CN105499228B - A kind of solar energy germanium wafer is packed for the cleaning method of wafer cassette - Google Patents
A kind of solar energy germanium wafer is packed for the cleaning method of wafer cassette Download PDFInfo
- Publication number
- CN105499228B CN105499228B CN201510828457.6A CN201510828457A CN105499228B CN 105499228 B CN105499228 B CN 105499228B CN 201510828457 A CN201510828457 A CN 201510828457A CN 105499228 B CN105499228 B CN 105499228B
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- CN
- China
- Prior art keywords
- wafer cassette
- deionized water
- wafer
- solar energy
- cleaning
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/0861—Cleaning crates, boxes or the like
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/02—Inorganic compounds ; Elemental compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The present invention discloses the cleaning method that a kind of solar energy germanium wafer is packed for wafer cassette, comprises the following steps：(1) used waste and old wafer cassette is arranged, wherein unbroken will arrange complete；(2) the waste and old wafer cassette to be cleaned put in order is put into the mixed solution of glacial acetic acid and deionized water composition, carries out pickling；(3) it will be cleaned in the mixed solution of being put into of the wafer cassette cerate after step (2) processing and deionized water composition, mixed solution temperature is 60~70 DEG C；(4) alcohol displacement is carried out under normal temperature state；(5) wafer cassette that cleaning is completed is dried.Using the waste and old wafer cassette after the cleaning method cleaning of the present invention, surface cleanliness can reuse close to new box, not interfere with the quality of solar energy germanium wafer, significantly reduce the production cost of product；Material glacial acetic acid of the present invention, change cerate, deionized water and alcohol are the conventional chemical article of low cost, reduce further production cost.
Description
Technical field
The present invention relates to solar energy germanium wafer manufacture field, and in particular to a kind of solar energy germanium wafer is packed for the cleaning of wafer cassette
Method.
Background technology
Because the wafer cassette for packing solar energy germanium wafer is directly contacted with solar energy germanium wafer surface, its cleanliness factor can be directly affected
Germanium wafer surface quality, in order to ensure the quality of germanium wafer, generally, wafer cassette can only be disposable, to ensure that it is clean.
In production process, stock or turnover need to use large number of wafer cassette, by some time overstock after, if can not be clear again
Utilization is washed, will carry out scrapping processing, large batch of waste and old wafer cassette is scrapped processing, although warehouse and workshop have been vacateed in cleaning
Space, but economic loss is direct, is not only the economic loss of waste and old wafer cassette, purchases new wafer cassette and is equally also required to pay
Go out a fund, virtually add the cost of product.But solar energy germanium wafer has not yet been viewed in the market and is packed for wafer
The cleaning method of box, and traditional cleaning method is difficult to ensure that the cleanliness factor of wafer cassette.
The content of the invention
Goal of the invention：Present invention aims in view of the shortcomings of the prior art there is provided a kind of cleaning method of wafer cassette, with
The packaging demand of solar energy germanium wafer is met, the buying of new box is reduced, product cost is reduced indirectly.
Technical scheme：Solar energy germanium wafer of the present invention is packed for the cleaning method of wafer cassette, comprises the following steps：
(1) used waste and old wafer cassette is arranged, wherein unbroken will arrange complete, it is standby, often cover to be cleaned give up
Old wafer cassette includes box body and lid；
(2) the waste and old wafer cassette to be cleaned put in order is put into the mixed solution of glacial acetic acid and deionized water composition,
Pickling is carried out, after the completion of pickling, enters water-filling using deionized water and replaces；
(3) it will clean, mix in the mixed solution of being put into of the wafer cassette cerate after step (2) processing and deionized water composition
It is 60~70 DEG C to close solution temperature, and deionized water is reused after cleaning and enters water-filling displacement；
(4) after the completion of the water displacement in step (3), then under normal temperature state alcohol displacement is carried out, alcohol concentration is
99.7%；
(5) wafer cassette that cleaning is completed is dried, qualified wafer cassette product is selected.
Further preferably technical scheme is that the waste and old wafer cassette cleaned every time is at least 200 sets to the present invention.
Preferably, the volume ratio in step (2) for glacial acetic acid and deionized water in the mixed solution of pickling is 1：10, its
Middle deionized water is at least 5L.
Preferably, the volume ratio of mixed solution internalization cerate and deionized water is 1 in step (3)：50, wherein deionized water
At least 5L.
Preferably, the deionized water that water replaces is used in step (2) or (3) and is at least 20L, often 50 sets of wafer cassettes are cleaned more
Change deionized water.
Preferably, the alcohol that alcohol displacement is used in step (4) is at least 5L, often cleans at least 400 sets wafer cassettes replacings
Alcohol.
Preferably, changing cerate described in step (3) includes organic solvent 5%~10%, and organic base 2%~5%, surface is lived
Property agent 5%~10%, inorganic salts 5%~20%, surplus is deionized water.
Beneficial effect：(1) using the waste and old wafer cassette after the cleaning method cleaning of the present invention, surface cleanliness is close to newly
Box, can be reused, and not interfere with the quality of solar energy germanium wafer, significantly reduce the production cost of product；The present invention
The material glacial acetic acid, change cerate, deionized water and the alcohol that are used are the conventional chemical article of low cost, be reduce further
Production cost；
(2) present invention uses the dilution glacial acetic acid of weak acid and the change cerate solution cleaning wafer box of weak base, and corrosivity is weak, clearly
Wash personnel's operation in the environment of low irritant smell, relatively safety；And entirely cleaning process is easy to operate, workload is small,
Clean personnel labor intensity low；
(3) wafer cassette after cleaning is finished in the present invention can be used as turnover box, not only reduce the accumulation in workshop,
Also improve the cleanliness factor and qualification rate of polished silicon wafer, it is to avoid secondary polishing of doing over again, reduce the usage amount of decoction and machine.
Embodiment
Be described in detail below by technical solution of the present invention, but protection scope of the present invention be not limited to it is described
Embodiment.
Embodiment 1：A kind of solar energy germanium wafer is packed for the cleaning method of wafer cassette, exemplified by cleaning 1000 sets of wafer cassettes,
Comprise the following steps：
(1) used waste and old wafer cassette is arranged, wherein unbroken will arrange complete, it is standby, often cover to be cleaned give up
Old wafer cassette includes box body and lid；
(2) it is 1 200 sets of waste and old wafer cassettes to be cleaned put in order to be put into volume ratio：10 glacial acetic acid and deionization
In the mixed solution of water, pickling is carried out, wherein deionized water is 5L, after the completion of pickling, enters water-filling using 20L deionized water and puts
Change, often clean 50 sets of wafer cassettes and change a deionized water；
(3) it is 1 the wafer cassette after step (2) processing to be put into volume ratio：50 change cerate and the mixing of deionized water are molten
In liquid clean, wherein change cerate include organic solvent 5%~10%, organic base 2%~5%, surfactant 5%~10%,
Inorganic salts 5%~20%, surplus is deionized water, for the chemism of guarantee cerate, and mixed solution temperature is 60~70
℃；Deionized water is 5L, enters water-filling using 20L deionized water and replaces, often cleans 50 sets of wafer cassettes and change a deionized water；
(4) after the completion of the water displacement in step (3), then the alcohol progress alcohol displacement under normal temperature state using 5L, wine
Smart concentration is 99.7%；
(5) wafer cassette that cleaning is completed is dried, qualified wafer cassette product is selected；
(6) repeat step (2)~(5), until the alcohol that 1000 sets of wafer cassettes are fully completed in cleaning, step (4) is every complete
Changed into cleaning twice.
1000 sets of wafer cassettes are cleaned in the present embodiment, are calculated with the unit price of each 18 yuan of wafer cassette, if any 20% cleaning
Wafer cassette afterwards can be used as new box, be altogether 3600 yuan of (1000*20%*18)；Cleaning cost is：5 portions of decoction (ice vinegar
Acid and change cerate) cost++ 2.5 parts of use water cost alcohol cost+electric cost, about 300 yuan, 3300 yuan are saved altogether.Thus
It can be seen that the tremendous economic advantage of the cleaning method of the present invention.
The experimental data contrast of wafer cassette after the cleaning method cleaning of the present invention is as follows：
| Piece model and piece number | The problem of wafer point | Turnover box is not cleaned | Cleaning finishes turnover box |
| 2 inches 10 | DT (dirty) | 4 | 0 |
| 4 inches 10 | P (dust) | 3 | 0 |
| 4 inches 10 | RB (scratch) | 1 | 0 |
As described above, although the present invention has been represented and described with reference to specific preferred embodiment, it must not be explained
For to the limitation of itself of the invention., can be right under the premise of the spirit and scope of the present invention that appended claims are defined are not departed from
Various changes can be made in the form and details for it.
Claims (6)
1. a kind of solar energy germanium wafer is packed for the cleaning method of wafer cassette, it is characterised in that comprise the following steps：
(1) used waste and old wafer cassette is arranged, wherein unbroken will arrange complete, it is standby, often cover waste and old crystalline substance to be cleaned
Circle box includes box body and lid；
(2) the waste and old wafer cassette to be cleaned put in order is put into the mixed solution of glacial acetic acid and deionized water composition, carried out
Pickling, after the completion of pickling, enters water-filling using deionized water and replaces；
(3) it will clean, mix molten in the mixed solution of being put into of the wafer cassette cerate after step (2) processing and deionized water composition
Liquid temperature degree is 60~70 DEG C, and deionized water is reused after cleaning and enters water-filling displacement；
(4) after the completion of the water displacement in step (3), then the progress alcohol displacement under normal temperature state, alcohol concentration is 99.7%；
(5) wafer cassette that cleaning is completed is dried, qualified wafer cassette product is selected.
2. solar energy germanium wafer according to claim 1 is packed for the cleaning method of wafer cassette, it is characterised in that cleaning every time
Waste and old wafer cassette be at least 200 sets.
3. solar energy germanium wafer according to claim 2 is packed for the cleaning method of wafer cassette, it is characterised in that step (2)
In be used for pickling mixed solution in glacial acetic acid and deionized water volume ratio be 1：10, wherein deionized water is at least 5L.
4. solar energy germanium wafer according to claim 3 is packed for the cleaning method of wafer cassette, it is characterised in that step (3)
The volume ratio of middle mixed solution internalization cerate and deionized water is 1：50, wherein deionized water is at least 5L.
5. the solar energy germanium wafer according to claim 2~4 any one is packed for the cleaning method of wafer cassette, its feature exists
In the alcohol for being used for alcohol displacement in step (4) is at least 5L, often cleans at least 400 sets wafer cassettes and changes alcohol.
6. solar energy germanium wafer according to claim 1 is packed for the cleaning method of wafer cassette, it is characterised in that step (3)
Described in change cerate include organic solvent 5%~10%, organic base 2%~5%, surfactant 5%~10%, inorganic salts
5%~20%, surplus is deionized water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510828457.6A CN105499228B (en) | 2015-11-25 | 2015-11-25 | A kind of solar energy germanium wafer is packed for the cleaning method of wafer cassette |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510828457.6A CN105499228B (en) | 2015-11-25 | 2015-11-25 | A kind of solar energy germanium wafer is packed for the cleaning method of wafer cassette |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105499228A CN105499228A (en) | 2016-04-20 |
| CN105499228B true CN105499228B (en) | 2017-08-25 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510828457.6A Active CN105499228B (en) | 2015-11-25 | 2015-11-25 | A kind of solar energy germanium wafer is packed for the cleaning method of wafer cassette |
Country Status (1)
| Country | Link |
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| CN (1) | CN105499228B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL275626B2 (en) * | 2018-01-05 | 2024-07-01 | Fujifilm Electronic Mat Usa Inc | Surface treatment compositions and methods |
| CN108389781A (en) * | 2018-03-05 | 2018-08-10 | 广东先导先进材料股份有限公司 | The method of clean and reuse wafer cassette or casey |
| CN109530374B (en) * | 2018-11-21 | 2021-07-27 | 上海超硅半导体有限公司 | Wafer box cleaning method |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010135525A (en) * | 2008-12-04 | 2010-06-17 | Siltronic Ag | Method of cleaning semiconductor wafer |
| CN101942365A (en) * | 2010-03-10 | 2011-01-12 | 宁波太阳能电源有限公司 | Silicon wafer cleaning solution and method for cleaning silicon wafers using same |
| CN101979160B (en) * | 2010-05-21 | 2014-05-14 | 北京天科合达蓝光半导体有限公司 | Method for cleaning pollutants on surface of silicon carbide wafer |
| US8883701B2 (en) * | 2010-07-09 | 2014-11-11 | Air Products And Chemicals, Inc. | Method for wafer dicing and composition useful thereof |
| CN102658270B (en) * | 2012-05-09 | 2016-05-11 | 上海华虹宏力半导体制造有限公司 | A kind of wafer cassette cleaning device and cleaning method thereof |
| CN102994283B (en) * | 2012-10-17 | 2014-07-09 | 张志明 | Wax removal cleaning method |
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| CN105499228A (en) | 2016-04-20 |
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Effective date of registration: 20211201 Address after: 211299 No. 9, Zhongxing East Road, Lishui District, Nanjing City, Jiangsu Province Patentee after: CHINA GERMANIUM Co.,Ltd. Address before: 211299 No.9, Zhongxing East Road, Lishui Development Zone, Nanjing City, Jiangsu Province Patentee before: CHINA GERMANIUM Co.,Ltd. Patentee before: Nanjing Zhongge Technology Co., Ltd |