CN104308397B - 铝合金共形钎料的制备方法 - Google Patents

铝合金共形钎料的制备方法 Download PDF

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CN104308397B
CN104308397B CN201410526104.6A CN201410526104A CN104308397B CN 104308397 B CN104308397 B CN 104308397B CN 201410526104 A CN201410526104 A CN 201410526104A CN 104308397 B CN104308397 B CN 104308397B
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栾兆菊
满慧
余雷
陈美芳
柳龙华
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/02—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
    • B23K35/0222—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape for use in soldering, brazing
    • B23K35/0233—Sheets, foils
    • B23K35/0238—Sheets, foils layered
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1254—Sol or sol-gel processing

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Abstract

本发明提供一种铝合金共形钎料的制备方法，包括下述步骤：1)清理铝合金工件和硅靶材；2)将硅靶材安装于真空室中，将铝合金工件安放于样品台上，采用磁控溅射的方法，在工件表面沉积纳米硅薄膜；3)对铝合金工件和纳米硅薄膜退火；4)采用溶胶凝胶的方法，在纳米硅薄膜表面沉积铝薄膜；5)对工件、纳米硅薄膜以及铝薄膜退火处理，以形成与工件共形的铝合金钎料。本发明的优点在于：钎料和待焊工件共形，实现无焊片真空钎焊，可以实现任意立体的焊接面焊接，优化了钎料的制备流程，简化了真空钎焊工艺。

Description

铝合金共形钎料的制备方法
技术领域
本发明涉及一种钎料制备方法，特别涉及一种真空钎焊的钎料制备方法。
背景技术
钎料是铝合金钎焊时的必需材料之一，现有的真空钎焊技术均采用焊片作为钎料。该方法首先需要繁琐的工艺制备焊片，其次，在焊片使用过程中需要进行焊片设计、清洗等一系列繁琐的流程，最后，对待焊工件提出一些近似苛刻的要求。焊片使用的上述弊端，极大的影响了真空钎焊技术应用的拓展，阻碍了真空钎焊技术工艺的简化。
发明内容
本发明所要解决的技术问题在于提供一种铝合金共形钎料的制备方法，充分简化钎料制备工艺，弱化现有焊片焊接技术对铝合金待焊工件的要求。
本发明采用以下技术方案解决上述技术问题的：一种铝合金共形钎料的制备方法，包括以下步骤：
1)清理铝合金工件和硅靶材；
2)将硅靶材安装于真空室中，将铝合金工件安放于样品台上，采用磁控溅射的方法，在工件表面沉积纳米硅薄膜；
3)对铝合金工件和纳米硅薄膜退火；
4)采用溶胶凝胶的方法，在纳米硅薄膜表面沉积铝薄膜；
5)对工件、纳米硅薄膜以及铝薄膜退火处理，以形成与工件共形的铝合金钎料。
优化的，所述步骤1)中，采用超声波清洗器清洗铝合金工件和硅靶材，清洗时间为10-30min。
优化的，所述步骤2)中，溅射气体选用氩气，本底真空度为2×10-5Torr，工作真空度为75×10-4Torr，样品台的转速为3r/min，溅射电流为1A，沉积时间为24min。
优化的，所述步骤3)中，采用管式炉对工件及硅薄膜进行退火，退火处理的温度为300℃，退火时间为1小时。
优化的，所述步骤4)中，溶胶的配置过程为：九水硝酸铝为原料，添加无水乙醇，使溶液的浓度为0.5mol/L，再添加与九水硝酸铝等摩尔比的二乙醇胺作为稳定剂，并滴加硝酸，调节溶液的pH值为3.2-3.7之间，采用磁力搅拌3小时后静置。
进一步优化的，所述步骤4)中，采用浸渍提拉法制备铝薄膜，将覆盖有纳米硅薄膜的铝合金工件，浸没于铝溶胶中，并使用拉膜机缓慢提升工件，提拉的速度为7cm/min。
进一步优化的，所述步骤4)中，将提拉后的工件置于炉中退火，退火时间为120min，退火温度为120℃。
进一步优化的，将浸渍提拉和提拉后退火的步骤循环进行5次，最终，制备出与工件共形的铝合金真空钎焊钎料。
本发明的优点在于：
1)钎料和待焊工件共形，实现无焊片真空钎焊，可以实现任意立体的焊接面焊接，优化了钎料的制备流程，简化了真空钎焊工艺。
2)钎料厚度小，可以有效控制真空钎焊中常见的漫溢现象。
3)钎料为纳米结构，可以有效的降低铝合金的钎焊温度。
附图说明
图1为本发明中待焊铝合金工件和钎料共形示意图；
图2是本发明中钎料的制备流程图。
具体实施方式
以下结合附图对本发明进行详细的描述。
本发明一种铝合金共形钎料的制备方法包括下述步骤：
1)采用3A21铝合金制备图1中所示的铝合金工件；
采用超声波清洗器清洗铝合金工件和硅靶材，清洗时间为20min，清洗溶液为酒精。
2)将硅靶材安装于真空室中，将铝合金工件安放于样品台上，溅射气体选用氩气，本底真空度为2×10-5Torr，工作真空度为75×10-4Torr，样品台的转速为3r/min，溅射电流为1A，沉积时间为24min。
3)取出沉积有硅薄膜的铝合金工件，置于管式炉中退火，退火处理的温度为300℃，退火时间为1小时。
4)采用浸渍提拉法制备铝薄膜，将覆盖有硅薄膜的铝合金工件，浸没于铝溶胶中，并使用拉膜机缓慢提升工件，提拉的速度为7cm/min；
配置铝溶胶的具体方法为：九水硝酸铝为原料，添加无水乙醇，使溶液的浓度为0.5mol/L，再添加与九水硝酸铝等摩尔比的二乙醇胺作为稳定剂，并滴加硝酸，调节溶液的pH值为3.2-3.7之间。采用磁力搅拌3小时后静置；
5)将提拉后的工件置于炉中退火，退火时间为120min，退火温度为120℃；
重复进行步骤4)和5)，共计五次，获得和铝合金工件共形的真空钎焊钎料。
以上所述仅为本发明创造的较佳实施例而已，并不用以限制本发明创造，凡在本发明创造的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明创造的保护范围之内。

Claims (7)

1.一种铝合金共形钎料的制备方法，其特征在于：
1)清理铝合金工件和硅靶材；
2)将硅靶材安装于真空室中，将铝合金工件安放于样品台上，采用磁控溅射的方法，在工件表面沉积纳米硅薄膜；
3)对铝合金工件和纳米硅薄膜退火；
4)采用溶胶凝胶的方法，在纳米硅薄膜表面沉积铝薄膜；
5)对工件、纳米硅薄膜以及铝薄膜退火处理，以形成与工件共形的铝合金钎料；
所述步骤4)中，溶胶的配置为：九水硝酸铝为原料，添加无水乙醇，使溶液的浓度为0.5mol/L，再添加与九水硝酸铝等摩尔比的二乙醇胺作为稳定剂，并滴加硝酸，调节溶液的pH值为3.2-3.7之间，采用磁力搅拌3小时后静置。
2.根据权利要求1所述的铝合金共形钎料的制备方法，其特征在于：所述步骤1)中，采用超声波清洗器清洗铝合金工件和硅靶材，清洗时间为20min。
3.根据权利要求1所述的铝合金共形钎料的制备方法，其特征在于：所述步骤2)中，溅射气体选用氩气，本底真空度为2×10-5Torr，工作真空度为75×10-4Torr，样品台的转速为3r/min，溅射电流为1A，沉积时间为24min。
4.根据权利要求1所述的铝合金共形钎料的制备方法，其特征在于：所述步骤3)中，采用管式炉对工件及硅薄膜进行退火，退火处理的温度为300℃，退火时间为1小时。
5.根据权利要求4所述的铝合金共形钎料的制备方法，其特征在于：所述步骤4)中，采用浸渍提拉法制备铝薄膜，将覆盖有硅薄膜的铝合金工件，浸没于溶胶中，并使用拉膜机缓慢提升工件，提拉的速度为7cm/min。
6.根据权利要求5所述的铝合金共形钎料的制备方法，其特征在于：所述步骤5)中，将提拉后的工件置于炉中退火，退火时间为120min，退火温度为120℃。
7.根据权利要求6所述的铝合金共形钎料的制备方法，其特征在于：将浸渍提拉和提拉后退火的步骤循环进行5次，最终，制备出与工件共形的铝合金真空钎焊钎料。
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CN101182642A (zh) * 2007-12-18 2008-05-21 长春理工大学 一种电镀结合真空镀膜制备Au-Sn合金焊料的方法
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CN103170765A (zh) * 2013-03-05 2013-06-26 中国工程物理研究院应用电子学研究所 一种金锡合金焊料制备方法

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Publication number Priority date Publication date Assignee Title
CN1607990A (zh) * 2001-11-21 2005-04-20 达纳加拿大公司 无焊剂钎焊方法和对铝或不同金属钎焊的多层材料物系的组合物
CN1726112A (zh) * 2002-12-13 2006-01-25 克里斯铝轧制品有限公司 具有包覆层和铁合金涂层的硬钎焊薄板产品及其制造方法
WO2004080640A1 (en) * 2003-03-14 2004-09-23 Hille & Müller GMBH Aluminium layered brazing product and method of its manufacture
CN101182642A (zh) * 2007-12-18 2008-05-21 长春理工大学 一种电镀结合真空镀膜制备Au-Sn合金焊料的方法
CN102340945A (zh) * 2010-07-21 2012-02-01 鸿富锦精密工业（深圳）有限公司 壳体及其制作方法
CN103170765A (zh) * 2013-03-05 2013-06-26 中国工程物理研究院应用电子学研究所 一种金锡合金焊料制备方法

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