CN102885632B - 放射线检测装置和包括该放射线检测装置的检测系统 - Google Patents
放射线检测装置和包括该放射线检测装置的检测系统 Download PDFInfo
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- CN102885632B CN102885632B CN201210250693.0A CN201210250693A CN102885632B CN 102885632 B CN102885632 B CN 102885632B CN 201210250693 A CN201210250693 A CN 201210250693A CN 102885632 B CN102885632 B CN 102885632B
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- film transistor
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- 238000001514 detection method Methods 0.000 title claims abstract description 58
- 230000005855 radiation Effects 0.000 title claims abstract description 22
- 239000010409 thin film Substances 0.000 claims description 221
- 239000003990 capacitor Substances 0.000 claims description 52
- 238000006243 chemical reaction Methods 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 6
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- 230000005540 biological transmission Effects 0.000 claims description 2
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- 230000000977 initiatory effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 description 22
- 230000008859 change Effects 0.000 description 14
- 239000012535 impurity Substances 0.000 description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 8
- 229920005591 polysilicon Polymers 0.000 description 8
- 230000007423 decrease Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910021417 amorphous silicon Inorganic materials 0.000 description 5
- 238000003491 array Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000007667 floating Methods 0.000 description 4
- 230000003071 parasitic effect Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
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- 238000003745 diagnosis Methods 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
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- 239000004973 liquid crystal related substance Substances 0.000 description 1
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- 230000005258 radioactive decay Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/30—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from X-rays
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
- H04N25/779—Circuitry for scanning or addressing the pixel array
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/016—Manufacture or treatment of image sensors covered by group H10F39/12 of thin-film-based image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/189—X-ray, gamma-ray or corpuscular radiation imagers
- H10F39/1898—Indirect radiation image sensors, e.g. using luminescent members
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/803—Pixels having integrated switching, control, storage or amplification elements
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
- Measurement Of Radiation (AREA)
- Apparatus For Radiation Diagnosis (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011159011A JP5847472B2 (ja) | 2011-07-20 | 2011-07-20 | 検出装置及び検出システム |
| JP2011-159011 | 2011-07-20 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102885632A CN102885632A (zh) | 2013-01-23 |
| CN102885632B true CN102885632B (zh) | 2014-09-24 |
Family
ID=46980707
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210250693.0A Active CN102885632B (zh) | 2011-07-20 | 2012-07-19 | 放射线检测装置和包括该放射线检测装置的检测系统 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8680478B2 (enExample) |
| EP (1) | EP2549299B1 (enExample) |
| JP (1) | JP5847472B2 (enExample) |
| CN (1) | CN102885632B (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014192320A (ja) * | 2013-03-27 | 2014-10-06 | Sony Corp | 撮像装置および撮像表示システム |
| FR3013546B1 (fr) * | 2013-11-15 | 2017-05-19 | Trixell | Mise en commun de deux colonnes de pixels d'un detecteur d'images |
| JP6339853B2 (ja) * | 2014-05-01 | 2018-06-06 | キヤノン株式会社 | 放射線撮像装置および放射線撮像システム |
| WO2016030801A1 (en) * | 2014-08-29 | 2016-03-03 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device and electronic device |
| US10163948B2 (en) * | 2015-07-23 | 2018-12-25 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device and electronic device |
| US10356027B2 (en) * | 2016-10-03 | 2019-07-16 | HYP3R Inc | Location resolution of social media posts |
| US10527728B2 (en) * | 2017-01-27 | 2020-01-07 | Samsung Electronics Co., Ltd | Apparatus and method for range measurement |
| KR102462071B1 (ko) * | 2017-12-27 | 2022-11-01 | 엘지디스플레이 주식회사 | 시프트 레지스터, 게이트 구동 회로, 엑스선 탐지 패널 및 엑스선 탐지 장치 |
| JP7088686B2 (ja) * | 2018-02-15 | 2022-06-21 | Tianma Japan株式会社 | イメージセンサ及びイメージセンサの駆動方法 |
| CN110853591A (zh) * | 2019-11-11 | 2020-02-28 | 福建华佳彩有限公司 | 一种gip驱动电路及其控制方法 |
| KR20230047392A (ko) * | 2020-08-03 | 2023-04-07 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 및 전자 기기 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0474238A2 (en) * | 1990-09-05 | 1992-03-11 | Nec Corporation | Semiconductor memory circuit |
| CN1276535A (zh) * | 1999-06-07 | 2000-12-13 | 株式会社东芝 | 射线探测器 |
| CN101311785A (zh) * | 2007-05-21 | 2008-11-26 | 爱普生映像元器件有限公司 | 电光装置、电光装置的驱动电路以及电子设备 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6449381A (en) * | 1987-08-20 | 1989-02-23 | Fuji Photo Film Co Ltd | Solid-state image pickup device |
| JPH09163244A (ja) * | 1995-12-05 | 1997-06-20 | Olympus Optical Co Ltd | 固体撮像装置 |
| JP2001273785A (ja) * | 2000-03-29 | 2001-10-05 | Casio Comput Co Ltd | シフトレジスタ及び電子装置 |
| JP4991459B2 (ja) * | 2007-09-07 | 2012-08-01 | キヤノン株式会社 | 撮像装置及び放射線撮像システム |
| JP5188221B2 (ja) * | 2008-03-14 | 2013-04-24 | キヤノン株式会社 | 固体撮像装置 |
| JP5392533B2 (ja) * | 2008-10-10 | 2014-01-22 | ソニー株式会社 | 固体撮像素子、光学装置、信号処理装置及び信号処理システム |
| JP5248396B2 (ja) * | 2009-04-01 | 2013-07-31 | 浜松ホトニクス株式会社 | 固体撮像素子及びその製造方法、放射線撮像装置及びその製造方法、並びに固体撮像素子の検査方法 |
| JP2011015158A (ja) * | 2009-07-01 | 2011-01-20 | Toshiba Corp | 固体撮像装置 |
| JP5436121B2 (ja) * | 2009-09-28 | 2014-03-05 | キヤノン株式会社 | 撮像装置および放射線撮像システム |
| US8054935B2 (en) * | 2009-11-13 | 2011-11-08 | Au Optronics Corporation | Shift register with low power consumption |
-
2011
- 2011-07-20 JP JP2011159011A patent/JP5847472B2/ja active Active
-
2012
- 2012-06-22 EP EP12173101.2A patent/EP2549299B1/en active Active
- 2012-07-09 US US13/544,105 patent/US8680478B2/en active Active
- 2012-07-19 CN CN201210250693.0A patent/CN102885632B/zh active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0474238A2 (en) * | 1990-09-05 | 1992-03-11 | Nec Corporation | Semiconductor memory circuit |
| CN1276535A (zh) * | 1999-06-07 | 2000-12-13 | 株式会社东芝 | 射线探测器 |
| CN101311785A (zh) * | 2007-05-21 | 2008-11-26 | 爱普生映像元器件有限公司 | 电光装置、电光装置的驱动电路以及电子设备 |
Non-Patent Citations (3)
| Title |
|---|
| 15.2: 2.0 inch a-Si:H TFT-LCD with Low Noise Integrated Gate Driver;Jae Hwan Oh et.al.;《SID 05 DIGEST》;20051231;942-945 * |
| Jae Hwan Oh et.al..15.2: 2.0 inch a-Si:H TFT-LCD with Low Noise Integrated Gate Driver.《SID 05 DIGEST》.2005,942-945. |
| JP昭64-49381A 1989.02.23 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102885632A (zh) | 2013-01-23 |
| JP2013026780A (ja) | 2013-02-04 |
| EP2549299A3 (en) | 2015-04-01 |
| JP5847472B2 (ja) | 2016-01-20 |
| US8680478B2 (en) | 2014-03-25 |
| EP2549299B1 (en) | 2019-10-30 |
| EP2549299A2 (en) | 2013-01-23 |
| US20130020494A1 (en) | 2013-01-24 |
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| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |