CN103298782B - 肟酯化合物以及含有该化合物的光聚合引发剂 - Google Patents

肟酯化合物以及含有该化合物的光聚合引发剂 Download PDF

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CN103298782B
CN103298782B CN201280004665.9A CN201280004665A CN103298782B CN 103298782 B CN103298782 B CN 103298782B CN 201280004665 A CN201280004665 A CN 201280004665A CN 103298782 B CN103298782 B CN 103298782B
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compound
methyl
acid
alkyl
alkali
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CN103298782A (zh
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村田圣
大石武雄
君岛孝一
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Adeka Corp
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Asahi Denka Kogyo KK
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    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/46—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
    • C07C323/47—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
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    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C391/00—Compounds containing selenium
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    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
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    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/62—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/64—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton
    • C07C323/65—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton containing sulfur atoms of sulfone or sulfoxide groups bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
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    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
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    • C07D303/02—Compounds containing oxirane rings
    • C07D303/12—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms
    • C07D303/18—Compounds containing oxirane rings with hydrocarbon radicals, substituted by singly or doubly bound oxygen atoms by etherified hydroxyl radicals
    • C07D303/20—Ethers with hydroxy compounds containing no oxirane rings
    • C07D303/22—Ethers with hydroxy compounds containing no oxirane rings with monohydroxy compounds
    • C07D303/23—Oxiranylmethyl ethers of compounds having one hydroxy group bound to a six-membered aromatic ring, the oxiranylmethyl radical not being further substituted, i.e.
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    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D307/40—Radicals substituted by oxygen atoms
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    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/5022—Aromatic phosphines (P-C aromatic linkage)
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
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    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated
CN201280004665.9A 2011-03-25 2012-02-07 肟酯化合物以及含有该化合物的光聚合引发剂 Active CN103298782B (zh)

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JP2011067406 2011-03-25
JP2011-067406 2011-03-25
PCT/JP2012/052775 WO2012132558A1 (ja) 2011-03-25 2012-02-07 オキシムエステル化合物及び該化合物を含有する光重合開始剤

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CN103298782B true CN103298782B (zh) 2016-04-06

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JP (1) JP6000942B2 (ja)
KR (1) KR101930099B1 (ja)
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TW (1) TWI541221B (ja)
WO (1) WO2012132558A1 (ja)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102093446B1 (ko) * 2012-11-01 2020-03-25 가부시키가이샤 아데카 알칼리 현상성 감광성 조성물
JP5337293B1 (ja) * 2012-11-13 2013-11-06 積水化学工業株式会社 液晶表示素子用シール剤、上下導通材料及び液晶表示素子
WO2015029846A1 (ja) * 2013-08-29 2015-03-05 積水化学工業株式会社 表示素子用封止剤及びオキシムエステル開始剤
JP6621643B2 (ja) * 2015-10-22 2019-12-18 株式会社Adeka オキシムエステル化合物及び該化合物を含有する重合開始剤
TWI731895B (zh) * 2015-12-08 2021-07-01 日商富士軟片股份有限公司 感放射線性樹脂組成物、硬化膜、圖案形成方法、固體攝影元件及影像顯示裝置
JP6788971B2 (ja) * 2016-01-14 2020-11-25 東京応化工業株式会社 感光性組成物
JP2017132863A (ja) * 2016-01-26 2017-08-03 積水化学工業株式会社 オキシムエステル開始剤、硬化性樹脂組成物、液晶表示素子用シール剤、上下導通材料、及び、液晶表示素子
WO2017169819A1 (ja) * 2016-03-29 2017-10-05 株式会社Adeka 黒色感光性樹脂組成物
KR101892086B1 (ko) * 2016-05-19 2018-08-27 주식회사 삼양사 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물
WO2017200354A1 (ko) * 2016-05-19 2017-11-23 주식회사 삼양사 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물
TWI772616B (zh) * 2018-03-01 2022-08-01 日商日本化藥股份有限公司 新穎化合物、含有該化合物之光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物
TWI774931B (zh) * 2018-03-02 2022-08-21 日商日本化藥股份有限公司 新穎化合物、含有該化合物的光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物
JP2022540658A (ja) * 2019-07-12 2022-09-16 サムヤン コーポレーション 感光性樹脂組成物
JP2023070648A (ja) 2021-11-09 2023-05-19 住友化学株式会社 樹脂膜及び表示装置
JP2023070646A (ja) 2021-11-09 2023-05-19 住友化学株式会社 樹脂組成物、樹脂膜及び表示装置
JP2023070645A (ja) 2021-11-09 2023-05-19 住友化学株式会社 樹脂組成物、樹脂膜及び表示装置
JP2023070647A (ja) 2021-11-09 2023-05-19 住友化学株式会社 樹脂組成物、樹脂膜及び表示装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007310317A (ja) * 2006-05-22 2007-11-29 Fujifilm Corp 光重合性組成物、カラーフィルタ、及びその製造方法
JP2009047871A (ja) * 2007-08-20 2009-03-05 Fujifilm Corp ホログラフィック記録用組成物、ホログラフィック記録媒体、情報記録方法および新規化合物
CN101528682A (zh) * 2006-12-27 2009-09-09 株式会社艾迪科 肟酯化合物和含有该化合物的光聚合引发剂
CN102086171A (zh) * 2009-11-27 2011-06-08 株式会社艾迪科 肟酯化合物及含有该化合物的光聚合引发剂

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
JP5507054B2 (ja) * 2008-03-28 2014-05-28 富士フイルム株式会社 重合性組成物、カラーフィルタ、カラーフィルタの製造方法、及び固体撮像素子
JP2011099974A (ja) * 2009-11-05 2011-05-19 Fujifilm Corp 着色感光性組成物、カラーフィルタ、及び液晶表示装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007310317A (ja) * 2006-05-22 2007-11-29 Fujifilm Corp 光重合性組成物、カラーフィルタ、及びその製造方法
CN101528682A (zh) * 2006-12-27 2009-09-09 株式会社艾迪科 肟酯化合物和含有该化合物的光聚合引发剂
JP2009047871A (ja) * 2007-08-20 2009-03-05 Fujifilm Corp ホログラフィック記録用組成物、ホログラフィック記録媒体、情報記録方法および新規化合物
CN102086171A (zh) * 2009-11-27 2011-06-08 株式会社艾迪科 肟酯化合物及含有该化合物的光聚合引发剂

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KR101930099B1 (ko) 2018-12-17
CN103298782A (zh) 2013-09-11
TWI541221B (zh) 2016-07-11
TW201242931A (en) 2012-11-01
KR20130140096A (ko) 2013-12-23
JPWO2012132558A1 (ja) 2014-07-24
JP6000942B2 (ja) 2016-10-05
WO2012132558A1 (ja) 2012-10-04

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