CN103608966B - 无针孔介电薄膜制造 - Google Patents

无针孔介电薄膜制造 Download PDF

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Publication number
CN103608966B
CN103608966B CN201280029540.1A CN201280029540A CN103608966B CN 103608966 B CN103608966 B CN 103608966B CN 201280029540 A CN201280029540 A CN 201280029540A CN 103608966 B CN103608966 B CN 103608966B
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China
Prior art keywords
dielectric material
layer
depositing
substrate
dielectric
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Expired - Fee Related
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CN201280029540.1A
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English (en)
Chinese (zh)
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CN103608966A (zh
Inventor
冲·蒋
秉圣·利奥·郭
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Applied Materials Inc
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Applied Materials Inc
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Priority to CN201611217409.4A priority Critical patent/CN106947948A/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0676—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C23C14/5833—Ion beam bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/586—Nitriding
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Inorganic Insulating Materials (AREA)
  • Primary Cells (AREA)
  • Secondary Cells (AREA)
CN201280029540.1A 2011-06-17 2012-06-14 无针孔介电薄膜制造 Expired - Fee Related CN103608966B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201611217409.4A CN106947948A (zh) 2011-06-17 2012-06-14 无针孔介电薄膜制造

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161498480P 2011-06-17 2011-06-17
US61/498,480 2011-06-17
PCT/US2012/042487 WO2012174260A2 (en) 2011-06-17 2012-06-14 Pinhole-free dielectric thin film fabrication

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201611217409.4A Division CN106947948A (zh) 2011-06-17 2012-06-14 无针孔介电薄膜制造

Publications (2)

Publication Number Publication Date
CN103608966A CN103608966A (zh) 2014-02-26
CN103608966B true CN103608966B (zh) 2017-02-15

Family

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Application Number Title Priority Date Filing Date
CN201280029540.1A Expired - Fee Related CN103608966B (zh) 2011-06-17 2012-06-14 无针孔介电薄膜制造
CN201611217409.4A Pending CN106947948A (zh) 2011-06-17 2012-06-14 无针孔介电薄膜制造

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Country Status (5)

Country Link
US (1) US9593405B2 (cg-RX-API-DMAC7.html)
JP (1) JP6076969B2 (cg-RX-API-DMAC7.html)
KR (1) KR101942961B1 (cg-RX-API-DMAC7.html)
CN (2) CN103608966B (cg-RX-API-DMAC7.html)
WO (1) WO2012174260A2 (cg-RX-API-DMAC7.html)

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US20170038658A1 (en) 2011-09-30 2017-02-09 View, Inc. Particle removal during fabrication of electrochromic devices
US12496809B2 (en) 2010-11-08 2025-12-16 View Operating Corporation Electrochromic window fabrication methods
KR101945260B1 (ko) 2011-08-08 2019-02-07 어플라이드 머티어리얼스, 인코포레이티드 레이저 패터닝을 위해 통합된 차광층들 및 차열층들을 구비한 박막 구조물들 및 디바이스들
US12403676B2 (en) 2011-12-12 2025-09-02 View Operating Corporation Thin-film devices and fabrication
US10802371B2 (en) 2011-12-12 2020-10-13 View, Inc. Thin-film devices and fabrication
US12061402B2 (en) 2011-12-12 2024-08-13 View, Inc. Narrow pre-deposition laser deletion
US11865632B2 (en) 2011-12-12 2024-01-09 View, Inc. Thin-film devices and fabrication
EP3182500B1 (en) 2012-04-18 2018-06-13 Applied Materials, Inc. Pinhole-free solid state electrolytes with high ionic conductivity
CN105474441B (zh) * 2013-08-26 2019-10-08 富士通株式会社 全固体型二次电池、其制造方法及电子设备
KR20160104707A (ko) * 2014-01-02 2016-09-05 어플라이드 머티어리얼스, 인코포레이티드 리튬 금속 상의 고체 상태 전해질 및 배리어, 및 그 방법들
US9746678B2 (en) * 2014-04-11 2017-08-29 Applied Materials Light wave separation lattices and methods of forming light wave separation lattices
WO2016070185A1 (en) * 2014-10-31 2016-05-06 Applied Materials, Inc. Integration of laser processing with deposition of electrochemical device layers
WO2018039080A1 (en) 2016-08-22 2018-03-01 View, Inc. Electromagnetic-shielding electrochromic windows
US12235560B2 (en) 2014-11-25 2025-02-25 View, Inc. Faster switching electrochromic devices
CN107533267A (zh) 2015-03-20 2018-01-02 唯景公司 更快速地切换低缺陷电致变色窗
US20170301893A1 (en) * 2016-04-14 2017-10-19 Applied Materials, Inc. Energy storage device with wraparound encapsulation
FR3062962B1 (fr) * 2017-02-16 2019-03-29 Stmicroelectronics (Tours) Sas Procede de fabrication d'une batterie au lithium
CN109763101A (zh) * 2019-01-30 2019-05-17 南京大学 一种制备超薄无针孔介电薄膜的方法
CN114525471B (zh) * 2022-02-18 2024-03-19 辽宁师范大学 质子交换膜燃料电池不锈钢双极板高质量Cr基涂层制备方法
CN116504987A (zh) * 2022-12-23 2023-07-28 安迈特科技(北京)有限公司 复合集流体及其制备方法和应用以及锂离子电池

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Also Published As

Publication number Publication date
JP6076969B2 (ja) 2017-02-08
KR101942961B1 (ko) 2019-01-28
CN103608966A (zh) 2014-02-26
CN106947948A (zh) 2017-07-14
WO2012174260A2 (en) 2012-12-20
JP2014524974A (ja) 2014-09-25
KR20140044860A (ko) 2014-04-15
US20120318664A1 (en) 2012-12-20
US9593405B2 (en) 2017-03-14
WO2012174260A3 (en) 2013-04-25

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