CN102820241A - 氧化物介质层经时绝缘击穿可靠性测试方法 - Google Patents
氧化物介质层经时绝缘击穿可靠性测试方法 Download PDFInfo
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Cited By (6)
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---|---|---|---|---|
CN104617004A (zh) * | 2013-11-01 | 2015-05-13 | 北大方正集团有限公司 | 一种监测金属间介质层的装置和方法 |
CN104851818A (zh) * | 2014-02-14 | 2015-08-19 | 中芯国际集成电路制造(上海)有限公司 | 介质层缺陷的检测方法和检测装置 |
CN106124961A (zh) * | 2016-09-19 | 2016-11-16 | 武汉新芯集成电路制造有限公司 | 一种测试结构 |
CN108257644A (zh) * | 2016-12-29 | 2018-07-06 | 北京兆易创新科技股份有限公司 | 一种测试电路、闪存和测试系统 |
CN109307831A (zh) * | 2018-09-25 | 2019-02-05 | 长江存储科技有限责任公司 | 集成电路中栅极氧化层的tddb测试方法 |
CN113253088A (zh) * | 2021-06-25 | 2021-08-13 | 上海瞻芯电子科技有限公司 | 晶体管栅氧测试装置及系统 |
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Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104617004A (zh) * | 2013-11-01 | 2015-05-13 | 北大方正集团有限公司 | 一种监测金属间介质层的装置和方法 |
CN104851818A (zh) * | 2014-02-14 | 2015-08-19 | 中芯国际集成电路制造(上海)有限公司 | 介质层缺陷的检测方法和检测装置 |
CN106124961A (zh) * | 2016-09-19 | 2016-11-16 | 武汉新芯集成电路制造有限公司 | 一种测试结构 |
CN108257644A (zh) * | 2016-12-29 | 2018-07-06 | 北京兆易创新科技股份有限公司 | 一种测试电路、闪存和测试系统 |
CN108257644B (zh) * | 2016-12-29 | 2023-10-31 | 兆易创新科技集团股份有限公司 | 一种测试电路、闪存和测试系统 |
CN109307831A (zh) * | 2018-09-25 | 2019-02-05 | 长江存储科技有限责任公司 | 集成电路中栅极氧化层的tddb测试方法 |
CN109307831B (zh) * | 2018-09-25 | 2020-03-31 | 长江存储科技有限责任公司 | 集成电路中栅极氧化层的tddb测试方法 |
CN113253088A (zh) * | 2021-06-25 | 2021-08-13 | 上海瞻芯电子科技有限公司 | 晶体管栅氧测试装置及系统 |
CN113253088B (zh) * | 2021-06-25 | 2021-09-28 | 上海瞻芯电子科技有限公司 | 晶体管栅氧测试装置及系统 |
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