CN103132002B - 一种黑色y2o3陶瓷涂层的制备方法 - Google Patents
一种黑色y2o3陶瓷涂层的制备方法 Download PDFInfo
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- CN103132002B CN103132002B CN201110396423.6A CN201110396423A CN103132002B CN 103132002 B CN103132002 B CN 103132002B CN 201110396423 A CN201110396423 A CN 201110396423A CN 103132002 B CN103132002 B CN 103132002B
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- black
- powder
- plasma
- ceramic coating
- coating
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- 238000005524 ceramic coating Methods 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 32
- 239000000843 powder Substances 0.000 claims abstract description 29
- 239000011248 coating agent Substances 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 24
- 238000007750 plasma spraying Methods 0.000 claims abstract description 18
- 238000005245 sintering Methods 0.000 claims abstract description 17
- 238000002360 preparation method Methods 0.000 claims abstract description 14
- 230000009467 reduction Effects 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 238000009818 secondary granulation Methods 0.000 claims abstract description 11
- 239000000463 material Substances 0.000 claims abstract description 10
- 238000005507 spraying Methods 0.000 claims abstract description 4
- 230000008569 process Effects 0.000 claims description 17
- 238000006722 reduction reaction Methods 0.000 claims description 14
- 239000007789 gas Substances 0.000 claims description 12
- 239000007921 spray Substances 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 239000002245 particle Substances 0.000 claims description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- 238000007664 blowing Methods 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 6
- 239000011159 matrix material Substances 0.000 claims description 5
- 238000005488 sandblasting Methods 0.000 claims description 5
- 238000002203 pretreatment Methods 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 238000000137 annealing Methods 0.000 claims description 3
- 239000002826 coolant Substances 0.000 claims description 3
- 239000000112 cooling gas Substances 0.000 claims description 3
- 238000005469 granulation Methods 0.000 claims description 2
- 230000003179 granulation Effects 0.000 claims description 2
- 239000004576 sand Substances 0.000 claims description 2
- 238000005530 etching Methods 0.000 abstract description 12
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 238000001020 plasma etching Methods 0.000 description 6
- 238000010894 electron beam technology Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- Coating By Spraying Or Casting (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201110396423.6A CN103132002B (zh) | 2011-12-02 | 2011-12-02 | 一种黑色y2o3陶瓷涂层的制备方法 |
Applications Claiming Priority (1)
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CN201110396423.6A CN103132002B (zh) | 2011-12-02 | 2011-12-02 | 一种黑色y2o3陶瓷涂层的制备方法 |
Publications (2)
Publication Number | Publication Date |
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CN103132002A CN103132002A (zh) | 2013-06-05 |
CN103132002B true CN103132002B (zh) | 2015-04-15 |
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Family Applications (1)
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CN201110396423.6A Active CN103132002B (zh) | 2011-12-02 | 2011-12-02 | 一种黑色y2o3陶瓷涂层的制备方法 |
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CN (1) | CN103132002B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101350294B1 (ko) * | 2013-07-12 | 2014-01-13 | 주식회사 펨빅스 | 균열이 없는 금속산화물 막 구조물 |
CN109468575A (zh) * | 2018-11-29 | 2019-03-15 | 沈阳富创精密设备有限公司 | 一种应用于半导体领域的氧化钇涂层的制备方法 |
CN113684439A (zh) * | 2021-08-24 | 2021-11-23 | 湖南威斯康新材料科技有限公司 | 一种氧化钇热障涂层的制备方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200925323A (en) * | 2007-12-06 | 2009-06-16 | Tocalo Co Ltd | Method of forming black yttrium oxide sprayed coating and member provided with black yttrium oxide sprayed coating |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0791063B2 (ja) * | 1987-02-20 | 1995-10-04 | 住友大阪セメント株式会社 | 黒色系色彩を有する超微粒子低次酸化チタン粉末の製造方法 |
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2011
- 2011-12-02 CN CN201110396423.6A patent/CN103132002B/zh active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200925323A (en) * | 2007-12-06 | 2009-06-16 | Tocalo Co Ltd | Method of forming black yttrium oxide sprayed coating and member provided with black yttrium oxide sprayed coating |
Non-Patent Citations (1)
Title |
---|
氧化钇陶瓷涂层的制备及结构研究;罗小晨等;《材料热处理技术》;20111031;第40卷(第20期);全文 * |
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CN103132002A (zh) | 2013-06-05 |
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Effective date of registration: 20201228 Address after: 510000 601, building a, 136 Kaiyuan Avenue, Huangpu District, Guangzhou City, Guangdong Province Patentee after: AoXin integrated circuit technology (Guangdong) Co.,Ltd. Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics of the Chinese Academy of Sciences |
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Effective date of registration: 20220506 Address after: 510000 room 710, Jianshe building, No. 348, Kaifa Avenue, Huangpu District, Guangzhou, Guangdong Patentee after: Ruili flat core Microelectronics (Guangzhou) Co.,Ltd. Address before: 510000 601, building a, 136 Kaiyuan Avenue, Huangpu District, Guangzhou City, Guangdong Province Patentee before: AoXin integrated circuit technology (Guangdong) Co.,Ltd. |
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