CN103088298B - 镀膜修正板及镀膜装置 - Google Patents
镀膜修正板及镀膜装置 Download PDFInfo
- Publication number
- CN103088298B CN103088298B CN201110337356.0A CN201110337356A CN103088298B CN 103088298 B CN103088298 B CN 103088298B CN 201110337356 A CN201110337356 A CN 201110337356A CN 103088298 B CN103088298 B CN 103088298B
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- Prior art keywords
- film coating
- correction plate
- shielding
- shielding plates
- coating correction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Physical Vapour Deposition (AREA)
Abstract
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Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201110337356.0A CN103088298B (zh) | 2011-10-31 | 2011-10-31 | 镀膜修正板及镀膜装置 |
Applications Claiming Priority (1)
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CN201110337356.0A CN103088298B (zh) | 2011-10-31 | 2011-10-31 | 镀膜修正板及镀膜装置 |
Publications (2)
Publication Number | Publication Date |
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CN103088298A CN103088298A (zh) | 2013-05-08 |
CN103088298B true CN103088298B (zh) | 2016-05-11 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201110337356.0A Expired - Fee Related CN103088298B (zh) | 2011-10-31 | 2011-10-31 | 镀膜修正板及镀膜装置 |
Country Status (1)
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CN (1) | CN103088298B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4198162A1 (en) * | 2021-12-16 | 2023-06-21 | Essilor International | Physical vapor deposition machine with a shutter having at least one intermediate position |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN205295446U (zh) * | 2016-01-18 | 2016-06-08 | 合肥京东方光电科技有限公司 | 一种真空蒸发镀膜设备 |
JP6698509B2 (ja) * | 2016-12-14 | 2020-05-27 | 株式会社神戸製鋼所 | ターゲット用シャッタ機構およびそれを備えた成膜装置 |
CN107630188A (zh) * | 2017-10-31 | 2018-01-26 | 安徽富芯微电子有限公司 | 一种用于提高金属层镀膜均匀性的镀膜机构及其使用方法 |
CN108642453B (zh) * | 2018-06-25 | 2020-03-27 | 京东方科技集团股份有限公司 | 真空蒸镀腔室及真空蒸镀设备 |
CN109457221B (zh) * | 2019-01-23 | 2023-09-01 | 广州北辰工业自动化有限公司 | 可调节的镀膜修正板机构 |
CN111752301B (zh) * | 2019-12-31 | 2024-06-07 | 广州极飞科技股份有限公司 | 无人设备定位检测装置、方法及无人设备 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58131129A (ja) * | 1982-01-29 | 1983-08-04 | Ulvac Corp | プラネタリ−式成膜装置における膜厚修正装置 |
CN201212059Y (zh) * | 2008-06-27 | 2009-03-25 | 贵州振华云科电子有限公司 | 溅射薄膜的厚度均匀性修正装置 |
CN101457349A (zh) * | 2007-12-10 | 2009-06-17 | 鸿富锦精密工业(深圳)有限公司 | 镀膜修正板 |
CN102086505A (zh) * | 2009-12-03 | 2011-06-08 | 鸿富锦精密工业(深圳)有限公司 | 镀膜修正板 |
-
2011
- 2011-10-31 CN CN201110337356.0A patent/CN103088298B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58131129A (ja) * | 1982-01-29 | 1983-08-04 | Ulvac Corp | プラネタリ−式成膜装置における膜厚修正装置 |
CN101457349A (zh) * | 2007-12-10 | 2009-06-17 | 鸿富锦精密工业(深圳)有限公司 | 镀膜修正板 |
CN201212059Y (zh) * | 2008-06-27 | 2009-03-25 | 贵州振华云科电子有限公司 | 溅射薄膜的厚度均匀性修正装置 |
CN102086505A (zh) * | 2009-12-03 | 2011-06-08 | 鸿富锦精密工业(深圳)有限公司 | 镀膜修正板 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4198162A1 (en) * | 2021-12-16 | 2023-06-21 | Essilor International | Physical vapor deposition machine with a shutter having at least one intermediate position |
WO2023110807A1 (en) * | 2021-12-16 | 2023-06-22 | Essilor International | Physical vapor deposition machine with a shutter having at least one intermediate position |
Also Published As
Publication number | Publication date |
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CN103088298A (zh) | 2013-05-08 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
CB03 | Change of inventor or designer information |
Inventor after: Wang Tao Inventor after: Yi Lixia Inventor after: Liu Wenming Inventor after: Wang Weiqin Inventor before: Pei Shaokai |
|
COR | Change of bibliographic data | ||
TR01 | Transfer of patent right |
Effective date of registration: 20170302 Address after: Zhenjiang city of Zhenjiang province Jiangsu fifteen new Dingmao Road No. 99 building D40 Patentee after: Optical instrument (Zhenjiang) Co., Ltd. Address before: 518109 Guangdong city of Shenzhen province Baoan District Longhua Town Industrial Zone tabulaeformis tenth East Ring Road No. 2 two Patentee before: Hongfujin Precise Industry (Shenzhen) Co., Ltd. Patentee before: Hon Hai Precision Industry Co., Ltd. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160511 Termination date: 20171031 |