CN103314760A

CN103314760A - Field planting method for clonal tea trees

Info

Publication number: CN103314760A
Application number: CN2013102822735A
Authority: CN
Inventors: 张意; 刘雨晴; 张德敏
Original assignee: JURONG ZHANGMIAO TEA PLANTATION
Current assignee: JURONG ZHANGMIAO TEA PLANTATION
Priority date: 2013-07-05
Filing date: 2013-07-05
Publication date: 2013-09-25

Abstract

The invention discloses a field planting method for clonal tea trees. The field planting method includes steps of deeply plowing a land, in other words, deeply plowing soil by the depth of 80 centimeters at least without breaking soil blocks or disrupting the sequence of soil layers so as to improve the permeability of the soil, and artificially leveling the soil after sunning and weathering the upturned soil in summer; ditching and fertilizing the land, in other words, cracking the soil blocks, removing weeds, and digging planting ditches with the depths of 60 centimeters and the widths of 40 centimeters after the land is leveled; laying straw at the bottoms of the planting ditches to form layers with the thicknesses of 5-10 centimeters, applying organic fertilizers mixed with soil into the ditches, and covering soil into the ditches until height difference among rows is 5-10cm; planting tea tree seedlings, in other words, performing field planting on the tea tree seedlings at the bottoms of the ditches after natural settling and planting the tea tree seedlings individually at the planting density according to the planting spacing of 8 centimeters X1.5 meters; covering soil on the ditches, in other words, covering the soil in autumn in the same year after the tea tree seedlings survive, crushing soil among the rows, ridging bases of the tea trees by the aid of the crushed soil to form layers with the thicknesses of 5-10cm, and ridging the bases of the tea trees in autumn every year for the next three years until the tea tree rows are turned into ridges instead of the ditches.

Description

A kind of clone tea tree field planting method

Technical field

The invention belongs to tealeaves planting technology field.

Background technology

Clone breeding tea tree is best in quality because of it, and proterties neatly and is not promoted rapidly.But the clone tea shoot is not owing to there is main root, and lateral root is cross growth more, and it is shallow to bury, and root/shoot ratio is little.According to traditional approach, in the field planting of Pingdu trench digging, in case run into poor environment or extensive management, very easily dead.The phenomenon that some place " plants tea every year and loses tea ", main cause are just here.

Summary of the invention

Technical problem to be solved by this invention provides a kind of clone tea tree field planting method, to overcome the deficiency of traditional tea shoot field planting, has increased the root system amount, has strengthened resistance.

For solving the problems of the technologies described above, the technical solution used in the present invention is as follows:

A kind of clone tea tree field planting method, this method comprises the steps:

(1) soil deeptillage: adopt excavator operation, plough deeply soil, strengthen permeability, the degree of depth of digging requires more than 80 centimeters, and soil block needn't be smashed, and attention can not upset the soil layer order.After sunning the earth which has been ploughed up weathering summer, manually smooth.

(2) trench digging is fostered and apply fertilizer: use manual work, break soil block into pieces, know weeds, excavate 60 centimeters dark, plantation ditches of 40 centimeters wide through smooth back.The thick stalk of 5-10cm is gone in bottom shop earlier, to increase soil permeability, is beneficial to the tea place draining; Apply then with the fertilizer mixed of soil, last earthing to differ the 5-10cm height in the ranks.

(3) tea shoot is planted: wait for natural subsidence, water or the rainwater sedimentation after, the field planting tea shoot.The tea shoot field planting is in the ditch bottom, and planting density is pressed 8 centimeters * 1.5 meters of seeding row spacings, and individual plant is planted.

(4) earthing: carry out earthing after tea shoot survives then autumn, in the ranks soil is trained to the tea tree base portion thickness 5-10cm after pulverizing.Earth up once continuous 3 years later on annual autumn.Be the ridge up to the capable change of tea ditch.

Beneficial effect: can the amount of changing soil after the stalk of this method under burying rots, both improved soil organic matter content, increased permeability again; Utilize tea tree to survive the winter after the autumn and winter season ridging, can sprout adventive root after the tea root neck is buried, increased the tea root amount, thereby strengthened resistance.

Description of drawings

Fig. 1 is the inventive method schematic diagram.

Embodiment

According to following embodiment, the present invention may be better understood.Yet, those skilled in the art will readily understand that the described content of embodiment only is used for explanation the present invention, and should also can not limit the present invention described in detail in claims.

Embodiment 1:

(4) earthing: carry out earthing after tea shoot survives then autumn, in the ranks soil is trained to the tea tree base portion thickness 5-10cm after pulverizing.Earth up once continuous 3 years later on annual autumn.Be the ridge up to the capable change of tea ditch, shown in Figure 1.

Claims

1. a clone tea tree field planting method is characterized in that this method comprises the steps:

(1) soil deeptillage: plough deeply soil, strengthen permeability, the degree of depth of digging requires more than 80 centimeters, and soil block needn't be smashed, and can not upset the soil layer order, and is after sunning the earth which has been ploughed up weathering summer, manually smooth;

(2) trench digging is fostered and apply fertilizer: break soil block into pieces, know weeds,, 40 centimeter wide plantation ditch dark through 60 centimeters of smooth back excavations; The thick stalk of 5-10cm is gone in bottom earlier shop, applies the fertilizer of mixing with soil then, last earthing to differ 5-10cm in the ranks highly;

(3) tea shoot is planted: after waiting for natural subsidence, and the field planting tea shoot, the tea shoot field planting is in the ditch bottom, and planting density is pressed 8 centimeters * 1.5 meters of seeding row spacings, and individual plant is planted;

(4) earthing: carry out earthing after tea shoot survives then autumn, in the ranks soil is trained to the tea tree base portion after pulverizing, thickness 5-10cm, and later on annual ridging in autumn once continuous 3 years, is the ridge up to the capable change of tea ditch.