JP2013531807A - 低熱応力複屈折画像レンズ - Google Patents

低熱応力複屈折画像レンズ Download PDF

Info

Publication number
JP2013531807A
JP2013531807A JP2013511316A JP2013511316A JP2013531807A JP 2013531807 A JP2013531807 A JP 2013531807A JP 2013511316 A JP2013511316 A JP 2013511316A JP 2013511316 A JP2013511316 A JP 2013511316A JP 2013531807 A JP2013531807 A JP 2013531807A
Authority
JP
Japan
Prior art keywords
lens
glass
stress birefringence
thermal stress
lens element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2013511316A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013531807A5 (enExample
Inventor
フレデリック カーツ，アンドリュー
レイモンド ビートリー，ジョセフ
ディー シルヴァーステイン，バリー
Original Assignee
イーストマン コダック カンパニー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by イーストマン コダック カンパニー filed Critical イーストマン コダック カンパニー
Publication of JP2013531807A publication Critical patent/JP2013531807A/ja
Publication of JP2013531807A5 publication Critical patent/JP2013531807A5/ja
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/16—Optical objectives specially designed for the purposes specified below for use in conjunction with image converters or intensifiers, or for use with projectors, e.g. objectives for projection TV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Lenses (AREA)
JP2013511316A 2010-05-21 2011-05-18 低熱応力複屈折画像レンズ Pending JP2013531807A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/784,520 2010-05-21
US12/784,520 US8649094B2 (en) 2010-05-21 2010-05-21 Low thermal stress birefringence imaging lens
PCT/US2011/036925 WO2011146566A1 (en) 2010-05-21 2011-05-18 Low thermal stress birefringence imaging lens

Publications (2)

Publication Number Publication Date
JP2013531807A true JP2013531807A (ja) 2013-08-08
JP2013531807A5 JP2013531807A5 (enExample) 2014-07-03

Family

ID=44121309

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013511316A Pending JP2013531807A (ja) 2010-05-21 2011-05-18 低熱応力複屈折画像レンズ

Country Status (5)

Country Link
US (2) US8649094B2 (enExample)
EP (1) EP2572223B1 (enExample)
JP (1) JP2013531807A (enExample)
CN (1) CN102918442B (enExample)
WO (1) WO2011146566A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017504082A (ja) * 2013-12-24 2017-02-02 ライトロ, インコーポレイテッドLytro, Inc. プレノプティックカメラの分解能の改良
JP2022177091A (ja) * 2017-12-19 2022-11-30 パナソニックＩｐマネジメント株式会社 投写レンズ系及び画像投写装置

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8649094B2 (en) * 2010-05-21 2014-02-11 Eastman Kodak Company Low thermal stress birefringence imaging lens
US9492969B2 (en) * 2010-05-28 2016-11-15 Lawrence Livermore National Security, Llc High resolution projection micro stereolithography system and method
GB2488245B (en) * 2011-02-21 2018-12-05 Zeiss Carl Optronics Gmbh Optics for thermal imaging cameras
US8749796B2 (en) * 2011-08-09 2014-06-10 Primesense Ltd. Projectors of structured light
CN104868361B (zh) 2011-10-11 2019-07-16 深圳光峰科技股份有限公司 光源系统与激光光源
US8830580B2 (en) * 2011-10-27 2014-09-09 Eastman Kodak Company Low thermal stress catadioptric imaging optics
WO2013088299A1 (en) * 2011-12-13 2013-06-20 Koninklijke Philips Electronics N.V. Optical collimator for led lights
JP6230222B2 (ja) * 2012-10-12 2017-11-15 キヤノン株式会社 レンズアレイ光学系及びレンズアレイの製造方法
JP6471424B2 (ja) * 2013-11-13 2019-02-20 セイコーエプソン株式会社 プロジェクター
JP2015228015A (ja) * 2014-05-02 2015-12-17 キヤノン株式会社 画像投射装置
JP2015230989A (ja) * 2014-06-05 2015-12-21 株式会社リコー 撮像モジュール及び撮像装置
CN112946974B (zh) 2014-12-31 2022-11-08 杜比实验室特许公司 用于图像投影仪的高对比度分立输入棱镜
EP4050895A1 (en) 2015-05-06 2022-08-31 Dolby Laboratories Licensing Corp. Thermal compensation in image projection
CN105511093B (zh) * 2015-06-18 2018-02-09 广州优视网络科技有限公司 3d成像方法及装置
WO2017127844A1 (en) * 2016-01-22 2017-07-27 Hera Systems, Inc. Imaging system optimized for nanosatellites with multiple cameras and image stabilization and pixel shifting
US10338376B2 (en) 2016-01-22 2019-07-02 Hera Systems, Inc. Image stabilization and pixel shifting for a nanosatellite imaging system
US10670853B2 (en) 2016-01-22 2020-06-02 Hera Systems, Inc. Imaging system with an optical path and telescope shape optimized for nanosatellites
US10475171B2 (en) 2016-01-22 2019-11-12 Hera Systems, Inc. Multi-camera imaging system for nanosatellites
WO2017130121A1 (en) 2016-01-26 2017-08-03 Imax Corporation Stereo image projection with high intra-frame contrast
DE102016108040B4 (de) * 2016-04-29 2018-05-09 Sypro Optics Gmbh Beleuchtungseinrichtung für Gestenerkennungsvorrichtung
US10875247B2 (en) 2016-07-15 2020-12-29 Lawrence Livermore National Securitv. LLC Multi-beam resin curing system and method for whole-volume additive manufacturing
KR102464368B1 (ko) * 2017-11-07 2022-11-07 삼성전자주식회사 메타 프로젝터 및 이를 포함하는 전자 장치
CN111344605B (zh) 2017-11-14 2023-10-20 图像影院国际有限公司 针对影院的直视型显示器的光调节
TWI687717B (zh) * 2018-04-11 2020-03-11 大立光電股份有限公司 光學影像鏡頭、取像裝置及電子裝置
CN110621544A (zh) * 2018-04-17 2019-12-27 法国圣戈班玻璃厂 光学传感器装置、尤其是机动车的光学传感器装置
CN108801930B (zh) * 2018-05-30 2020-09-08 华中科技大学 一种高时间分辨率的穆勒矩阵椭偏测量装置与方法
EP3712686A1 (en) * 2019-03-18 2020-09-23 LIMO Display GmbH Device for generating a linear intensity distribution in a working plane
US12467939B2 (en) * 2022-07-15 2025-11-11 The George Washington University Optical probe for measuring wall-shear stress
JP2025529829A (ja) * 2022-08-19 2025-09-09 ニル・テクノロジー・アンパルトセルスカブ 光学レンズシステムおよび光学レンズシステムが組み込まれた撮像システム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006163369A (ja) * 2004-11-10 2006-06-22 Nikon Corp 投影光学系、露光装置、および露光方法
JP2009536370A (ja) * 2006-05-05 2009-10-08 コーニング インコーポレイテッド 擬テレセントリック結像レンズの歪調整

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US583336A (en) 1897-05-25 Paul rudolph
US4441791A (en) 1980-09-02 1984-04-10 Texas Instruments Incorporated Deformable mirror light modulator
GB2153543B (en) * 1983-12-28 1988-09-01 Canon Kk A projection exposure apparatus
US4704011A (en) 1985-12-13 1987-11-03 Lockheed Missiles & Space Company, Inc. Three-glass photographic objective color-corrected at four wavelengths
US4770477A (en) * 1986-12-04 1988-09-13 The Perkin-Elmer Corporation Lens usable in the ultraviolet
US5083857A (en) 1990-06-29 1992-01-28 Texas Instruments Incorporated Multi-level deformable mirror device
US5172275A (en) 1990-12-14 1992-12-15 Eastman Kodak Company Apochromatic relay lens systems suitable for use in a high definition telecine apparatus
US5576854A (en) 1993-11-12 1996-11-19 Hughes-Jvc Technology Corporation Liquid crystal light valve projector with improved contrast ratio and with 0.27 wavelength compensation for birefringence in the liquid crystal light valve
US5625495A (en) * 1994-12-07 1997-04-29 U.S. Precision Lens Inc. Telecentric lens systems for forming an image of an object composed of pixels
US5535047A (en) 1995-04-18 1996-07-09 Texas Instruments Incorporated Active yoke hidden hinge digital micromirror device
US6317268B1 (en) 1999-11-23 2001-11-13 Eastman Kodak Company Movie projection lens
US7187503B2 (en) * 1999-12-29 2007-03-06 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
ATE216088T1 (de) 2000-01-18 2002-04-15 Isco Optic Gmbh Projektionsobjektiv
DE10123725A1 (de) 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
US6785051B2 (en) 2001-07-18 2004-08-31 Corning Incorporated Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures
US6547396B1 (en) 2001-12-27 2003-04-15 Infocus Corporation Stereographic projection system
US6909473B2 (en) 2002-01-07 2005-06-21 Eastman Kodak Company Display apparatus and method
US6774983B2 (en) * 2002-08-12 2004-08-10 Anvik Corporation Distributed projection system
US7072102B2 (en) 2002-08-22 2006-07-04 Asml Netherlands B.V. Methods for reducing polarization aberration in optical systems
US6758565B1 (en) * 2003-03-20 2004-07-06 Eastman Kodak Company Projection apparatus using telecentric optics
DE10316428A1 (de) 2003-04-08 2004-10-21 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
US6839181B1 (en) * 2003-06-25 2005-01-04 Eastman Kodak Company Display apparatus
DE602004018551D1 (de) 2003-10-21 2009-01-29 Barco Nv Verfahren und Vorrichtung zur Durchführung einer stereoskopischen Bildanzeige auf der Basis von farbselektiven Filtern
US7170574B2 (en) 2003-12-11 2007-01-30 Jds Uniphase Corporation Trim retarders incorporating negative birefringence
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
US20060218971A1 (en) * 2005-02-10 2006-10-05 Rolf Martin Synthetic quartz glass and process for producing a quartz glass body
JP4738879B2 (ja) * 2005-03-10 2011-08-03 富士フイルム株式会社 画像読取用レンズおよび画像読取装置
US7357511B2 (en) 2005-03-23 2008-04-15 3M Innovative Properties Company Stress birefringence compensation in polarizing beamsplitters and systems using same
US7518662B2 (en) 2005-05-22 2009-04-14 Real D Contrast enhancement for liquid crystal based projection systems
KR101423592B1 (ko) 2005-05-26 2014-07-30 리얼디 인크. 개선된 입체투사를 위한 고스트 보정
US7528906B2 (en) 2006-01-23 2009-05-05 Real D Achromatic polarization switches
JP4931628B2 (ja) 2006-03-09 2012-05-16 セイコーインスツル株式会社 照明装置及びこれを備える表示装置
DE102008051252B4 (de) * 2008-10-10 2016-09-08 Sypro Optics Gmbh Projektionsobjektiv und Projektor
US8504328B2 (en) * 2010-05-21 2013-08-06 Eastman Kodak Company Designing lenses using stress birefringence performance criterion
US8649094B2 (en) * 2010-05-21 2014-02-11 Eastman Kodak Company Low thermal stress birefringence imaging lens
US8287129B2 (en) * 2010-05-21 2012-10-16 Eastman Kodak Company Low thermal stress birefringence imaging system
US8830580B2 (en) * 2011-10-27 2014-09-09 Eastman Kodak Company Low thermal stress catadioptric imaging optics
US8786943B2 (en) * 2011-10-27 2014-07-22 Eastman Kodak Company Low thermal stress catadioptric imaging system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006163369A (ja) * 2004-11-10 2006-06-22 Nikon Corp 投影光学系、露光装置、および露光方法
JP2009536370A (ja) * 2006-05-05 2009-10-08 コーニング インコーポレイテッド 擬テレセントリック結像レンズの歪調整

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017504082A (ja) * 2013-12-24 2017-02-02 ライトロ, インコーポレイテッドLytro, Inc. プレノプティックカメラの分解能の改良
JP2022177091A (ja) * 2017-12-19 2022-11-30 パナソニックＩｐマネジメント株式会社 投写レンズ系及び画像投写装置
JP7390671B2 (ja) 2017-12-19 2023-12-04 パナソニックＩｐマネジメント株式会社 投写レンズ系及び画像投写装置

Also Published As

Publication number Publication date
CN102918442B (zh) 2014-11-05
CN102918442A (zh) 2013-02-06
US20110292505A1 (en) 2011-12-01
US8649094B2 (en) 2014-02-11
EP2572223A1 (en) 2013-03-27
US20140036377A1 (en) 2014-02-06
US9069105B2 (en) 2015-06-30
WO2011146566A1 (en) 2011-11-24
EP2572223B1 (en) 2020-10-21

Similar Documents

Publication Publication Date Title
JP5731636B2 (ja) 応力複屈折性能基準を用いたレンズ設計方法
US9069105B2 (en) Low thermal stress birefringence imaging lens
US8830580B2 (en) Low thermal stress catadioptric imaging optics
US8287129B2 (en) Low thermal stress birefringence imaging system
US6672721B2 (en) Projection system having low astigmatism
US20200271932A1 (en) Micro led display system
KR20200009062A (ko) 다층의 높은 동적 범위 헤드 마운티드 디스플레이
US8786943B2 (en) Low thermal stress catadioptric imaging system
US10650785B1 (en) Color management of display device
US12282168B2 (en) Anamorphic directional illumination device with selective light-guiding
US20230418068A1 (en) Anamorphic directional illumination device
US20240427123A1 (en) Anamorphic directional illumination device
US20230418034A1 (en) Anamorphic directional illumination device
US20240427152A1 (en) Anamorphic directional illumination device
US20240427161A1 (en) Anamorphic directional illumination device
US20250164798A1 (en) Anamorphic Near-Eye Display Device
CN113841088B (zh) 图像显示设备和图像显示单元
JP2006091727A (ja) 色分解合成光学系
JP2016177128A (ja) プロジェクター

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140513

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20140513

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20141119

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20141202

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20150512