CN103499592B - 透射x射线分析装置 - Google Patents
透射x射线分析装置 Download PDFInfo
- Publication number
- CN103499592B CN103499592B CN201310055104.8A CN201310055104A CN103499592B CN 103499592 B CN103499592 B CN 103499592B CN 201310055104 A CN201310055104 A CN 201310055104A CN 103499592 B CN103499592 B CN 103499592B
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- tdi sensor
- sample
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- rollers
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
- G01N2223/1016—X-ray
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-034792 | 2012-02-21 | ||
| JP2012034792A JP5875403B2 (ja) | 2012-02-21 | 2012-02-21 | 透過x線分析装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103499592A CN103499592A (zh) | 2014-01-08 |
| CN103499592B true CN103499592B (zh) | 2017-04-12 |
Family
ID=48982262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310055104.8A Active CN103499592B (zh) | 2012-02-21 | 2013-02-21 | 透射x射线分析装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9001966B2 (https=) |
| JP (1) | JP5875403B2 (https=) |
| KR (1) | KR101874133B1 (https=) |
| CN (1) | CN103499592B (https=) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6397690B2 (ja) * | 2014-08-11 | 2018-09-26 | 株式会社日立ハイテクノロジーズ | X線透過検査装置及び異物検出方法 |
| JP6512980B2 (ja) * | 2015-07-29 | 2019-05-15 | 株式会社日立ハイテクサイエンス | X線透過検査装置及びx線透過検査方法 |
| US20180284037A1 (en) * | 2017-03-30 | 2018-10-04 | Sumitomo Chemical Company, Limited | Inspection device, inspection method, and method of producing film roll |
| WO2020115876A1 (ja) * | 2018-12-06 | 2020-06-11 | 株式会社日立ハイテク | 荷電粒子線装置 |
| JP7201481B2 (ja) * | 2019-03-04 | 2023-01-10 | 株式会社日立ハイテクサイエンス | X線検査装置及びx線検査方法 |
| CN110231345B (zh) * | 2019-07-17 | 2023-11-14 | 佛山市清极能源科技有限公司 | 一种膜电极缺陷在线检测方法及设备 |
| US12584869B2 (en) * | 2021-02-26 | 2026-03-24 | Honeywell Limited | Boehmite detection and warning system, and concentration indicator for LiB separator sheet manufacturing |
| EP4358505A4 (en) * | 2021-07-13 | 2025-02-26 | Hamamatsu Photonics K.K. | X-ray image acquisition device and x-ray image acquisition system |
| CN114088742B (zh) * | 2021-11-18 | 2022-09-06 | 吉林大学 | 一种变矩器的铸造叶片塌陷位置检测装置 |
| JP7846885B2 (ja) * | 2022-02-02 | 2026-04-16 | 株式会社イシダ | X線検査装置 |
| WO2024044968A1 (zh) * | 2022-08-30 | 2024-03-07 | 宁德时代新能源科技股份有限公司 | 极片检测的方法和装置 |
| JP2025072964A (ja) | 2023-10-25 | 2025-05-12 | 株式会社日立ハイテクサイエンス | X線分析装置 |
| KR20260001375A (ko) * | 2024-06-27 | 2026-01-05 | 삼성에스디아이 주식회사 | 건식 전극 제조 장치 및 건식 전극 제조 방법 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3317736A (en) * | 1963-11-12 | 1967-05-02 | Gen Electric | Apparatus for measuring the probability of the presence of optical blemishes |
| CN1437017A (zh) * | 2002-02-05 | 2003-08-20 | 株式会社石田 | X射线检查装置 |
| CN101111759A (zh) * | 2005-03-25 | 2008-01-23 | 新日本石油精制株式会社 | 异物检测装置及检测方法,以及异物去除装置及去除方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2570288A (en) * | 1949-05-03 | 1951-10-09 | Howard Paper Mills Inc | Photoelectric inspection of sheet materials |
| JPS60154181A (ja) * | 1984-01-25 | 1985-08-13 | Nippon Steel Corp | 帯状金属板の介在物検出装置 |
| JP2000298102A (ja) * | 1999-02-08 | 2000-10-24 | Nkk Corp | 表面検査装置 |
| US6324249B1 (en) * | 2001-03-21 | 2001-11-27 | Agilent Technologies, Inc. | Electronic planar laminography system and method |
| JP3971238B2 (ja) * | 2002-05-16 | 2007-09-05 | 住友ゴム工業株式会社 | X線検査装置 |
| JP2004061479A (ja) | 2002-07-27 | 2004-02-26 | Elco:Kk | X線異物検出装置 |
| JP3678730B2 (ja) * | 2003-02-26 | 2005-08-03 | 株式会社日鉄エレックス | X線異物検査方法及び装置 |
| JP5126645B2 (ja) * | 2006-08-23 | 2013-01-23 | 国際技術開発株式会社 | 検査装置 |
| JP2009128090A (ja) * | 2007-11-21 | 2009-06-11 | Core Staff Inc | テーピングic対応自動x線検査装置 |
| JP5443033B2 (ja) * | 2009-03-27 | 2014-03-19 | トヨタ自動車株式会社 | 欠陥検査装置および方法 |
| JP4919115B2 (ja) | 2009-09-24 | 2012-04-18 | 横河電機株式会社 | 放射線検査装置 |
-
2012
- 2012-02-21 JP JP2012034792A patent/JP5875403B2/ja active Active
-
2013
- 2013-02-07 KR KR1020130013755A patent/KR101874133B1/ko active Active
- 2013-02-18 US US13/769,704 patent/US9001966B2/en active Active
- 2013-02-21 CN CN201310055104.8A patent/CN103499592B/zh active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3317736A (en) * | 1963-11-12 | 1967-05-02 | Gen Electric | Apparatus for measuring the probability of the presence of optical blemishes |
| CN1437017A (zh) * | 2002-02-05 | 2003-08-20 | 株式会社石田 | X射线检查装置 |
| CN101111759A (zh) * | 2005-03-25 | 2008-01-23 | 新日本石油精制株式会社 | 异物检测装置及检测方法,以及异物去除装置及去除方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5875403B2 (ja) | 2016-03-02 |
| US9001966B2 (en) | 2015-04-07 |
| KR20130096180A (ko) | 2013-08-29 |
| US20130216024A1 (en) | 2013-08-22 |
| CN103499592A (zh) | 2014-01-08 |
| KR101874133B1 (ko) | 2018-07-03 |
| JP2013170924A (ja) | 2013-09-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C53 | Correction of patent of invention or patent application | ||
| CB02 | Change of applicant information |
Address after: Tokyo, Japan Applicant after: HITACHI HIGH-TECH SCIENCE Corp. Address before: Chiba, Chiba, Japan Applicant before: SII NanoTechnology Inc. |
|
| COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: SEIKO NANOTECHNOLOGY INC. TO: HITACHI HIGH TECH SCIENCE CORP. |
|
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: Tokyo, Japan Patentee after: Hitachi High Tech Analysis Co.,Ltd. Country or region after: Japan Address before: Tokyo, Japan Patentee before: HITACHI HIGH-TECH SCIENCE Corp. Country or region before: Japan |