WO2020087984A1

WO2020087984A1 - Cleaning device and spraying device using same

Info

Publication number: WO2020087984A1
Application number: PCT/CN2019/096020
Authority: WO
Inventors: 魏凡
Original assignee: 武汉华星光电技术有限公司
Priority date: 2018-10-30
Filing date: 2019-07-15
Publication date: 2020-05-07
Also published as: CN109570075A

Abstract

A cleaning device (2) and a spraying device using same. The cleaning device comprises a bracket (20), a drive member (21), and a sliding sheet (22). The drive member (21) is fixed on the bracket (20). The sliding sheet (22) is able to extend into a device to be cleaned. The drive member (21) is connected to the sliding sheet (22) to drive the sliding sheet (22) to move within the device to be cleaned. By cleaning a spray nozzle (3) of the spraying device using the cleaning device (2), photoresist residues can be effectively removed, thereby avoiding the block of the spray nozzle.

Description

Cleaning device and spray device adopting the cleaning device

Technical field

The invention relates to the field of preparation of display devices, in particular to a cleaning device and a spray device adopting the cleaning device.

Background technique

Recently, as society has entered an information-oriented society, the display field that processes and displays a large amount of information is rapidly developing, and accordingly, various flat panel display (FPD) devices have been developed and attracted a lot of attention. Examples of FPD devices include LCD devices, plasma display panel (PDP) devices, field emission display (FED) devices, electroluminescence display (ELD) devices, organic light emitting diode (OLED) display devices, and the like. FPD devices have excellent performance such as thinness, lightness, and low power consumption. Therefore, the application fields of FPD devices are continuously expanding. Especially in most electronic devices or mobile devices, FPD devices are used as a user interface.

In the preparation process of various flat panel display (FPD) devices, it is usually necessary to prepare the basic structure by means of photoresist exposure and development. For example, after the substrate is cleaned and dried before coating, it is transferred to the coating device for photoresist coating; after the coating is completed, the substrate coated with photoresist is transferred to the exposure device for exposure, and the exposed substrate It is then transferred to the developing device for development, and a mask is formed on the substrate. In the development process, the developing solution and the exposed photoresist chemically react, and then the photoresist is washed away. Due to the high cost of developing solution (TMAH), in order to ensure that the developing solution can be reused, currently all the developing solution is recovered into the developer storage tank. The concentration of the developer in the developer storage tank is adjusted to 2.38% from the developer stock solution (25% concentration) and water (except for the PLN process of 0.4%).

Figure 1 is a schematic diagram of a developing device. Please refer to FIG. 1. In the development process stage, the development device includes a first development tank 10, a second development tank 11 and a third development tank 12. A first developing nozzle 13 and a second developing nozzle 14 spray the developing solution into the first developing tank 10 so that the upper surface of the substrate 18 is sprayed with the developing solution 19. A part of the developing solution 19 carried on the upper surface of the substrate 18 reacts with the photoresist when flowing through the second developing tank 11 and the third developing tank 12, wherein the first liquid tank disposed above the second developing tank 11 The three developing nozzles 15 and the fourth developing nozzle 16 disposed above the third developing tank 12 can be selectively opened to enhance the developing function. When the substrate 18 is transported out of the third developing tank 12, the developing solution carried on the upper surface of the substrate 18 will be blown back to the third developing tank 12 by the air knife 17 of the developing outlet and flow back to the developing Liquid storage tank 100, so that the developer recovery rate reaches 95% or more. Among them, the developer that reacts with the photoresist on the substrate 18 is mainly the developer 19 carried on the upper surface of the substrate 18, because the developer removes the photoresist from the substrate 18 to make the developer solution When the photoresist concentration increases, a large amount of photoresist particles are present in the reacted developer solution at this time, which will return to the developer storage tank 100.

technical problem

The above development process will have the following problems: (1) The concentration of the photoresist in the developer storage tank 100 increases, and when this part of the developer stays for a long time in the first development nozzle 13, the second development nozzle 14, the third development nozzle 15, the first When the four developing nozzles 16 (when the machine is not in operation), photoresist solidification may cause the first developing nozzle 13, the second developing nozzle 14, the third developing nozzle 15, and the fourth developing nozzle 16 to be blocked (the width of the nozzle opening is only 150 μm ); (2) There are many photoresist residues in the first developing tank 10, second developing tank 11 and third developing tank 12, long-term volatilization will also cause the first developing nozzle 13, second developing nozzle 14, third developing nozzle 15. The fourth developing nozzle 16 is blocked; (3) Due to the uninterrupted exhaust system (exhaust) of the developing device, it will also stay at the bottom of the first developing tank 10, the second developing tank 11 and the third developing tank 12 faster The evaporation of the photoresist residues causes the first developing nozzle 13, the second developing nozzle 14, the third developing nozzle 15, and the fourth developing nozzle 16 to block. The clogging of the nozzle is the main cause of the development-related unevenness (mura).

Therefore, it is necessary to provide a cleaning device to avoid nozzle clogging.

Technical solution

The technical problem to be solved by the present invention is to provide a cleaning device and a spray device adopting the cleaning device, which can effectively remove the photoresist residue and avoid nozzle clogging.

In order to solve the above problems, the present invention provides a cleaning device, which includes a bracket, a driving member and a sliding plate, the driving member is fixed on the bracket, the sliding plate can extend into a device to be cleaned In the interior, the driving member is connected to the slide to drive the slide to move within the device to be cleaned, the cleaning device further includes a slide rail and a slider, the slide rail and the slide The bracket is connected, the slide rail extends along the moving direction of the slide, the slider is connected with the slide, and the slide moves along the slide to drive the slide along the slide The rail moves, the bracket is a liftable bracket, and the cleaning device further includes a limit device, which is provided at the beginning and end of the sliding of the slide to define the moving position of the slide

In order to solve the above problem, the present invention also provides a cleaning device, which includes a bracket, a driving member and a sliding plate, the driving member is fixed on the bracket, the sliding plate can extend into a cleaning Inside the device, the drive member is connected to the slide to drive the slide to move within the device to be cleaned.

In an embodiment, the cleaning device further includes a slide rail and a slider, the slide rail is connected to the bracket or the device to be cleaned, and the slide rail moves along the slide Extending in the direction, the slider is connected with the slider, and the slider moves along the slide rail to drive the slider to move along the slide rail.

In one embodiment, the support is a liftable support.

In one embodiment, the cleaning device further includes a limiting device, which is disposed at the beginning end and the end end of the sliding piece to define the moving position of the sliding piece.

The present invention also provides a spray device including a nozzle and a cleaning device as described above, the slide is inserted into the nozzle, and in the nozzle, the slide can be along the length of the nozzle Direction of movement.

In an embodiment, the nozzle further includes a nozzle and a tip opposite to the nozzle, the tip has a slit, the slider extends from the slit to the nozzle, and the cleaning device It also includes a slide rail and a slider. The slide rail is disposed at the top end and extends along the length of the nozzle. The slider is connected to the slider, and the slider can move along the The sliding rail moves to drive the sliding piece to move along the sliding rail.

In one embodiment, the width of the slide is smaller than the width of the nozzle, and the slide extends from the slit to the nozzle and protrudes from the nozzle.

In one embodiment, at the top end, a sealing structure is provided on both sides of the slit to prevent liquid from being ejected from the slit.

In one embodiment, at least one side wall of the nozzle is provided with a plurality of liquid inlets, and a liquid is transmitted into the nozzle through the liquid inlet and is ejected through the nozzle.

In an embodiment, the cleaning device further includes a limiting device, and the limiting device is disposed at both ends of the nozzle to define a moving position of the slider.

Beneficial effect

The advantage of the present invention is that the nozzle of the spray device is cleaned by the cleaning device, which can effectively remove the photoresist residue and avoid the nozzle clogging.

BRIEF DESCRIPTION

Figure 1 Schematic diagram of the existing developing device;

2 is a schematic structural view of the cleaning device of the present invention;

3 is a schematic side view of the structure of the spray device of the present invention;

4 is a schematic view of the bottom structure of the spray device of the present invention;

5 is a schematic view of the structure of the tip of the nozzle.

Embodiments of the invention

The specific embodiments of the cleaning device provided by the present invention and the spray device adopting the cleaning device will be described in detail below with reference to the drawings.

2 is a schematic view of the structure of the cleaning device of the present invention. Referring to FIG. 2, the cleaning device 2 includes a bracket 20, a driving member 21 and a sliding piece 22.

The bracket 20 is used to support other components of the cleaning device 2. Specifically, the bracket 20 mainly plays a supporting role, which can be used to support the driving member 21. The bracket 20 may be fixed on the device to be cleaned, or the bracket 20 may be fixed on other external structures, which is not limited in the present invention. Further, the bracket 20 can be raised and lowered to drive other components of the cleaning device 2 to move up and down. Among them, the bracket with a liftable function is a conventional structure in the art, which will not be repeated here.

The driving member 21 is fixed on the bracket 20. That is, the bracket 20 supports the driving member 21. The driving member 21 can drive other components of the cleaning device to move, for example, the driving member 21 drives the sliding plate 22 to move. The driving member 21 has a conventional structure, and specifically, it is a technical means commonly used in the field of automatic control, for example, a cylinder.

The sliding piece 22 is directly or indirectly connected to the driving member 21. Specifically, the sliding plate 22 may be directly connected to the moving part (not shown in the drawings) of the driving member 21, or the sliding plate 22 may be indirectly connected to the driving member 21 through a connecting member On moving parts. The moving part of the driving part 21 moves to move the sliding plate 22. The sliding piece 22 and the driving member 21 may be connected in a manner well known to those skilled in the art. For example, in this embodiment, the driving member 21 is a cylinder, then the sliding plate 22 is connected to the piston rod of the cylinder through a connecting member 200, and the piston rod moves back and forth to drive the sliding plate 22 Move back and forth. Wherein, the sliding sheet 22 includes, but is not limited to, a ceramic sheet, which has a certain rigidity and does not affect the performance of the liquid to be subsequently sprayed by the device to be cleaned.

The slide 22 can extend into the interior of a device to be cleaned (such as the nozzle 3 in FIG. 3). For example, the slide 22 is inserted into the device to be cleaned. Driven by the driving member 21, the slide 22 can move in the device to be cleaned. In FIG. 2, the moving direction of the slide 22 is shown by arrow A in the figure. For example, the slide 22 can reciprocate in the horizontal direction. During the movement of the sliding plate 22, the impurities that block the device to be cleaned are scraped off by the sliding plate 22, thereby serving to clean the device to be cleaned. The width of the slide 22 is smaller than the width of the position where the slide is allowed to be inserted in the device to be cleaned, so that when the slide 22 moves, it does not interfere with various parts of the device to be cleaned. In addition, in the present invention, a control method commonly used in the field of automation can also be used to set the moving frequency of the slide 22, so that the cleaning device can be automated.

Further, the cleaning device 3 further includes a slide rail 23 and a slider 24. The sliding rail 23 extends along the moving direction of the sliding sheet 21. The slide rail 23 may be connected to the bracket 20 or may be fixed on the device to be cleaned. The slider 24 is connected to the slider 22. Specifically, the slider 24 is connected to an end of the slide 22 that does not extend into the device to be cleaned. For example, in this embodiment, the slider 24 and the slide 22 The upper part is connected, and the upper part of the sliding piece 22 does not extend into the device to be cleaned. The slider 24 can move along the slide rail 23, and then drives the slide plate 22 to move along the slide rail 23. The sliding rail 23 is used in conjunction with the slider 24 to make the sliding piece 22 move smoothly along its moving direction. The slide rail 23 and the slider 24 are both slide rail and slider structures well known to those skilled in the art, and will not be described in detail.

Further, the cleaning device 3 further includes a limiting device 25. The position-limiting device 25 is disposed at the beginning and end of the sliding plate 22 to limit the moving position of the sliding plate 22. Specifically, in this embodiment, the limit device 25 is two limit sensors provided at the beginning and end of the slide 22, and the limit sensor senses the position of the slide 22 , And sends the position information to the driving member 21 after processing, thereby controlling the driving process of the driving member 21, so as to prevent the sliding piece 22 from hitting other members. Wherein, the limiting device 25 is a conventional structure, specifically, it is a technical method commonly used in the field of automatic control, and will not be repeated here.

The invention also provides a spray device. Fig. 3 is a schematic view of the side structure of the spray device of the present invention, and Fig. 4 is a schematic view of the bottom structure of the spray device of the present invention. Please refer to FIGS. 3 and 4. The spraying device includes a nozzle 3 and a cleaning device 3 described above.

The nozzle 3 includes a nozzle 30 for ejecting liquid, and the liquid includes but is not limited to a developer. When the spray device is in operation, the spray port 30 faces the sample to be sprayed. Specifically, in this embodiment, the nozzle 30 is a conventional slit nozzle in the art, and its length and width can be set according to actual practice.

The slider 22 is inserted into the nozzle 3, and in the nozzle 3, the slider 22 can move along the longitudinal direction of the nozzle 3. In FIG. 3, in order to clearly explain the technical solution of the present invention, the portion of the sliding plate 22 blocked by the nozzle 3 is shown by a dotted line. Specifically, the slider 22 can move from the starting end W1 of its operation to the terminal W2 of its operation. The sliding plate 22 can pass through the nozzle 30, and when the sliding plate 22 moves, it can remove the blockage at the nozzle 30, and then clean the nozzle 30. In this embodiment, the nozzle 3 has a tip 31 opposite to the nozzle 30, and the tip 31 has a slit 33. FIG. 5 is a schematic structural view of the tip 31 of the nozzle 3. 3, 4 and 5, the slide 22 is inserted into the nozzle 3 through the slit 33 and extends to the nozzle 30, and the slide 22 protrudes from the nozzle 30, In order to effectively clean the inside of the nozzle 3. Wherein, the width of the sliding plate 22 is smaller than the width of the nozzle 30, which can facilitate the movement of the sliding plate 22, and can prevent other components from being damaged due to the movement of the sliding plate 22.

The slide rail 23 of the cleaning device 3 is provided at the top end 31. Specifically, it can be fixedly or detachably connected to the top end 31. The slide rail 23 extends along the longitudinal direction of the nozzle 3. In this embodiment, the sliding rail 23 extends from the starting end W1 of the sliding plate 22 to the terminal W2 of the sliding plate 22. The slider 24 is connected to the slider 22, specifically, the slider 24 is fixedly or detachably connected to the slider 22. The advantage of the detachable base island is that it is convenient to replace the damaged slide 22. The slider 24 can move along the sliding rail 23 to drive the sliding piece 22 to move along the sliding rail 23.

The limiting devices 25 of the cleaning device 3 are provided at both ends of the spray device to define the moving position of the slide 22. Specifically, when the slider 22 runs from the starting end W1 to the terminal W2, the limit device at the terminal W2 detects the signal of the slider 22, which is processed by a microprocessor , Converted into a signal that controls the driving member 21 to decelerate and transmit the signal to the driving member 21, so that the driving member 21 drives the sliding plate 22 to decelerate; When running in the reverse direction to the starting end W1, the limit device located at the starting end W1 detects the signal of the slider 22, which is processed by a microprocessor (not shown in the drawing) and then converted to control A signal that the drive member 21 decelerates and transmits the signal to the drive member 21, so that the drive member 21 drives the slide 22 to decelerate. The limiting device 25, the driving member 21 and the microprocessor are all conventional structures in the field of automation and control, and will not be described in detail.

Further, please continue to refer to FIGS. 2 and 5. At the top end 31, a sealing structure 4 is provided on both sides of the slit 33 to prevent liquid from being ejected from the slit 33. In other embodiments, the sealing structure 4 may also surround the edge position of the nozzle 3 except the nozzle 30 to avoid liquid leakage from the area other than the nozzle 30 of the nozzle 3.

Furthermore, a plurality of liquid inlets 32 are provided on the side wall of the nozzle 3. The liquid required by the spray device is transferred into the nozzle 3 through the liquid inlet 32 and is ejected through the nozzle 30. The liquid includes but is not limited to a developer. The liquid inlet 32 is connected to a liquid storage device (not shown in the drawings) through an external liquid delivery pipe 5. The liquid inlet 32 is provided on the side wall of the nozzle 3, so as to avoid the interference between the cleaning device 2 and the external liquid delivery pipe 5.

The spraying device of the present invention has the cleaning device 3, and the control method commonly used in the field of automation can be used to set the moving frequency and start time of the slide 22, so that the cleaning device can be automated, for example, by controlling the The driving frequency of the driving member 21 of the cleaning device 3 controls the moving frequency of the cleaning device 3, or controls the starting time of the driving member 21, so as to realize the timing start of the slide 22, so that the cleaning device can be automated. In addition, when the nozzle 3 is in operation, the slide 22 is outside the effective spraying area of the nozzle 3, which does not affect the spraying of the liquid.

The following is an example of the cleaning process of the spray device of the present invention.

(1) When the spray device works for a long time or the spray device stops working for a long time, the system starts the nozzle cleaning function;

(2) Motors and other power devices drive cylinders and other driving parts to operate, and the slider moves from one side of the nozzle to the other for scraping test;

(3) After the slider reaches the set number of scraping tests, it moves to the invalid area of the nozzle, and the nozzle pre-discharges the liquid, that is, the nozzle cleaning process is completed.

The above is only the preferred embodiment of the present invention. It should be pointed out that for those of ordinary skill in the art, without departing from the principles of the present invention, several improvements and retouches can be made. These improvements and retouches should also be regarded as This is the protection scope of the present invention.

Industrial applicability

The subject matter of this application can be manufactured and used in industry with industrial applicability.

Claims

A cleaning device includes a bracket, a driving member and a sliding piece, the driving member is fixed on the bracket, the sliding piece can extend into the interior of a device to be cleaned, the driving member and all The sliding plate is connected to drive the sliding plate to move in the device to be cleaned, the cleaning device further includes a sliding rail and a sliding block, the sliding rail is connected to the bracket, and the sliding rail is along The moving direction of the slide extends, the slider is connected to the slide, and the slider moves along the slide rail to drive the slide to move along the slide rail, and the bracket is a For the lifting bracket, the cleaning device further includes a limit device, which is provided at the beginning and end of the sliding of the slide to define the moving position of the slide.
A cleaning device includes a bracket, a driving member and a sliding piece, the driving member is fixed on the bracket, the sliding piece can extend into the interior of a device to be cleaned, the driving member and all The slider is connected to drive the slider to move in the device to be cleaned.
The cleaning device according to claim 2, wherein the cleaning device further comprises a slide rail and a slider, the slide rail is connected to the bracket, the slide rail extends along the moving direction of the slide, The slider is connected to the slider, and the slider moves along the slide rail to drive the slider to move along the slide rail.
The cleaning device according to claim 2, wherein the cleaning device further comprises a slide rail and a slider, the slide rail is connected to the device to be cleaned, and the slide rail is along the moving direction of the slide Stretching, the slider is connected with the slider, and the slider moves along the slide rail to drive the slider to move along the slide rail.
The cleaning device according to claim 2, wherein the bracket is a liftable bracket.
The cleaning device according to claim 2, wherein the cleaning device further comprises a limiting device, which is disposed at the starting end and the end of the sliding of the sliding piece to define the moving position of the sliding piece.
A spraying device comprising a nozzle and a cleaning device according to claim 2, the slide is inserted into the nozzle, and in the nozzle, the slide can be along the length of the nozzle Direction of movement.
The spraying device according to claim 7, wherein the nozzle further includes a nozzle and a tip opposite to the nozzle, the tip has a slit, and the slider extends from the slit to the Nozzle, the cleaning device further includes a slide rail and a slider, the slide rail is disposed at the top end, and extends along the length of the nozzle, the slider is connected to the slide, and the The slider can move along the slide rail to drive the slider to move along the slide rail.
The spray device according to claim 8, wherein the width of the slider is smaller than the width of the nozzle, and the slider extends from the slit to the nozzle and protrudes from the nozzle.
The spray device according to claim 8, wherein at the top end, a sealing structure is provided on both sides of the slit to prevent liquid from being sprayed out of the slit.
The spray device according to claim 8, wherein at least one side wall of the nozzle is provided with a plurality of liquid inlets, and a liquid is transmitted into the nozzle through the liquid inlet and sprayed through the nozzle Out.
The spraying device according to claim 7, wherein the cleaning device further comprises a limiting device, the limiting device is disposed at both ends of the nozzle to define a moving position of the slider.