CN103194714B - 一种等离子喷涂制备碳化硼涂层的方法 - Google Patents
一种等离子喷涂制备碳化硼涂层的方法 Download PDFInfo
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- CN103194714B CN103194714B CN201210001927.8A CN201210001927A CN103194714B CN 103194714 B CN103194714 B CN 103194714B CN 201210001927 A CN201210001927 A CN 201210001927A CN 103194714 B CN103194714 B CN 103194714B
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- powder
- plasma
- boron carbide
- coating
- plasma spraying
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- 238000000034 method Methods 0.000 title claims abstract description 31
- 239000011248 coating agent Substances 0.000 title claims abstract description 27
- 238000000576 coating method Methods 0.000 title claims abstract description 27
- 238000007750 plasma spraying Methods 0.000 title claims abstract description 25
- 229910052580 B4C Inorganic materials 0.000 title claims abstract description 20
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 title claims abstract description 19
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000000843 powder Substances 0.000 claims abstract description 20
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 9
- 239000011812 mixed powder Substances 0.000 claims abstract description 3
- 238000002156 mixing Methods 0.000 claims abstract description 3
- 239000000428 dust Substances 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 10
- 239000007921 spray Substances 0.000 claims description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- 238000005488 sandblasting Methods 0.000 claims description 5
- 238000002203 pretreatment Methods 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 239000004576 sand Substances 0.000 claims description 3
- 238000005507 spraying Methods 0.000 abstract description 6
- 238000007254 oxidation reaction Methods 0.000 abstract description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
- 239000012535 impurity Substances 0.000 abstract description 2
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 239000001301 oxygen Substances 0.000 abstract description 2
- 230000002349 favourable effect Effects 0.000 abstract 1
- 238000000197 pyrolysis Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 9
- 238000005260 corrosion Methods 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 239000002585 base Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000001020 plasma etching Methods 0.000 description 5
- 239000004411 aluminium Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005524 ceramic coating Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- XWROUVVQGRRRMF-UHFFFAOYSA-N F.O[N+]([O-])=O Chemical compound F.O[N+]([O-])=O XWROUVVQGRRRMF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- DGCPSAFMAXHHDM-UHFFFAOYSA-N sulfuric acid;hydrofluoride Chemical compound F.OS(O)(=O)=O DGCPSAFMAXHHDM-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
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- Coating By Spraying Or Casting (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201210001927.8A CN103194714B (zh) | 2012-01-05 | 2012-01-05 | 一种等离子喷涂制备碳化硼涂层的方法 |
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CN201210001927.8A CN103194714B (zh) | 2012-01-05 | 2012-01-05 | 一种等离子喷涂制备碳化硼涂层的方法 |
Publications (2)
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CN103194714A CN103194714A (zh) | 2013-07-10 |
CN103194714B true CN103194714B (zh) | 2016-04-27 |
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Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103572192B (zh) * | 2013-11-13 | 2015-11-11 | 东北大学 | 一种在旋转机械薄壳构件表面制备陶瓷阻尼涂层的方法 |
CN104711503B (zh) * | 2013-12-17 | 2018-06-26 | 中国科学院微电子研究所 | 一种应用于石英基材的碳化硼梯度涂层及其制备方法 |
CN104032253B (zh) * | 2014-06-19 | 2016-09-14 | 河北科技大学 | 一种Ti-B-C-N陶瓷涂层及其制备方法 |
CN109898006A (zh) * | 2017-12-11 | 2019-06-18 | 郑州航空工业管理学院 | 一种碳化硼/铁隔热耐磨复合材料及其制备方法 |
CN114000091A (zh) * | 2021-10-22 | 2022-02-01 | 兆山科技(北京)有限公司 | 高熵硼硅陶瓷材料等离子热喷涂制备梯度陶瓷涂层的方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6054187A (en) * | 1997-12-15 | 2000-04-25 | Ngk Insulators, Ltd. | Method of manufacturing a boron carbide film on a substrate |
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2012
- 2012-01-05 CN CN201210001927.8A patent/CN103194714B/zh active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6054187A (en) * | 1997-12-15 | 2000-04-25 | Ngk Insulators, Ltd. | Method of manufacturing a boron carbide film on a substrate |
Non-Patent Citations (1)
Title |
---|
等离子喷涂碳化硼涂层的性能研究;曾毅 等;《材料保护》;19990430;第32卷(第4期);33-34,36 * |
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