CN106180110A - Liquid crystal glass base method for cleaning surface after a kind of grinding - Google Patents
Liquid crystal glass base method for cleaning surface after a kind of grinding Download PDFInfo
- Publication number
- CN106180110A CN106180110A CN201610716299.XA CN201610716299A CN106180110A CN 106180110 A CN106180110 A CN 106180110A CN 201610716299 A CN201610716299 A CN 201610716299A CN 106180110 A CN106180110 A CN 106180110A
- Authority
- CN
- China
- Prior art keywords
- liquid crystal
- crystal glass
- glass base
- cleaning
- grinding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 58
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 52
- 238000004140 cleaning Methods 0.000 title claims abstract description 38
- 238000000034 method Methods 0.000 title claims abstract description 22
- 238000000227 grinding Methods 0.000 title claims abstract description 20
- 239000012530 fluid Substances 0.000 claims abstract description 22
- LTUDISCZKZHRMJ-UHFFFAOYSA-N potassium;hydrate Chemical compound O.[K] LTUDISCZKZHRMJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- 238000001035 drying Methods 0.000 claims abstract description 10
- 229910021642 ultra pure water Inorganic materials 0.000 claims abstract description 7
- 239000012498 ultrapure water Substances 0.000 claims abstract description 7
- 238000003756 stirring Methods 0.000 claims abstract description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 14
- 238000002360 preparation method Methods 0.000 claims description 8
- 239000007921 spray Substances 0.000 claims description 5
- 238000009991 scouring Methods 0.000 claims description 4
- 238000005406 washing Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 2
- 239000006210 lotion Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims 1
- 229910001948 sodium oxide Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 230000007812 deficiency Effects 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 239000000843 powder Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000005355 lead glass Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- YASYEJJMZJALEJ-UHFFFAOYSA-N Citric acid monohydrate Chemical compound O.OC(=O)CC(O)(C(O)=O)CC(O)=O YASYEJJMZJALEJ-UHFFFAOYSA-N 0.000 description 1
- 229960002303 citric acid monohydrate Drugs 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B08B1/143—
Landscapes
- Detergent Compositions (AREA)
- Surface Treatment Of Glass (AREA)
- Cleaning In General (AREA)
Abstract
The invention belongs to liquid crystal glass base thinning field, the present invention is directed to the deficiency of existing thinning Technology, provide liquid crystal glass base method for cleaning surface after a kind of grinding, its step includes: step one prepares cleanout fluid: prepared in dosing bucket with ultra-pure water by monohydrate potassium, stirring, until monohydrate potassium is completely dissolved, is configured to cleanout fluid；Step 2 liquid crystal glass base surface clean；Step 3 liquid crystal glass base skin drying；Beneficial effects of the present invention: liquid crystal glass base can be obviously improved and grind clean effect after rear surface is cleaned, no matter whether the grounds travel of liquid crystal glass base remained on surface is dried, all can be by the grounds travel cleaning of its remained on surface under the conditions of normal wash, substantially reduce operation easier, improve production efficiency and product yield.
Description
Technical field
The invention belongs to liquid crystal glass base thinning field, be specifically related to liquid crystal glass base surface clean after a kind of grinding
Method.
Background technology
The thinning of liquid crystal glass base mainly uses chemistry Milling Technique In The Microstructure Study, and its technique includes: chemistry thinning, clear after thinning
Washing, grind, manual cleaning after grinding, horizontal cleaning machine cleans.Along with the development of technology, super large ultra-thin liquid crystal panel thinning
Becoming main flow in industry, after grinding, the cleaning of liquid crystal glass base then becomes difficult point.Traditional cleans the liquid after thinning is ground
The method of crystal glass substrate, is that the liquid crystal glass base after grinding is placed directly on rinsing table use tap water cleaning.Mesh
Before, after grinding, the cleaning of liquid crystal glass base there is problems in that
(1) liquid crystal glass base after cleaning still has the dirty residuals such as grounds travel so that liquid crystal glass base
Surface cleanliness is the best, needs again to do over again, causes the waste of production cost.
(2) after partial liquid crystal glass substrate grinds, the time of staying is long, causes moisture evaporation in its surface grinding powder, and this does
After dry, residual grounds travel is less susceptible to clean.Under the conditions of conventional clean machine and cleanout fluid, it is impossible to the grinding that substrate surface is remained
Powder cleaning, still has the partial mill powder marking to remain, and causes follow-up plated film quality bad, because this grounds travel marking is wet
Under conditions of profit non-dust cloth wiping, it is impossible to be removed, it is necessary to struck off with blade, but the method can cause substrate surface
Secondary bad---scratch.
Summary of the invention
It is an object of the invention to the deficiency for existing thinning Technology, it is provided that a kind of clean thinning grind after liquid crystal
Glass substrate washing method, the method can cleaning solution crystal glass substrate surface the most easily dirty, substantially reduce liquid crystal
The grounds travel marking residual of glass substrate, reduces to grind and does over again, save production cost.
In order to achieve the above object, the present invention adopts the following technical scheme that
Liquid crystal glass base method for cleaning surface after a kind of grinding, its step is as follows:
Step one: preparation cleanout fluid: prepared in dosing bucket with ultra-pure water by monohydrate potassium, stirs until one
Citric acid monohydrate is completely dissolved, and is configured to cleanout fluid；The mass fraction 0.15%～0.5% of monohydrate potassium in cleanout fluid；
Step 2: liquid crystal glass base surface clean:
1. take in the tote cart of region to be cleaned liquid crystal glass base, be positioned on rinsing table.
2. dip the cleanout fluid prepared uniform scouring products surface with sponge block or use spray equipment to prepare
Cleanout fluid spray liquid crystal glass base surface the most to be cleaned uniformly, and use the sponge block after moistening to liquid crystal
Glass baseplate surface is completely cleaned；
Step 3: liquid crystal glass base skin drying: the liquid-crystalline glasses after qualified for cleaning is positioned over cleaning, drying immediately
Clean in all-in-one, after having cleaned, automatically dry；It is configured with sodium hydroxide clear in the dipper of cleaning drying integral machine
Lotion.
Preferably, in step 3, the concentration of sodium hydroxide abluent is 3%.
Preferably, the model of sodium hydroxide abluent is CZ-606 or CZ-601.
Preferably, the angle of inclination of rinsing table is 45 degree.
Preferably, sponge block is PVA material.
The invention has the beneficial effects as follows:
1. the present invention can be obviously improved liquid crystal glass base and grind clean effect after rear surface is cleaned, no matter liquid-crystalline glasses
Whether the grounds travel of substrate surface residual is dried, and all can clean clean by the grounds travel of its remained on surface under the conditions of normal wash
Only, hence it is evident that reduce operation easier, improve production efficiency and product yield.Under identical test condition, use institute of the present invention
The liquid crystal glass base that the liquid crystal glass base that method of stating is cleaned cleans than traditional pure water substantially reduces Check-Out Time, can reduce
The Check-Out Time of 20%～60%.
2. the present invention still has the liquid crystal glass base of residual grounds travel to grinding rear surface, and in residual grounds travel, moisture is waved
Dry dry liquid crystal glass base cleaning performance has clear improvement, and by the cleaning of this cleanout fluid, substrate surface is residual without grounds travel
Stay；
Method the most of the present invention, under the conditions of can be used for enterprise's existing equipment, is not required to additionally increase equipment, will not increase
The cost of enterprise, reduces the waste of resource；Environment will not be caused any pollution.
Accompanying drawing explanation
Fig. 1 is the process chart of the present invention.
Detailed description of the invention
The present invention is further illustrated with embodiment below in conjunction with the accompanying drawings.
Embodiment 1
A kind of method of liquid crystal glass base surface clean after grinding, its step is as follows:
Step one: preparation cleanout fluid: monohydrate potassium is entered in the dosing bucket of 70CM diameter 85CM with ultra-pure water
Row preparation, stirring is until monohydrate potassium is completely dissolved；In cleanout fluid, the mass fraction of monohydrate potassium is 0.15%,
The mass fraction of ultra-pure water is 99.85%；
Step 2: liquid crystal glass base surface clean:
1. take in the tote cart of region to be cleaned substrate, be positioned on the rinsing table that angle of inclination is 45 degree.
2. dip the cleanout fluid prepared uniform scouring products surface with PVA sponge block, and use the sponge block after moistening
Liquid crystal glass base surface is completely cleaned；
Step 3: liquid crystal glass base skin drying: the liquid-crystalline glasses after qualified for cleaning is positioned in cleaning machine immediately
Clean, in the dipper of cleaning machine, be configured with the sodium hydroxide abluent of the CZ-606 model that concentration is 3%；After cleaning completes,
Automatically dry.
Embodiment 2
A kind of method of liquid crystal glass base surface clean after grinding, its step is as follows:
Step one: preparation cleanout fluid: monohydrate potassium is entered in the dosing bucket of 70CM diameter 85CM with ultra-pure water
Row preparation, stirring is until monohydrate potassium is completely dissolved；In cleanout fluid, the mass fraction of monohydrate potassium is 0.3%, super
The mass fraction of pure water is 99.7%；
Step 2: liquid crystal glass base surface clean:
1. take in the tote cart of region to be cleaned substrate, be positioned on the rinsing table that angle of inclination is 45 degree.
2. use spray equipment that the cleanout fluid prepared is sprayed substrate surface the most to be cleaned uniformly, and make
With the sponge block after moistening, liquid crystal glass base surface is completely cleaned；
Step 3: liquid crystal glass base skin drying: the liquid-crystalline glasses after qualified for cleaning is positioned in cleaning machine immediately
Clean, in the dipper of cleaning machine, be configured with the sodium hydroxide abluent of the CZ-601 model that concentration is 3%；After cleaning completes,
Automatically dry.
Embodiment 3
A kind of method of liquid crystal glass base surface clean after grinding, its step is as follows:
Step one: preparation cleanout fluid: monohydrate potassium is entered in the dosing bucket of 70CM diameter 85CM with ultra-pure water
Row preparation, stirring is until monohydrate potassium is completely dissolved；In cleanout fluid, the mass fraction of monohydrate potassium is 0.5%, super
The mass fraction of pure water is 99.5%；
Step 2: liquid crystal glass base surface clean:
1. take in the tote cart of region to be cleaned substrate, be positioned on the rinsing table that angle of inclination is 45 degree.
2. dip the cleanout fluid prepared uniform scouring products surface with PVA sponge block, and use the sponge block after moistening
Liquid crystal glass base surface is completely cleaned；
Step 3: liquid crystal glass base skin drying: the liquid-crystalline glasses after qualified for cleaning is positioned in cleaning machine immediately
Clean, in the dipper of cleaning machine, be configured with the sodium hydroxide abluent of the CZ-601 model that concentration is 3%；After cleaning completes,
Automatically dry.
Embodiment described above only have expressed the preferred embodiment of the present invention, and it describes more concrete and detailed, but also
Therefore the restriction to the scope of the claims of the present invention can not be interpreted as.It should be pointed out that, for those of ordinary skill in the art
For, without departing from the inventive concept of the premise, it is also possible to making some deformation, improve and substitute, these broadly fall into this
Bright protection domain.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (5)
1. liquid crystal glass base method for cleaning surface after a grinding, it is characterised in that step is as follows:
Step one: preparation cleanout fluid: prepared in dosing bucket with ultra-pure water by monohydrate potassium, stirring is until one is hydrated
Citric acid is completely dissolved, and is configured to cleanout fluid；The mass fraction 0.15%～0.5% of monohydrate potassium in cleanout fluid；
Step 2: liquid crystal glass base surface clean:
1. take in the tote cart of region to be cleaned liquid crystal glass base, be positioned on rinsing table.
2. dip the cleanout fluid prepared uniform scouring products surface with sponge block or use spray equipment clear by prepare
Washing liquid sprays liquid crystal glass base surface the most to be cleaned uniformly, and uses the sponge block after moistening to liquid-crystalline glasses
Substrate surface is completely cleaned；
Step 3: liquid crystal glass base skin drying: the liquid-crystalline glasses after qualified for cleaning is positioned over cleaning, drying one immediately
Clean in machine, after having cleaned, carry out surface and automatically dry；It is configured with sodium hydroxide clear in the dipper of cleaning drying integral machine
Lotion.
Liquid crystal glass base method for cleaning surface after a kind of grinding the most according to claim 1, it is characterised in that step 3
In, the concentration of sodium hydroxide abluent is 3%.
Liquid crystal glass base method for cleaning surface after a kind of grinding the most according to claim 1 and 2, it is characterised in that hydrogen
The model of sodium oxide abluent is CZ-606 or CZ-601.
Liquid crystal glass base method for cleaning surface after a kind of grinding the most according to claim 1, it is characterised in that rinsing table
Angle of inclination be 45 degree.
Liquid crystal glass base method for cleaning surface after a kind of grinding the most according to claim 1, it is characterised in that sponge block
For PVA material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610716299.XA CN106180110A (en) | 2016-08-24 | 2016-08-24 | Liquid crystal glass base method for cleaning surface after a kind of grinding |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610716299.XA CN106180110A (en) | 2016-08-24 | 2016-08-24 | Liquid crystal glass base method for cleaning surface after a kind of grinding |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106180110A true CN106180110A (en) | 2016-12-07 |
Family
ID=57523977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610716299.XA Pending CN106180110A (en) | 2016-08-24 | 2016-08-24 | Liquid crystal glass base method for cleaning surface after a kind of grinding |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106180110A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107955744A (en) * | 2017-11-29 | 2018-04-24 | 惠州市清洋实业有限公司 | A kind of production method of cleaning solution before glass thinning |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000208466A (en) * | 1999-01-12 | 2000-07-28 | Dainippon Screen Mfg Co Ltd | Method and apparatus for treating substrate |
| CN1304439A (en) * | 1998-03-09 | 2001-07-18 | 莱姆研究公司 | Method and apparatus for cleaning semiconductor substrates after polishing of copper film |
| CN1429183A (en) * | 2000-05-19 | 2003-07-09 | 国际商业机器公司 | Lanthanide oxide dissolution from glass surface |
| CN101062503A (en) * | 2006-04-24 | 2007-10-31 | 联华电子股份有限公司 | Wafer cleaning method after chemical milling |
| CN103272796A (en) * | 2013-05-23 | 2013-09-04 | 浙江长兴众成电子有限公司 | Method for cleaning high-cleanliness monocrystal silicon grinding slice |
| CN104070034A (en) * | 2013-03-26 | 2014-10-01 | 安瀚视特控股株式会社 | Manufacturing method of glass substrate and manufacturing method of glass substrate used for display |
| CN105047538A (en) * | 2015-07-31 | 2015-11-11 | 江苏奥能光电科技有限公司 | Silicon wafer cleaning method and cleaning device |
-
2016
- 2016-08-24 CN CN201610716299.XA patent/CN106180110A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1304439A (en) * | 1998-03-09 | 2001-07-18 | 莱姆研究公司 | Method and apparatus for cleaning semiconductor substrates after polishing of copper film |
| JP2000208466A (en) * | 1999-01-12 | 2000-07-28 | Dainippon Screen Mfg Co Ltd | Method and apparatus for treating substrate |
| CN1429183A (en) * | 2000-05-19 | 2003-07-09 | 国际商业机器公司 | Lanthanide oxide dissolution from glass surface |
| CN101062503A (en) * | 2006-04-24 | 2007-10-31 | 联华电子股份有限公司 | Wafer cleaning method after chemical milling |
| CN104070034A (en) * | 2013-03-26 | 2014-10-01 | 安瀚视特控股株式会社 | Manufacturing method of glass substrate and manufacturing method of glass substrate used for display |
| CN103272796A (en) * | 2013-05-23 | 2013-09-04 | 浙江长兴众成电子有限公司 | Method for cleaning high-cleanliness monocrystal silicon grinding slice |
| CN105047538A (en) * | 2015-07-31 | 2015-11-11 | 江苏奥能光电科技有限公司 | Silicon wafer cleaning method and cleaning device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107955744A (en) * | 2017-11-29 | 2018-04-24 | 惠州市清洋实业有限公司 | A kind of production method of cleaning solution before glass thinning |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20161207 |
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| RJ01 | Rejection of invention patent application after publication |