CN102994283B - Wax removal cleaning method - Google Patents

Wax removal cleaning method Download PDF

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CN102994283B
CN102994283B CN201210395298.1A CN201210395298A CN102994283B CN 102994283 B CN102994283 B CN 102994283B CN 201210395298 A CN201210395298 A CN 201210395298A CN 102994283 B CN102994283 B CN 102994283B
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clean
out system
weight percent
deionized water
cloth
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CN201210395298.1A
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CN102994283A (en
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张志明
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Abstract

The invention relates to a wax removal cleaning method, comprising the following steps of: (1) using a cleaning agent which is composed of the following constituents in percentage by weight: 7.6-10.3% of octaphenyl polyoxyethyiene, 3.5-6.7% of salicylic acid, 1.5-5.2% of acetamide, 2.6-7.8% of 2-hydroxyphosphonoacetic acid, 4.1-8.3% of sodium silicate, 3.7-5.8% of sodium gluconate, 5.1-9.2% of alcohol, 1.3-4.0% of isopropanol, 5.5-9.8% of trichloro ethylene, and the balance of deionized water; and (2) soaking a cloth for cleaning in the cleaning agent at first, and then wiping the surface of an object with the cloth until waxiness on the surface of the object is removed. Via the wax removal cleaning method disclosed by the invention, waxy dirt on the surface of the object can be rapidly removed; and moreover, the surface of the object cannot be corroded, and the cleaned object can be clean as new.

Description

Paraffin removal purging method
Technical field
The present invention relates to a kind of paraffin removal purging method, belong to industrial cleaning technique field.
Background technology
According to the applicant understood, in prior art, there is no paraffin removal clean-out system targetedly, be difficult to the wax dirt of body surface thoroughly to clean up.Need a kind of efficient cleaner with strong points badly.
Summary of the invention
Technical problem to be solved by this invention is: overcomes the problem that prior art exists, a kind of paraffin removal purging method is provided, can remove fast the wax dirt of body surface, and can erosion surface, can make the object after cleaning clean as new.
The technical scheme that the present invention solves its technical problem is as follows:
A kind of paraffin removal clean-out system, is characterized in that, is made up of the component of following weight percent:
The preparation method of above-mentioned clean-out system, comprises the following steps:
(1) in stirrer, add by weight percentage successively 7.6-10.3% polyoxyethylene octylphenol ether, 3.5-6.7% Whitfield's ointment, 1.5-5.2% ethanamide, 2.6-7.8%2-HPAA, 4.1-8.3% water glass, 3.7-5.8% Sunmorl N 60S, 5.1-9.2% ethanol, 1.3-4.0% Virahol, 5.5-9.8% trieline; Finally adding deionized water to make total weight percent is 100%;
(2) the clean-out system finished product that stirs to obtain.
The purging method that adopts above-mentioned clean-out system, comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 7.6-10.3% polyoxyethylene octylphenol ether, 3.5-6.7% Whitfield's ointment, 1.5-5.2% ethanamide, 2.6-7.8%2-HPAA, 4.1-8.3% water glass, 3.7-5.8% Sunmorl N 60S, 5.1-9.2% ethanol, 1.3-4.0% Virahol, 5.5-9.8% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
The present patent application people is through repeatedly, in depth experimental study just draws and adopts the clean-out system of above-mentioned formula, this clean-out system can be removed the wax dirt of body surface fast, and can not corrode object, can make the object after cleaning clean as new, cleaning efficiency is greater than 99%, is the crystallization that the present patent application people pays a large amount of painstaking effort.
Embodiment
Below in conjunction with embodiment, the present invention is described in further detail.But the invention is not restricted to given example.
Embodiment 1
The present embodiment paraffin removal clean-out system is made up of the component of following weight percent:
Figure BDA00002264448800021
The present embodiment clean-out system is preparation method comprise the following steps:
(1) in stirrer, add by weight percentage successively 7.6% polyoxyethylene octylphenol ether, 3.5% Whitfield's ointment, 1.5% ethanamide, 2.6%2-HPAA, 4.1% water glass, 3.7% Sunmorl N 60S, 5.1% ethanol, 1.3% Virahol, 5.5% trieline; Finally adding deionized water to make total weight percent is 100%;
(2) the clean-out system finished product that stirs to obtain.
The present embodiment purging method comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 7.6% polyoxyethylene octylphenol ether, 3.5% Whitfield's ointment, 1.5% ethanamide, 2.6%2-HPAA, 4.1% water glass, 3.7% Sunmorl N 60S, 5.1% ethanol, 1.3% Virahol, 5.5% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
Object after cleaning is clean as new, and cleaning efficiency is greater than 99%.
Embodiment 2
The present embodiment paraffin removal clean-out system is made up of the component of following weight percent:
Figure BDA00002264448800031
The present embodiment clean-out system is preparation method comprise the following steps:
(1) in stirrer, add by weight percentage successively 10.3% polyoxyethylene octylphenol ether, 6.7% Whitfield's ointment, 5.2% ethanamide, 7.8%2-HPAA, 8.3% water glass, 5.8% Sunmorl N 60S, 9.2% ethanol, 4.0% Virahol, 9.8% trieline; Finally adding deionized water to make total weight percent is 100%;
(2) the clean-out system finished product that stirs to obtain.
The present embodiment purging method comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 10.3% polyoxyethylene octylphenol ether, 6.7% Whitfield's ointment, 5.2% ethanamide, 7.8%2-HPAA, 8.3% water glass, 5.8% Sunmorl N 60S, 9.2% ethanol, 4.0% Virahol, 9.8% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
Object after cleaning is clean as new, and cleaning efficiency is greater than 99%.
Embodiment 3
The present embodiment paraffin removal clean-out system is made up of the component of following weight percent:
Figure BDA00002264448800041
The present embodiment clean-out system is preparation method comprise the following steps:
(1) in stirrer, add by weight percentage successively 8.4% polyoxyethylene octylphenol ether, 5.1% Whitfield's ointment, 2.7% ethanamide, 4.3%2-HPAA, 5.8% water glass, 4.3% Sunmorl N 60S, 6.7% ethanol, 2.7% Virahol, 8.4% trieline; Finally adding deionized water to make total weight percent is 100%;
(2) the clean-out system finished product that stirs to obtain.
The present embodiment purging method comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 8.4% polyoxyethylene octylphenol ether, 5.1% Whitfield's ointment, 2.7% ethanamide, 4.3%2-HPAA, 5.8% water glass, 4.3% Sunmorl N 60S, 6.7% ethanol, 2.7% Virahol, 8.4% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
Object after cleaning is clean as new, and cleaning efficiency is greater than 99%.
Embodiment 4
The present embodiment paraffin removal clean-out system is made up of the component of following weight percent:
Figure BDA00002264448800051
The present embodiment clean-out system is preparation method comprise the following steps:
(1) in stirrer, add by weight percentage successively 9.8% polyoxyethylene octylphenol ether, 4.2% Whitfield's ointment, 3.9% ethanamide, 6.2%2-HPAA, 7.1% water glass, 5.4% Sunmorl N 60S, 8.4% ethanol, 3.6% Virahol, 6.9% trieline; Finally adding deionized water to make total weight percent is 100%;
(2) the clean-out system finished product that stirs to obtain.
The present embodiment purging method comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 9.8% polyoxyethylene octylphenol ether, 4.2% Whitfield's ointment, 3.9% ethanamide, 6.2%2-HPAA, 7.1% water glass, 5.4% Sunmorl N 60S, 8.4% ethanol, 3.6% Virahol, 6.9% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
Object after cleaning is clean as new, and cleaning efficiency is greater than 99%.

Claims (3)

1. a paraffin removal purging method, is characterized in that, comprises the following steps:
(1) adopt the clean-out system being formed by following weight percent component: 7.6-10.3% polyoxyethylene octylphenol ether, 3.5-6.7% Whitfield's ointment, 1.5-5.2% ethanamide, 2.6-7.8%2-HPAA, 4.1-8.3% water glass, 3.7-5.8% Sunmorl N 60S, 5.1-9.2% ethanol, 1.3-4.0% Virahol, 5.5-9.8% trieline, surplus are deionized water;
(2) first the cloth that cleans use is immersed in clean-out system, then use this cloth cleaning piece surface, until body surface wax is removed totally.
2. paraffin removal purging method according to claim 1; it is characterized in that; in step (1), adopt the clean-out system being formed by following weight percent component: 8.4% polyoxyethylene octylphenol ether, 5.1% Whitfield's ointment, 2.7% ethanamide, 4.3%2-HPAA, 5.8% water glass, 4.3% Sunmorl N 60S, 6.7% ethanol, 2.7% Virahol, 8.4% trieline, surplus are deionized water.
3. paraffin removal purging method according to claim 1; it is characterized in that; in step (1), adopt the clean-out system being formed by following weight percent component: 9.8% polyoxyethylene octylphenol ether, 4.2% Whitfield's ointment, 3.9% ethanamide, 6.2%2-HPAA, 7.1% water glass, 5.4% Sunmorl N 60S, 8.4% ethanol, 3.6% Virahol, 6.9% trieline, surplus are deionized water.
CN201210395298.1A 2012-10-17 2012-10-17 Wax removal cleaning method Expired - Fee Related CN102994283B (en)

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104531380B (en) * 2014-12-09 2017-10-20 侯琳 A kind of preparation method of paraffin removal cleaning agent for oil pumping in oil fields pipeline
CN105499228B (en) * 2015-11-25 2017-08-25 中锗科技有限公司 A kind of solar energy germanium wafer is packed for the cleaning method of wafer cassette
CN105381984B (en) * 2015-12-11 2018-02-02 华南协同创新研究院 A kind of method for removing 3D printing wax pattern backing material
CN109979799A (en) * 2017-12-27 2019-07-05 东莞新科技术研究开发有限公司 The Degumming method of semiconductor wafer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1193897A (en) * 1995-06-27 1998-09-23 普罗格特-甘布尔公司 Cleaning/sanitizing methods, compositions and/or products for articles
CN101974377A (en) * 2010-11-10 2011-02-16 南通海迅天恒纳米科技有限公司 LED gallium arsenide substrate dewaxing cleaning agent
CN102373129A (en) * 2010-08-12 2012-03-14 郑绪成 Automobile waterless dry-cleaning cosmetic

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1193897A (en) * 1995-06-27 1998-09-23 普罗格特-甘布尔公司 Cleaning/sanitizing methods, compositions and/or products for articles
CN102373129A (en) * 2010-08-12 2012-03-14 郑绪成 Automobile waterless dry-cleaning cosmetic
CN101974377A (en) * 2010-11-10 2011-02-16 南通海迅天恒纳米科技有限公司 LED gallium arsenide substrate dewaxing cleaning agent

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