 |