CN104070034A - Manufacturing method of glass substrate and manufacturing method of glass substrate used for display - Google Patents
Manufacturing method of glass substrate and manufacturing method of glass substrate used for display Download PDFInfo
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- CN104070034A CN104070034A CN201410116911.0A CN201410116911A CN104070034A CN 104070034 A CN104070034 A CN 104070034A CN 201410116911 A CN201410116911 A CN 201410116911A CN 104070034 A CN104070034 A CN 104070034A
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- glass substrate
- face
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- magnetic
- chemical liquid
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
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- Surface Treatment Of Glass (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Detergent Compositions (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention relates to a manufacturing method of a glass substrate used for a display on the aspect of the end surface treatment of the glass substrate. The end surface of the glass substrate can be cleaned, the leftover can be removed from the end surface, and the flying dust of the later process can be inhibited. The manufacturing method of the glass substrate is used for the glass substrate of the grinding processing part after the grinding processing. The processing part is ground by being contacted with the magnetic grinding particles, and then the processing part is provided with the acid cleaning liquid, and then the processing part and the surface of the magnet attached to the processing are electrified with the same polarity, and therefore the processing part and the magnet repel each other, and the metal attached objects can move to the acid cleaning liquid.
Description
In described example, be to use example and lapping device 40 illustrated in fig. 4, utilization is arranged on the ground slurry that contains magnetic 37 keeping between magnetic force body 36a, the 36b on rotating shaft 35 and carries out the mirror ultrafinish processing of the end face 33 of glass substrate G, also can pass through another form, the cleaning of the glass grinding for making the end contact of magnetic abrasive grains and glass substrate.Fig. 8 represents the lapping device 180 of another form.The ground slurry 187 that contains magnetic is fed into and has the groove that there is no the swiveling wheel of illustrated groove 182 from supply unit 184, utilizes the magnetic force body 185 being arranged on swiveling wheel 182 keep the ground slurry 187 that contains magnetic and make it mobile.The end face of ground slurry 187 contact glass plate along with rotation that contains magnetic, and be recovered portion's 186 recovery.In addition, Fig. 4 (b) represents to comprise two magnetic force body 36a, 36b that vacate gap (magnetic field forming portion) and configure swiveling wheel 36, and the aspect of the ground slurry 37 that contains magnetic in this magnetic field forming portion maintenance.But, also can not make two magnetic force body 36a, 36b vacate gap and compact configuration.Not making two magnetic force body 36a, 36b vacate gap compact configuration in the situation that, ground slurry 37 is maintained on the outer peripheral face of swiveling wheel 36 because of the formed magnetic field of swiveling wheel 36.
In described example, with reference to Fig. 6 and Fig. 7, to cleaning one by one the monolithic cleaning way of glass substrate G, be illustrated.But, in matting T5 of the present invention, also can adopt batch purging system that simultaneously cleans multiple pieces of glass substrate G.
Fig. 9 is the profile of in a plurality of liquid baths 700 that represent conceptually simultaneously to clean in batch purging system of multiple pieces of glass substrate G.Batch purging system possesses the liquid bath 700 shown in a plurality of Fig. 9, and possesses the carrying mechanism that the card casket 800 that holds multiple pieces of glass substrate G is carried.Each liquid bath 700 possesses as required and glass substrate G impregnated in to the ultrasonic cleaning agency that by ultrasonic wave, it cleaned under the state in liquid L and regulating the thermoregulation mechanism of the temperature of liquid L.In addition, batch purging system possesses to the storage tank of feed fluid L in each liquid bath 700.
The card casket 800 that holds multiple pieces of glass substrate G is handled upside down equipment and carries, and sequentially be impregnated in the liquid L such as acidic chemical liquid stored in liquid bath 700, pure water, ultra-pure water.In each liquid bath 700, stored acidic chemical liquid is to add and be selected from the more than a kind acid ingredient in the multicomponent organic acids such as oxalic acid, tartaric acid and citric acid and make in the dilution that forms of the cleaning agent used to dilute with water glass substrate G.By making the pH value that contains organic acid acidic chemical liquid be reduced to 2.Below 0, preferably 1.Below 6, make the surperficial zeta potential of glass substrate G become positive potential, and make the end face of glass substrate G and the accompanying magnetic of first type surface easily leave glass substrate G.In addition, by the chelating effect of acidic chemical medicine liquid ingredient, and prevent that magnetic is attached on glass substrate G again.By having given play to these functions of acidic chemical liquid, can effectively clean the accompanying magnetic of glass substrate G.
In addition, after utilizing acidic chemical liquid to clean, also can add the matting of utilizing alkaline cleaning fluid.As alkaline cleaning fluid, for example, can use the solution of potassium hydroxide (KOH).
[utilizing possibility] in industry
Glass substrate as manufacturing by the present invention, is not limited to display applications, can for display, use aptly
The manufacture method of glass substrate and the manufacture method of glass substrate for display
Technical field
The present invention relates to a kind of aspect the end face processing of glass substrate the manufacture method of the characteristic glass substrate for display of tool.
Background technology
The display of liquid crystal display etc. comprises that with the manufacturing process of panel and glass substrate for display the end face that breaking glass substrate is formed carries out the operation of chamfering.For the end face of glass substrate, utilize skive to grind and cut, and remove slight crack and the sharp edge producing because of cut-out.For example, the mode of utilizing skive to become R shape with section is adjusted shape.Thereafter, the end face of glass substrate is by using the attrition process of the abrasive wheel with flexibility that for example comprises Foamex to grind.
In addition, as grinding technology, the known technology for the attrition process of glass substrate end face by the ground slurry that contains magnetic having as described in Patent Document 1.In addition, known just like patent documentation 2,3, record in order to carry out surperficial mirror finish, use the technology of the ground slurry that contains magnetic.
In addition, for the glass substrate through attrition process, need by cleaning the table back side (first type surface) and the end face of glass substrate, and the glass dust producing during by attrition process and accompanying grinding-material, abrasive grains are removed from glass substrate.
[prior art document]
[patent documentation]
No. 2012/067587th, [patent documentation 1] International Publication
[patent documentation 2] Japanese Patent Laid-Open 2011-83827 communique
[patent documentation 3] Japanese Patent Laid-Open 2000-233359 communique
Summary of the invention
[problem that invention will solve]
In recent years, along with display floater is to high-precision refinement, high-resolution future development, for driving panel side to require the graph thinning of TFT live width, in addition, for colored filter panel side, further require the graph thinning of black matrix.In order to tackle this requirement to glass substrate, for the higher cleanliness factor of the surface requirements of glass substrate.
Therefore, the invention provides a kind of manufacture method of glass substrate, it uses the technology that is attached to the foreign matter of glass substrate end face because of attrition process of cleaning.
[technological means of dealing with problems]
As one of main generation reason of the accompanying foreign matter of the first type surface of glass substrate, the known foreign matter that has an end face that is once attached to glass substrate adheres to and remains in its first type surface.Utilize magnetic abrasive grains to carry out the foreign matter that also can residually exist existing matting to remove on the end face of glass substrate of mirror ultrafinish.
Therefore, the present invention is the manufacture method having through the glass substrate of the handling part of attrition process, and described handling part is contacted and is polished by the ground slurry with comprising magnetic, to supplying with cleaning fluid through the described handling part grinding, make the surface band homocharge of the accompanying described magnetic of the surface of described handling part and described handling part, and described handling part and described magnetic are repelled mutually, thereby described magnetic is moved in cleaning fluid.For example, for having, utilize magnetic abrasive grains to carry out the glass substrate of the end face of attrition process, end face by through attrition process is supplied with acidic cleaning solution, is preferably contained organic acid cleaning fluid, making end face and the accompanying magnetic abrasive grains of this end face of glass substrate is that iron is atomic surface band homocharge, and make this end face and iron, being that particulate repels mutually, is that particulate moves in cleaning fluid thereby make iron.
In addition, the invention provides a kind of manufacturing process of glass substrate for display, it possesses following operation and utilizes magnetic abrasive grains to carry out the method for the accompanying magnetic abrasive grains of the end face of glass substrate of attrition process as removal, this operation is by the surface ion of the accompanying magnetic abrasive grains of the end face of glass substrate under specific pH value environment, and make the surface potential of the end face of glass substrate become positive potential, make magnetic abrasive grains from the end face floating of glass substrate, and prevent that by chelation magnetic abrasive grains is attached to first type surface and the end face of glass substrate again, and remove magnetic abrasive grains from cleaning glass substrate.In addition, for glass substrate, after end face processing operation and matting, through the flushing operation of end face, the first type surface of glass substrate and the cleaning of end face that utilize alkaline cleaner etc. to carry out.
In addition, the manufacture method of glass substrate of the present invention has following operation: forming process, by melten glass formed glass sheets; Cut off operation, described glass plate is cut off and formation glass substrate; End face processing operation, the end face that contacts described glass substrate by the ground slurry that makes to comprise the magnetic being kept by magnetic force body carries out mirror ultrafinish; And matting, it is particulate that the acidic chemical liquid by pH value below 2 cleans the iron being produced by the accompanying described magnetic of the end face of described glass substrate; And the feature of described matting is to be atomic Fe by the described iron of formation
3+be reduced into Fe
2+ion, by described Fe
2+the coordination more than bidentate of ion and form complex compound.
In addition, the manufacture method of glass substrate for display of the present invention has following operation: forming process, by melten glass formed glass sheets; Cut off operation, described glass plate is cut off and formation glass substrate; End face processing operation, the end face that contacts described glass substrate by the ground slurry that makes to comprise the magnetic being kept by magnetic force body carries out mirror ultrafinish processing; And matting, utilize acidic chemical liquid to clean described end face.Described end face processing operation is to use the grinding of magnetic abrasive grains, be use possess have and the magnetic field forming portion of the 1st magnetic force body that rotating shaft together rotates and the 2nd magnetic force body and described in comprise magnetic abrasive grains and liquid and be formed on described the 1st magnetic force body and described the 2nd magnetic force body between the abrasive wheel of the ground slurry that contains described magnetic that keeps of magnetic field, under the state that described rotating shaft is rotated, make the end contact of described ground slurry and described glass substrate and carry out mirror ultrafinish processing.And, the feature of described matting is, in order to remove the iron being produced by the accompanying described magnetic abrasive grains of the end face of described glass substrate in described end face processing operation, it is particulate, and use pH value below 2, the acidic chemical liquid of preferred pH value below 1.6, by the described iron of formation, be atomic Fe
3+be reduced into Fe
2+ion, makes described Fe
2+there is coordination above and form complex compound in 2 places of ion.The concentration of the described magnetic abrasive grains in the described ground slurry that in addition, described mirror ultrafinish processing is used is 85～95wt% preferably.
In addition, the manufacture method of glass substrate for display of the present invention has following matting, this matting is to using the end face of the glass substrate that magnetic abrasive grains grinds to supply with following, the preferred pH value of specific pH value below 2, the more preferably acidic chemical liquid of pH value below 1.6, and end face described in physical cleaning.The described acidic chemical liquid that described matting is used is preferably brought into play the free salicylic acid of choosing of chelating effect under specific pH value, phthalic acid, glyoxalic acid, oxalic acid, fumaric acid, maleic acid, malonic acid, butanedioic acid, gluconic acid, trans-aconitic acid, hydroxymalonic acid, lactic acid, pyruvic acid, citric acid, isocitric acid, glycolic, malic acid, the organic acids such as tartaric acid, NTA, ethylenediamine tetra-acetic acid, Oxyethylethylenediaminetriacetic acid, the amino carboxylic acids such as diethylenetriamine pentaacetic acid, serine, aspartic acid, glutamic acid, the amino acid such as cysteine form group in more than a kind, be preferably two or more being selected from described group.
In addition, the concentration that the chemical liquid with chelating effect that matting of the present invention is used is preferably selected from the group who is comprised of oxalic acid, tartaric acid and citric acid is adjusted to chemical liquid more than 0.5wt%.
[effect of invention]
According to the manufacture method of the manufacture method of glass substrate of the present invention and glass substrate for display, can remove the accompanying magnetic of end face of glass substrate, and suppress first type surface and end face that magnetic is attached to glass substrate again.
Accompanying drawing explanation
Fig. 1 means the flow chart of each operation in the manufacture method of glass substrate of the present invention.
Fig. 2 represents that the melting operation in the present invention arrives the schematic diagram that cuts off operation.
Fig. 3 represents the figure of aspect of the end face processing of glass substrate of the present invention.
Fig. 4 (a), (b) mean the figure of the aspect of the attrition process of using the ground slurry that contains magnetic of the present invention.
Fig. 5 means the schematic diagram of the end face part of the glass substrate that the present invention processes.
Fig. 6 (a)～(c) mean figure of the action of cleaning device used in the present invention.
Fig. 7 (a)～(c) mean figure of the action of the cleaning means that cleaning device used in the present invention possesses.
Fig. 8 means the figure of aspect of processing of the glass surface of another example of the present invention.
Fig. 9 means the profile that a part for used in the present invention batch of purging system forms.
The specific embodiment
Below, with reference to graphic, the manufacture method of glass substrate of the present invention example is described.In addition, in this manual, glass substrate comprises glass substrate for display.
(1) summary of the manufacture method of glass substrate
Fig. 1 is the flow chart of manufacture method of the glass substrate of this example.Glass substrate is to manufacture through melting each operation of operation T1, forming process T2, cut-out operation T3, end face processing operation T4, matting T5 and inspection operation T6 as shown in Figure 1.
Use Fig. 2, a part for the manufacturing installation that the manufacture method of glass substrate of the present invention is used (device 100) describes.In melting operation T1, by make it melting at the interior heating frit of fusing device 200, and make melten glass.Then, in clarifier 300, make melten glass in contained gas componant from melten glass, discharge, or gas componant contained in melten glass is absorbed in melten glass.For example, frit comprises Si0
2, A1
20
3deng composition.
In forming process T2, utilize carrier pipe 400 that the melten glass through clarification is supplied to building mortion 500, and be configured as banded glass plate G1.
In cutting off operation T3, glass plate G1 utilizes not have illustrated shearing device to cut off and singualtion along width.Further to become the mode of specific dimensions, cut off 4 limits, and the glass substrate G of making articles size.
In end face processing operation T4, utilize the 1st end face processing machine 30 shown in Fig. 3, to processing by cutting off the end face forming.In the both ends of the surface of mobile glass substrate G, making to utilize does not have illustrated rotating shaft and the 1st grinding and cut wheel 31 and the 2nd and grind and cut wheel 32 and contact of rotation, thus the end face 33 of glass substrate G is processed.After the end face 33 of long side of processing glass substrate G, the end face 33 of short brink is processed.Utilize the lapping device 40 that be arranged on 2nd end face processing machine 34 Fig. 4 shown on carry out the mirror ultrafinish processing of end face 33 thereafter.At this, be to use the ground slurry that contains magnetic.The ground slurry that what is called contains magnetic, refers to that the liquid that contains magnetic abrasive grains that magnetic plays a role mainly as abrasive grains or magnetic are mainly as the liquid playing a role for transporting the carrier of abrasive grains.
Secondly, to comprising that the matting of the operation that magnetic accompanying in the attrition process of end face processing operation T4 is removed from the end face of glass substrate G describes.
In matting T5, utilize the 1st end face cleaning device 60 shown in Fig. 6 (a), utilize end face cleaning means 61 to be cleaned the end face 33 of the glass substrate G processing through mirror ultrafinish in end face processing operation T4.In the 1st end face cleaning device 60, in the both sides of the glass substrate G of carrying on carrying roller 62, the 1st end face cleaning means 61 is set, and setting is penetrated the end face washer jet 63 of cleaning fluid from the main surface side of glass substrate G to end face side spray.
For by the glass substrate G of the 1st end face cleaning device 60, then utilize the 2nd end face cleaning device 70 shown in Fig. 6 (b) to clean end face.In the 2nd end face cleaning device 70, in the both sides of the glass substrate G of carrying on carrying roller 62, the 2nd end face cleaning means 64 is set.
For utilize the 1st end face cleaning device the 60, the 2nd end face cleaning device 70 to clean the glass substrate G of the end face 33 of long side, utilize do not have illustrated reverse engine by glass substrate G towards 90-degree rotation, and long side similarly cleans the short brink of glass substrate G.
Then,, after 4 limits of the end face 33 of glass substrate G are cleaned, clean the first type surface of glass substrate G.Utilize the surface cleaning apparatus 80 shown in Fig. 6 (c) and surface, the back side of cleaning glass substrate G.Face side, the rear side of glass substrate G in carrying on carrying roller 62 arranges cleaning roller 65, smears the alkaline cleaner that glass substrate uses and cleans the first type surface of glass substrate G.In this example, cleaning roller 65 is that brush roll and sponge roller are used in combination, and removes accompanying organic matter and the particle of first type surface of glass substrate.
In checking operation T6, end face 33 and the first type surface of glass substrate G are checked, thereafter, with the form shipment of glass substrate for display to display floater manufacturer etc.
Below, with reference to graphic, end face processing operation T4 of the present invention and matting T5 are described in more detail.The end face processing operation T4 of this example has the 1st shown in Fig. 3 and grinds and cut operation, the 2nd and grind and cut the grinding step shown in operation and Fig. 4.
First, the 1st end face processing machine 30 and the 2nd end face processing machine 34 are described.As shown in Figure 3, in the 1st end face processing machine 30, one side is along direction of arrow moving glass substrate G, and one side is utilized the 1st the grinding and cut wheel the 31, the 2nd and grind and cut wheel 32 and first the end face of long side is sequentially ground and cuts processing of two ends be arranged on glass substrate.Then, long side is ground and cut after processing, similarly carry out grinding of short brink and cut processing, there is no as required illustrated directional plane processing, corner cut.
The 1st grinds that to cut wheel 31 be that to utilize the metal contain iron be that adhesive is fixed with grinding of diamond lap grain and cuts wheel.The 1st grinds hardness and the rigidity of cutting the adhesive that wheel uses grinds higher than the 2nd the adhesive of cutting wheel 32.So-called hardness refers to Shore hardness herein, and so-called rigidity refers to Young's modulus.As long as the 1st grinds that to cut wheel 31 adhesive be metal system, also can use other metal-to-metal adhesives such as cobalt system, bronze system etc.In addition, as long as hardness and rigidity grind higher than the 2nd the adhesive of cutting wheel, also can use the adhesive of pottery to grind as the 1st the adhesive of cutting wheel 31.The 1st grinds and cuts the diamond lap grain of granularity that wheel 31 for example can be used about #300 to #400 of JIS R6001-1987 defined.In this example, the 1st grinds that to cut wheel 31 are the diamond lap grains that use the granularity of #400.Abrasive grains is not limited to diamond, also can be CBN (borazon).
The 1st grinds and cuts wheel 31 granularity and can be equal to or be greater than the 2nd granularity of grinding the diamond lap grain of cutting wheel 32.
The 2nd grinds that to cut wheel 32 be to utilize the adhesive of the resin system contain epoxy resin and be fixed with grinding of diamond lap grain and cut wheel.The 2nd grinds that to cut wheel 32 adhesive be to use hardness and rigidity lower than the 1st adhesive that grinds the adhesive of cutting wheel 31.About the 2nd, grind and cut the adhesive of taking turns 32, as long as hardness and rigidity grind lower than the 1st the adhesive of cutting wheel 31, also can use the adhesive of pottery.As long as be resin system, for example also can use the material of polyimides system.Abrasive grains is not limited to diamond, also can be CBN.In this example, the 2nd grinds that to cut wheel 32 are the diamond lap grains of granularity that use the #400 of JIS R6001-1987 defined.
In addition,, with regard to grinding expeditiously the aspect of cutting, the 1st granularity of grinding the abrasive grains of cutting wheel 31 is preferably equal to or is greater than the 2nd grinds the granularity of cutting the abrasive grains of taking turns 32.
The 1st, grind and cut in operation, utilize the 1st to grind and cut formed shape on wheel 31, for example, there is grinding of specific curvature and cut groove, the end face 33 of glass substrate G is ground and cut specifically to grind the amount of cutting.Thus, the end face 33 of glass substrate G compares with former end face 33 center side that retreats into glass substrate, and the section shape of end face 33 grinds and cuts grinding of wheel 31 and cut the section shape of groove and ground the convex form being whittled into curvature, circular-arc or R shape corresponding to the 1st.Herein, what is called is ground the amount of cutting and is referred to from grinding the distance till former end face 33 cutting plays the summit of being ground the end face that grinds the convex form after cutting 33 of cutting and retreating.That is the end face 33 that, refers to glass substrate G is ground the amount of cutting in the direction of the first type surface of glass substrate G.Utilize the 1st to grind and cut wheel the grinding in the scope that the amount of cutting is for example 40 μ m to 80 μ m of the 31 glass substrate G that produce.With regard to guaranteeing productive viewpoint, the 1st grind the preferred 10m/min of transporting velocity of the glass substrate G cutting in operation more than.In this example, the transporting velocity of glass substrate G is 10m/min.
The 1st, grind and cut in operation, with the maximum height Rmax of the JIS B0601-1982 defined of the end face 33 of glass substrate G, become that at least 10 μ m are above and 18 μ m are following, more preferably 13 μ m mode above and below 14 μ m is ground the end face 33 of cutting glass substrate G.In addition, the arithmetic average roughness Ra of the JIS B0601-1994 defined of the end face 33 of glass substrate G for example reaches 0.5 μ m left and right.
, continue 1st grind cut operation after set 2nd grind cut in operation, for glass substrate G, utilize the 2nd to grind and cut grinding of wheel 32 and cut groove and grind and cut end face 33 thereafter.Thus, the section shape of the end face 33 of glass substrate G grinds and cuts grinding of wheel 32 and cut the section shape of groove and ground the convex form being whittled into curvature, circular-arc or R shape corresponding to the 2nd.In this example, by grinding and cut grinding of wheel 32 and cut groove and be made as with the 1st and grind and cut grinding and cutting the roughly the same shape of groove of wheel 31 the 2nd, can with the specific amount of cutting of grinding, grind the end face 33 of cutting glass substrate G in the situation that do not change the face shaping of the end face 33 of glass substrate G.
Utilize the 2nd to grind and cut wheel the grinding in the scope that the amount of cutting is for example 10 μ m to 30 μ m of the 32 glass substrate G that produce.The 2nd, grind and cut in operation, with the maximum height Rmax of the JIS B0601-1982 defined of the end face 33 of glass substrate G, become that at least 4 μ m are above and 8 μ m are following, more preferably the mode of 6 μ m left and right is ground the end face 33 of cutting glass substrate G.In addition, the described arithmetic average roughness Ra of the end face of glass substrate G reaches below 0.2 μ, for example, about 0.1 μ m to 0.2 μ m.
By the described the 1st, grinding and cutting operation, the 2nd and grind and cut after operation processes the long side of glass substrate G, utilize do not have illustrated reverse engine make glass substrate G towards 90-degree rotation, and long side is similarly processed the short brink of glass substrate G.
In addition, about the 1st, grind and cut wheel the 31, the 2nd and grind and cut wheel 32 direction of rotation, the moving direction that grinding of some contact with glass substrate G can be cut to the outer peripheral face of wheel 31 is set as identical with the carrying direction of glass substrate G, also can be set as opposite direction.In this example, to grind and to cut operation, the 2nd and grind the 1st of the point that contacts with glass substrate G in cutting operation and grind and cut the reciprocal mode that moving direction that wheel the 31, the 2nd grinds the outer peripheral face of cutting wheel 32 becomes the carrying direction of glass substrate G the 1st, make the 1st to grind and cut wheel the 31, the 2nd and grind and cut wheel 32 along a direction rotation.
Cut in operation grinding, as mentioned above, the section shape of the end face of glass substrate G 33 is ground to the convex form being whittled into curvature, circular-arc or R shape, and the described arithmetic average roughness Ra of the end face of glass substrate G 33 is ground and cut to 0.2 μ m.Yet, grind and cut wheel the 31 and the 2nd and grind and cut wheel 32 and grind on the end face 33 of the glass substrate G cutting utilizing as the 1st of skive, can form the layer that contains the micro-fractures that is called hallrcuts or hair crack.This layer is called as affected layer or fragile breakable layer, even grind and cut operation, the 2nd and grind and cut operation through the described the 1st, still can exist with the thickness of 1 μ m to 3 μ m left and right.Because there is this layer, the breakdown strength of the end face 33 of glass substrate G can reduce, or glass comes off from micro-fractures.In order to remove this layer to improve the breakdown strength of the end face 33 of glass substrate G, and carry out attrition process.
In grinding step, remove affected layer or the fragile breakable layer of the end face 33 of glass substrate G, arithmetic average roughness Ra with the end face 33 of glass substrate G for example becomes the mode that is less than 0.01 μ m, utilizes lapping device 40 and the end face 33 of grinding glass substrate G.
As shown in Figure 4, by grinding the glass substrate G cutting that grinds of the end face 33 of cutting the glass substrate that operation completed long side, short brink, be moved to the position that utilizes lapping device 40 to grind., utilize the lapping device 40 2nd end face processing machine 34 Fig. 4 (a), (b) shown on installed, the end face 33 of glass substrate G is carried out to attrition process thereafter.Fig. 4 (b) is the profile along the II-II dotted line of Fig. 4 (a).Lapping device 40 is centered by rotating shaft 35, to make swiveling wheel 36 rotations.Swiveling wheel 36 is in the gap (also referred to as magnetic field forming portion) of the discoid magnetic force body 36a, the 36b that arrange abreast at the length direction along rotating shaft 35, to keep the ground slurry 37 that contains magnetic.
Submerge by the ground slurry that contains magnetic 37 being kept by magnetic force body 36a, the formed magnetic field of 36b in the end 33 of glass substrate G, swiveling wheel 36 is to rotate under the state that contacts with the ground slurry 37 that contains magnetic of the end face 33 at glass substrate G.Thus, the ground slurry 37 that contains magnetic and the end face 33 of glass substrate G relatively move, and the end face 33 of glass substrate G is contacted and is polished by the ground slurry that contains magnetic with being fettered by the formed magnetic field of magnetic field forming portion.
The contained abrasive grains of ground slurry 37 that contains magnetic is shaped as little polygon-shaped of circularity or has the indefinite shape in bight.What is called has the indefinite shape in bight, comprises inconsistent shape in the solid with one or more acute angles.In addition, what is called has bight, comprises following situation: particle is to edge thinning; The outline line of the section of particle forms one or more acute angles or obtuse angle; And the edge of particle is sharp-pointed.In addition, abrasive grains also can be spherical.What is called is spherical not only comprises that section shape is circular shape, also comprises that section shape is the shape with circular arc that ellipse, Long Circle etc. do not have angle.In addition, in the situation that the abrasive grains in the ground slurry that contains magnetic is magnetic abrasive grains, the concentration of the magnetic abrasive grains in this ground slurry is 85～95wt% preferably.The concentration of this magnetic abrasive grains is higher, and the ability of the end face 33 of grinding glass substrate G more improves, and but then, the cooling effect being produced by water evaporation more reduces.Therefore,, if more than the concentration of the magnetic abrasive grains in this ground slurry reaches 95wt%, can burn heat because processing the end face 33 that heat make glass substrate G.
Through grinding step, the end face 33 of glass substrate G as shown in Figure 5, boundary portion B, the C with top A, end face and first type surface, at these positions, for glass substrate G, affected layer or the fragile breakable layer of removing end face 33, the mode that is less than 0.01 μ m with arithmetic average roughness Ra is carried out mirror ultrafinish processing.Especially, by making the Ra of boundary portion B, C be less than 0.01, can suppress to produce glass dust from end face 33, and alleviate its adhering to glass substrate G first type surface.In addition, also can realize the raising of the bending strength of glass substrate G.
In addition, for glass substrate G, can under the state being fixed on platform, carry out end surface grinding, also can to fixing abrasive wheel, move and carry out end surface grinding by making it.In addition, can by limit, grind the end face 33 of glass substrate G, also can prepare a plurality of swiveling wheels 36, a plurality of limits of the end face 33 of simultaneous grinding glass substrate G.In addition, the ground slurry 37 that contains magnetic can be the liquid that contains magnetic abrasive grains that magnetic plays a role mainly as abrasive grains, also can be magnetic mainly as the liquid playing a role for transporting the carrier of abrasive grains.
In addition, the removal amount of glass substrate G and surface roughness are that the mensuration of arithmetic average roughness Ra is the Surfcom A1400 that uses Tokyo Micronics Inc. to manufacture, and at the summit A of end face 33 of the glass substrate G shown in Fig. 5 and boundary portion B, the C place of the boundary vicinity of end face 33 and first type surface, carry out.The mensuration of the removal amount of glass substrate G is to be that profile survey pattern, finding speed are that 0.6mm/s, slant correction are to carry out under first half proofreaies and correct, measures apart from the condition for 20mm in measurement pattern.In addition, the mensuration of surface roughness is to be that roughness concentration, finding speed are to carry out under 0.3mm/s, the assay method condition that is JIS1994 in measurement pattern.In addition, about the mensuration of arithmetic average roughness Ra, when Ra<0.02, be made as cutoff 0.08 and measured length 0.4mm, when 0.02<Ra<0.2, be made as cutoff 0.25 and measured length 1.25mm, when 0.1<Ra<2, be made as cutoff 0.8 and measured length 4mm.
Secondly, matting T5 and cleaning action thereof are described.In the present invention, as remove utilizing the ground slurry that contains magnetic to carry out the method for the accompanying magnetic of the end face of glass substrate G of attrition process, studied the surperficial positively ionized that makes the accompanying magnetic of the end face of glass substrate G under specific pH value environment, and make the surface potential of the end face of glass substrate G become positive potential, make magnetic from the end face floating of glass substrate G, and prevent from adhering to again by chelation.
First, in the present invention, in the 1st end face matting of utilizing the 1st end face cleaning device 60 shown in Fig. 6 (a) to carry out, by pH value below 2, preferably the acidic chemical liquid of pH value below 1.6 is supplied to the end face of glass substrate G from end face washer jet 63, carry out the ionization of the accompanying magnetic of the end face of glass substrate G.Thus, reduce the end face of glass substrate G and the electrostatic interaction of magnetic that surface potential becomes positive potential, magnetic is become and easily from the end face of glass substrate G, leave.And, by utilizing sponge to carry out physical cleaning under the state reducing the end face of glass substrate G and the electrostatic interaction of magnetic, and magnetic is positively departed from from the end face of glass substrate G.
In addition, by making the chemical liquid of supplying with in the 1st end face matting contain chemical liquid iron under the environment below 2 in pH value with chelating effect, make Ionized iron chelating, and the surface that prevents from being attached to again glass substrate G.
As the chemical liquid with reduction effect, preferably contain standard oxidationreduction potential at least for-acidic chemical liquid below 0.35V.For example, Fe
3+reduction needs-the 0.77V of ion, has the chemical liquid of chelating effect by use, can reduce Fe
3+the reduction potential of ion.That is, more than described current potential, also can obtain reduction effect, the cleaning action of the end face of glass substrate G further improves.
Even if the magnetic that leaves the end face of glass substrate G by physical cleaning is placed under the pH value environment of the degree that is enough to increase the surface of glass substrate G and the electrostatic interaction of magnetic, also can be because magnetic forms chelate, and prevent that magnetic is attached on glass substrate G again.
Then,, in the 2nd end face matting of utilizing the 2nd end face cleaning device 70 shown in Fig. 6 (b) to carry out, carry out removing for cleaning the flushing that the 1st end face matting becomes the magnetic of chelate.In the 2nd end face matting, preferably manage that magnetic is brought into after operation.For example, in order to remove the ferrous components that forms chelate, and use pH value 2 below, the acidic chemical liquid of preferred pH value below 1.6, by pure water, clean thereafter and chemical liquid that flushing is used washes away.
Use Fig. 7 (a), (b) to describe the 1st end face cleaning means 61 of Fig. 6 (a).Fig. 7 (a) represents a part for the end face of the glass substrate G in the 1st end face cleaning machine 60.The 1st end face cleaning means 61 has the upper set cleaning pad 61c of the 61b of support sector that utilizes rotating shaft 61a to be rotated, the two ends of the glass substrate G that its cleaning utilization carrying roller 62 is carried.
For the end face that cleans pad 61c and glass substrate G, from end face washer jet 63a ejection pH value below 2, the acidic chemical liquid of preferred pH value below 1.6.As an example, oxalic acid and tartaric mixed liquor can be applied to the end face of glass substrate G.Clean pad 61c and contain acidic chemical liquid, end face of its contact glass substrate G also slides, and can carry out Chemical cleaning and physical cleaning to the end face of glass substrate G thus, and the end face that makes the accompanying magnetic of end face of glass substrate G depart from glass substrate G.The magnetic departing from utilizes tartaric acid and chelating.
Also can be as Fig. 7 (b) burst of direction of rotation and the substantially vertical cleaning roller 611 of end face with the end face cleaning means 61 of the end contact of glass substrate G.In addition, also can be as end face washer jet 63b thigh from frontal to end face providing chemical liquid.
Secondly, use Fig. 7 (c) to describe the 2nd end face cleaning device 70 of Fig. 6 (b).Glass substrate G by the 1st end face cleaning device 60 is put in the 2nd end face cleaning device 70, utilizes the 2nd end face cleaning means 64a, 64b and rinses out the chemical liquid of front operation.
Fig. 7 (c) represents a part for the end face of the glass substrate G in the 2nd end face cleaning device 70.In the 2nd matting, utilize flushing liquor and rinse out the magnetic through chelating, until the surface cleaning apparatus of operation later, and reduce the pH value of the accompanying acidic chemical liquid of glass substrate, operation after inhibition acidic chemical liquid is brought into.
The 2nd end face cleaning means 64, as shown in Fig. 7 (c), has washer jet 64a, 64b there to be the mode subtend of special angle to arrange to the end face of glass substrate G.First, utilize the end face that rinses glass substrate G from the 1st flushing liquor of washer jet 64a ejection.The 1st flushing liquor be use have with the 1st end face matting in the flushing liquor of the equal pH value of the chemical liquid that uses.Utilize the 1st flushing liquor and after rinsing out the chemical liquid adhering to from the 1st end face matting, use pure water as the 2nd flushing liquor, to rinse the end face of glass substrate G.Thus, can prevent from acidic chemical liquid to bring in the first type surface matting of utilizing the glass substrate G that surface cleaning apparatus 80 carries out shown in Fig. 6 (c) of later operation.In addition, by by the chemical liquid with the pH value equal with the 1st end face matting for the 1st flushing liquor, and positively rinse out magnetic.
In addition, in this example, in the main surface side of glass substrate G, also can arrange and from main surface side to end face side spray, go out the washer jet of flushing liquor, and arrange from the washer jet of the face side ejection flushing liquor of end face.
In the manufacture method of glass substrate for display of the present invention, think and preferably the valence electron number of iron is made as to Fe
2+and form complex compound, therefore preferably the strong oxalic acid of reproducibility is added in the acidic chemical liquid that the 1st end face cleaning device 60 uses.
About the stability of complex compound, the valence electron number of iron is Fe
3+time, stability is higher than Fe
2+.But, at the iron of peeling off from the end face of glass substrate G, be that particulate is Fe
3+state under, failing this Fe
3+in the situation of complete chelating, in described flushing operation, and Fe
2+compare Fe
3+iron be that particulate is easily in the first type surface of glass substrate G and end face passivation and cause and adhere to.
Therefore, in the present invention, owing to reducing magnetic not chelating and residual possibility, so the flushing operation of the complex compound from glass substrate G removal magnetic before being carried to first type surface matting, even if from acidity change to neutral side, also can suppressing magnetic, the pH value of cleaning fluid is attached to again the first type surface of glass substrate G and passivation.
That is the Fe of magnetic,, according to the present invention, can bring into play following effect: by will be formed
3+be reduced into Fe
2+, and Fe
3+compare, by matting of the present invention, can suppress glass substrate G first type surface by passivation, caused adhere to again.
As the chelating agent using in the present invention, preferably carry out the chelating agent of coordination more than bidentate.Particularly, preferably possess iron ion center from the hexa-coordinate of the regular octahedron of Fe on xyz direction of principal axis with 3
following distance has the molecular configuration of electron-donating group.
As concrete example, the described chemical liquid with chelating effect is preferably selected from by salicylic acid, phthalic acid, glyoxalic acid, oxalic acid, fumaric acid, maleic acid, malonic acid, butanedioic acid, gluconic acid, trans-aconitic acid, hydroxymalonic acid, lactic acid, pyruvic acid, citric acid, isocitric acid, glycolic, malic acid, the organic acids such as tartaric acid, NTA, ethylenediamine tetra-acetic acid, Oxyethylethylenediaminetriacetic acid, the amino carboxylic acids such as diethylenetriamine pentaacetic acid, serine, aspartic acid, glutamic acid, the amino acid such as cysteine form group in more than a kind, especially be suitably two or more.
Above, understand in detail the example of the manufacture method of glass substrate of the present invention, but the present invention is not limited to described example, also can carry out without departing from the spirit and scope of the invention various improvement or change.
[embodiment]
Below, embodiments of the invention are elaborated.
(embodiment 1～5) and (comparative example 1～3)
First, the ground slurry that contains magnetic that the attrition process of the end face of glass substrate is used is the liquid that contains magnetic abrasive grains that magnetic plays a role mainly as abrasive grains.This magnetic abrasive grains is the magnetic of ferrite system, is to comprise the indefinite shape that being shaped as of particle has bight, and average grain diameter is that 5 μ m are above and below 10 μ m, peakflux density is 1.3T, the abrasive grains of the magnetic that maximum permeability is 3.0H/m.Secondly, by prepared abrasive grains and water are mixed, and make ground slurry.As an example, the mode that should become with the concentration of the abrasive grains in ground slurry 85～95wt% is mixed magnetic abrasive grains and water.
In the present embodiment, consider the easiness, volume production applicability of management and use wt% to carry out the concentration management of magnetic flow kinetoplast, but the concentration management of magnetic flow kinetoplast also can carry out with vo1%.The conversion of wt% and vo1% can be based on magnetic abrasive grains bulk specific gravity and the density 1g/cm of water
3calculate.In addition, in the present embodiment, consider the evaporation of water in the ground slurry that contains magnetic from attrition process, the water of evaporated amount is added in this ground slurry.Particularly, with specific interval, the swiveling wheel of the end face of grinding glass substrate is supplied with to the ground slurry that contains magnetic that magnetic abrasive grains and water are mixed.The ground slurry that contains magnetic about this, the ground slurry that contains magnetic that its concentration keeps lower than swiveling wheel, is to supply with the high state of mobility.
On the end face of the glass substrate obtaining by described milled processed, at the boundary portion B shown in Fig. 5, boundary portion C, adhere to magnetic abrasive grains.
The acidic chemical liquid that uses following " table 1 " to record cleans the end face of this glass substrate, and evaluates wash result.Evaluation result is gathered and is shown in table 1.
Particularly, in embodiment 1～5, the concentration that contains organic acid acidic chemical liquid is adjusted into 2wt%.In addition, the mode becoming below 2 with pH value during flushing is implemented operation.
After the end surface grinding processing of the glass substrate that utilizes magnetic abrasive grains to carry out, in following operation, implement the cleaning of this end face.
1) from nozzle, the end face of glass substrate is sprayed to the acidic chemical liquid shown in table 1,
2) utilize the sponge disc that has flooded chemical liquid to clean,
3) from nozzle, the end face of glass substrate is sprayed to chemical liquid and rinses,
4) end face of glass substrate being sprayed to pure water rinses.
In addition, in embodiment 1～5 and comparative example 1～3, the glass substrate that used thickness is 0.5mm.
Evaluation method is to utilize to have adhesive instrument the remaining foreign matter of the end face of glass substrate is peeled off, and measures the adhesion amount of its per unit area and carry out.Particularly, remaining area ratio about the remaining foreign matter of glass substrate end face, central portion separately at the end face on four limits of the glass substrate of each sample attaches adhesive tape, peel off again adhesive tape, use the light microscope of subsidiary CCD (Charge Coup1ed Device, charge-coupled image sensor) camera head to come the surface of the adhesive tape that observation post peels.In addition, manage to attach adhesive tape at the whole thickness direction (the B point of Fig. 5 is to C point) of the machining area of the end face of glass substrate.
The distance that the B point of end face that utilizes the viewing area of light microscope to be made as the glass substrate of Fig. 5 is ordered to C, be the region of the length direction 0.75mm of 0.75mm * glass substrate.Count the number of the foreign matter in this region, and evaluate.
In addition, for the accompanying foreign matter of first type surface (the table back side) of the glass substrate after matting, also evaluate.Particularly, for the accompanying foreign matter amount in the glass table back side, use glass baseplate surface testing fixture (G14830 that high-tech electronic engineering company of Hitachi manufactures) to measure.About condition determination, under the condition detecting more than polystyrene standard particle 1 μ m, measure.
[table 1]
As shown in table 1, the end face about the glass substrate after cleaning, utilizes laser microscope to carry out surface observation to the A point shown in Fig. 5, B point and C point, and implements the evaluation of cleaning performance.For pH value, reduction effect, each condition of chelating effect, according to chemical liquid physical property, quantize.
In the embodiment of table 1, comparative example, about acid dissociation constant (pKa), pH value 4.4 following tables are shown to ◎, pH value 4.4～6 is expressed as to ◎, pH value is less than 6 be expressed as *.In addition, about reducing power, according to the electrode potential of standard hydrogen electrode, general-0.35V is made as ◎ below, and general-0.35V～-0.05V is made as ◎, and general-0.05V is made as above *.
About cleaning performance, the end face particle number after cleaning is less than to 150 situation and is made as " cleaning performance: height ", the situation that is less than 300 is made as " cleaning performance: have ".In addition, more than 300 situations is made as " cleaning performance: without ".
If foreign matter does not surpass 300 in described viewing area,, in display manufacturing operation, can be not that particulate causes that yield reduces because there is iron.Also no problem in worrying the TFT panel manufacturing process that iron is atomic impact.In addition, utilize glass baseplate surface testing fixture, from described viewing area, foreign matter does not surpass the glass substrate of 300 and the foreign matter that surpasses 1 μ m do not detected.
About the result of described embodiment 1～5 and comparative example 1～3, if used, there is the oxalic acid of organic acid acidity degree, reducing power, the tartaric acid that chelating valency is high, can confirm high clean effect.In embodiment 4, obtained extra high cleaning performance.
According to described embodiment 1～5, preferably use the chemical liquid that contains organic acid carboxyl, adjust chemical liquid, and make it to have the ionizable pH value of at least a portion carboxyl.More preferably use the carboxyl with many places, and with the carboxyl generation ionization of many places and the chemical liquid of adjusting lower than the mode of glass isoelectric pH value.
As mentioned above, in an aspect of the present invention, by being made as pH value below 2, preferred pH value 1.Below 6, and reduce the electrostatic interaction of end face and the magnetic of glass substrate, using the iron as magnetic, it is particulate ionization and make it the end face floating from glass substrate, further making Ionized iron is particulate chelating, prevents thus first type surface and end face that it is attached to glass substrate again.And, in the flushing operation of operation, clean removal afterwards.Rinse the chemical liquid using and be preferably made as pH value below 3 or in the scope of pH value 2～3.But, rinse the chemical liquid use and also can be made as the identical pH value of chemical liquid of using with reduction or chelating.
If use acid that red fuming nitric acid (RFNA) or the concentrated sulfuric acid etc. have strong oxidability as acidic chemical liquid, can make iron is atomic surface passivation, thereby it is not good enough to have the acid of strong oxidability.
In addition, in the manufacture method of glass substrate of the present invention, preferably the valence electron number of iron is made as to Fe
2+and formation complex compound.With regard to the stability of complex compound, about the valence electron number of iron, Fe
3+stability higher than Fe
2+.But, by the iron of peeling off from the end face of glass substrate, be that particulate is from Fe
3+be reduced into Fe
2+situation under, failing Fe
3+completely, in the situation of chelating, there is following worry: iron is that particulate can be attached in the surface passivation of glass substrate first type surface and the end face of glass substrate again in rinsing operation.
Therefore, in the present invention, removing the complex compound of iron and removing in the flushing operation of other foreign matters, though in order to rinse by the pH value of cleaning fluid from acidity change to neutral side, by being atomic Fe by iron
3+be reduced into Fe
2+, and Fe
3+compare, also can suppress the passivation of first type surface and the end face of glass substrate, suppressing iron is first type surface and the end face that particulate is attached to glass substrate again.That is the iron that, suppresses to be once attached to the end face of glass substrate is that particulate is around being attached to first type surface.
The chemical liquid in addition, with reduction effect preferably contains standard oxidationreduction potential at least for-acidic chemical liquid below 0.35V.Fe
3+reduction needs-the 0.77V of ion, has the chemical liquid of chelating effect by use, can reduce Fe
3+the reduction potential of ion.That is, more than described setting current potential, just can obtain reduction effect, and can carry out end face cleaning.In described embodiment, be to use oxalic acid.In addition Fe,
3+reduction needs-the 0.77V of ion, so the chemical liquid of the standard oxidizing potential of have in order to obtain higher cleaning, should to use-acidic chemical liquid below 0.8V.
In addition, as chelating agent, preferably carry out the chelating agent of coordination more than bidentate.Particularly, preferably possess iron ion center from the hexa-coordinate of the regular octahedron of Fe on xyz direction of principal axis with 3
following distance has the molecular configuration of electron-donating group.As concrete example, the described chemical liquid with chelating effect can be enumerated and select free salicylic acid, phthalic acid, glyoxalic acid, oxalic acid, fumaric acid, maleic acid, malonic acid, butanedioic acid, gluconic acid, trans-aconitic acid, hydroxymalonic acid, lactic acid, pyruvic acid, citric acid, isocitric acid, glycolic, malic acid, the organic acids such as tartaric acid, NTA, ethylenediamine tetra-acetic acid, Oxyethylethylenediaminetriacetic acid, the amino carboxylic acids such as diethylenetriamine pentaacetic acid, serine, aspartic acid, glutamic acid, the amino acid such as cysteine form group in more than a kind.
The cleaning of the end face of glass substrate is preferably with the cleaning of physical cleaning.For the magnetic of peeling off from the end face of glass substrate is positively removed from end face, should use and contain or maintaining the cleaning means that contacts the end face of glass substrate under the state of chemical liquid and clean end face.For example, the sponge of preferred discotic or brush etc.
The glass substrate of manufacturing as using the present invention, is not limited to display applications, also can be applicable to the manufacture of other glass substrates.In addition, also can be applicable to coil into the glass substrate of the thin plate of roller shape.For the glass substrate that coils into roller shape, cut off the both sides of the glass plate of formed thereby, the section of these both sides is processed, and this section is processed, is cleaned.
On the way.The glass substrate for display of manufacturing as using the present invention, is not limited to drive the TFT panel glass substrate of use, such as also comprising: the glass substrate of colored filter use glass substrate or cover glass (cover glass) use etc.In addition, as display equipment, be not limited to liquid crystal display or OLED display, also can be other display applications.
[explanation of symbol]
G glass substrate
The glass plate of G1 band shape
L liquid
30 the 1st end face processing machines
31 the 1st grind and cut wheel
32 the 2nd grind and cut wheel
The end face of 33 glass substrate G
34 the 2nd end face processing machines
35 rotating shafts
36 swiveling wheels
36a, 36b magnetic force body
37 ground slurries that contain magnetic
40 lapping devices
60 the 1st end face cleaning devices
61 end face cleaning means
61a rotating shaft
61b support sector
61c cleans pad
62 carrying rollers
63,63a, 63b end face washer jet
64 the 2nd end face cleaning means
64a, 64b washer jet
65 cleaning rollers
70 the 2nd end face cleaning devices
80 surface cleaning apparatus
100 devices
180 lapping devices
182 swiveling wheels
184 supply units
185 magnetic force bodies
186 recoverers
187 ground slurries
200 fusing devices
300 clarifiers
400 carrier pipes
500 building mortions
611 cleaning rollers
700 liquid baths
800 card caskets
Claims (12)
1. the manufacture method of a glass substrate, it is the manufacture method having through the glass substrate of the handling part of attrition process, described handling part is contacted and is polished by the ground slurry with comprising magnetic, to supplying with cleaning fluid through the described handling part grinding, make the surperficial same polarity of described magnetic accompanying on the surface of described handling part and described handling part charged, and described handling part and described magnetic are repelled mutually, thereby described magnetic is moved in cleaning fluid.
2. a manufacture method for glass substrate, it comprises following operation:
Forming process, by melten glass formed glass sheets;
Cut off operation, described glass plate is cut off and formation glass substrate;
End face processing operation, the end face that contacts described glass substrate by the ground slurry that makes to comprise the magnetic being kept by magnetic force body carries out mirror ultrafinish; And
Matting, the iron that the acidic chemical liquid by pH value below 2 cleans by the described magnetic generation of the described end face of contact is particulate; And
The feature of described matting is to be atomic Fe by the described iron of formation
3+be reduced into Fe
2+ion, and by described Fe
2+the coordination more than bidentate of ion and form complex compound.
3. the manufacture method of glass substrate according to claim 2, wherein said acidic chemical liquid comprises chemical liquid of more than two kinds, and this chemical liquid contains the chemical liquid with chelating effect.
4. according to the manufacture method of the glass substrate described in claim 2 or 3, wherein said matting possesses to contact described end face and the cleaning means of end face described in physical cleaning.
5. the manufacture method of glass substrate according to claim 3, the wherein said chemical liquid with chelating effect have iron ion center from the hexa-coordinate of the regular octahedron of Fe on xyz direction of principal axis with 3
following distance has the molecular configuration of electron-donating group.
6. the manufacture method of glass substrate according to claim 3, the wherein said chemical liquid with chelating effect is to select free salicylic acid, phthalic acid, glyoxalic acid, oxalic acid, fumaric acid, maleic acid, malonic acid, butanedioic acid, gluconic acid, trans-aconitic acid, hydroxymalonic acid, lactic acid, pyruvic acid, citric acid, isocitric acid, glycolic, malic acid, tartaric acid, NTA, ethylenediamine tetra-acetic acid, Oxyethylethylenediaminetriacetic acid, diethylenetriamine pentaacetic acid, serine, aspartic acid, glutamic acid, and cysteine form group in more than a kind.
7. the manufacture method of glass substrate according to claim 6, the wherein said chemical liquid with chelating effect is to select the concentration in the group that free oxalic acid, tartaric acid and citric acid form to be adjusted to chemical liquid more than 0.5wt%.
8. the manufacture method of glass substrate according to claim 2, wherein in the rear operation of described matting, have the 1st and rinse operation and the 2nd flushing operation, in described the 1st flushing operation, being to use the chemical liquid of pH value below 3, is to use pH value to surpass 3 chemical liquid in described the 2nd flushing operation.
9. a manufacture method for glass substrate for display, it comprises following operation:
Forming process, by melten glass formed glass sheets;
Cut off operation, described glass plate is cut off and formation glass substrate;
End face processing operation, the end face that contacts described glass substrate by the ground slurry that makes to comprise the magnetic being kept by magnetic force body carries out mirror ultrafinish processing;
Matting, utilizes acidic chemical liquid to clean described end face; And
The feature of described end face processing operation is
Use abrasive wheel, described abrasive wheel possesses: have and the magnetic field forming portion of the 1st magnetic force body that rotating shaft together rotates and the 2nd magnetic force body and comprise magnetic abrasive grains and liquid and be formed on described the 1st magnetic force body and described the 2nd magnetic force body between the ground slurry that contains described magnetic that keeps of magnetic field
The ground slurry that makes to contain described magnetic under the state that described rotating shaft is rotated and the end contact of described glass substrate;
The feature of described matting is
In order to remove the iron that on the end face by described glass substrate, accompanying described magnetic abrasive grains produces in described end face processing operation, being particulate, and using the acidic chemical liquid of pH value below 1.6, is atomic Fe by the described iron of formation
3+be reduced into Fe
2+ion, makes described Fe
2+2 places of ion carry out coordination above and form complex compound.
10. the manufacture method of glass substrate for display according to claim 9, wherein
Described end face processing operation had before described mirror ultrafinish is processed grinds the grinding of end face of cutting described glass substrate and cuts processing,
Described grind the feature of cutting processing be have with utilize the 1st adhesive be fixed with the 1st of abrasive grains grind cut wheel grind cut described glass substrate end face the 1st grind cut process and
The described the 1st, grind to cut and with the 2nd adhesive that utilizes hardness and rigidity lower than described the 1st adhesive, be fixed with the 2nd of abrasive grains after processing and grind to cut to take turns and grind the 2nd the grinding and cut processing of end face of cutting described glass substrate,
The feature that described mirror ultrafinish is processed is that the concentration of the described magnetic abrasive grains in described ground slurry is 85～95wt%.
The manufacture method of 11. glass substrate for display according to claim 10, wherein said the 1st adhesive is metal-to-metal adhesive, described the 2nd adhesive is resin binder.
The manufacture method of 12. glass substrate for display according to claim 10, wherein
Described grinding, cut in processing, the end face of described glass substrate is ground to cut to the arithmetic average roughness Ra of JIS B0601-1994 defined to be become below 0.2 μ m,
In described mirror ultrafinish is processed, the end face of described glass substrate is milled to described arithmetic average roughness Ra and is less than 0.01 μ m.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013-065191 | 2013-03-26 | ||
| JP2013065191A JP5832468B2 (en) | 2013-03-26 | 2013-03-26 | Manufacturing method of glass substrate, manufacturing method of glass substrate for display, and cleaning method of end surface of glass substrate for display |
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|---|---|
| CN104070034A true CN104070034A (en) | 2014-10-01 |
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| Country | Link |
|---|---|
| JP (1) | JP5832468B2 (en) |
| CN (1) | CN104070034A (en) |
| TW (1) | TWI600478B (en) |
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| CN105457497A (en) * | 2015-11-29 | 2016-04-06 | 洛阳绿仁环保设备有限公司 | Ceramic membrane cleaning agent |
| CN106180110A (en) * | 2016-08-24 | 2016-12-07 | 赣州帝晶光电科技有限公司 | Liquid crystal glass base method for cleaning surface after a kind of grinding |
| CN109335581A (en) * | 2018-09-10 | 2019-02-15 | 彩虹（合肥）液晶玻璃有限公司 | A kind of feed belt method for cleaning |
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| CN107243783B (en) * | 2017-08-09 | 2018-08-28 | 睿力集成电路有限公司 | Chemical and mechanical grinding method, equipment and cleaning solution |
| JP7240931B2 (en) * | 2019-03-29 | 2023-03-16 | 株式会社荏原製作所 | Heat exchanger cleaning and polishing equipment |
| CN114367889B (en) * | 2021-12-31 | 2023-04-25 | 甘肃光轩高端装备产业有限公司 | Automatic deviation rectifying equipment and control method |
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2013
- 2013-03-26 JP JP2013065191A patent/JP5832468B2/en active Active
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105457497A (en) * | 2015-11-29 | 2016-04-06 | 洛阳绿仁环保设备有限公司 | Ceramic membrane cleaning agent |
| CN106180110A (en) * | 2016-08-24 | 2016-12-07 | 赣州帝晶光电科技有限公司 | Liquid crystal glass base method for cleaning surface after a kind of grinding |
| CN109335581A (en) * | 2018-09-10 | 2019-02-15 | 彩虹（合肥）液晶玻璃有限公司 | A kind of feed belt method for cleaning |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI600478B (en) | 2017-10-01 |
| JP2014188420A (en) | 2014-10-06 |
| JP5832468B2 (en) | 2015-12-16 |
| TW201438847A (en) | 2014-10-16 |
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