CN104517875A - 基板处理装置和基板处理方法 - Google Patents

基板处理装置和基板处理方法 Download PDF

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Publication number
CN104517875A
CN104517875A CN201410515122.4A CN201410515122A CN104517875A CN 104517875 A CN104517875 A CN 104517875A CN 201410515122 A CN201410515122 A CN 201410515122A CN 104517875 A CN104517875 A CN 104517875A
Authority
CN
China
Prior art keywords
substrate
volatile solvent
magnetic field
front surface
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201410515122.4A
Other languages
English (en)
Chinese (zh)
Inventor
长嶋裕次
松下淳
斋藤裕树
林航之介
宫崎邦浩
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Engineering Works Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Engineering Works Co Ltd filed Critical Shibaura Engineering Works Co Ltd
Publication of CN104517875A publication Critical patent/CN104517875A/zh
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/04—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/022—Cleaning travelling work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0071—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by heating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Mixers With Rotating Receptacles And Mixers With Vibration Mechanisms (AREA)
  • Drying Of Solid Materials (AREA)
  • Extraction Or Liquid Replacement (AREA)
CN201410515122.4A 2013-09-30 2014-09-29 基板处理装置和基板处理方法 Pending CN104517875A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2013205126 2013-09-30
JP2013-205126 2013-09-30
JP2014-139197 2014-07-04
JP2014139197A JP6426924B2 (ja) 2013-09-30 2014-07-04 基板処理装置及び基板処理方法

Publications (1)

Publication Number Publication Date
CN104517875A true CN104517875A (zh) 2015-04-15

Family

ID=51730317

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201410515122.4A Pending CN104517875A (zh) 2013-09-30 2014-09-29 基板处理装置和基板处理方法

Country Status (6)

Country Link
US (1) US20150090298A1 (https=)
EP (1) EP2854165A1 (https=)
JP (1) JP6426924B2 (https=)
KR (1) KR101624038B1 (https=)
CN (1) CN104517875A (https=)
TW (1) TW201523724A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI595583B (zh) * 2015-08-26 2017-08-11 思可林集團股份有限公司 基板處理裝置
CN110076119A (zh) * 2018-01-26 2019-08-02 株式会社斯库林集团 基板处理方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6588819B2 (ja) 2015-12-24 2019-10-09 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7064339B2 (ja) * 2018-01-31 2022-05-10 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
TWI702373B (zh) * 2019-03-22 2020-08-21 由田新技股份有限公司 翻面式多軸機械手臂裝置及其光學檢測設備
GB201905138D0 (en) 2019-04-11 2019-05-29 Spts Technologies Ltd Apparatus and method for processing a substrate
CN111842283A (zh) * 2020-06-29 2020-10-30 北京信和洁能新能源技术服务有限公司 具有内置水箱的离子瀑空气净化机的自动清洗系统及方法
JP7453874B2 (ja) * 2020-07-30 2024-03-21 芝浦メカトロニクス株式会社 基板処理方法、および基板処理装置
JP7072623B1 (ja) * 2020-11-11 2022-05-20 芝浦機械株式会社 抽出乾燥装置
JP2024145228A (ja) * 2023-03-31 2024-10-15 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003205273A (ja) * 2002-01-16 2003-07-22 Mgchemical Kk 洗浄及び乾燥方法
WO2004107426A1 (ja) * 2003-05-27 2004-12-09 Personal Creation Ltd. 磁石を備えた基板の処理装置及び処理方法
TW200847249A (en) * 2007-02-09 2008-12-01 Dainippon Screen Mfg Substrate treatment method and substrate treatment apparatus
US20100261122A1 (en) * 2009-04-08 2010-10-14 Tokyo Electron Limited Resist coating and developing apparatus, resist coating and developing method, resist-film processing apparatus, and resist-film processing method
CN102576670A (zh) * 2009-12-25 2012-07-11 东京毅力科创株式会社 基板干燥装置以及基板干燥方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008034779A (ja) 2006-06-27 2008-02-14 Dainippon Screen Mfg Co Ltd 基板処理方法および基板処理装置
JP2012200679A (ja) * 2011-03-25 2012-10-22 Tokyo Electron Ltd 基板洗浄装置及び基板洗浄方法
US8715518B2 (en) * 2011-10-12 2014-05-06 Intermolecular, Inc. Gas barrier with vent ring for protecting a surface region from liquid

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003205273A (ja) * 2002-01-16 2003-07-22 Mgchemical Kk 洗浄及び乾燥方法
WO2004107426A1 (ja) * 2003-05-27 2004-12-09 Personal Creation Ltd. 磁石を備えた基板の処理装置及び処理方法
TW200847249A (en) * 2007-02-09 2008-12-01 Dainippon Screen Mfg Substrate treatment method and substrate treatment apparatus
US20100261122A1 (en) * 2009-04-08 2010-10-14 Tokyo Electron Limited Resist coating and developing apparatus, resist coating and developing method, resist-film processing apparatus, and resist-film processing method
CN102576670A (zh) * 2009-12-25 2012-07-11 东京毅力科创株式会社 基板干燥装置以及基板干燥方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI595583B (zh) * 2015-08-26 2017-08-11 思可林集團股份有限公司 基板處理裝置
US10283380B2 (en) 2015-08-26 2019-05-07 SCREEN Holdings Co., Ltd. Substrate processing apparatus
CN110076119A (zh) * 2018-01-26 2019-08-02 株式会社斯库林集团 基板处理方法
CN110076119B (zh) * 2018-01-26 2021-11-02 株式会社斯库林集团 基板处理方法

Also Published As

Publication number Publication date
KR101624038B1 (ko) 2016-05-24
EP2854165A1 (en) 2015-04-01
TW201523724A (zh) 2015-06-16
JP2015092537A (ja) 2015-05-14
JP6426924B2 (ja) 2018-11-21
KR20150037509A (ko) 2015-04-08
US20150090298A1 (en) 2015-04-02

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