CN103074562A - 一种改进性能的y2o3耐侵蚀陶瓷涂层的制备方法 - Google Patents
一种改进性能的y2o3耐侵蚀陶瓷涂层的制备方法 Download PDFInfo
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- CN103074562A CN103074562A CN2011103282415A CN201110328241A CN103074562A CN 103074562 A CN103074562 A CN 103074562A CN 2011103282415 A CN2011103282415 A CN 2011103282415A CN 201110328241 A CN201110328241 A CN 201110328241A CN 103074562 A CN103074562 A CN 103074562A
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- plasma
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- ceramic coating
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- 238000005524 ceramic coating Methods 0.000 title claims abstract description 18
- 230000003628 erosive effect Effects 0.000 title claims abstract description 16
- 238000000034 method Methods 0.000 title claims description 31
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 26
- 239000001301 oxygen Substances 0.000 claims abstract description 26
- 239000011248 coating agent Substances 0.000 claims abstract description 25
- 238000000576 coating method Methods 0.000 claims abstract description 25
- 239000007789 gas Substances 0.000 claims abstract description 25
- 239000000843 powder Substances 0.000 claims abstract description 23
- 238000002360 preparation method Methods 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 19
- 238000007750 plasma spraying Methods 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 238000005507 spraying Methods 0.000 claims abstract description 10
- 239000007921 spray Substances 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 238000007254 oxidation reaction Methods 0.000 claims description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- 238000007664 blowing Methods 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 6
- 238000005488 sandblasting Methods 0.000 claims description 5
- 238000002203 pretreatment Methods 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 3
- 239000002826 coolant Substances 0.000 claims description 3
- 239000000112 cooling gas Substances 0.000 claims description 3
- 239000004576 sand Substances 0.000 claims description 2
- 238000005530 etching Methods 0.000 abstract description 16
- 238000001020 plasma etching Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000002245 particle Substances 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 206010067484 Adverse reaction Diseases 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 230000006838 adverse reaction Effects 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 238000009818 secondary granulation Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000010257 thawing Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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- Coating By Spraying Or Casting (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110328241.5A CN103074562B (zh) | 2011-10-26 | 一种改进性能的y2o3耐侵蚀陶瓷涂层的制备方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110328241.5A CN103074562B (zh) | 2011-10-26 | 一种改进性能的y2o3耐侵蚀陶瓷涂层的制备方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103074562A true CN103074562A (zh) | 2013-05-01 |
CN103074562B CN103074562B (zh) | 2016-12-14 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20160298223A1 (en) * | 2013-12-02 | 2016-10-13 | Kurashiki Boring Kiko Co., Ltd. | Method for producing internal member of dry etching chamber |
CN108554746A (zh) * | 2018-03-28 | 2018-09-21 | 上海申和热磁电子有限公司 | 一种半导体刻蚀腔体用梯度陶瓷溶射层的制备方法 |
CN109877012A (zh) * | 2019-02-09 | 2019-06-14 | 沈阳富创精密设备有限公司 | 一种制备高致密氧化钇涂层的方法 |
CN109963825A (zh) * | 2016-11-16 | 2019-07-02 | 阔斯泰公司 | 耐腐蚀组件和制造方法 |
US11376822B2 (en) | 2015-11-16 | 2022-07-05 | Coorstek, Inc. | Corrosion-resistant components and methods of making |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1156130A1 (en) * | 1999-12-10 | 2001-11-21 | Tocalo Co. Ltd. | Plasma processing container internal member and production method therefor |
WO2007013184A1 (ja) * | 2005-07-29 | 2007-02-01 | Tocalo Co., Ltd. | Y2o3溶射皮膜被覆部材およびその製造方法 |
TW200925323A (en) * | 2007-12-06 | 2009-06-16 | Tocalo Co Ltd | Method of forming black yttrium oxide sprayed coating and member provided with black yttrium oxide sprayed coating |
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1156130A1 (en) * | 1999-12-10 | 2001-11-21 | Tocalo Co. Ltd. | Plasma processing container internal member and production method therefor |
WO2007013184A1 (ja) * | 2005-07-29 | 2007-02-01 | Tocalo Co., Ltd. | Y2o3溶射皮膜被覆部材およびその製造方法 |
TW200925323A (en) * | 2007-12-06 | 2009-06-16 | Tocalo Co Ltd | Method of forming black yttrium oxide sprayed coating and member provided with black yttrium oxide sprayed coating |
Non-Patent Citations (2)
Title |
---|
HYUN-KWANG SEOK 等: "(Characterization of plasma-sprayed Y2O3 coating and investigation of its visual aspect change", 《SURFACE & COATINGS TECHNOLOGY》 * |
刘邦武 等: "等离子喷涂氧化钇涂层的组织结构", 《金属热处理》 * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20160298223A1 (en) * | 2013-12-02 | 2016-10-13 | Kurashiki Boring Kiko Co., Ltd. | Method for producing internal member of dry etching chamber |
US11376822B2 (en) | 2015-11-16 | 2022-07-05 | Coorstek, Inc. | Corrosion-resistant components and methods of making |
CN109963825A (zh) * | 2016-11-16 | 2019-07-02 | 阔斯泰公司 | 耐腐蚀组件和制造方法 |
CN109963825B (zh) * | 2016-11-16 | 2022-08-09 | 阔斯泰公司 | 耐腐蚀组件和制造方法 |
CN108554746A (zh) * | 2018-03-28 | 2018-09-21 | 上海申和热磁电子有限公司 | 一种半导体刻蚀腔体用梯度陶瓷溶射层的制备方法 |
CN109877012A (zh) * | 2019-02-09 | 2019-06-14 | 沈阳富创精密设备有限公司 | 一种制备高致密氧化钇涂层的方法 |
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Effective date of registration: 20201215 Address after: 510000 601, building a, 136 Kaiyuan Avenue, Huangpu District, Guangzhou City, Guangdong Province Patentee after: AoXin integrated circuit technology (Guangdong) Co.,Ltd. Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee before: Institute of Microelectronics of the Chinese Academy of Sciences |
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Effective date of registration: 20220425 Address after: 510000 room 710, Jianshe building, No. 348, Kaifa Avenue, Huangpu District, Guangzhou, Guangdong Patentee after: Ruili flat core Microelectronics (Guangzhou) Co.,Ltd. Address before: 510000 601, building a, 136 Kaiyuan Avenue, Huangpu District, Guangzhou City, Guangdong Province Patentee before: AoXin integrated circuit technology (Guangdong) Co.,Ltd. |
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