CN104080734A - 一种石墨烯纸的制备方法 - Google Patents

一种石墨烯纸的制备方法 Download PDF

Info

Publication number
CN104080734A
CN104080734A CN201280068231.5A CN201280068231A CN104080734A CN 104080734 A CN104080734 A CN 104080734A CN 201280068231 A CN201280068231 A CN 201280068231A CN 104080734 A CN104080734 A CN 104080734A
Authority
CN
China
Prior art keywords
graphene paper
preparation
substrate
passed
graphene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201280068231.5A
Other languages
English (en)
Inventor
周明杰
袁新生
王要兵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oceans King Lighting Science and Technology Co Ltd
Shenzhen Oceans King Lighting Engineering Co Ltd
Original Assignee
Oceans King Lighting Science and Technology Co Ltd
Shenzhen Oceans King Lighting Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oceans King Lighting Science and Technology Co Ltd, Shenzhen Oceans King Lighting Engineering Co Ltd filed Critical Oceans King Lighting Science and Technology Co Ltd
Publication of CN104080734A publication Critical patent/CN104080734A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/184—Preparation
    • C01B32/186—Preparation by chemical vapour deposition [CVD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2204/00—Structure or properties of graphene
    • C01B2204/04—Specific amount of layers or specific thickness

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Carbon And Carbon Compounds (AREA)

Abstract

提供一种石墨烯纸的制备方法，包括如下步骤：将清洗干净的衬底置入反应室中，接着往反应室中通入保护性气体，排净反应室中的空气；对衬底进行加热处理，加热温度为800-1100℃；往反应室中持续通入含碳物质100-300分钟；停止向反应室中通入含碳物质，同时停止对衬底加热，随后以5-30℃/分钟的速度冷却衬底；最后停止通入保护性气体，在衬底表面制得石墨烯纸。

Description

PCT国内申请，说明书已公开。

Claims (9)

  1. PCT国内申请，权利要求书已公开。
CN201280068231.5A 2012-03-31 2012-03-31 一种石墨烯纸的制备方法 Pending CN104080734A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2012/073421 WO2013143147A1 (zh) 2012-03-31 2012-03-31 一种石墨烯纸的制备方法

Publications (1)

Publication Number Publication Date
CN104080734A true CN104080734A (zh) 2014-10-01

Family

ID=49258124

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280068231.5A Pending CN104080734A (zh) 2012-03-31 2012-03-31 一种石墨烯纸的制备方法

Country Status (5)

Country Link
US (1) US20150042000A1 (zh)
EP (1) EP2832688A4 (zh)
JP (1) JP2015511574A (zh)
CN (1) CN104080734A (zh)
WO (1) WO2013143147A1 (zh)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101285175A (zh) * 2008-05-29 2008-10-15 中国科学院化学研究所 化学气相沉积法制备石墨烯的方法
US20090110627A1 (en) * 2007-10-29 2009-04-30 Samsung Electronics Co., Ltd. Graphene sheet and method of preparing the same
CN102011100A (zh) * 2010-12-01 2011-04-13 中国科学院化学研究所 一种在铁基衬底上制备大面积高质量石墨烯的方法
CN102092710A (zh) * 2010-12-17 2011-06-15 中国科学院化学研究所 一种规则石墨烯及其制备方法
CN102161482A (zh) * 2011-01-25 2011-08-24 中国科学院化学研究所 一种制备石墨烯的方法
CN102337513A (zh) * 2011-10-31 2012-02-01 杭州电子科技大学 石墨烯透明导电薄膜的制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5605650B2 (ja) * 2007-10-19 2014-10-15 ユニバーシティー オブ ウロンゴング グラフェン分散液の製造方法
KR101622306B1 (ko) * 2009-10-29 2016-05-19 삼성전자주식회사 그라펜 시트, 이를 포함하는 그라펜 기재 및 그의 제조방법
WO2010147860A1 (en) * 2009-06-15 2010-12-23 William Marsh Rice University Graphene nanoribbons prepared from carbon nanotubes via alkali metal exposure
US8697230B2 (en) * 2009-08-31 2014-04-15 Kyushu University Graphene sheet and method for producing the same
JP5563500B2 (ja) * 2010-05-28 2014-07-30 日本電信電話株式会社 グラフェン及び炭素分子薄膜の合成方法
CN102020263B (zh) * 2010-07-02 2013-04-17 浙江大学 一种合成石墨烯薄膜材料的方法
JP2012020915A (ja) * 2010-07-16 2012-02-02 Masayoshi Umeno 透明導電膜の形成方法及び透明導電膜
KR102051154B1 (ko) * 2010-08-11 2019-12-02 더 트러스티스 오브 더 유니버시티 오브 펜실바니아 대규모 그라핀 시트: 이것이 혼입된 물품, 조성물, 방법 및 장치
CN102001650B (zh) * 2010-12-28 2013-05-29 上海师范大学 冷腔壁条件下化学气相沉积制备石墨烯的方法
CN102220566A (zh) * 2011-06-09 2011-10-19 无锡第六元素高科技发展有限公司 一种化学气相沉积制备单层和多层石墨烯的方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090110627A1 (en) * 2007-10-29 2009-04-30 Samsung Electronics Co., Ltd. Graphene sheet and method of preparing the same
CN101285175A (zh) * 2008-05-29 2008-10-15 中国科学院化学研究所 化学气相沉积法制备石墨烯的方法
CN102011100A (zh) * 2010-12-01 2011-04-13 中国科学院化学研究所 一种在铁基衬底上制备大面积高质量石墨烯的方法
CN102092710A (zh) * 2010-12-17 2011-06-15 中国科学院化学研究所 一种规则石墨烯及其制备方法
CN102161482A (zh) * 2011-01-25 2011-08-24 中国科学院化学研究所 一种制备石墨烯的方法
CN102337513A (zh) * 2011-10-31 2012-02-01 杭州电子科技大学 石墨烯透明导电薄膜的制备方法

Also Published As

Publication number Publication date
EP2832688A1 (en) 2015-02-04
US20150042000A1 (en) 2015-02-12
JP2015511574A (ja) 2015-04-20
WO2013143147A1 (zh) 2013-10-03
EP2832688A4 (en) 2015-11-25

Similar Documents

Publication Publication Date Title
Liu et al. Achievements and challenges of graphene chemical vapor deposition growth
Li et al. Synthesis of graphene films on copper foils by chemical vapor deposition
WO2012008789A2 (ko) 그래핀의 저온 제조 방법, 및 이를 이용한 그래핀 직접 전사 방법 및 그래핀 시트
JP5707628B2 (ja) グラフェンのロールツーロール転写方法、グラフェンのロールツーロール転写装置、グラフェンロールの製造方法、及び素子の製造方法
WO2017148105A1 (zh) 一种柔性聚酰亚胺制备的碳膜及其制备方法
WO2014077507A1 (ko) 그래핀 합성장치
CN108251076A (zh) 碳纳米管-石墨烯复合散热膜、其制备方法与应用
CN104099577B (zh) 一种石墨烯的制备方法
US9249026B2 (en) Method for preparing graphene from biomass-derived carbonaceous mesophase
KR101701369B1 (ko) 탄소가 포함된 액체상의 전구체를 이용한 연속 롤투롤 방식의 고품질 그래핀 제조방법과 그 제조장치
WO2015143908A1 (zh) 一种高导热石墨膜的制备方法
CN103086359B (zh) 一种连续制备石墨烯的方法
CN105568253B (zh) 一种等离子体化学气相沉积设备生长六方氮化硼的方法
CN105603384A (zh) 一种cvd沉积石墨烯膜的规模化生产方法
CN105483824A (zh) 制备单晶双层石墨烯的方法
CN104404620B (zh) 一种在大直径6H/4H‑SiC硅面和碳面双面同时生长石墨烯的方法
Xie et al. H2o‐etchant‐promoted synthesis of high‐quality graphene on glass and its application in see‐through thermochromic displays
CN104556014A (zh) 一种非金属表面低温制备掺杂石墨烯的方法
CN106006619A (zh) 一种特定尺寸的石墨烯的制备方法
CN103387223A (zh) 一种制备石墨烯的方法
CN102915913A (zh) 基于蓝宝石衬底的石墨烯cvd直接外延生长方法及制造的器件
CN105710082B (zh) 一种去除金属纳米线表面有机物及氧化层的方法
CN114214042B (zh) 一种石墨烯膜做为耐高温热界面材料或散热膜材料的应用
Wu et al. Seven‐inch large‐size synthesis of monolayer hexagonal BN film by low‐pressure CVD
US20140193574A1 (en) Graphene manufacturing system and the method thereof

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20141001