CN104508171A - 特别是通过干法机械加工操作呈现月牙洼磨损降低的高性能刀具 - Google Patents
特别是通过干法机械加工操作呈现月牙洼磨损降低的高性能刀具 Download PDFInfo
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Abstract
本发明涉及一种涂层系统,包括至少一个由A纳米层和B纳米层彼此交替沉积而成的多层膜,其特征在于A纳米层主要包含铝铬硼氮化物,而B纳米层主要包含铝铬氮化物。
Description
本发明涉及一种涂层系统,用于减少因机械加工操作导致的切削刀具的月牙洼(crater)磨损,尤其是有益于干法机械加工操作,例如滚削,并且能够采用不复杂的去除涂层工艺从切削刀具上去除。另外,本发明还涉及一种使用本发明涂层系统涂覆表面的方法。
现有技术
当用于干法或湿法机械加工操作时,切削刀具要经历各种不同的磨损条件。
例如,在高切削速度,干法机械加工操作中通常作为第一磨损迹象观察到月牙洼磨损。尤其是已经观察到,由于滚削,月牙洼磨损显著限制了切削刀具的使用寿命。
AlCrN基涂层是目前熟知的涂层系统,用于提高干法机械加工操作所用切削刀具的切削性能和使用寿命。
然而,尽管,当前按照现有技术,通过使用AlCrN基涂层获得了一些改善,但是日益增加的新的需求需要得到满足。
AlCrN基涂层的另一个优点在于,它能够通过并不复杂的去除涂层工艺从切削刀具去除,相对于如去除AlTiN基涂层必须采用的那些工艺,此类去除涂层工艺更容易、更便宜,并且通常对于切削刀具的表面损害更少。
本发明的目的
本发明的目的是提供一种AlCrN基涂层系统,与现有技术相比,该系统可以显著降低干法机械加工操作特别是滚削所用切削刀具的月牙洼磨损,并因此降低侧面磨损,因而显著提高切削性能和使用寿命。另外,本发明所提供的涂层系统应当能够通过简单的去除涂层工艺,从切削刀具去除。此外,本发明的目的是提供制备本发明涂层系统的方法,该方法应该可适用于切削刀具的涂覆。
发明描述
本发明的目的通过提供含有多层膜的涂层系统来实现,该多层膜由铝铬硼氮化物(Al-Cr-B-N)和铝铬氮化物(Al-Cr-N)纳米层形成,该多层膜呈现低导热系数、低磨料磨损(abrasive wear)系数、高硬度及优异的粘附强度的特定组合。
本发明涂层系统的一个优选实施方案的特征在于呈现低于3.0W/m·K的导热系数,优选低于2.5 W/m·K。
在本发明涂层系统的一个优选实施方案中,多层膜由彼此交替沉积的Al-Cr-B-N和Al-Cr-N纳米层形成。Al-Cr-B-N纳米层的元素组成为(AlxCr1-x-zBz)N,其中如果存在于各Al-Cr-B-N纳米层中的Al、Cr和B原子的总量视为100%原子,则x=50-80at-%,z=5-30at-%,及x+z≤90at-%,优选x=50-70 at-%,z=10-20at-%,并且x+z≤80at-%,其中x和z分别为以原子百分比计的Al的浓度和B的浓度。Al-Cr-N纳米层的元素组成为(AlyCr1-y)N,其中如果存在于各Al-Cr-N纳米层中的Al和Cr原子的总量视为100%原子,则y=50-80at-%,优选60-70 at-%,y是Al的原子百分比浓度。
在本发明涂层系统的另一个优选实施方案中,多层膜中Al-Cr-N纳米层厚度与Al-Cr-B-N纳米层厚度之比(厚度AlCrN/厚度AlCrBN)≤2,优选约为1。
在本发明涂层系统的另一个优选实施方案中,多层膜中两个彼此交替沉积的Al-Cr-N和Al-Cr-B-N纳米层的厚度(厚度AlCrN+厚度AlCrBN)≤200nm,优选≤100,更优选≤50nm,尤其是为约10-30nm。
本发明涂层系统的再一个优选实施方案在多层膜下包括基础层,基础层的元素组成为(AlwCr1-w)N,其中如果存在于基础层中的Al和Cr原子的总量视为100%原子,则w=50-80at-%,优选60-70at-%,并且w为Al的原子百分比浓度。基础层厚度与多层膜厚度之比(厚度基础层/厚度多层膜)优选在2-5之间,更优选约3和4。
通过物理蒸气沉积(PVD)方法,可以特别好的制备本发明的涂层系统。
制备本发明涂层系统特别有利的是采用电弧离子电镀(AIP)沉积方法。
用于制备本发明涂层系统的涂覆方法的一个优选实施方案是电弧离子电镀方法,其中用于在基体表面上形成涂层的材料通过在氮气气氛中,电弧蒸发Al-Cr和Al-Cr-B靶而提供。
用于制备本发明涂层系统的涂覆方法的另一个优选实施方案在涂层沉积之前包括等离子体蚀刻步骤,用于在基体中形成扩散区域,涂层沉积在氮气中进行,或在氮气/氢气、或在氮气/氢气/氩气的气氛中进行。
试验实施例
根据本发明,滚削刀具在电弧离子电镀涂布机中涂覆。将基体引入涂布室中,涂布室抽空至小于0.4Pa,加热基体,分别在氩气或氩气/氢气气氛中蚀刻,将本发明由基础层和多层膜组成的涂层系统沉积到基体上。涂层沉积所用的Al-Cr-B和Al-Cr合金靶以原子百分比计分别具有例如以下的原子组成:Al52Cr28B20和Al50Cr50或Al52Cr28B20和Al70Cr30或Al70Cr20B10和Al50Cr50或Al70Cr20B10和Al70Cr30。在一些情况,首先沉积Al-Cr-N基础层,然后是多层的Al-Cr-B-N膜,在其他的情况,仅仅沉积多层的Al-Cr-B-N膜。对于基础层的沉积,仅蒸发Al-Cr靶的材料。Al-Cr-B和Al-Cr合金靶在战略上放置在涂布机内,以便通过在涂布室中基体的旋转移动,彼此交替沉积相应的Al-Cr-B-N和Al-Cr-N纳米层。相应地选择用于蒸发Al-Cr-B-N和Al-Cr-N靶的电弧电流,以便获得最有效的工艺和关于不同层和/或相应纳米层的期望厚度关系,并且同时获得适宜的机械特性。
发明人发现,Al-Cr-B-N涂层呈现比Al-Cr-N涂层低的压缩应力,且Al-Cr-B-N涂层在一定程度上是多孔的。另外,通过增加Al-Cr-B-N涂层的硼含量,观察到压缩应力降低。然而,对于机械加工操作中的应用来讲,过低的压缩应力也可能是不利的。因此,发明人在基体上施加偏压以增加膜的压缩应力。令人惊讶的是,发明人发现,在沉积Al-Cr-B-N层的过程中,通过施加给基体至少70V的偏压,但优选大于70V,可以产生特别令人感兴趣的Al-Cr-B-N层,其具有特别高的密度(避免了空隙)、惊人低的导热系数,并且同时产生适宜的压缩应力。因此,通过调节偏压和硼含量,发明人能够沉积对于关于密度、导热系数和压缩应力进行限定的应用来讲具有最适宜特性的Al-Cr-B-N层。因此,举例来说,可以从Al52Cr28B20靶沉积Al-Cr-B-N层,其呈现非常低的约2.0W/m.k的导热系数。
发明人还发现,通过从较低值U偏-低一直到较高值U偏-高改变基体的偏压,沉积本发明的Al-Cr-N基础层,能够获得特别好的涂层机械特性和粘附强度。基体的偏压可以连续增加或者逐步增加。
用于沉积本发明涂层系统的的涂覆方法的另一个实施方案涉及基础层的沉积,在沉积期间,基体的偏压从较低的偏压逐渐或逐步的改变到较高的偏压,如在至少两步中,并且优选其中U偏-最低≤4·U偏-最高。
采用本发明的涂层系统,可以获得切削刀具使用寿命的非常强烈的提高,这一点可进一步的通过提供示范的切削试验的结果来显示。
示范的切削试验
用于同步铣(milling)的PM-HSS齿轮滚刀s390 Bohler的模量mn=2.557mm,压力角αn0=17.5°,直径da0=110mm,采用三种不同的涂覆系统来涂覆。
-比较涂层1:现有技术的涂覆系统,基本上由(Al70Cr30)N组成,
-比较涂层2:现有技术的涂层系统,由含有(Al70Cr30)N和Al-Cr-Si-W-N层的多层涂层组成,和
-发明涂层;本发明的涂层系统,具有主要为Al-Cr-N的基础层,其由Al70Cr30靶在主要含有氮气的气氛中沉积得到;和多层膜,其主要由彼此交替沉积的Al-Cr-N和Al-Cr-B-N纳米层形成,Al-Cr-N纳米层由Al70Cr30靶沉积,而Al-Cr-B-N层由用于沉积Al-Cr-B-N层的Al70Cr20B10靶在主要包含氮气的气氛中沉积,为了沉积Al-Cr-B-N层,在基体施加大于70V的偏压。
采用下述切削条件,通过飞速滚削16MnCr5(硬度:160HB)来测试用上述比较涂层1、比较涂层2和发明涂层涂覆的切削刀具:
-干法
-Vc=240m/min
-fa=4.8mm
-Hcu,按照SPARTA的最大值=0.25mm
-刀具寿命标准:月牙洼磨损深度(KT)或侧面磨损VBmax≥150μm
如图1所示,与确定的现有技术涂层相比,通过采用本发明的涂层,可以显著提高切削性能,并获得刀具寿命的巨大增加。
导热性、耐磨强度(abrasive wear resistance)和硬度
在本发明的范围内,不同涂层的导热系数按照David G.Cahill教授在他的论文中提出并描述的测量技术测量,该论文标题为“用于时间域热反射的分层结构中的热流量分析”,发表于Rev.Sci.Instrum,75,5119(2004)。
另外,按照DIN V ENV 1071,采用kaloMAX NT型磨耗测试仪来测定相同涂层的磨料磨损系数。依据该方法,球通过具有橡胶轮的传动轴驱动,并且沿着样品滑动。样品架与水平轴的角度和球的尺寸决定球和样品表面之间施加的负荷。将浆料加到球的中心上,并移入接触区域,球在样品中研磨形成月牙洼。去除的材料量通过测量月牙洼直径来计算,磨损系数由负荷、滑动距离和磨损月牙洼的体积计算。由于测量技术极度依赖于湿度和温度,因此实验在环境控制的房间进行,室温为20℃,湿度为39%,所用球的直径为30mm,浆料含有晶粒尺寸为1μm的氧化铝颗粒,滑动速度为100rpm。
在表1中,显示比较涂层1、比较涂层2、发明涂层、单层Al-Cr-B-N涂层和单层Ti-Al-N涂层的导热系数、维克硬度值和磨料磨损系数。在主要含有氮气的气氛中,并采用大于70V的偏压,单层Al-Cr-B-N涂层由Al-Cr-B靶沉积,以原子百分比计该靶具有52∶28∶20的元素组成。单层的Ti-Al-N涂层在主要含有氮气的气氛中,由Ti-Al靶沉积,以原子百分比计该靶具有50∶50的元素组成。
正如在表1中可观察到的那样,发明涂层呈现非常好的膜特性组合,令人惊讶的是这些特性与单层Al-Cr-B-N涂层的膜特性非常类似,尽管涂层的构成不同。
然而,根据本发明沉积的含有多层Al-Cr-N/Al-Cr-B-N膜和/或含有多层Cr-Al-N/Cr-Al-B-N膜和基础Cr-Al-N层的涂层,呈现比单层Al-Cr-B-N涂层更好的切削性能。
表1:测量的导热系数、维克硬度值和磨料磨损系数
在本发明的上下文中,各单独纳米层A和B的厚度优选不大于200nm,更优选不大于100nm。
在本发明的(AlxCr1-x-zBz)N层中,最高硼浓度也可以低于5at%,但是优选不低于2at.%,以尽可能的产生具有低导热系数的含硼层。根据本发明,具有低导热系数的涂层非常有利于在暴露于高温的切削刀具中降低热负荷,热负荷是在高切削速度(Vc>200m/min)下切削处理期间的结果。根据本发明制备的涂层的该性质特别有益于降低切削刀具中由高速钢例如HSS-齿轮滚刀产生的月牙洼磨损,因为在此类切削刀具中产生的月牙洼磨损基本上是由于太高的热负荷。
在本发明上下文中,铝铬硼氮化物(Al-Cr-B-N)纳米层将被称为A纳米层,铝铬氮化物(Al-Cr-N)纳米层将被称为B纳米层。A和B纳米层分别主要含有铝、铬、硼和氮或铝、铬和氮。然而,A纳米层和B纳米层可以含有少量的其他元素,但是在这些A和B层中的少量的其他元素不应该高于A层中铝、铬和硼的和的原子百分比总浓度和/或B层中铝和铬的和的原子百分比总浓度的5%。
如果形成多层膜的A和B纳米层通过PVD反应工艺制备,该PVD反应工艺以使得待涂覆基体表面在涂布室中旋转的方式,以使得表面交替暴露于含AlCrB靶和含AlCr靶的方式实施,以分别制备A纳米层和B纳米层,应理解:
-在A纳米层和B纳米层之间,该A纳米层和B纳米层主要具有对应于上文所述的式(AlxCr1-x-zBz)N和(AlyCr1-y)N的元素浓度,可以有含有铝、铬、硼和氮的区域,但是该区域具有较低的硼浓度,最可能是硼的浓度在这些区域是渐变的。这些区域中,硼的浓度可低于3at.%。但是在此类情况中,式(AlxCr1-x-zBz)N中的情况z≥3%,优选z≥5%指的是A纳米层中具有最高硼含量的区域。
在本发明涂层系统的再一个优选实施方案中,铝含量与铬含量的原子百分比比率沿着多层膜的厚度保持恒定,该多层膜由分别主要含有铝铬硼氮化物和铝铬氮化物的交替的A纳米层和B纳米层形成。如果按照本发明的该实施方案,涂层系统还包含也含有铝和铬的基础层,那么制备基础层以便具有与在多层膜中相同的铝含量和铬含量的比率。
对于一些切削操作,通过使用本发明涂层系统涂覆的切削刀具,也能够获得非常好的切削性能,该涂层系统具有约0.25或更高的基础层的厚度与多层膜的厚度之比(厚度基础层/厚度多层膜),优选约0.5或更高。
本发明涂层系统的再一个优选实施方案沿着涂层系统的总厚度,含有多于一个由A纳米层和B纳米层形成的多层膜。
在该优选实施方案的一个优选的变体中,包含多于一个多层膜,涂层系统沉积在切削刀具的表面上,涂层系统含有沉积在基体表面上的、由铝铬氮化物制成的基础层,和沉积在基础层上的多层结构膜,其中多层结构膜由彼此交替沉积的C层和D层形成。其中C层是AlCrN层,不含B,而D层是由交替的A纳米层和B纳米层形成的多层膜。
在该优选实施方案的另一个优选变体中,涂层系统沉积在其上的切削刀具表面是氮富集区域。
根据本发明,在待涂覆的刀具基体表面形成氮富集区域相当有助于降低刀具的月牙洼磨损。
本发明涂层系统的优选制备方法是PVD方法,其中用于制备A纳米层和B纳米层的元素铝、铬和硼分别来自具有以原子百分比计的元素组成为(AliCr1-i)1-jBj和(AliCr1-i)的靶,且其中
-i优选不低于50at-%,并且不高于80at-%,更优选i是70at-%;
-j优选不低于2at-%,并且不高于30at-%。
磁控溅射工艺也用于将本发明的涂层系统涂覆至基体,尤其是包括合适的高功率脉冲磁控溅射(HIPIMS)技术。
另外,由粉末冶金制备的靶尤其适用于本发明涂层系统的制备。
特别地,涂层系统的最优选实施方案、涂覆的基体以及用本发明涂层系统涂覆基体的方法在随后的权利要求1-15中进行描述。
Claims (15)
1.沉积在基体表面上的涂层系统,包括至少一个由A纳米层和B纳米层彼此交替沉积而成的多层膜,其特征在于A纳米层包含铝铬硼氮化物,B纳米层也含有铝铬氮化物,但是不含硼。
2.如权利要求1所述的涂层系统,其特征在于A纳米层具有硼含量最高的区域和硼含量较低的区域,其中具有较低硼含量的区域为临近B纳米层的区域。
3.如权利要求1-2中至少一项所述的涂层系统,其特征在于
-A纳米层的元素组成,或如果在A纳米层中具有最高硼含量的区域中给出,则主要由式(AlxCr1-x-zBz)N限定,其中:
●如果计算中仅考虑元素Al、Cr和B,则x和z分别为Al和B的原子百分比浓度,并且
●x=50-80at-%,z=2-30at-%,及x+z≤90at-%,优选
x=50-70at-%,z=5-20at-%或z=5-20at-%,并且x+z≤80at-%,
和/或
-B纳米层的元素组成主要由式(AlyCr1-y)N限定,其中:
●如果计算中仅考虑元素Al和Cr,则y是Al的原子百分比浓度,并且
●y=50-80at-%,优选60-70at-%。
4.如权利要求1-3中至少一项所述的涂层系统,其特征在于涂层系统呈现低于3.0W/m.K的导热系数,优选低于2.5W/m.K。
5.如权利要求1-4中至少一项所述的涂层系统,其特征在于多层膜中彼此交替沉积的A纳米层的厚度和B纳米层的厚度的和不大于200nm,优选不大于100nm,更优选不大于50nm,尤其不大于30nm。
6.如权利要求1-5中至少一项所述的涂层系统,其特征在于多层膜中彼此交替沉积的B纳米层厚度与A纳米层厚度之比不大于2,优选约为1。
7.如权利要求1-6中至少一项所述的涂层系统,其特征在于涂层系统包括沉积在基体表面和多层膜之间的基础层,优选基础层的元素组成主要由式(AlwCr1-w)N限定,其中:
-如果计算中仅考虑元素Al和Cr,则w为Al的原子百分比浓度,并且
-w=50-80at-%,优选60-70at-%。
8.如权利要求7所述的涂层系统,其特征在于涂层系统包括沉积在基础层上的多层结构膜,其中多层结构膜由彼此交替沉积的C-层和D-层形成,其中C层是不含硼的AlCrN层,而D层是由交替的A纳米层和B纳米层形成的多层膜。
9.如权利要求1-8中至少一项所述的涂层系统,其特征在于沿着多层膜的总厚度和/或如果沿着基础层的总厚度给出,则铝含量与铬含量的比率保持恒定。
10.用权利要求1-9中至少一项所述涂层系统涂覆的基体,其特征在于所述基体在与涂层系统的界面处含有氮富集的扩散区域。
11.用权利要求1-9中至少一项所述涂层系统涂覆基体表面的方法,其特征在于至少多层膜通过物理蒸气沉积技术沉积,如阴极电弧PVD和/或磁控溅射技术,尤其是包括高功率脉冲磁控溅射技术,
优选,形成多层膜的材料通过在含氮气气氛中,由以下靶的阴极电弧离子电镀蒸发来提供:至少一个含有用于制备A纳米层的铝、铬和硼的靶,优选粉末冶金制备的靶;和至少一个含有用于制备B纳米层的铝和铬的靶,优选粉末冶金制备的靶;并且
至少通过沉积含B层,在基体上施加绝对值优选不低于70V的负偏压。
12.如权利要求11所述的方法,其特征在于用于形成A纳米层的至少一个靶具有由式(AliCr1-i)1-jBj给出的原子百分比的元素组成,并且用于形成B纳米层的至少一个靶具有由式(AliCr1-i)给出的原子百分比的元素组成,其中:
-i优选不低于50at-%,并且不高于80at-%,更优选i是70at-%;
-j优选不低于2at-%,并且不高于30at-%。
13.如权利要求11-12中至少一项所述的用权利要求7-9中至少一项所述的涂层系统涂覆基体表面的方法,其特征在于通过物理蒸气沉积技术,优选通过反应性阴极电弧离子电镀PVD技术,至少在部分沉积时间内在基体上施加负偏压,来沉积所述基础层。
14.如权利要求13所述的方法,其特征在于在基础层的沉积过程中施加的偏压在沉积过程中是可变的,并且从最低值U偏-最低增加一直到最高值U偏-最高,优选按绝对值,U偏-最低不大于4倍U偏-最高。
15.如权利要求11-14中至少一项所述的用于制备权利要求10的涂覆的基体的方法,其特征在于通过在涂层沉积之前完成等离子体蚀刻步骤来产生所述扩散区域,涂层沉积在氮气或氮气/氢气、或氮气/氢气/氩气的气氛中进行。
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US9464347B2 (en) | 2016-10-11 |
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