CN102826762B - 薄膜形成装置以及薄膜形成方法 - Google Patents

薄膜形成装置以及薄膜形成方法 Download PDF

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Publication number
CN102826762B
CN102826762B CN201210182134.0A CN201210182134A CN102826762B CN 102826762 B CN102826762 B CN 102826762B CN 201210182134 A CN201210182134 A CN 201210182134A CN 102826762 B CN102826762 B CN 102826762B
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CN
China
Prior art keywords
mentioned
coating
housing
film forming
control part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201210182134.0A
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English (en)
Chinese (zh)
Other versions
CN102826762A (zh
Inventor
德安良纪
山本英明
渡濑直树
松井淳一
中村秀男
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Ameco Technology Co ltd
Original Assignee
Hitachi Ltd
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Publication date
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Publication of CN102826762A publication Critical patent/CN102826762A/zh
Application granted granted Critical
Publication of CN102826762B publication Critical patent/CN102826762B/zh
Expired - Fee Related legal-status Critical Current
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
    • B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
    • B05C9/14—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation involving heating or cooling
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Coating Apparatus (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Liquid Crystal (AREA)
CN201210182134.0A 2011-06-16 2012-06-05 薄膜形成装置以及薄膜形成方法 Expired - Fee Related CN102826762B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011134131A JP5864141B2 (ja) 2011-06-16 2011-06-16 薄膜形成装置および薄膜形成方法
JP2011-134131 2011-06-16

Publications (2)

Publication Number Publication Date
CN102826762A CN102826762A (zh) 2012-12-19
CN102826762B true CN102826762B (zh) 2015-10-28

Family

ID=47330106

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201210182134.0A Expired - Fee Related CN102826762B (zh) 2011-06-16 2012-06-05 薄膜形成装置以及薄膜形成方法

Country Status (4)

Country Link
JP (1) JP5864141B2 (ja)
KR (1) KR101395157B1 (ja)
CN (1) CN102826762B (ja)
TW (1) TWI526250B (ja)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103487993A (zh) * 2013-10-17 2014-01-01 深圳市华星光电技术有限公司 一种配向液喷嘴
JP6452318B2 (ja) * 2014-05-20 2019-01-16 中外炉工業株式会社 基板の塗布装置及び基板の塗布方法
JP6326315B2 (ja) 2014-07-24 2018-05-16 中外炉工業株式会社 塗布装置及び塗布方法
CN104984869A (zh) * 2015-07-15 2015-10-21 深圳市创思泰科技有限公司 自动刮擦涂抹机及自动刮擦涂抹生产线
JP6339553B2 (ja) * 2015-12-24 2018-06-06 Ａｉメカテック株式会社 薄膜形成装置
CN105618300B (zh) * 2015-12-25 2018-10-30 天津滨海光热反射技术有限公司 专用于制作光热发电反射镜的喷涂设备及其运行方法
CN105880104B (zh) * 2016-05-25 2020-03-31 成都国珈星际固态锂电科技有限公司 一种涂布机构、狭缝涂布装置及膜制备方法
CN107718880A (zh) * 2016-08-12 2018-02-23 惠州市富丽电子有限公司 一种全自动喷码设备
CN107102458B (zh) * 2017-06-20 2023-05-16 南京信息职业技术学院 一种液晶显示器光刻胶成膜的装置及方法
DE102019207158A1 (de) 2019-05-16 2020-11-19 Robert Bosch Gmbh Verfahren und Vorrichtung zur Steuerung des Bremsverhaltens eines Elektrofahrzeugs
DE102019207185A1 (de) * 2019-05-16 2020-11-19 Siemens Aktiengesellschaft Druckeinrichtung und Verfahren zum Bedrucken eines Gegenstands
CN110588186B (zh) * 2019-08-07 2020-07-10 华中科技大学 一种喷墨打印柔性显示器件制造系统及方法
JP6783365B1 (ja) * 2019-09-20 2020-11-11 株式会社大気社 塗装方法、塗装装置、および塗装プログラム
JP7313783B2 (ja) * 2020-03-04 2023-07-25 東レエンジニアリング株式会社 液滴撮像装置
KR102510929B1 (ko) * 2020-04-23 2023-03-15 세메스 주식회사 하중 분산 장치 및 이를 구비하는 기판 처리 시스템
JP2021183332A (ja) * 2020-11-26 2021-12-02 Ａｉメカテック株式会社 塗布装置
JP7526150B2 (ja) * 2021-09-13 2024-07-31 芝浦メカトロニクス株式会社 塗布装置、液滴吐出検査方法
CN115921168B (zh) * 2023-02-10 2023-10-03 东莞市华纬涂装设备有限公司 一种多工位喷涂机械手
CN117920534B (zh) * 2024-03-25 2024-06-18 武汉驿路通科技股份有限公司 一种fbg光栅自动点胶设备

Citations (2)

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Publication number Priority date Publication date Assignee Title
CN1939095A (zh) * 2004-12-14 2007-03-28 株式会社爱发科 涂敷装置、有机材料薄膜的形成方法、有机el面板制造装置
CN101407131A (zh) * 2007-10-12 2009-04-15 株式会社日立工业设备技术 喷墨头装置

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JP2004057928A (ja) * 2002-07-29 2004-02-26 Pioneer Electronic Corp パターン形成材料の射出塗布装置及びパターン形成材料の射出塗布方法
JP4413535B2 (ja) * 2002-09-19 2010-02-10 大日本印刷株式会社 インクジェット法による有機ｅｌ表示装置及びカラーフィルターの製造方法、製造装置
JP2006133671A (ja) * 2004-11-09 2006-05-25 Toshiba Corp 表示装置の製造方法及び薄膜の成膜方法
KR20070031876A (ko) * 2004-12-14 2007-03-20 가부시키가이샤 알박 도포 장치, 유기 재료 박막의 형성 방법, 유기 ｅｌ 패널제조 장치
JP5321770B2 (ja) * 2005-03-25 2013-10-23 大日本印刷株式会社 塗工装置
JP2007232866A (ja) * 2006-02-28 2007-09-13 Seiko Epson Corp パターン形成方法、液滴吐出装置及び液晶表示装置
JP2007256449A (ja) * 2006-03-22 2007-10-04 Toshiba Corp 液滴噴射検査装置、液滴噴射装置及び塗布体の製造方法
JP2009072691A (ja) * 2007-09-20 2009-04-09 Hitachi High-Technologies Corp インク噴射状態検査装置、フラットパネルの製造装置およびフラットパネル
KR101182226B1 (ko) * 2009-10-28 2012-09-12 삼성디스플레이 주식회사 도포 장치, 이의 도포 방법 및 이를 이용한 유기막 형성 방법

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1939095A (zh) * 2004-12-14 2007-03-28 株式会社爱发科 涂敷装置、有机材料薄膜的形成方法、有机el面板制造装置
CN101407131A (zh) * 2007-10-12 2009-04-15 株式会社日立工业设备技术 喷墨头装置

Also Published As

Publication number Publication date
JP5864141B2 (ja) 2016-02-17
JP2013000656A (ja) 2013-01-07
CN102826762A (zh) 2012-12-19
KR20120139547A (ko) 2012-12-27
TWI526250B (zh) 2016-03-21
KR101395157B1 (ko) 2014-05-15
TW201311354A (zh) 2013-03-16

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
ASS Succession or assignment of patent right

Owner name: HITACHI,LTD.

Free format text: FORMER OWNER: HITACHI PLANT TECHNOLOGIES LTD.

Effective date: 20140115

C41 Transfer of patent application or patent right or utility model
TA01 Transfer of patent application right

Effective date of registration: 20140115

Address after: Tokyo, Japan

Applicant after: Hitachi, Ltd.

Address before: Tokyo, Japan

Applicant before: Hitachi Plant Technologies, Ltd.

C14 Grant of patent or utility model
GR01 Patent grant
C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20161209

Address after: Ibaraki

Patentee after: Ameco Technology Co.,Ltd.

Address before: Tokyo, Japan

Patentee before: Hitachi, Ltd.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20151028