JP2013531807A5 - - Google Patents
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- Publication number
- JP2013531807A5 JP2013531807A5 JP2013511316A JP2013511316A JP2013531807A5 JP 2013531807 A5 JP2013531807 A5 JP 2013531807A5 JP 2013511316 A JP2013511316 A JP 2013511316A JP 2013511316 A JP2013511316 A JP 2013511316A JP 2013531807 A5 JP2013531807 A5 JP 2013531807A5
- Authority
- JP
- Japan
- Prior art keywords
- thermal stress
- glass
- stress birefringence
- sensitivity
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008646 thermal stress Effects 0.000 claims 17
- 239000011521 glass Substances 0.000 claims 12
- 230000035945 sensitivity Effects 0.000 claims 12
- 238000003384 imaging method Methods 0.000 claims 4
- 230000035882 stress Effects 0.000 claims 4
- 230000003287 optical effect Effects 0.000 claims 3
- 230000031700 light absorption Effects 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000011156 evaluation Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/784,520 | 2010-05-21 | ||
| US12/784,520 US8649094B2 (en) | 2010-05-21 | 2010-05-21 | Low thermal stress birefringence imaging lens |
| PCT/US2011/036925 WO2011146566A1 (en) | 2010-05-21 | 2011-05-18 | Low thermal stress birefringence imaging lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013531807A JP2013531807A (ja) | 2013-08-08 |
| JP2013531807A5 true JP2013531807A5 (enExample) | 2014-07-03 |
Family
ID=44121309
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013511316A Pending JP2013531807A (ja) | 2010-05-21 | 2011-05-18 | 低熱応力複屈折画像レンズ |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US8649094B2 (enExample) |
| EP (1) | EP2572223B1 (enExample) |
| JP (1) | JP2013531807A (enExample) |
| CN (1) | CN102918442B (enExample) |
| WO (1) | WO2011146566A1 (enExample) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8649094B2 (en) * | 2010-05-21 | 2014-02-11 | Eastman Kodak Company | Low thermal stress birefringence imaging lens |
| US9492969B2 (en) * | 2010-05-28 | 2016-11-15 | Lawrence Livermore National Security, Llc | High resolution projection micro stereolithography system and method |
| GB2488245B (en) * | 2011-02-21 | 2018-12-05 | Zeiss Carl Optronics Gmbh | Optics for thermal imaging cameras |
| US8749796B2 (en) * | 2011-08-09 | 2014-06-10 | Primesense Ltd. | Projectors of structured light |
| CN104868361B (zh) | 2011-10-11 | 2019-07-16 | 深圳光峰科技股份有限公司 | 光源系统与激光光源 |
| US8830580B2 (en) * | 2011-10-27 | 2014-09-09 | Eastman Kodak Company | Low thermal stress catadioptric imaging optics |
| WO2013088299A1 (en) * | 2011-12-13 | 2013-06-20 | Koninklijke Philips Electronics N.V. | Optical collimator for led lights |
| JP6230222B2 (ja) * | 2012-10-12 | 2017-11-15 | キヤノン株式会社 | レンズアレイ光学系及びレンズアレイの製造方法 |
| JP6471424B2 (ja) * | 2013-11-13 | 2019-02-20 | セイコーエプソン株式会社 | プロジェクター |
| DE112014005866B4 (de) * | 2013-12-24 | 2018-08-02 | Lytro, Inc. | Verbesserung der plenoptischen Kameraauflösung |
| JP2015228015A (ja) * | 2014-05-02 | 2015-12-17 | キヤノン株式会社 | 画像投射装置 |
| JP2015230989A (ja) * | 2014-06-05 | 2015-12-21 | 株式会社リコー | 撮像モジュール及び撮像装置 |
| CN112946974B (zh) | 2014-12-31 | 2022-11-08 | 杜比实验室特许公司 | 用于图像投影仪的高对比度分立输入棱镜 |
| EP4050895A1 (en) | 2015-05-06 | 2022-08-31 | Dolby Laboratories Licensing Corp. | Thermal compensation in image projection |
| CN105511093B (zh) * | 2015-06-18 | 2018-02-09 | 广州优视网络科技有限公司 | 3d成像方法及装置 |
| WO2017127844A1 (en) * | 2016-01-22 | 2017-07-27 | Hera Systems, Inc. | Imaging system optimized for nanosatellites with multiple cameras and image stabilization and pixel shifting |
| US10338376B2 (en) | 2016-01-22 | 2019-07-02 | Hera Systems, Inc. | Image stabilization and pixel shifting for a nanosatellite imaging system |
| US10670853B2 (en) | 2016-01-22 | 2020-06-02 | Hera Systems, Inc. | Imaging system with an optical path and telescope shape optimized for nanosatellites |
| US10475171B2 (en) | 2016-01-22 | 2019-11-12 | Hera Systems, Inc. | Multi-camera imaging system for nanosatellites |
| WO2017130121A1 (en) | 2016-01-26 | 2017-08-03 | Imax Corporation | Stereo image projection with high intra-frame contrast |
| DE102016108040B4 (de) * | 2016-04-29 | 2018-05-09 | Sypro Optics Gmbh | Beleuchtungseinrichtung für Gestenerkennungsvorrichtung |
| US10875247B2 (en) | 2016-07-15 | 2020-12-29 | Lawrence Livermore National Securitv. LLC | Multi-beam resin curing system and method for whole-volume additive manufacturing |
| KR102464368B1 (ko) * | 2017-11-07 | 2022-11-07 | 삼성전자주식회사 | 메타 프로젝터 및 이를 포함하는 전자 장치 |
| CN111344605B (zh) | 2017-11-14 | 2023-10-20 | 图像影院国际有限公司 | 针对影院的直视型显示器的光调节 |
| JPWO2019124082A1 (ja) * | 2017-12-19 | 2021-01-28 | パナソニックIpマネジメント株式会社 | 投写レンズ系及び画像投写装置 |
| TWI687717B (zh) * | 2018-04-11 | 2020-03-11 | 大立光電股份有限公司 | 光學影像鏡頭、取像裝置及電子裝置 |
| CN110621544A (zh) * | 2018-04-17 | 2019-12-27 | 法国圣戈班玻璃厂 | 光学传感器装置、尤其是机动车的光学传感器装置 |
| CN108801930B (zh) * | 2018-05-30 | 2020-09-08 | 华中科技大学 | 一种高时间分辨率的穆勒矩阵椭偏测量装置与方法 |
| EP3712686A1 (en) * | 2019-03-18 | 2020-09-23 | LIMO Display GmbH | Device for generating a linear intensity distribution in a working plane |
| US12467939B2 (en) * | 2022-07-15 | 2025-11-11 | The George Washington University | Optical probe for measuring wall-shear stress |
| JP2025529829A (ja) * | 2022-08-19 | 2025-09-09 | ニル・テクノロジー・アンパルトセルスカブ | 光学レンズシステムおよび光学レンズシステムが組み込まれた撮像システム |
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| US583336A (en) | 1897-05-25 | Paul rudolph | ||
| US4441791A (en) | 1980-09-02 | 1984-04-10 | Texas Instruments Incorporated | Deformable mirror light modulator |
| GB2153543B (en) * | 1983-12-28 | 1988-09-01 | Canon Kk | A projection exposure apparatus |
| US4704011A (en) | 1985-12-13 | 1987-11-03 | Lockheed Missiles & Space Company, Inc. | Three-glass photographic objective color-corrected at four wavelengths |
| US4770477A (en) * | 1986-12-04 | 1988-09-13 | The Perkin-Elmer Corporation | Lens usable in the ultraviolet |
| US5083857A (en) | 1990-06-29 | 1992-01-28 | Texas Instruments Incorporated | Multi-level deformable mirror device |
| US5172275A (en) | 1990-12-14 | 1992-12-15 | Eastman Kodak Company | Apochromatic relay lens systems suitable for use in a high definition telecine apparatus |
| US5576854A (en) | 1993-11-12 | 1996-11-19 | Hughes-Jvc Technology Corporation | Liquid crystal light valve projector with improved contrast ratio and with 0.27 wavelength compensation for birefringence in the liquid crystal light valve |
| US5625495A (en) * | 1994-12-07 | 1997-04-29 | U.S. Precision Lens Inc. | Telecentric lens systems for forming an image of an object composed of pixels |
| US5535047A (en) | 1995-04-18 | 1996-07-09 | Texas Instruments Incorporated | Active yoke hidden hinge digital micromirror device |
| US6317268B1 (en) | 1999-11-23 | 2001-11-13 | Eastman Kodak Company | Movie projection lens |
| US7187503B2 (en) * | 1999-12-29 | 2007-03-06 | Carl Zeiss Smt Ag | Refractive projection objective for immersion lithography |
| ATE216088T1 (de) | 2000-01-18 | 2002-04-15 | Isco Optic Gmbh | Projektionsobjektiv |
| DE10123725A1 (de) | 2001-05-15 | 2002-11-21 | Zeiss Carl | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
| US6785051B2 (en) | 2001-07-18 | 2004-08-31 | Corning Incorporated | Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
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| US6909473B2 (en) | 2002-01-07 | 2005-06-21 | Eastman Kodak Company | Display apparatus and method |
| US6774983B2 (en) * | 2002-08-12 | 2004-08-10 | Anvik Corporation | Distributed projection system |
| US7072102B2 (en) | 2002-08-22 | 2006-07-04 | Asml Netherlands B.V. | Methods for reducing polarization aberration in optical systems |
| US6758565B1 (en) * | 2003-03-20 | 2004-07-06 | Eastman Kodak Company | Projection apparatus using telecentric optics |
| DE10316428A1 (de) | 2003-04-08 | 2004-10-21 | Carl Zeiss Smt Ag | Katadioptrisches Reduktionsobjektiv |
| US6839181B1 (en) * | 2003-06-25 | 2005-01-04 | Eastman Kodak Company | Display apparatus |
| DE602004018551D1 (de) | 2003-10-21 | 2009-01-29 | Barco Nv | Verfahren und Vorrichtung zur Durchführung einer stereoskopischen Bildanzeige auf der Basis von farbselektiven Filtern |
| US7170574B2 (en) | 2003-12-11 | 2007-01-30 | Jds Uniphase Corporation | Trim retarders incorporating negative birefringence |
| US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
| JP4868209B2 (ja) * | 2004-11-10 | 2012-02-01 | 株式会社ニコン | 投影光学系、露光装置、および露光方法 |
| US20060218971A1 (en) * | 2005-02-10 | 2006-10-05 | Rolf Martin | Synthetic quartz glass and process for producing a quartz glass body |
| JP4738879B2 (ja) * | 2005-03-10 | 2011-08-03 | 富士フイルム株式会社 | 画像読取用レンズおよび画像読取装置 |
| US7357511B2 (en) | 2005-03-23 | 2008-04-15 | 3M Innovative Properties Company | Stress birefringence compensation in polarizing beamsplitters and systems using same |
| US7518662B2 (en) | 2005-05-22 | 2009-04-14 | Real D | Contrast enhancement for liquid crystal based projection systems |
| KR101423592B1 (ko) | 2005-05-26 | 2014-07-30 | 리얼디 인크. | 개선된 입체투사를 위한 고스트 보정 |
| US7528906B2 (en) | 2006-01-23 | 2009-05-05 | Real D | Achromatic polarization switches |
| JP4931628B2 (ja) | 2006-03-09 | 2012-05-16 | セイコーインスツル株式会社 | 照明装置及びこれを備える表示装置 |
| JP2009536370A (ja) * | 2006-05-05 | 2009-10-08 | コーニング インコーポレイテッド | 擬テレセントリック結像レンズの歪調整 |
| DE102008051252B4 (de) * | 2008-10-10 | 2016-09-08 | Sypro Optics Gmbh | Projektionsobjektiv und Projektor |
| US8504328B2 (en) * | 2010-05-21 | 2013-08-06 | Eastman Kodak Company | Designing lenses using stress birefringence performance criterion |
| US8649094B2 (en) * | 2010-05-21 | 2014-02-11 | Eastman Kodak Company | Low thermal stress birefringence imaging lens |
| US8287129B2 (en) * | 2010-05-21 | 2012-10-16 | Eastman Kodak Company | Low thermal stress birefringence imaging system |
| US8830580B2 (en) * | 2011-10-27 | 2014-09-09 | Eastman Kodak Company | Low thermal stress catadioptric imaging optics |
| US8786943B2 (en) * | 2011-10-27 | 2014-07-22 | Eastman Kodak Company | Low thermal stress catadioptric imaging system |
-
2010
- 2010-05-21 US US12/784,520 patent/US8649094B2/en active Active
-
2011
- 2011-05-18 CN CN201180024845.9A patent/CN102918442B/zh active Active
- 2011-05-18 EP EP11721626.7A patent/EP2572223B1/en active Active
- 2011-05-18 JP JP2013511316A patent/JP2013531807A/ja active Pending
- 2011-05-18 WO PCT/US2011/036925 patent/WO2011146566A1/en not_active Ceased
-
2013
- 2013-10-01 US US14/042,755 patent/US9069105B2/en active Active