CN102994283A - Wax removal cleaning method - Google Patents
Wax removal cleaning method Download PDFInfo
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- CN102994283A CN102994283A CN2012103952981A CN201210395298A CN102994283A CN 102994283 A CN102994283 A CN 102994283A CN 2012103952981 A CN2012103952981 A CN 2012103952981A CN 201210395298 A CN201210395298 A CN 201210395298A CN 102994283 A CN102994283 A CN 102994283A
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Abstract
The invention relates to a wax removal cleaning method, comprising the following steps of: (1) using a cleaning agent which is composed of the following constituents in percentage by weight: 7.6-10.3% of octaphenyl polyoxyethyiene, 3.5-6.7% of salicylic acid, 1.5-5.2% of acetamide, 2.6-7.8% of 2-hydroxyphosphonoacetic acid, 4.1-8.3% of sodium silicate, 3.7-5.8% of sodium gluconate, 5.1-9.2% of alcohol, 1.3-4.0% of isopropanol, 5.5-9.8% of trichloro ethylene, and the balance of deionized water; and (2) soaking a cloth for cleaning in the cleaning agent at first, and then wiping the surface of an object with the cloth until waxiness on the surface of the object is removed. Via the wax removal cleaning method disclosed by the invention, waxy dirt on the surface of the object can be rapidly removed; and moreover, the surface of the object cannot be corroded, and the cleaned object can be clean as new.
Description
Technical field
The present invention relates to a kind of paraffin removal purging method, belong to industrial cleaning technique field.
Background technology
Understand according to the applicant, there is no targetedly paraffin removal clean-out system in the prior art, be difficult to the wax dirt of body surface is thoroughly cleaned up.Need a kind of efficient cleaner with strong points badly.
Summary of the invention
Technical problem to be solved by this invention is: overcome the problem that prior art exists, a kind of paraffin removal purging method is provided, can remove fast the wax dirt of body surface, and can the erosion surface, can make the object after the cleaning clean as new.
The technical scheme that the present invention solves its technical problem is as follows:
A kind of paraffin removal clean-out system is characterized in that, is comprised of the component of following weight percent:
The preparation method of above-mentioned clean-out system may further comprise the steps:
(1) in stirrer, adds by weight percentage successively 7.6-10.3% polyoxyethylene octylphenol ether, 3.5-6.7% Whitfield's ointment, 1.5-5.2% ethanamide, 2.6-7.8%2-HPAA, 4.1-8.3% water glass, 3.7-5.8% Sunmorl N 60S, 5.1-9.2% ethanol, 1.3-4.0% Virahol, 5.5-9.8% trieline; Adding at last deionized water, to make total weight percent be 100%;
(2) the clean-out system finished product that stirs to get.
Adopt the purging method of above-mentioned clean-out system, may further comprise the steps:
(1) adopt the clean-out system that is comprised of following weight percent component: 7.6-10.3% polyoxyethylene octylphenol ether, 3.5-6.7% Whitfield's ointment, 1.5-5.2% ethanamide, 2.6-7.8%2-HPAA, 4.1-8.3% water glass, 3.7-5.8% Sunmorl N 60S, 5.1-9.2% ethanol, 1.3-4.0% Virahol, 5.5-9.8% trieline, surplus are deionized water;
(2) will clean first in the cloth immersion clean-out system of usefulness, use again this cloth cleaning piece surface, until the body surface wax is removed totally.
The present patent application people is through repeatedly, in depth experimental study just draws the clean-out system that adopts above-mentioned prescription, this clean-out system can be removed the wax dirt of body surface fast, and can not corrode object, can make the object after the cleaning clean as new, cleaning efficiency is the crystallization that the present patent application people pays a large amount of painstaking effort greater than 99%.
Embodiment
Below in conjunction with embodiment the present invention is described in further detail.But the invention is not restricted to given example.
Embodiment 1
Present embodiment paraffin removal clean-out system is comprised of the component of following weight percent:
The present embodiment clean-out system is the preparation method may further comprise the steps:
(1) in stirrer, adds by weight percentage successively 7.6% polyoxyethylene octylphenol ether, 3.5% Whitfield's ointment, 1.5% ethanamide, 2.6%2-HPAA, 4.1% water glass, 3.7% Sunmorl N 60S, 5.1% ethanol, 1.3% Virahol, 5.5% trieline; Adding at last deionized water, to make total weight percent be 100%;
(2) the clean-out system finished product that stirs to get.
The present embodiment purging method may further comprise the steps:
(1) adopt the clean-out system that is comprised of following weight percent component: 7.6% polyoxyethylene octylphenol ether, 3.5% Whitfield's ointment, 1.5% ethanamide, 2.6%2-HPAA, 4.1% water glass, 3.7% Sunmorl N 60S, 5.1% ethanol, 1.3% Virahol, 5.5% trieline, surplus are deionized water;
(2) will clean first in the cloth immersion clean-out system of usefulness, use again this cloth cleaning piece surface, until the body surface wax is removed totally.
Object after the cleaning is clean as new, and cleaning efficiency is greater than 99%.
Embodiment 2
Present embodiment paraffin removal clean-out system is comprised of the component of following weight percent:
The present embodiment clean-out system is the preparation method may further comprise the steps:
(1) in stirrer, adds by weight percentage successively 10.3% polyoxyethylene octylphenol ether, 6.7% Whitfield's ointment, 5.2% ethanamide, 7.8%2-HPAA, 8.3% water glass, 5.8% Sunmorl N 60S, 9.2% ethanol, 4.0% Virahol, 9.8% trieline; Adding at last deionized water, to make total weight percent be 100%;
(2) the clean-out system finished product that stirs to get.
The present embodiment purging method may further comprise the steps:
(1) adopt the clean-out system that is comprised of following weight percent component: 10.3% polyoxyethylene octylphenol ether, 6.7% Whitfield's ointment, 5.2% ethanamide, 7.8%2-HPAA, 8.3% water glass, 5.8% Sunmorl N 60S, 9.2% ethanol, 4.0% Virahol, 9.8% trieline, surplus are deionized water;
(2) will clean first in the cloth immersion clean-out system of usefulness, use again this cloth cleaning piece surface, until the body surface wax is removed totally.
Object after the cleaning is clean as new, and cleaning efficiency is greater than 99%.
Embodiment 3
Present embodiment paraffin removal clean-out system is comprised of the component of following weight percent:
The present embodiment clean-out system is the preparation method may further comprise the steps:
(1) in stirrer, adds by weight percentage successively 8.4% polyoxyethylene octylphenol ether, 5.1% Whitfield's ointment, 2.7% ethanamide, 4.3%2-HPAA, 5.8% water glass, 4.3% Sunmorl N 60S, 6.7% ethanol, 2.7% Virahol, 8.4% trieline; Adding at last deionized water, to make total weight percent be 100%;
(2) the clean-out system finished product that stirs to get.
The present embodiment purging method may further comprise the steps:
(1) adopt the clean-out system that is comprised of following weight percent component: 8.4% polyoxyethylene octylphenol ether, 5.1% Whitfield's ointment, 2.7% ethanamide, 4.3%2-HPAA, 5.8% water glass, 4.3% Sunmorl N 60S, 6.7% ethanol, 2.7% Virahol, 8.4% trieline, surplus are deionized water;
(2) will clean first in the cloth immersion clean-out system of usefulness, use again this cloth cleaning piece surface, until the body surface wax is removed totally.
Object after the cleaning is clean as new, and cleaning efficiency is greater than 99%.
Embodiment 4
Present embodiment paraffin removal clean-out system is comprised of the component of following weight percent:
The present embodiment clean-out system is the preparation method may further comprise the steps:
(1) in stirrer, adds by weight percentage successively 9.8% polyoxyethylene octylphenol ether, 4.2% Whitfield's ointment, 3.9% ethanamide, 6.2%2-HPAA, 7.1% water glass, 5.4% Sunmorl N 60S, 8.4% ethanol, 3.6% Virahol, 6.9% trieline; Adding at last deionized water, to make total weight percent be 100%;
(2) the clean-out system finished product that stirs to get.
The present embodiment purging method may further comprise the steps:
(1) adopt the clean-out system that is comprised of following weight percent component: 9.8% polyoxyethylene octylphenol ether, 4.2% Whitfield's ointment, 3.9% ethanamide, 6.2%2-HPAA, 7.1% water glass, 5.4% Sunmorl N 60S, 8.4% ethanol, 3.6% Virahol, 6.9% trieline, surplus are deionized water;
(2) will clean first in the cloth immersion clean-out system of usefulness, use again this cloth cleaning piece surface, until the body surface wax is removed totally.
Object after the cleaning is clean as new, and cleaning efficiency is greater than 99%.
Claims (3)
1. a paraffin removal purging method is characterized in that, may further comprise the steps:
(1) adopt the clean-out system that is comprised of following weight percent component: 7.6-10.3% polyoxyethylene octylphenol ether, 3.5-6.7% Whitfield's ointment, 1.5-5.2% ethanamide, 2.6-7.8%2-HPAA, 4.1-8.3% water glass, 3.7-5.8% Sunmorl N 60S, 5.1-9.2% ethanol, 1.3-4.0% Virahol, 5.5-9.8% trieline, surplus are deionized water;
(2) will clean first in the cloth immersion clean-out system of usefulness, use again this cloth cleaning piece surface, until the body surface wax is removed totally.
2. described paraffin removal purging method according to claim 1; it is characterized in that; in the step (1), adopt the clean-out system that is comprised of following weight percent component: 8.4% polyoxyethylene octylphenol ether, 5.1% Whitfield's ointment, 2.7% ethanamide, 4.3%2-HPAA, 5.8% water glass, 4.3% Sunmorl N 60S, 6.7% ethanol, 2.7% Virahol, 8.4% trieline, surplus are deionized water.
3. described paraffin removal purging method according to claim 1; it is characterized in that; in the step (1), adopt the clean-out system that is comprised of following weight percent component: 9.8% polyoxyethylene octylphenol ether, 4.2% Whitfield's ointment, 3.9% ethanamide, 6.2%2-HPAA, 7.1% water glass, 5.4% Sunmorl N 60S, 8.4% ethanol, 3.6% Virahol, 6.9% trieline, surplus are deionized water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210395298.1A CN102994283B (en) | 2012-10-17 | 2012-10-17 | Wax removal cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210395298.1A CN102994283B (en) | 2012-10-17 | 2012-10-17 | Wax removal cleaning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102994283A true CN102994283A (en) | 2013-03-27 |
| CN102994283B CN102994283B (en) | 2014-07-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210395298.1A Expired - Fee Related CN102994283B (en) | 2012-10-17 | 2012-10-17 | Wax removal cleaning method |
Country Status (1)
| Country | Link |
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| CN (1) | CN102994283B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104531380A (en) * | 2014-12-09 | 2015-04-22 | 孟红琳 | Preparation method of wax removing cleaning agent for oil field oil pumping pipeline |
| CN105381984A (en) * | 2015-12-11 | 2016-03-09 | 华南协同创新研究院 | Method for eliminating 3D printing wax type supporting material |
| CN105499228A (en) * | 2015-11-25 | 2016-04-20 | 中锗科技有限公司 | Cleaning method for wafer cassettes for solar germanium sheet packaging |
| CN109979799A (en) * | 2017-12-27 | 2019-07-05 | 东莞新科技术研究开发有限公司 | The Degumming method of semiconductor wafer |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1193897A (en) * | 1995-06-27 | 1998-09-23 | 普罗格特-甘布尔公司 | Cleaning/sanitizing methods, compositions and/or products for articles |
| CN101974377A (en) * | 2010-11-10 | 2011-02-16 | 南通海迅天恒纳米科技有限公司 | LED gallium arsenide substrate dewaxing cleaning agent |
| CN102373129A (en) * | 2010-08-12 | 2012-03-14 | 郑绪成 | Automobile waterless dry-cleaning cosmetic |
-
2012
- 2012-10-17 CN CN201210395298.1A patent/CN102994283B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1193897A (en) * | 1995-06-27 | 1998-09-23 | 普罗格特-甘布尔公司 | Cleaning/sanitizing methods, compositions and/or products for articles |
| CN102373129A (en) * | 2010-08-12 | 2012-03-14 | 郑绪成 | Automobile waterless dry-cleaning cosmetic |
| CN101974377A (en) * | 2010-11-10 | 2011-02-16 | 南通海迅天恒纳米科技有限公司 | LED gallium arsenide substrate dewaxing cleaning agent |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104531380A (en) * | 2014-12-09 | 2015-04-22 | 孟红琳 | Preparation method of wax removing cleaning agent for oil field oil pumping pipeline |
| CN104531380B (en) * | 2014-12-09 | 2017-10-20 | 侯琳 | A kind of preparation method of paraffin removal cleaning agent for oil pumping in oil fields pipeline |
| CN105499228A (en) * | 2015-11-25 | 2016-04-20 | 中锗科技有限公司 | Cleaning method for wafer cassettes for solar germanium sheet packaging |
| CN105381984A (en) * | 2015-12-11 | 2016-03-09 | 华南协同创新研究院 | Method for eliminating 3D printing wax type supporting material |
| CN105381984B (en) * | 2015-12-11 | 2018-02-02 | 华南协同创新研究院 | A kind of method for removing 3D printing wax pattern backing material |
| CN109979799A (en) * | 2017-12-27 | 2019-07-05 | 东莞新科技术研究开发有限公司 | The Degumming method of semiconductor wafer |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102994283B (en) | 2014-07-09 |
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