CN103444268A - 静电远程等离子体源 - Google Patents

静电远程等离子体源 Download PDF

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Publication number
CN103444268A
CN103444268A CN2012800137906A CN201280013790A CN103444268A CN 103444268 A CN103444268 A CN 103444268A CN 2012800137906 A CN2012800137906 A CN 2012800137906A CN 201280013790 A CN201280013790 A CN 201280013790A CN 103444268 A CN103444268 A CN 103444268A
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CN
China
Prior art keywords
electrode
plasma
chamber
fluid
power
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Pending
Application number
CN2012800137906A
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English (en)
Chinese (zh)
Inventor
D·J·霍夫曼
D·卡特
V·布劳克
K·彼德森
R·戈瑞理
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Advanced Energy Industries Inc
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Advanced Energy Industries Inc
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Filing date
Publication date
Application filed by Advanced Energy Industries Inc filed Critical Advanced Energy Industries Inc
Priority to CN201710831581.7A priority Critical patent/CN107396526B/zh
Publication of CN103444268A publication Critical patent/CN103444268A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/03—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using electrostatic fields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/327—Arrangements for generating the plasma

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
CN2012800137906A 2011-01-25 2012-01-24 静电远程等离子体源 Pending CN103444268A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710831581.7A CN107396526B (zh) 2011-01-25 2012-01-24 静电远程等离子体源

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201161436131P 2011-01-25 2011-01-25
US61/436,131 2011-01-25
US201161554536P 2011-11-02 2011-11-02
US61/554,536 2011-11-02
US13/356,546 2012-01-23
US13/356,546 US8723423B2 (en) 2011-01-25 2012-01-23 Electrostatic remote plasma source
PCT/US2012/022380 WO2012103101A1 (en) 2011-01-25 2012-01-24 Electrostatic remote plasma source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201710831581.7A Division CN107396526B (zh) 2011-01-25 2012-01-24 静电远程等离子体源

Publications (1)

Publication Number Publication Date
CN103444268A true CN103444268A (zh) 2013-12-11

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ID=46543681

Family Applications (2)

Application Number Title Priority Date Filing Date
CN2012800137906A Pending CN103444268A (zh) 2011-01-25 2012-01-24 静电远程等离子体源
CN201710831581.7A Active CN107396526B (zh) 2011-01-25 2012-01-24 静电远程等离子体源

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201710831581.7A Active CN107396526B (zh) 2011-01-25 2012-01-24 静电远程等离子体源

Country Status (7)

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US (3) US8723423B2 (enExample)
EP (1) EP2668830A4 (enExample)
JP (2) JP5905906B2 (enExample)
KR (1) KR20140005244A (enExample)
CN (2) CN103444268A (enExample)
TW (1) TWI538570B (enExample)
WO (1) WO2012103101A1 (enExample)

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* Cited by examiner, † Cited by third party
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