CN104876957B - 有机氨基硅烷及其制备方法 - Google Patents

有机氨基硅烷及其制备方法 Download PDF

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Publication number
CN104876957B
CN104876957B CN201510091650.6A CN201510091650A CN104876957B CN 104876957 B CN104876957 B CN 104876957B CN 201510091650 A CN201510091650 A CN 201510091650A CN 104876957 B CN104876957 B CN 104876957B
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silane
organic
amino
organic amino
compound
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CN104876957A (zh
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萧满超
M·R·麦克唐纳德
R·霍
雷新建
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Versum Materials US LLC
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Versum Materials US LLC
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/025—Silicon compounds without C-silicon linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0801—General processes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CN201510091650.6A 2014-02-28 2015-02-28 有机氨基硅烷及其制备方法 Active CN104876957B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201461946164P 2014-02-28 2014-02-28
US61/946,164 2014-02-28
US14/625,158 US9233990B2 (en) 2014-02-28 2015-02-18 Organoaminosilanes and methods for making same
US14/625,158 2015-02-18

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Publication Number Publication Date
CN104876957A CN104876957A (zh) 2015-09-02
CN104876957B true CN104876957B (zh) 2019-04-19

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US (3) US9233990B2 (cg-RX-API-DMAC10.html)
EP (2) EP3395822B1 (cg-RX-API-DMAC10.html)
JP (2) JP6046758B2 (cg-RX-API-DMAC10.html)
KR (2) KR101873565B1 (cg-RX-API-DMAC10.html)
CN (1) CN104876957B (cg-RX-API-DMAC10.html)
TW (1) TWI540138B (cg-RX-API-DMAC10.html)

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US9233990B2 (en) * 2014-02-28 2016-01-12 Air Products And Chemicals, Inc. Organoaminosilanes and methods for making same
CN107002236B (zh) * 2014-09-23 2019-04-05 乔治洛德方法研究和开发液化空气有限公司 用于沉积含Si膜的碳硅烷取代的胺前体以及其方法
US10354860B2 (en) * 2015-01-29 2019-07-16 Versum Materials Us, Llc Method and precursors for manufacturing 3D devices
US9777025B2 (en) 2015-03-30 2017-10-03 L'Air Liquide, Société pour l'Etude et l'Exploitation des Procédés Georges Claude Si-containing film forming precursors and methods of using the same
TWI716333B (zh) 2015-03-30 2021-01-11 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 碳矽烷與氨、胺類及脒類之觸媒去氫耦合
KR102307983B1 (ko) * 2015-06-16 2021-09-30 버슘머트리얼즈 유에스, 엘엘씨 할라이도실란 화합물 및 조성물 및 이를 사용하여 규소-함유 막을 증착시키기 위한 공정
EP3390411B1 (en) * 2015-12-18 2020-09-30 DDP Specialty Electronic Materials US 9, LLC Method for making an organoaminosilane; a method for making a silylamine from the organoaminosilane
US10053775B2 (en) 2015-12-30 2018-08-21 L'air Liquide, Societé Anonyme Pour L'etude Et L'exploitation Des Procédés Georges Claude Methods of using amino(bromo)silane precursors for ALD/CVD silicon-containing film applications
US9701695B1 (en) * 2015-12-30 2017-07-11 American Air Liquide, Inc. Synthesis methods for amino(halo)silanes
TWI753794B (zh) 2016-03-23 2022-01-21 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 形成含矽膜之組成物及其製法與用途
US10464953B2 (en) * 2016-10-14 2019-11-05 Versum Materials Us, Llc Carbon bridged aminosilane compounds for high growth rate silicon-containing films
US11735413B2 (en) * 2016-11-01 2023-08-22 Versum Materials Us, Llc Precursors and flowable CVD methods for making low-k films to fill surface features
CN110099911B (zh) * 2016-12-27 2021-11-23 南大光电半导体材料有限公司 胺与硅烷之间的脱氢偶联反应的催化
TWI784022B (zh) * 2017-07-31 2022-11-21 中國大陸商南大光電半導體材料有限公司 1,1,1-參(二甲胺基)二矽烷及其製備方法
WO2019055393A1 (en) * 2017-09-14 2019-03-21 Versum Material Us, Llc COMPOSITIONS AND METHODS FOR DEPOSITION OF FILMS CONTAINING SILICON
JP6788650B2 (ja) * 2017-12-08 2020-11-25 ダウ シリコーンズ コーポレーション ヒドロカルビルオキシジシラン
CN108084219B (zh) * 2017-12-26 2020-09-15 浙江博瑞电子科技有限公司 一种二（二乙基氨基）硅烷合成方法
CN112041323B (zh) * 2018-05-23 2024-01-05 美国陶氏有机硅公司 制备有机氨基硅烷的方法
EP3902939A4 (en) * 2019-02-05 2022-09-28 Versum Materials US, LLC DEPOSITION OF CARBON-DOped SILICON OXIDE
US20210017198A1 (en) 2019-04-05 2021-01-21 Versum Materials Us, Llc Organoamino-Functionalized Cyclic Oligosiloxanes For Deposition Of Silicon-Containing Films
US11649560B2 (en) 2019-06-20 2023-05-16 Applied Materials, Inc. Method for forming silicon-phosphorous materials
US11466037B2 (en) * 2019-10-31 2022-10-11 Nata Semiconductor Materials Co., Ltd. Catalysis of dehydrocoupling reactions between amines and silanes
CN115443347A (zh) * 2020-04-02 2022-12-06 弗萨姆材料美国有限责任公司 用于沉积含硅膜的有机氨基官能化环状低聚硅氧烷
TWI797640B (zh) 2020-06-18 2023-04-01 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 基於矽之自組裝單層組成物及使用該組成物之表面製備
CN112210769B (zh) * 2020-09-29 2023-04-25 合肥安德科铭半导体科技有限公司 一种低温高生长速率氧化硅薄膜的原子层沉积方法
FR3126417B1 (fr) * 2021-08-31 2024-06-21 Elkem Silicones France Sas Procédé d’hydrosilylation catalysé par un complexe de fer
CN115260223B (zh) * 2022-09-26 2022-12-23 江苏南大光电材料股份有限公司 无氯催化剂于制备二异丙胺硅烷中的用途
KR102858392B1 (ko) 2023-07-18 2025-09-11 주식회사 한솔케미칼 2종의 실리콘 전구체 화합물을 이용하여 박막을 형성하는 방법
KR20250085041A (ko) 2023-12-04 2025-06-12 (주)원익머트리얼즈 디알킬아미노디실란의 제조방법
CN118122383A (zh) * 2024-02-02 2024-06-04 湖北和远新材料有限公司 改性氧化石墨烯催化剂的制备方法及在制备二异丙胺基硅烷中的应用

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Publication number Publication date
US20160168169A1 (en) 2016-06-16
EP3395822B1 (en) 2020-03-25
KR101873565B1 (ko) 2018-07-03
KR20180079259A (ko) 2018-07-10
US20150246937A1 (en) 2015-09-03
EP2913334B1 (en) 2018-12-19
JP2017066147A (ja) 2017-04-06
US9233990B2 (en) 2016-01-12
JP6046758B2 (ja) 2016-12-21
TWI540138B (zh) 2016-07-01
US9758534B2 (en) 2017-09-12
US10294250B2 (en) 2019-05-21
CN104876957A (zh) 2015-09-02
EP2913334A1 (en) 2015-09-02
KR102201058B1 (ko) 2021-01-08
EP3395822A1 (en) 2018-10-31
KR20150102725A (ko) 2015-09-07
JP2015164917A (ja) 2015-09-17
US20170204120A1 (en) 2017-07-20
TW201533051A (zh) 2015-09-01

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