CN102918442B - 低热应力双折射成像透镜 - Google Patents

低热应力双折射成像透镜 Download PDF

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Publication number
CN102918442B
CN102918442B CN201180024845.9A CN201180024845A CN102918442B CN 102918442 B CN102918442 B CN 102918442B CN 201180024845 A CN201180024845 A CN 201180024845A CN 102918442 B CN102918442 B CN 102918442B
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CN
China
Prior art keywords
lens
glass
thermal stress
birefringence
stress birefringence
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CN201180024845.9A
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English (en)
Chinese (zh)
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CN102918442A (zh
Inventor
安德鲁·弗雷德里克·库尔茨
约瑟夫·雷蒙德·比耶特里
巴里·D·西尔弗斯坦
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Imax Corp
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Eastman Kodak Co
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Publication of CN102918442A publication Critical patent/CN102918442A/zh
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/16—Optical objectives specially designed for the purposes specified below for use in conjunction with image converters or intensifiers, or for use with projectors, e.g. objectives for projection TV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Lenses (AREA)
CN201180024845.9A 2010-05-21 2011-05-18 低热应力双折射成像透镜 Active CN102918442B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/784,520 US8649094B2 (en) 2010-05-21 2010-05-21 Low thermal stress birefringence imaging lens
US12/784,520 2010-05-21
PCT/US2011/036925 WO2011146566A1 (en) 2010-05-21 2011-05-18 Low thermal stress birefringence imaging lens

Publications (2)

Publication Number Publication Date
CN102918442A CN102918442A (zh) 2013-02-06
CN102918442B true CN102918442B (zh) 2014-11-05

Family

ID=44121309

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201180024845.9A Active CN102918442B (zh) 2010-05-21 2011-05-18 低热应力双折射成像透镜

Country Status (5)

Country Link
US (2) US8649094B2 (enExample)
EP (1) EP2572223B1 (enExample)
JP (1) JP2013531807A (enExample)
CN (1) CN102918442B (enExample)
WO (1) WO2011146566A1 (enExample)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8649094B2 (en) * 2010-05-21 2014-02-11 Eastman Kodak Company Low thermal stress birefringence imaging lens
US9492969B2 (en) * 2010-05-28 2016-11-15 Lawrence Livermore National Security, Llc High resolution projection micro stereolithography system and method
GB2488245B (en) * 2011-02-21 2018-12-05 Zeiss Carl Optronics Gmbh Optics for thermal imaging cameras
US8749796B2 (en) * 2011-08-09 2014-06-10 Primesense Ltd. Projectors of structured light
CN104868361B (zh) * 2011-10-11 2019-07-16 深圳光峰科技股份有限公司 光源系统与激光光源
US8830580B2 (en) * 2011-10-27 2014-09-09 Eastman Kodak Company Low thermal stress catadioptric imaging optics
US10254521B2 (en) 2011-12-13 2019-04-09 Signify Holding B.V. Optical collimator for LED lights
JP6230222B2 (ja) * 2012-10-12 2017-11-15 キヤノン株式会社 レンズアレイ光学系及びレンズアレイの製造方法
JP6471424B2 (ja) * 2013-11-13 2019-02-20 セイコーエプソン株式会社 プロジェクター
US9392153B2 (en) * 2013-12-24 2016-07-12 Lytro, Inc. Plenoptic camera resolution
JP2015228015A (ja) * 2014-05-02 2015-12-17 キヤノン株式会社 画像投射装置
JP2015230989A (ja) * 2014-06-05 2015-12-21 株式会社リコー 撮像モジュール及び撮像装置
CN112946974B (zh) 2014-12-31 2022-11-08 杜比实验室特许公司 用于图像投影仪的高对比度分立输入棱镜
EP4050895A1 (en) 2015-05-06 2022-08-31 Dolby Laboratories Licensing Corp. Thermal compensation in image projection
CN105511093B (zh) * 2015-06-18 2018-02-09 广州优视网络科技有限公司 3d成像方法及装置
WO2017127844A1 (en) * 2016-01-22 2017-07-27 Hera Systems, Inc. Imaging system optimized for nanosatellites with multiple cameras and image stabilization and pixel shifting
US10475171B2 (en) 2016-01-22 2019-11-12 Hera Systems, Inc. Multi-camera imaging system for nanosatellites
US10670853B2 (en) 2016-01-22 2020-06-02 Hera Systems, Inc. Imaging system with an optical path and telescope shape optimized for nanosatellites
US10338376B2 (en) 2016-01-22 2019-07-02 Hera Systems, Inc. Image stabilization and pixel shifting for a nanosatellite imaging system
US20210168352A1 (en) 2016-01-26 2021-06-03 Imax Corporation Stereo image projection with high intra-frame contrast
DE102016108040B4 (de) * 2016-04-29 2018-05-09 Sypro Optics Gmbh Beleuchtungseinrichtung für Gestenerkennungsvorrichtung
US10875247B2 (en) 2016-07-15 2020-12-29 Lawrence Livermore National Securitv. LLC Multi-beam resin curing system and method for whole-volume additive manufacturing
KR102464368B1 (ko) * 2017-11-07 2022-11-07 삼성전자주식회사 메타 프로젝터 및 이를 포함하는 전자 장치
US11889234B2 (en) 2017-11-14 2024-01-30 Imax Theatres International Limited Light conditioning of direct view display for cinema
CN111492293B (zh) * 2017-12-19 2022-07-29 松下知识产权经营株式会社 投影镜头系统以及图像投影装置
TWI687717B (zh) * 2018-04-11 2020-03-11 大立光電股份有限公司 光學影像鏡頭、取像裝置及電子裝置
DE202019005386U1 (de) * 2018-04-17 2020-06-19 Saint-Gobain Glass France Optische Sensoranordnung, insbesondere für ein Kraftfahrzeug
CN108801930B (zh) * 2018-05-30 2020-09-08 华中科技大学 一种高时间分辨率的穆勒矩阵椭偏测量装置与方法
EP3712686A1 (en) * 2019-03-18 2020-09-23 LIMO Display GmbH Device for generating a linear intensity distribution in a working plane
US12467939B2 (en) * 2022-07-15 2025-11-11 The George Washington University Optical probe for measuring wall-shear stress
EP4573396A2 (en) * 2022-08-19 2025-06-25 Nil Technology ApS Optical lens systems and imaging systems incorporating the same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1576950A (zh) * 2003-06-25 2005-02-09 伊斯曼柯达公司 显示设备
CN101243360A (zh) * 2005-06-14 2008-08-13 卡尔蔡司Smt股份公司 具有大孔径和平面端面的投影物镜

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US583336A (en) 1897-05-25 Paul rudolph
US4441791A (en) 1980-09-02 1984-04-10 Texas Instruments Incorporated Deformable mirror light modulator
GB2153543B (en) * 1983-12-28 1988-09-01 Canon Kk A projection exposure apparatus
US4704011A (en) 1985-12-13 1987-11-03 Lockheed Missiles & Space Company, Inc. Three-glass photographic objective color-corrected at four wavelengths
US4770477A (en) * 1986-12-04 1988-09-13 The Perkin-Elmer Corporation Lens usable in the ultraviolet
US5083857A (en) 1990-06-29 1992-01-28 Texas Instruments Incorporated Multi-level deformable mirror device
US5172275A (en) 1990-12-14 1992-12-15 Eastman Kodak Company Apochromatic relay lens systems suitable for use in a high definition telecine apparatus
US5576854A (en) 1993-11-12 1996-11-19 Hughes-Jvc Technology Corporation Liquid crystal light valve projector with improved contrast ratio and with 0.27 wavelength compensation for birefringence in the liquid crystal light valve
US5625495A (en) * 1994-12-07 1997-04-29 U.S. Precision Lens Inc. Telecentric lens systems for forming an image of an object composed of pixels
US5535047A (en) 1995-04-18 1996-07-09 Texas Instruments Incorporated Active yoke hidden hinge digital micromirror device
US6317268B1 (en) 1999-11-23 2001-11-13 Eastman Kodak Company Movie projection lens
US7187503B2 (en) * 1999-12-29 2007-03-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
EP1134606B1 (de) 2000-01-18 2002-04-10 Isco-Optic Gmbh Projektionsobjektiv
DE10123725A1 (de) 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
US6785051B2 (en) 2001-07-18 2004-08-31 Corning Incorporated Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures
US6547396B1 (en) 2001-12-27 2003-04-15 Infocus Corporation Stereographic projection system
US6909473B2 (en) 2002-01-07 2005-06-21 Eastman Kodak Company Display apparatus and method
US6774983B2 (en) * 2002-08-12 2004-08-10 Anvik Corporation Distributed projection system
US6958864B2 (en) 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
US6758565B1 (en) * 2003-03-20 2004-07-06 Eastman Kodak Company Projection apparatus using telecentric optics
DE10316428A1 (de) 2003-04-08 2004-10-21 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
US7832869B2 (en) 2003-10-21 2010-11-16 Barco N.V. Method and device for performing stereoscopic image display based on color selective filters
US7170574B2 (en) 2003-12-11 2007-01-30 Jds Uniphase Corporation Trim retarders incorporating negative birefringence
JP4868209B2 (ja) * 2004-11-10 2012-02-01 株式会社ニコン 投影光学系、露光装置、および露光方法
US20060218971A1 (en) * 2005-02-10 2006-10-05 Rolf Martin Synthetic quartz glass and process for producing a quartz glass body
JP4738879B2 (ja) * 2005-03-10 2011-08-03 富士フイルム株式会社 画像読取用レンズおよび画像読取装置
US7357511B2 (en) 2005-03-23 2008-04-15 3M Innovative Properties Company Stress birefringence compensation in polarizing beamsplitters and systems using same
US7518662B2 (en) 2005-05-22 2009-04-14 Real D Contrast enhancement for liquid crystal based projection systems
EP2501139A3 (en) 2005-05-26 2014-01-08 RealD Inc. Ghost-compensation for improved stereoscopic projection
US7528906B2 (en) 2006-01-23 2009-05-05 Real D Achromatic polarization switches
JP4931628B2 (ja) 2006-03-09 2012-05-16 セイコーインスツル株式会社 照明装置及びこれを備える表示装置
CN101479637B (zh) 2006-05-05 2011-09-21 康宁股份有限公司 准远心成像透镜的畸变调谐
DE102008051252B4 (de) * 2008-10-10 2016-09-08 Sypro Optics Gmbh Projektionsobjektiv und Projektor
US8504328B2 (en) * 2010-05-21 2013-08-06 Eastman Kodak Company Designing lenses using stress birefringence performance criterion
US8649094B2 (en) * 2010-05-21 2014-02-11 Eastman Kodak Company Low thermal stress birefringence imaging lens
US8287129B2 (en) * 2010-05-21 2012-10-16 Eastman Kodak Company Low thermal stress birefringence imaging system
US8786943B2 (en) * 2011-10-27 2014-07-22 Eastman Kodak Company Low thermal stress catadioptric imaging system
US8830580B2 (en) * 2011-10-27 2014-09-09 Eastman Kodak Company Low thermal stress catadioptric imaging optics

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1576950A (zh) * 2003-06-25 2005-02-09 伊斯曼柯达公司 显示设备
CN101243360A (zh) * 2005-06-14 2008-08-13 卡尔蔡司Smt股份公司 具有大孔径和平面端面的投影物镜

Also Published As

Publication number Publication date
EP2572223A1 (en) 2013-03-27
US20140036377A1 (en) 2014-02-06
EP2572223B1 (en) 2020-10-21
WO2011146566A1 (en) 2011-11-24
US20110292505A1 (en) 2011-12-01
JP2013531807A (ja) 2013-08-08
US8649094B2 (en) 2014-02-11
CN102918442A (zh) 2013-02-06
US9069105B2 (en) 2015-06-30

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