CN103819378A - 光酸发生剂及含有它的抗蚀剂组合物 - Google Patents

光酸发生剂及含有它的抗蚀剂组合物 Download PDF

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Publication number
CN103819378A
CN103819378A CN201310573166.8A CN201310573166A CN103819378A CN 103819378 A CN103819378 A CN 103819378A CN 201310573166 A CN201310573166 A CN 201310573166A CN 103819378 A CN103819378 A CN 103819378A
Authority
CN
China
Prior art keywords
group
carbonatoms
chemical formula
alkyl
independent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201310573166.8A
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English (en)
Chinese (zh)
Inventor
朱炫相
金三珉
安浩益
申珍奉
成耆珠
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kumho Petrochemical Co Ltd
Original Assignee
Korea Kumho Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Kumho Petrochemical Co Ltd filed Critical Korea Kumho Petrochemical Co Ltd
Publication of CN103819378A publication Critical patent/CN103819378A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts
    • G03F7/063—Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids
    • G03F7/066—Organic derivatives of bivalent sulfur, e.g. onium derivatives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CN201310573166.8A 2012-11-19 2013-11-15 光酸发生剂及含有它的抗蚀剂组合物 Pending CN103819378A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20120130783A KR101507827B1 (ko) 2012-11-19 2012-11-19 광산발생제 및 이를 포함하는 레지스트 조성물
KR10-2012-0130783 2012-11-19

Publications (1)

Publication Number Publication Date
CN103819378A true CN103819378A (zh) 2014-05-28

Family

ID=50754715

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201310573166.8A Pending CN103819378A (zh) 2012-11-19 2013-11-15 光酸发生剂及含有它的抗蚀剂组合物

Country Status (3)

Country Link
KR (1) KR101507827B1 (ko)
CN (1) CN103819378A (ko)
TW (1) TWI519513B (ko)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1199603A1 (en) * 2000-10-20 2002-04-24 Fuji Photo Film Co., Ltd. Positive photosensitive composition
CN101585794A (zh) * 2008-05-21 2009-11-25 锦湖石油化学株式会社 用于化学放大型抗蚀剂组合物的酸生成剂
CN101987880A (zh) * 2009-08-04 2011-03-23 锦湖石油化学株式会社 新型共聚物和含有该共聚物的光刻胶组合物
US20110076615A1 (en) * 2009-09-30 2011-03-31 Fujifilm Corporation Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
CN102030643A (zh) * 2009-10-06 2011-04-27 韩国锦湖石油化学株式会社 丙烯酸单体、聚合物和化学增幅型光致抗蚀剂组合物
JP2012073401A (ja) * 2010-09-28 2012-04-12 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、並びに、これを用いたレジスト膜及びパターン形成方法、
CN102781911A (zh) * 2010-02-24 2012-11-14 巴斯夫欧洲公司 潜酸及其用途

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1780198B1 (en) * 2005-10-31 2011-10-05 Shin-Etsu Chemical Co., Ltd. Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
KR20100031714A (ko) * 2010-03-05 2010-03-24 금호석유화학 주식회사 화학증폭형 레지스트 조성물용 산발생제
KR20110131904A (ko) * 2010-06-01 2011-12-07 금호석유화학 주식회사 광산발생제, 이의 제조방법 및 이를 포함하는 레지스트 조성물

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1199603A1 (en) * 2000-10-20 2002-04-24 Fuji Photo Film Co., Ltd. Positive photosensitive composition
CN101585794A (zh) * 2008-05-21 2009-11-25 锦湖石油化学株式会社 用于化学放大型抗蚀剂组合物的酸生成剂
CN101987880A (zh) * 2009-08-04 2011-03-23 锦湖石油化学株式会社 新型共聚物和含有该共聚物的光刻胶组合物
US20110076615A1 (en) * 2009-09-30 2011-03-31 Fujifilm Corporation Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
CN102030643A (zh) * 2009-10-06 2011-04-27 韩国锦湖石油化学株式会社 丙烯酸单体、聚合物和化学增幅型光致抗蚀剂组合物
CN102781911A (zh) * 2010-02-24 2012-11-14 巴斯夫欧洲公司 潜酸及其用途
JP2012073401A (ja) * 2010-09-28 2012-04-12 Fujifilm Corp 感活性光線性又は感放射線性樹脂組成物、並びに、これを用いたレジスト膜及びパターン形成方法、

Also Published As

Publication number Publication date
KR20140063985A (ko) 2014-05-28
TWI519513B (zh) 2016-02-01
KR101507827B1 (ko) 2015-04-06
TW201420555A (zh) 2014-06-01

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Application publication date: 20140528