CN103249674B - 合成非晶态二氧化硅粉末及其制造方法 - Google Patents

合成非晶态二氧化硅粉末及其制造方法 Download PDF

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Publication number
CN103249674B
CN103249674B CN201280004018.8A CN201280004018A CN103249674B CN 103249674 B CN103249674 B CN 103249674B CN 201280004018 A CN201280004018 A CN 201280004018A CN 103249674 B CN103249674 B CN 103249674B
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CN
China
Prior art keywords
powder
silica
sio
silica powder
less
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Expired - Fee Related
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CN201280004018.8A
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English (en)
Chinese (zh)
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CN103249674A (zh
Inventor
植田稔晃
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Mitsubishi Materials Corp
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Mitsubishi Materials Corp
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Publication of CN103249674A publication Critical patent/CN103249674A/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • C01B33/1415—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/102—Forming solid beads by blowing a gas onto a stream of molten glass or onto particulate materials, e.g. pulverising
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/10—Solid density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Silicon Compounds (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Glass Compositions (AREA)
CN201280004018.8A 2011-03-23 2012-02-29 合成非晶态二氧化硅粉末及其制造方法 Expired - Fee Related CN103249674B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2011064451 2011-03-23
JP2011-064451 2011-03-23
JP2011064456 2011-03-23
JP2011-064456 2011-03-23
PCT/JP2012/055059 WO2012128005A1 (ja) 2011-03-23 2012-02-29 合成非晶質シリカ粉末及びその製造方法

Publications (2)

Publication Number Publication Date
CN103249674A CN103249674A (zh) 2013-08-14
CN103249674B true CN103249674B (zh) 2015-03-11

Family

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CN201280004018.8A Expired - Fee Related CN103249674B (zh) 2011-03-23 2012-02-29 合成非晶态二氧化硅粉末及其制造方法

Country Status (7)

Country Link
US (1) US9446959B2 (OSRAM)
EP (1) EP2690066A4 (OSRAM)
JP (1) JP5825145B2 (OSRAM)
KR (1) KR20140002673A (OSRAM)
CN (1) CN103249674B (OSRAM)
TW (1) TWI525041B (OSRAM)
WO (1) WO2012128005A1 (OSRAM)

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JP6466635B2 (ja) * 2013-06-14 2019-02-06 信越化学工業株式会社 非水電解質二次電池用負極の製造方法及び非水電解質二次電池の製造方法
WO2015001592A1 (ja) * 2013-06-30 2015-01-08 株式会社Sumco シリコン単結晶引上げ用シリカガラスルツボの製造に好適なシリカ粉の評価方法
US9745201B2 (en) * 2014-01-29 2017-08-29 Mitsubishi Materials Corporation Synthetic amorphous silica powder and process for manufacturing same
CN104227006A (zh) * 2014-08-26 2014-12-24 苏州智研新材料科技有限公司 一种微细球形不锈钢粉体的制备方法
TWI794149B (zh) * 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 石英玻璃粉粒、不透明成型體及彼等之製備方法
US11236002B2 (en) 2015-12-18 2022-02-01 Heraeus Quarzglas Gmbh & Co. Kg Preparation of an opaque quartz glass body
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass
US11492285B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies from silicon dioxide granulate
WO2017103125A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
WO2017103124A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Erhöhen des siliziumgehalts bei der herstellung von quarzglas
WO2017103115A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall
WO2017103166A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung eines quarzglaskörpers in einem mehrkammerofen
EP3390303B1 (de) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
WO2018092804A1 (ja) * 2016-11-16 2018-05-24 日本化成株式会社 定量供給用シリカ粉体、並びにこれを用いた生体物質の精製キット及びその製造方法
CN107052225A (zh) * 2016-12-30 2017-08-18 天津泽希矿产加工有限公司 特种砂‑球形熔融硅砂及其制备方法和应用
JP2019182691A (ja) * 2018-04-04 2019-10-24 東ソ−・エスジ−エム株式会社 石英ガラスインゴット及び石英ガラス製品の製造方法
CN113165938A (zh) * 2018-12-14 2021-07-23 东曹石英股份有限公司 不透明石英玻璃的制造方法
CN111943214B (zh) * 2020-08-18 2022-08-30 苏州英纳特纳米科技有限公司 非晶态纳米球形二氧化硅的制备方法
JP2024043650A (ja) * 2022-09-20 2024-04-02 株式会社Sumco 石英ガラスルツボ及びその製造方法及び石英ガラスルツボ用石英粉

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JP2004225135A (ja) * 2003-01-24 2004-08-12 High Frequency Heattreat Co Ltd 熱プラズマによる粉末の合成／精製または球状化方法とその装置
JP2005162593A (ja) * 2003-12-04 2005-06-23 Kiyoaki Shiraishi 加熱処理する事によって「角（かど）」無くしたシリカ
CN1642855A (zh) * 2002-03-18 2005-07-20 瓦克化学有限公司 高纯度硅石粉末、其制造方法及装置

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DE3525495C1 (de) 1985-07-17 1987-01-02 Heraeus Schott Quarzschmelze Verfahren zur Herstellung von Gegenstaenden aus synthetischem Siliziumdioxid
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JPS62176929A (ja) 1986-01-30 1987-08-03 Olympus Optical Co Ltd 成形型の離型リング
JPH03275527A (ja) 1990-03-24 1991-12-06 Mitsubishi Kasei Corp 多孔質シリカガラス粉末
JPH0475848A (ja) 1990-07-17 1992-03-10 Toyoda Mach Works Ltd 適応制御装置
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JP4154563B2 (ja) * 2001-07-23 2008-09-24 信越化学工業株式会社 シリカ含有複合酸化物球状微粒子及びその製造方法
JP5013573B2 (ja) * 2005-09-30 2012-08-29 信越石英株式会社 高耐熱性石英ガラス粉の製造方法、高耐熱性石英ガラス粉及びガラス体
EP2014622B1 (de) 2007-07-06 2017-01-18 Evonik Degussa GmbH Verfahren zur Herstellung eines Kieselglasgranulats
JP5648640B2 (ja) * 2010-01-07 2015-01-07 三菱マテリアル株式会社 合成非晶質シリカ粉末
JP2011157261A (ja) * 2010-01-07 2011-08-18 Mitsubishi Materials Corp 合成非晶質シリカ粉末及びその製造方法
JP2011157260A (ja) * 2010-01-07 2011-08-18 Mitsubishi Materials Corp 合成非晶質シリカ粉末及びその製造方法

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CN1642855A (zh) * 2002-03-18 2005-07-20 瓦克化学有限公司 高纯度硅石粉末、其制造方法及装置
JP2004225135A (ja) * 2003-01-24 2004-08-12 High Frequency Heattreat Co Ltd 熱プラズマによる粉末の合成／精製または球状化方法とその装置
JP2005162593A (ja) * 2003-12-04 2005-06-23 Kiyoaki Shiraishi 加熱処理する事によって「角（かど）」無くしたシリカ

Also Published As

Publication number Publication date
EP2690066A4 (en) 2014-08-20
WO2012128005A1 (ja) 2012-09-27
TW201242897A (en) 2012-11-01
KR20140002673A (ko) 2014-01-08
JP5825145B2 (ja) 2015-12-02
EP2690066A1 (en) 2014-01-29
TWI525041B (zh) 2016-03-11
US20140065423A1 (en) 2014-03-06
US9446959B2 (en) 2016-09-20
JP2012211070A (ja) 2012-11-01
CN103249674A (zh) 2013-08-14

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Granted publication date: 20150311