CN104303272B - 用于抛光模组的预化学机械平坦化的方法与设备 - Google Patents

用于抛光模组的预化学机械平坦化的方法与设备 Download PDF

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Publication number
CN104303272B
CN104303272B CN201380023950.XA CN201380023950A CN104303272B CN 104303272 B CN104303272 B CN 104303272B CN 201380023950 A CN201380023950 A CN 201380023950A CN 104303272 B CN104303272 B CN 104303272B
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China
Prior art keywords
substrate
pad assembly
polishing pad
polishing
rotating
Prior art date
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CN201380023950.XA
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English (en)
Chinese (zh)
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CN104303272A (zh
Inventor
H·陈
J·阿特金森
A·L·德阿姆巴拉
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Applied Materials Inc
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Applied Materials Inc
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Publication of CN104303272A publication Critical patent/CN104303272A/zh
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
    • B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
    • B24B37/107—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/06—Work supports, e.g. adjustable steadies
    • B24B41/068—Table-like supports for panels, sheets or the like

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
CN201380023950.XA 2012-04-28 2013-04-16 用于抛光模组的预化学机械平坦化的方法与设备 Active CN104303272B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/459,177 US8968055B2 (en) 2012-04-28 2012-04-28 Methods and apparatus for pre-chemical mechanical planarization buffing module
US13/459,177 2012-04-28
PCT/US2013/036764 WO2013162950A1 (en) 2012-04-28 2013-04-16 Methods and apparatus for pre-chemical mechanical planarization of buffing module

Publications (2)

Publication Number Publication Date
CN104303272A CN104303272A (zh) 2015-01-21
CN104303272B true CN104303272B (zh) 2017-06-16

Family

ID=49477715

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380023950.XA Active CN104303272B (zh) 2012-04-28 2013-04-16 用于抛光模组的预化学机械平坦化的方法与设备

Country Status (6)

Country Link
US (1) US8968055B2 (enExample)
JP (1) JP2015517923A (enExample)
KR (1) KR102128393B1 (enExample)
CN (1) CN104303272B (enExample)
TW (1) TWI573660B (enExample)
WO (1) WO2013162950A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11705354B2 (en) 2020-07-10 2023-07-18 Applied Materials, Inc. Substrate handling systems
US12394651B2 (en) 2020-04-16 2025-08-19 Applied Materials, Inc. High throughput polishing modules and modular polishing systems

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ITMO20130231A1 (it) * 2013-08-06 2015-02-07 Cms Spa Attrezzatura per tenere un pezzo
JP6721967B2 (ja) * 2015-11-17 2020-07-15 株式会社荏原製作所 バフ処理装置および基板処理装置
KR102666494B1 (ko) * 2016-03-25 2024-05-17 어플라이드 머티어리얼스, 인코포레이티드 국부 영역 연마 시스템 및 연마 시스템용 연마 패드 조립체들
CN109075054B (zh) * 2016-03-25 2023-06-09 应用材料公司 具有局部区域速率控制及振荡模式的研磨系统
CN107520717A (zh) * 2017-08-11 2017-12-29 王臻 一种风能发电叶片用打磨装置
CN109702625A (zh) * 2018-12-28 2019-05-03 天津洙诺科技有限公司 一种硅片单面抛光装置及其方法
CN110977680B (zh) * 2019-12-24 2021-04-16 丹阳广丰光学器材有限公司 一种光学镜片加工用抛光装置
US12198944B2 (en) 2020-11-11 2025-01-14 Applied Materials, Inc. Substrate handling in a modular polishing system with single substrate cleaning chambers
US12224186B2 (en) 2023-04-03 2025-02-11 Applied Materials, Inc. Apparatus and method of brush cleaning using periodic chemical treatments

Citations (2)

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US5738574A (en) * 1995-10-27 1998-04-14 Applied Materials, Inc. Continuous processing system for chemical mechanical polishing
US6857950B2 (en) * 2000-09-21 2005-02-22 Nikon Corporation Polishing apparatus, semiconductor device manufacturing method using the polishing apparatus, and semiconductor device manufactured by the manufacturing method

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US5804507A (en) 1995-10-27 1998-09-08 Applied Materials, Inc. Radially oscillating carousel processing system for chemical mechanical polishing
JPH09168968A (ja) * 1995-10-27 1997-06-30 Applied Materials Inc ケミカルメカニカルポリシング装置のキャリアヘッドのデザイン
US5762544A (en) 1995-10-27 1998-06-09 Applied Materials, Inc. Carrier head design for a chemical mechanical polishing apparatus
JPH10329011A (ja) * 1997-03-21 1998-12-15 Canon Inc 精密研磨装置及び方法
JPH11291166A (ja) * 1998-04-07 1999-10-26 Nikon Corp 研磨装置及び研磨方法
US6095905A (en) * 1998-07-01 2000-08-01 Molecular Optoelectronics Corporation Polishing fixture and method
US6296557B1 (en) 1999-04-02 2001-10-02 Micron Technology, Inc. Method and apparatus for releasably attaching polishing pads to planarizing machines in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies
JP2001044157A (ja) 1999-07-16 2001-02-16 Promos Technol Inc 化学機械研磨終点を検出する方法と装置
US6435941B1 (en) 2000-05-12 2002-08-20 Appllied Materials, Inc. Apparatus and method for chemical mechanical planarization
US6585572B1 (en) 2000-08-22 2003-07-01 Lam Research Corporation Subaperture chemical mechanical polishing system
US6913528B2 (en) * 2001-03-19 2005-07-05 Speedfam-Ipec Corporation Low amplitude, high speed polisher and method
JP2004148479A (ja) * 2002-11-01 2004-05-27 Fuji Seiki Seisakusho:Kk 研磨装置
JPWO2005016595A1 (ja) * 2003-08-19 2006-10-12 株式会社ニコン 研磨装置、これを用いた半導体デバイス製造方法およびこの方法により製造される半導体デバイス
KR100568258B1 (ko) * 2004-07-01 2006-04-07 삼성전자주식회사 화학적 기계적 연마용 연마 패드 및 이를 이용하는 화학적기계적 연마 장치
US8524035B2 (en) * 2009-11-30 2013-09-03 Corning Incorporated Method and apparatus for conformable polishing

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5738574A (en) * 1995-10-27 1998-04-14 Applied Materials, Inc. Continuous processing system for chemical mechanical polishing
US6857950B2 (en) * 2000-09-21 2005-02-22 Nikon Corporation Polishing apparatus, semiconductor device manufacturing method using the polishing apparatus, and semiconductor device manufactured by the manufacturing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12394651B2 (en) 2020-04-16 2025-08-19 Applied Materials, Inc. High throughput polishing modules and modular polishing systems
US12400892B2 (en) 2020-04-16 2025-08-26 Applied Materials, Inc. High throughput polishing modules and modular polishing systems
US11705354B2 (en) 2020-07-10 2023-07-18 Applied Materials, Inc. Substrate handling systems

Also Published As

Publication number Publication date
KR20150005680A (ko) 2015-01-14
US8968055B2 (en) 2015-03-03
WO2013162950A1 (en) 2013-10-31
KR102128393B1 (ko) 2020-06-30
TWI573660B (zh) 2017-03-11
JP2015517923A (ja) 2015-06-25
CN104303272A (zh) 2015-01-21
TW201402273A (zh) 2014-01-16
US20130288578A1 (en) 2013-10-31

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