CN104490715A - Anti-allergy stress relief face mask essence containing saccharide isomerate and preparation method thereof - Google Patents
Anti-allergy stress relief face mask essence containing saccharide isomerate and preparation method thereof Download PDFInfo
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- CN104490715A CN104490715A CN201510008364.9A CN201510008364A CN104490715A CN 104490715 A CN104490715 A CN 104490715A CN 201510008364 A CN201510008364 A CN 201510008364A CN 104490715 A CN104490715 A CN 104490715A
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- skin
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- oligosaccharide
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Abstract
The invention discloses anti-allergy stress relief face mask essence containing saccharide isomerate. By adding saccharide isomerate, the essence can be used for effectively and immediately reduce inflammatory response and meanwhile repairing damaged skin barriers for a long time, reconstructing the skin structure, relieving and calming skin and enhancing the immunity of inner skin to an external stimulation source, so that allergy symptoms can be fundamentally reduced or avoided. Meanwhile, skin moisture can be further supplemented, so that the skin is recovered to healthy, balanced and beautiful states. The invention further discloses a preparation method of the anti-allergy stress relief face mask essence containing saccharide isomerate.
Description
Technical field
The invention belongs to cosmetic field, relate to a kind of facial mask essence, especially relate to a kind of antiallergic containing isomery oligosaccharide and to releive facial mask essence and preparation method thereof.
Background technology
Along with socioeconomic fast development, the living standard of people is also more and more higher, and increasing women starts to pay attention to beauty and make-up, brings into use skin care product to modify the skin problem of oneself.But owing to using the level of product uneven, some product exceedes skin burden, adds the continuous deterioration of living environment, be even easy to make skin be upset and sensitivity, serious meeting causes chronic injury.Have data to show, the Chinese of current 50-60% think it oneself is responsive skin, and this situation only has 30% in the eighties, and metropolitan human body skin is responsive and degree of inflammation is higher.
The main feature of skin sensitivity has the generation of more inflammation, the variation of barrier function, the lacking of Stratum corneum lipids, subjective feeling has skin to occur tight, pruritus, twinge, calcination, erythema, and normal skin relatively, and skin sensitivity can the process of accelerated ageing.The inflammation that product often just occurs for sensitivity of releiving existing skin antiallergic specifically suppresses, and have ignored the maintenance of skin damaged themselves barrier function, is thus also just difficult to fundamentally reduce responsive generation.
Summary of the invention
The object of the invention is to overcome the deficiencies in the prior art, providing a kind of with the addition of and there is the antiallergic of isomery oligosaccharide ingredient repairing skin barrier function releiving facial mask essence.Reacted by inflammation-inhibiting, and repair the skin barrier function damage caused by factors such as naturally-aged, environment, external use skin cares, strengthening skin intrinsic resistance, reduces various skin sensitivity situation, recovers the normal equilibrium state of skin.
Another object of the present invention is to provide a kind of above-mentioned antiallergic containing isomery oligosaccharide and releives the preparation method of facial mask essence.
A kind of technical scheme realizing above-mentioned purpose is: a kind of antiallergic containing isomery oligosaccharide is releived facial mask essence, comprises the component of following percentage by weight:
The percentage by weight sum of above-mentioned all components is 100%.
Above-mentioned a kind of antiallergic containing isomery oligosaccharide is releived facial mask essence, and wherein, described antiseptic adopts Microcare MTI, and described Microcare MTI is the compound of Methylisothiazolinone and iodine propilolic alcohol butyl mephenesin Carbamate.
Above-mentioned raw materials is commercially available prod.
Of the present inventionly additionally provide a kind of antiallergic containing isomery oligosaccharide and to releive the preparation method of facial mask essence, comprise the following steps:
A, take deionized water in emulsifying pot, drop into load weighted EDETATE SODIUM, glycerol, glycyrrhizic acid dipotassium, methyl hydroxybenzoate, pantothenylol successively, after unlatching stirring and dissolving is even, drop into hyaluronate sodium and carbomer successively, turn on agitator and homogenizer, drop into after butanediol and Scleroglucan outer scattered in emulsifying pot, and make the temperature to 80 DEG C in emulsifying pot, remain on 80 DEG C to stir 30 minutes, the component in emulsifying pot is thoroughly uniformly dispersed;
B, open cooling, after greenhouse cooling to 60 in emulsifying pot DEG C, aminomethyl propanol is dropped in emulsifying pot with after a small amount of deionized water dilution, and stirs;
C, continuation cooling, when the temperature in emulsifying pot is down to less than 50 DEG C, drop into isomery oligosaccharide, olea europaea fruit water, Chondrus crispus extract and tremella polysaccharide, and stir;
D, continuation are stirred and cooling, when the temperature in emulsifying pot is down to 45 DEG C, drop into antiseptic, stir;
E, continuation cooling, when the temperature in emulsifying pot is down to 35 DEG C, discharging after inspection.
The above-mentioned antiallergic containing isomery oligosaccharide is releived in the preparation method of facial mask essence, and in step D, described antiseptic adopts Microcare MTI, and described Microcare MTI is the compound of Methylisothiazolinone and iodine propilolic alcohol butyl mephenesin Carbamate.
Compared with prior art, antiallergic of the present invention is releived reparation facial mask essence, to releive mechanism according to up-to-date antiallergic, use isomery oligosaccharide to repair skin barrier function innovatively, and reach in conjunction with traditional anti-inflammatory active ingredient glycyrrhizic acid dipotassium the effect that antiallergic releives.Skin is the contact surface of our health and environment, forms primarily of epidermis, corium and subcutaneous tissue.The outermost layer of its mesocuticle is horny layer, is made up of seedless horn cell.Horny layer is the of paramount importance protective barrier of skin, effectively can prevent moisture of skin and electrolytical loss, provides immunological stress, ultraviolet protection and antagonism oxidative pressure etc.Thus skin barrier plays vital effect to keeping the health of skin.Antiallergic of the present invention releives the isomery oligosaccharide source repairing in facial mask essence and contain in vegetalitas D-Glucose, similar with the composition of nature moisturizing factor NMF in human body skin.It can be combined closely with the lysine in horn cell, the binding mechanism of this uniqueness, and it can not be washed off, only has natural skin exfoliation process just can go out.The key gene that can work in chafe barrier is expressed, and is embodied in:
(1) raise the gene expression of silk polyprotein and hyaluronic acid synthase 3, promote nature moisturizing factor (NMF) and hyaluronic synthesis, improve skin water holding capacity;
(2) improve loricrin gene expression dose, affect the function of hornification coating;
(3) ASM gene expression dose is improved, the synthesis of the amide that excites nerve.Recover skin barrier normal function, improve the system of defense of self, the skin sensitivity that opposing environmental stimuli causes.
The glycyrrhizic acid dipotassium simultaneously added can suppress the activity of hyaluronidase, maintains body fluids balance; Suppress histamine release and the inflammation such as leukotriene B4, the PGE2 factor to generate, realize suppression and long-acting reparation immediately and combine, U.S. flesh of getting well.
A kind of antiallergic containing isomery oligosaccharide of the present invention is adopted to releive the technical scheme of preparation method of facial mask essence, the activity of isomery oligosaccharide, olea europaea fruit water, Chondrus crispus extract and tremella polysaccharide can better be kept, promote and to releive effect containing the releive antiallergic of facial mask essence of the antiallergic of isomery oligosaccharide.
Detailed description of the invention
The present inventor, in order to understand technical scheme of the present invention better, is described in detail below by embodiment particularly:
| Raw material | Embodiment 1 | Embodiment 2 | Embodiment 3 | Reference examples |
| Isomery oligosaccharide | 1.0 | 1.5 | 0.5 | 0 |
| Olea europaea fruit water | 2.0 | 1.5 | 2.0 | 2.0 |
| Chondrus crispus extract | 0.5 | 0.5 | 1.0 | 0.5 |
| Tremella polysaccharide | 1.0 | 2.0 | 0.5 | 1.0 |
| Hydrolysis Scleroglucan | 0.4 | 0.5 | 0.4 | 0.4 |
| Pantothenylol | 1.0 | 0.5 | 0.5 | 1.0 |
| Glycerol | 6.0 | 5.0 | 6.0 | 6.0 |
| Butanediol | 8.0 | 8.0 | 8.0 | 8.0 |
| Carbomer | 0.05 | 0.02 | 0.03 | 0.05 |
| Aminomethyl propanol | 0.05 | 0.02 | 0.03 | 0.05 |
| Methyl hydroxybenzoate | 0.2 | 0.2 | 0.2 | 0.2 |
| Antiseptic Microcare MTI | 0.19 | 0.15 | 0.15 | 0.19 |
| Glycyrrhizic acid dipotassium | 0.3 | 0.2 | 0.1 | 0.3 |
| Hyaluronate sodium | 0.1 | 0.05 | 0.03 | 0.1 |
| EDETATE SODIUM | 0.05 | 0.1 | 0.1 | 0.05 |
| Deionized water | Surplus | Surplus | Surplus | Surplus |
Table 1
The facial mask essence of releive containing the antiallergic of isomery oligosaccharide facial mask essence and the reference examples of embodiment 1-3 is prepared according to the proportioning raw materials of table 1.
Antiallergic containing isomery oligosaccharide provided by the invention facial mask essence of releiving is prepared by following steps:
A, take deionized water in emulsifying pot, drop into load weighted EDETATE SODIUM, glycerol, glycyrrhizic acid dipotassium, methyl hydroxybenzoate, pantothenylol successively, after unlatching stirring and dissolving is even, drop into hyaluronate sodium and carbomer successively, turn on agitator and homogenizer, drop into after butanediol and Scleroglucan outer scattered in emulsifying pot, and make the temperature to 80 DEG C in emulsifying pot, remain on 80 DEG C to stir 30 minutes, the component in emulsifying pot is thoroughly uniformly dispersed;
B, open cooling, after greenhouse cooling to 60 in emulsifying pot DEG C, aminomethyl propanol is dropped in emulsifying pot with after a small amount of deionized water dilution, and stirs;
C, continuation cooling, when the temperature in emulsifying pot is down to less than 50 DEG C, drop into isomery oligosaccharide, olea europaea fruit water, Chondrus crispus extract and tremella polysaccharide, and stir;
D, continuation are stirred and cooling, when the temperature in emulsifying pot is down to 45 DEG C, drop into antiseptic, stir;
E, continuation cooling, when the temperature in emulsifying pot is down to 35 DEG C, discharging after inspection.
Antiallergic containing isomery oligosaccharide of the present invention is releived in facial mask essence, and isomery oligosaccharide source is in vegetalitas D-Glucose, similar with the composition of nature moisturizing factor NMF in human body skin.It can be combined closely with the lysine in horn cell, the binding mechanism of this uniqueness, and it can not be washed off, only has natural skin exfoliation process just can go out.The key gene that can work in chafe barrier is expressed.
Carrying out assessment respectively contrast containing releive facial mask essence, the facial mask essence of reference examples and the effect of commercially available antiallergic sense facial film of the antiallergic of isomery oligosaccharide the above-mentioned embodiment 1-3 prepared.
Choose the female volunteers in 75 25-28 years, be divided into five groups, often organize 15 people, these five groups use to releive the facial film of facial mask essence, the facial film of the facial mask essence containing reference examples and commercially available antiallergic sense facial film containing the antiallergic of isomery oligosaccharide containing embodiment 1-3 correspondingly, frequency of utilization is use three times every other day weekly, each deposited 15 minutes, continue use 8 weeks.Respectively skin irritation, skin moisture-keeping degree are carried out test and observed, and carry out questionnaire assessment by volunteer, comprehensively obtain data.Test result is as follows:
The test result of skin irritation is as shown in table 2, and in table 2, A indicates without skin irritation; B represents mild skin zest; C represents medium skin irritation; D represents strong cutaneous zest; E represents strongly skin irritation.
Table 2
From the skin irritation result of human volunteer's test, experimenter releives and repairs the embodiment product of facial mask essence after 8 weeks employing the antiallergic that with the addition of isomery oligosaccharide, and skin does not occur irritant reaction substantially.This explanation, one side antiallergic releives facial mask essence itself can not to the stimulation causing skin, the nature moisturizing factor existed due to the component in the isomery oligosaccharide that wherein contains and human body self is on the other hand close, thus skin affinity is good, life-time service has obvious effect to the moisturizing of skin, the barrier function reparation of skin, reduces the generation of responsive irritant reaction.Individual subject uses and does not add the reference examples of isomery oligosaccharide and commercially available antiallergic facial film has then occurred irritant reaction in various degree, as twinge appears in face, rubescent etc.
As can be seen here, experimenter releives and repairs after facial mask essence employing the antiallergic being added with isomery oligosaccharide, effectively immediately, inflammatory reaction can be reduced occur, long-acting reparation damaged skin barrier simultaneously, rebuild skin texture, to releive calm skin, increase the immunity of inherent skin stimulus to external world, fundamentally reduce or avoid the appearance of condition susceptible; Can moisture of skin be supplemented again simultaneously, thus make skin return to health, balance, beautiful state.
Those of ordinary skill in the art will be appreciated that, above embodiment is only used to the present invention is described, and be not used as limitation of the invention, as long as in spirit of the present invention, all will drop in Claims scope of the present invention the change of the above embodiment, modification.
Claims (4)
1. to releive a facial mask essence containing the antiallergic of isomery oligosaccharide, it is characterized in that, comprise the component of following percentage by weight:
The percentage by weight sum of above-mentioned all components is 100%.
2. a kind of antiallergic containing isomery oligosaccharide is releived facial mask essence as claimed in claim 1, it is characterized in that, described antiseptic adopts Mi crocare MTI, and described Mi crocare MTI is the compound of Methylisothiazolinone and iodine propilolic alcohol butyl mephenesin Carbamate.
3. the antiallergic containing isomery oligosaccharide as claimed in claim 1 is releived a preparation method for facial mask essence, it is characterized in that, comprises the following steps:
A, take deionized water in emulsifying pot, drop into load weighted EDETATE SODIUM, glycerol, glycyrrhizic acid dipotassium, methyl hydroxybenzoate, pantothenylol successively, after unlatching stirring and dissolving is even, drop into hyaluronate sodium and carbomer successively, turn on agitator and homogenizer, drop into after butanediol and Scleroglucan outer scattered in emulsifying pot, and make the temperature to 80 DEG C in emulsifying pot, remain on 80 DEG C to stir 30 minutes, the component in emulsifying pot is thoroughly uniformly dispersed;
B, open cooling, after greenhouse cooling to 60 in emulsifying pot DEG C, aminomethyl propanol is dropped in emulsifying pot with after a small amount of deionized water dilution, and stirs;
C, continuation cooling, when the temperature in emulsifying pot is down to less than 50 DEG C, drop into isomery oligosaccharide, olea europaea fruit water, Chondrus crispus extract and tremella polysaccharide, and stir;
D, continuation are stirred and cooling, when the temperature in emulsifying pot is down to 45 DEG C, drop into antiseptic, stir;
E, continuation cooling, when the temperature in emulsifying pot is down to 35 DEG C, discharging after inspection.
4. the antiallergic containing isomery oligosaccharide as claimed in claim 3 is releived the preparation method of facial mask essence, it is characterized in that, in step D, described antiseptic adopts Mi crocare MTI, and described Mi crocare MTI is the compound of Methylisothiazolinone and iodine propilolic alcohol butyl mephenesin Carbamate.
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Cited By (8)
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| CN105193655A (en) * | 2015-09-25 | 2015-12-30 | 斐丝肌(上海)商贸有限公司 | Composite with efficacies of water locking and moisturizing, face mask and face mask preparation method |
| CN105213252A (en) * | 2015-09-25 | 2016-01-06 | 斐丝肌(上海)商贸有限公司 | A kind ofly lock essence of water moisture-keeping efficacy and preparation method thereof |
| CN106166123A (en) * | 2016-08-06 | 2016-11-30 | 北京国济众芳中医药研究所 | There is the skin care compositions of antiallergic itching-relieving efficacies, emulsion and preparation method thereof |
| CN106333914A (en) * | 2016-08-24 | 2017-01-18 | 广东芭薇生物科技股份有限公司 | Quickly-absorbed moisturizing mask and preparation method thereof |
| CN106420596A (en) * | 2016-11-30 | 2017-02-22 | 广东芭薇生物科技股份有限公司 | Composition containing corn kernel extract and application of composition containing corn kernel extract |
| CN107648177A (en) * | 2017-11-13 | 2018-02-02 | 诺斯贝尔化妆品股份有限公司 | A kind of profit repairs facial mask for releiving for sensitive skin |
| CN112472642A (en) * | 2020-12-04 | 2021-03-12 | 泉后(广州)生物科技研究院有限公司 | Instant soothing cosmetic composition and application thereof |
| CN114732844A (en) * | 2021-11-09 | 2022-07-12 | 西安润玉医疗科技有限公司 | Immediate allergy-relieving bionic membrane composition and preparation method thereof |
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| CN112472642A (en) * | 2020-12-04 | 2021-03-12 | 泉后(广州)生物科技研究院有限公司 | Instant soothing cosmetic composition and application thereof |
| CN114732844A (en) * | 2021-11-09 | 2022-07-12 | 西安润玉医疗科技有限公司 | Immediate allergy-relieving bionic membrane composition and preparation method thereof |
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