CN102681334B - From the removing method holding container taking-up large pellicle component - Google Patents

From the removing method holding container taking-up large pellicle component Download PDF

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Publication number
CN102681334B
CN102681334B CN201210140722.8A CN201210140722A CN102681334B CN 102681334 B CN102681334 B CN 102681334B CN 201210140722 A CN201210140722 A CN 201210140722A CN 102681334 B CN102681334 B CN 102681334B
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framework
component
holding
teat
groove
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CN102681334A (en
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谷村彰浩
前田拓郎
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Mitsui Chemicals Inc
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Asahi Chemical Co Ltd
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Sustainable Development (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)

Abstract

The invention provides the holding method of the framework of large pellicle component.This framework has the framework of the polygonal shape be made up of many limits, be made up of with the jointing material in the lower edge face being coated in this framework the pellicle in the upper limb face being bonded in this framework, when the length of the longest edge holding above-mentioned framework is the above-mentioned framework of large pellicle component of more than 1m, above-mentioned framework has the protuberance or recess that hold respectively in all edge, by holding protuberance or the recess of the holding at more than at least 1 place in each edge of above-mentioned framework respectively simultaneously, reliably can hold framework, and can not produce crooked when pellicle component being pasted on photomask, bend and simply pellicle component taken out from accommodation container.

Description

From the removing method holding container taking-up large pellicle component
The divisional application that the present invention is application number is 200880023582.8, the applying date is on July 2nd, 2008, denomination of invention is the application for a patent for invention of the framework of large pellicle component and the holding method of this framework.
Technical field
The present invention relates to the framework of the member of formation as pellicle component (pellicle), this pellicle component is used for the photomask, reticle mask (reticle) the middle attachment foreign matter that prevent from using in the photo-mask process when the thin film transistor (TFT) (TFT), color filter (CF) etc. of manufacture formation LSI, liquid crystal display (LCD).Particularly relate to as liquid crystal large pellicle component member of formation, be namely the framework of member of formation of large pellicle component of more than 1m as long edge lengths.
Background technology
The present invention relates to the technology of the framework of the member of formation as pellicle component, first instruction card film structural component.
In the past, in the manufacture of semiconductor device, wafer is formed in the photo-mask process of circuit pattern, usually use the dust proof member being referred to as pellicle component to be attached to photomask, reticle mask to prevent foreign matter.Pellicle component be conform in the shape of shape and photomask or reticle mask, thickness is that the upper limb face of the framework of a few millimeter is sprawled and the bonding thickness polymeric membrane (hereinafter referred to as " pellicle ") that to be cellulose nitrate, the cellulose derivative (cellulose derivative) or fluorine-based polymer etc. of less than 10 μm transparent.Usually, pellicle component is greatly mainly with at the lower edge face of this framework coating jointing material and the Product Status shipment of stacked diaphragm on this bonding material layer.
Above-mentioned bonding material layer is used for pellicle component to be adhered to photomask or reticle mask, and said protection film protects the bonding plane of this bonding material layer to maintain the bonding force of jointing material before this bonding material layer is used to such use.
This pellicle component is supplied to the fabricator's (hereinafter referred to as " mask maker ") manufacturing photomask or reticle mask usually by pellicle component fabricator.Mask maker peels off said protection film from pellicle component; utilize after pellicle component is pasted on photomask or reticle mask by bonding material layer, this mask or reticle mask are supplied to carry out photoetching fabricator, such as semiconductor device fabricator or liquid crystal panel fabricator.
At pellicle component as in the characteristic of dust proof member, the process of this pellicle component needs to be treated to non-cohesive dust.Usually, when processing list film structural component, usually by inserting pin-shaped instrument to hold in the hole being formed in framework lateral surface, make staff directly can not contact pellicle component (such as with reference to patent documentation 1) by holding tool body.In addition, it is also proposed and hold by forming the instrument for the groove inserted for swingle with swingle at the lateral surface of framework, making staff directly can not contact pellicle component (such as with reference to patent documentation 2) by holding the main body of this instrument.
In addition, when pellicle component is transported to mask maker from pellicle component fabricator, in order to non-cohesive dust, usually pellicle component is put in the accommodation container with sealing and carry.Certainly, hold in container owing to requiring that pellicle component is fixed in, therefore, it is also proposed by inserting pin-shaped merit tool in the hole being formed in framework lateral surface and pellicle component be fixed on the method (such as with reference to patent documentation 3) held in container.
In addition, it is also proposed by by forming the pallet that holds container and lid clips the horizontal projections that is formed on framework lateral surface and pellicle component is fixed on the method (such as with reference to patent documentation 4 or 5) holding container.
Further, be not only directed to the holding of the teat be formed on framework lateral surface, groove or hole his-and-hers watches film structural component, fixed function, the framework shape of going back his-and-hers watches film structural component has also carried out various research.Such as, in order to ensure pellicle component inside and outside gas penetration potential, propose setting and extend through the hole (such as with reference to patent documentation 6) of medial surface with filtrator from framework lateral surface.
In addition, in order to control distance (stand-off) from the pattern plane of photomask to pellicle (such as with reference to patent documentation 7 ~ 9), the pressurised zone (such as with reference to patent documentation 13) that controls the step (such as with reference to patent documentation 12) stretching out (such as with reference to patent documentation 10 or 11), form mask jointing material of mask jointing material, guarantee when being pasted on photomask, propose the various shapes of establishing groove, projection, step in the upper limb face of framework or lower edge face.
In recent years, along with the maximization of LCD, the pellicle component of photomask and use thereof also maximizes, and the pellicle component that the length of longest edge is greater than 1m has emerged.It is generally acknowledged, from now on, in order to tackle LCD maximization, enhance productivity, the maximization of photomask is also absolutely necessary.
When large-scale photomask, raw material is synthetic quartz substrate mostly, and fee of material is very expensive.Therefore, relative to the effective exposure area size of setting, photomask size designs minimum usually.
When being pasted on the large pellicle component on large-scale photomask, in view of the restriction of photomask size, also there is restriction in the frame width for the table mould between the outer circumference end be secured at from effective exposure area to photomask, even if pellicle component maximizes, the width of framework in fact also cannot increase.
Further, because the distance (stand-off) from the pattern plane of photomask to pellicle is exposed the optical system restriction of machine, therefore, also there is restriction in the height for framework, even if pellicle component maximizes, the height of framework in fact also cannot increase.
On the other hand, the area as suppression pellicle is 1000cm 2the method of the framework flexure of above large pellicle component, proposes and makes the long hem width degree of framework be greater than minor face width (such as with reference to patent documentation 14).
In addition; in recent years; the fabricator of mask etc. in order to directly be installed on mask by pellicle component after accommodation container takes out; adopt from hold container take out pellicle component time, under the state that diaphragm is pasted on pallet, takes out the method for pellicle component from the interface of diaphragm and jointing material, the method (such as reference patent documentation 15) requiring to make when taking out pellicle component produce distortion and taken out with bending.
Patent documentation 1: Japanese Unexamined Patent Publication 9-204039 publication
Patent documentation 2: Japanese Unexamined Patent Publication 2005-326634 publication
Patent documentation 3: Japanese Unexamined Patent Publication 2006-267179 publication
Patent documentation 4: Japanese Unexamined Patent Publication 10-48812 publication
Patent documentation 5: Japanese Unexamined Patent Publication 10-48811 publication
Patent documentation 6: Japanese Unexamined Patent Publication 2001-133960 publication
Patent documentation 7: Japanese Unexamined Patent Publication 2002-182373 publication
Patent documentation 8: Japanese Unexamined Patent Publication 2002-182371 publication
Patent documentation 9: Japanese Unexamined Patent Publication 2000-298333 publication
Patent documentation 10: Japanese Unexamined Patent Publication 2005-338722 publication
Patent documentation 11: Japanese Unexamined Patent Publication 2000-292910 publication
Patent documentation 12: Japanese Unexamined Patent Publication 2006-163035 publication, Fig. 6
Patent documentation 13: Japanese Unexamined Patent Publication 2005-308901 publication
Patent documentation 14: Japanese Unexamined Patent Publication 2001-109135 publication
Patent documentation 15: Japanese Unexamined Patent Publication 2007-017811 publication
As mentioned above, in large pellicle component, due to the width of framework, the restriction of height, the flexure of framework edge can become large along with the maximization of pellicle component.So the present inventor is that the making of the large pellicle component of 1.4m ~ 2.0m is studied to the size of longest edge, found that employing method is in the past extremely difficult and hold framework.
Namely, as as described in above-mentioned patent documentation 1 ~ 5, adopt and hold or fixing previous methods by inserting the instruments such as pin, slide block in the groove on two the relative limit lateral surfaces being formed in framework, hole, exist and be easy to cause the instrument such as pin, slide block to depart from from groove, hole due to the flexure of framework edge, the situation of adopt the groove of framework lateral surface, hole cannot hold, fixing.Such as, when Xiang Kongzhong inserts the method (patent documentation 1) of selling, method (patent documentation 2) that insert swingle in groove, due to roughly one dot point on each limit of framework, therefore, load is easy to concentrated, easily departs from sometimes because of the flexure of framework edge.
Change by the raw material of framework the high rigidization realized and be also considered countermeasure, but in view of the quality such as dustless required by pellicle component, in fact easily cannot change the raw material of framework.
So far, as mentioned above, various imagination has been carried out to framework shape, but be design framework shape (such as with reference to patent documentation 6 ~ 12) in the scope of the width of the framework be restricted, height substantially, therefore, extremely do not contributed to the high rigidization of framework.
In addition, (such as with reference to patent documentation 4 or 5) is also studied for designing framework shape outside the scope of the width of framework, height.It can be described as excellent technology to the restriction of framework at that time relative to application.Namely, patent documentation 4 or 5 application at that time, the pellicle component of LSI purposes is main flow, the photomask size of LSI purposes is usually while be 5 ~ 7 inches (127 ~ 178mm), be less than the large-scale photomask size (while being 330 ~ 1400mm) of liquid crystal display (LCD) purposes, therefore, compared with large-scale photomask size, photomask size can be made to be greater than pellicle scantling.Therefore, outside the scope of the width of framework, height, to design framework shape be not problem.
But, from now on, popularize for the pellicle component along with more enlarged and the problem considering to come to the surface, the expectation that namely cannot maximize for table mould owing to doing one's utmost to reduce photomask size come correspondingly make the width of framework, highly increase to the such problem of more than required degree, need the holding method improveing pellicle component.
For removing method, such as, also there is the load utilizing pellicle member retainer tool to keep pellicle component described later and detect the applying of his-and-hers watches film structural component holder and make holder space out to peel off the method for pellicle component with accommodation container; Aforesaid pellicle component is (such as with reference to patent documentation 13) of with splicing tape, the label (pressing part) of the diaphragm near the central portion being equivalent to be configured in the limit of rectangular box being fixed on pellicle members contain container.But, it is generally acknowledged, adopt the method, when large pellicle component, owing to the label (pressing part) being configured in the central portion on limit being held in accommodation container with splicing tape, therefore, even if detect load to peel off the flexure (Fig. 9 with reference to patent documentation 13) also cannot avoiding framework.
That is, the framework of pellicle component requires framework can not be made to produce the method bending, torsionally take out on a kind of basis can reliably hold, when taking out pellicle component from accommodation container subsequently.And; particularly large, that process is also comparatively difficult large pellicle component is become for pellicle component own wt; a kind of such method is required when accommodation, carrying, keeping; namely; reliably keep being unnecessary to mention; and when taking out from accommodation container, in order to it be directly pasted on after removal on mask etc., pellicle component can not be taken out with producing crooked flexure from the interface of diaphragm and jointing material.
Summary of the invention
That is, when the invention provides a kind of process in pellicle component framework, accommodation, carrying, keeping time reliably can hold framework and also crooked, flexure can not be produced when being pasted on by pellicle component on photomask etc. and can simply by pellicle component from the framework holding the pellicle component that container takes out.In addition, a kind of holding method using the large pellicle component of the framework of this pellicle component is also provided.
The framework that the holding method of the framework of large pellicle component of the present invention holds has the polygonal shape be made up of many limits, can at the bonding pellicle in upper limb face of this framework, at the lower edge face of this framework coating jointing material, the length of the longest edge of above-mentioned framework is more than 1m, wherein, above-mentioned framework has the protuberance or recess that hold respectively in all edge; All edge of above-mentioned framework hold the protuberance of the holding at least 1 place or recess respectively and carries.
In addition, the holding method of the framework of large pellicle component of the present invention preferably holds protuberance or the recess of all holdings in all edge of above-mentioned framework.
The present inventor etc. carry out deep research to solve above-mentioned problem, found that, in order to not be subject to the restriction of photomask, by forming the protuberance or recess that hold in all edge of pellicle component framework respectively, can solve and hold the length of longest edge is the such above-mentioned problem of the large pellicle component of 1.4m ~ 2.0m.Based on found that of research, the method also effectively for the large pellicle component that the length of longest edge is more than 1m, thus can complete the present invention.That is, the present invention is as follows.
1. the framework of a large pellicle component, this framework has the polygonal shape be made up of many limits, the jointing material in the pellicle that can comprise the upper limb face being bonded in this framework and the lower edge face being coated in this framework, the length of the longest edge of above-mentioned framework is more than 1m, wherein, above-mentioned framework has the protuberance or recess that hold respectively in all edge.
2. the framework of the large pellicle component according to above-mentioned 1, wherein, the protuberance held or recess are on the lateral surface of framework.
3. the framework of the large pellicle component according to above-mentioned 2, wherein, the protuberance held or recess are in position on the lateral surface of framework, that leave from upper limb face and lower edge face.
4. the framework of the large pellicle component according to any one of above-mentioned 1 ~ 3, wherein, the protuberance held or recess are groove or hole.
5. the framework of the large pellicle component according to above-mentioned 4, wherein, the protuberance held or recess are groove or the hole with the spatial portion inwardly broadened.
6. the framework of the large pellicle component according to above-mentioned 4, wherein, the protuberance held or recess are groove or the hole with the spatial portion inwardly narrowed.
7. the framework of the large pellicle component according to any one of above-mentioned 1 ~ 6, wherein, the protuberance held or recess are on each limit of framework, and the protuberance of this holding or the length shared by recess are respectively more than 10% of the length on limit.
8. the framework of the large pellicle component according to above-mentioned 7, wherein, the protuberance held or recess are the grooves on the complete cycle of all edge being located at framework.
9. the framework of the large pellicle component according to above-mentioned 7, wherein, the protuberance held or recess are the grooves that local is located in the edge of framework.
10. the framework of the large pellicle component according to any one of above-mentioned 1 ~ 6, wherein, the protuberance held or recess are respectively provided with multiple holes in all edge of framework.
11. 1 kinds of large pellicle components, the framework of the large pellicle component of this large pellicle component according to any one of above-mentioned 1 ~ 10, the jointing material in lower edge face being adhered to the pellicle on the upper limb face of this framework and being coated in this framework are formed.
12. large pellicle components according to above-mentioned 11, wherein, the length of the longest edge of framework is 1.4m ~ 2.0m.
13. large pellicle components according to any one of above-mentioned 11 ~ 12, wherein, the width of framework is 1.5 ~ 4.0 with the ratio of height.
The holding method of the framework of 14. 1 kinds of large pellicle components, the framework of this large pellicle component is according to any one of above-mentioned 1 ~ 10, wherein, all edge of the framework of above-mentioned large pellicle component hold respectively protuberance or the recess of the holding at more than at least 1 place.
The holding method of the framework of 15. large pellicle components according to above-mentioned 13, wherein, all edge of the framework of large pellicle component holds protuberance or the recess of all holdings.
The antidote of the framework shape of 16. 1 kinds of large pellicle components, this antidote is for correcting the framework shape of the large pellicle component according to any one of above-mentioned 11 ~ 13, wherein, all edge of the framework of above-mentioned large pellicle component hold protuberance or the recess of the holding at more than at least 1 place respectively, applies by least 1 place of the framework to above-mentioned large pellicle component the distortion that stress reduces this framework.
The framework of 17. large pellicle components according to any one of above-mentioned 1 ~ 3, wherein, the protuberance held or recess load and unload the teat be freely fixed in the edge of framework.
The framework of 18. large pellicle components according to any one of above-mentioned 1 ~ 3 and 17, wherein, the protuberance held or recess are the teat of tabular or bar-shaped teat.
The framework of 19. large pellicle components according to any one of above-mentioned 1 ~ 3 and 17, wherein, the protuberance held or recess are tabulars, and are that the overhang of this teat becomes large teat from four bights of framework towards the central portion on limit.
The framework of 20. large pellicle components according to any one of above-mentioned 1 ~ 3 and 17 ~ 19, wherein, the protuberance held or recess are the teats that front end forms hook shape.
The framework of 21. large pellicle components according to any one of above-mentioned 1 ~ 3 and 17 ~ 20, wherein, the protuberance held or recess to be formed as when pellicle component being pasted on photomask, with the circumferential lateral surface of photomask and/or be formed at the teat that the groove on photomask contacts.
The framework of 22. large pellicle components according to any one of above-mentioned 1 ~ 3 and 17 ~ 21, wherein, the protuberance held or recess be to be formed as when pellicle component being pasted on photomask, by with another part combination and physical method can be utilized framework to be fixed on the teat of this photomask.
The framework of 23. large pellicle components according to above-mentioned 7, wherein, the protuberance held or recess are the teats of the tabular on the complete cycle of all edge being arranged on framework.
The framework of 24. large pellicle components according to above-mentioned 7, wherein, the protuberance held or recess are the teats that local is arranged at the tabular in the edge of framework.
The framework of 25. large pellicle components according to any one of above-mentioned 1 ~ 3 and 17 ~ 18, wherein, the protuberance held or recess are respectively provided with multiple bar-shaped teats in all edge of framework.
26. 1 kinds of large pellicle components, wherein, the framework of the large pellicle component of this large pellicle component according to any one of above-mentioned 17 ~ 25, the jointing material in lower edge face being adhered to the pellicle on the upper limb face of this framework and being coated in this framework are formed.
27. large pellicle components according to above-mentioned 26, wherein, the length of the longest edge of framework is 1.4m ~ 2.0m.
28. large pellicle components according to any one of above-mentioned 26 ~ 27, wherein, the width of framework is 1.5 ~ 4.0 with the ratio of height.
The holding method of the framework of 29. 1 kinds of large pellicle components, the framework of this large pellicle component is according to any one of above-mentioned 17 ~ 25, wherein, all edge of the framework of above-mentioned large pellicle component hold respectively protuberance or the recess of the holding at more than at least 1 place.
The holding method of the framework of 30. large pellicle components according to above-mentioned 29, wherein, all edge of the framework of large pellicle component holds protuberance or the recess of all holdings.
The antidote of the framework shape of 31. 1 kinds of large pellicle components, this antidote is for correcting the framework shape of the large pellicle component according to any one of above-mentioned 26 ~ 28, wherein, all edge of the framework of above-mentioned large pellicle component hold protuberance or the recess of the holding at more than at least 1 place respectively, applies by least 1 place of the framework to above-mentioned large pellicle component the distortion that stress reduces this framework.
Adopt the framework of large pellicle component of the present invention and the holding method of this framework, when the process of pellicle component, accommodation, carrying, keeping time reliably can hold framework and also can not produce when pellicle component being pasted on photomask crooked, flexure and can simply by pellicle component from accommodation container take out.
Accompanying drawing explanation
Figure 1A is the stereographic map of a mode (recess held is groove) of the framework of large pellicle component for illustration of present embodiment, represents the large pellicle component being adhered to photomask.
Figure 1B is the figure of a mode (recess held is groove) of the framework of large pellicle component for illustration of present embodiment, represents the partial enlargement longitudinal section comprising framework.
Fig. 1 C is the figure of a mode (recess held is groove) of the framework of large pellicle component for illustration of present embodiment, represents the framework of large pellicle component.
Fig. 1 D is the stereographic map of a mode (protuberance held is tabular) of the framework of large pellicle component for illustration of present embodiment, represents the large pellicle component being adhered to photomask.
Fig. 1 E is the figure of a mode (protuberance held is tabular) of the framework of large pellicle component for illustration of present embodiment, represents the partial enlargement longitudinal section comprising framework.
Fig. 1 F is the figure of a mode (protuberance held is tabular) of the framework of large pellicle component for illustration of present embodiment, represents the framework of large pellicle component.
Fig. 2 A is the stereographic map of a mode of framework for illustration of mini table film structural component in the past, represents the pellicle being adhered to photomask.
Fig. 2 B is the figure of a mode of framework for illustration of mini table film structural component in the past, represents the partial enlargement longitudinal section comprising the groove of framework.
Fig. 2 C is the figure of a mode of framework for illustration of mini table film structural component in the past, represents the framework of pellicle component.
Fig. 3 A is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the lateral surface of framework.
Fig. 3 B is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the lateral surface of framework.
Fig. 3 C is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the lateral surface of framework.
Fig. 3 D is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the lateral surface of framework.
Fig. 3 E is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the lateral surface of framework.
Fig. 3 F is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the lateral surface of framework.
Fig. 3 G is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the lateral surface of framework.
Fig. 4 A is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the upper limb face of framework.
Fig. 4 B is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the upper limb face of framework.
Fig. 5 A is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the lower edge face of framework.
Fig. 5 B is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the upper limb face of framework.
Fig. 6 A is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the medial surface of framework.
Fig. 6 B is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the medial surface of framework.
Fig. 6 C is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the medial surface of framework.
Fig. 6 D is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the medial surface of framework.
Fig. 6 E is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the medial surface of framework.
Fig. 6 F is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the medial surface of framework.
Fig. 6 G is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example excavating groove or the hole held from the medial surface of framework.
Fig. 7 A is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is to be provided with the groove of multiple holding or the mode example in hole.
Fig. 7 B is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is to be provided with the groove of multiple holding or the mode example in hole.
Fig. 7 C is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is to be provided with the groove of multiple holding or the mode example in hole.
The skeleton diagram in direction that Fig. 8 A is the configuration of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, that see pellicle.
The skeleton diagram in direction that Fig. 8 B is the configuration of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, that see pellicle.
The skeleton diagram in direction that Fig. 8 C is the configuration of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, that see pellicle.
The skeleton diagram in direction that Fig. 8 D is the configuration of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, that see pellicle.
The skeleton diagram in direction that Fig. 9 A is the configuration of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, that see pellicle.
The skeleton diagram in direction that Fig. 9 B is the configuration of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, that see pellicle.
The skeleton diagram in direction that Fig. 9 C is the configuration of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, that see pellicle.
Skeleton diagram that Figure 10 A is the configuration of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, that see from the side surface direction of framework.
Skeleton diagram that Figure 10 B is the configuration of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, that see from the side surface direction of framework.
The partial enlargement longitudinal section of mode example when Figure 11 A is the framework for illustration of the large pellicle component holding, fix present embodiment with holding component.
The partial enlargement longitudinal section of mode example when Figure 11 B is the framework for illustration of the large pellicle component holding, fix present embodiment with holding component.
The partial enlargement longitudinal section of mode example when Figure 11 C is the framework for illustration of the large pellicle component holding, fix present embodiment with holding component.
The partial enlargement longitudinal section of mode example when Figure 11 D is the framework for illustration of the large pellicle component holding, fix present embodiment with holding component.
The partial enlargement longitudinal section of mode example when Figure 11 E is the framework for illustration of the large pellicle component holding, fix present embodiment with holding component.
Local skeleton diagram that Figure 12 A is the mode example of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, that see from the lateral surface direction of framework.
Figure 12 B be the mode example of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, from the local skeleton diagram seeing that the direction of pellicle is seen.
Figure 12 C be the mode example of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, from the local skeleton diagram seeing that the direction of pellicle is seen.
Figure 12 D be the mode example of groove for illustration of the holding in the framework of the large pellicle component of present embodiment, from the local skeleton diagram seeing that the direction of pellicle is seen.
Figure 13 A be for illustration of in the framework of large pellicle component, the figure of the configuration in the hole that is arranged at corner part, be the local skeleton diagram seen from the lateral surface direction of framework.
Figure 13 B be for illustration of in the framework of large pellicle component, the figure of the configuration in the hole that is arranged at corner part, be the local skeleton diagram from seeing that the direction of pellicle is seen.
Figure 14 A is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the lateral surface of framework.
Figure 14 B is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the lateral surface of framework.
Figure 14 C is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the lateral surface of framework.
Figure 14 D is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the lateral surface of framework.
Figure 14 E is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the lateral surface of framework.
Figure 14 F is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the lateral surface of framework.
Figure 14 G is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the lateral surface of framework.
Figure 15 A is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat in the upper limb face of framework.
Figure 15 B is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat in the upper limb face of framework.
Figure 15 C is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat in the upper limb face of framework.
Figure 15 D is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat in the upper limb face of framework.
Figure 16 A is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat in the lower edge face of framework.
Figure 16 B is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat in the lower edge face of framework.
Figure 16 C is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat in the lower edge face of framework.
Figure 16 D is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat in the lower edge face of framework.
Figure 17 A is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the medial surface of framework.
Figure 17 B is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the medial surface of framework.
Figure 17 C is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the medial surface of framework.
Figure 17 D is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the medial surface of framework.
Figure 17 E is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the medial surface of framework.
Figure 17 F is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the medial surface of framework.
Figure 17 G is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with teat at the medial surface of framework.
Figure 18 A is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with multiple teat.
Figure 18 B is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with multiple teat.
Figure 18 C is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with multiple teat.
Figure 18 D is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with multiple teat.
Figure 18 E is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with multiple teat.
Figure 18 F is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with multiple teat.
Figure 18 G is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, is the mode example being provided with multiple teat.
Figure 19 A be for illustration of teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle.
Figure 19 B be for illustration of teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle.
Figure 19 C be for illustration of teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle.
Figure 19 D be for illustration of teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle.
Figure 20 A be for illustration of teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle.
Figure 20 B be for illustration of teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle.
Figure 20 C be for illustration of the teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle.
Figure 20 D be for illustration of the teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle.
Figure 20 E be for illustration of the teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle.
Figure 21 A is the partial enlargement longitudinal section that the teat be arranged in the framework of large pellicle component loads and unloads when being freely fixed on the mode of framework edge, represents that screw thread is fixed.
Figure 21 B is the partial enlargement longitudinal section that the teat be arranged in the framework of large pellicle component loads and unloads when being freely fixed on the mode of framework edge, and it is fixing that expression utilizes unitor to carry out.
Figure 21 C is the partial enlargement longitudinal section that the teat be arranged in the framework of large pellicle component loads and unloads when being freely fixed on the mode of framework edge, and it is fixing that expression utilizes elastic body to carry out.
Figure 21 D is the partial enlargement longitudinal sections of the teat handling be arranged in the framework of large pellicle component when being freely fixed on the mode of framework edge, represents by sandwiching carry out fixing.
Figure 22 A is the stereographic map of the another way (teat is bar-shaped) of the framework of large pellicle component for illustration of present embodiment, represents the large pellicle component being adhered to photomask.
Figure 22 B is the stereographic map of the another way (teat is bar-shaped) of the framework of large pellicle component for illustration of present embodiment, represents the framework of large pellicle component.
Figure 23 A be for illustration of the bar-shaped teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle, be identical with the mode of Figure 12, be respectively provided with 3 teats respectively at minor face and long limit situation.
Figure 23 B be for illustration of the bar-shaped teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle, be identical with the mode of Figure 12, be respectively provided with 1 teat respectively at minor face and long limit and be respectively provided with the situation of 1 teat at 4 angles.
Figure 23 C be for illustration of the bar-shaped teat in the framework of the large pellicle component of present embodiment configuration, the skeleton diagram in the direction of seeing pellicle, be the situation of the teat integration on, each limit that make in Figure 23 A identical with the mode of Figure 12.
Figure 24 A is the partial enlargement longitudinal section of the teat comprised in the framework being arranged at large pellicle component, the mode that the edge that expression teat is L-shaped, front end bends contacts with photomask.
Figure 24 B is the partial enlargement longitudinal section of the teat comprised in the framework being arranged at large pellicle component, and expression teat is L-shaped, front end penetrates into mode in the groove be arranged on photomask.
Figure 25 be the teat in the framework being arranged at large pellicle component combine another component and fixing large pellicle component time partial enlargement longitudinal section.
The partial enlargement longitudinal section of situation when Figure 26 A is the framework for illustration of the large pellicle component holding, fix present embodiment with holding component, the mode that expression holds, constant cross-section is the teat of rectangle.
The partial enlargement longitudinal section of situation when Figure 26 B is the framework for illustration of the large pellicle component holding, fix present embodiment with holding component, represents that teat, the i.e. cross section holding, be fixedly installed on the lateral surface of framework is the mode of the teat of L-shaped.
The partial enlargement longitudinal section of situation when Figure 26 C is the framework for illustration of the large pellicle component holding, fix present embodiment with holding component, represents that teat, the i.e. cross section holding, be fixedly installed on the upper limb face of framework is the mode of the teat of L-shaped.
The partial enlargement longitudinal section of situation when Figure 26 D is the framework for illustration of the large pellicle component holding, fix present embodiment with holding component, represents the mode holding, be fixedly installed on teat, the i.e. teat of 2 rectangles of the medial surface of framework.
Figure 27 is the schematic diagram of the flat shape representing the diaphragm that embodiment 1 uses.
description of reference numerals
1, pellicle frame; 2, mask jointing material; 3, the upper limb face of framework; 4, the lower edge face of framework; 5, the lateral surface of framework; 6, the medial surface of framework; 7, the groove held or hole or teat; The inner space inwardly broadened in 7a, the groove held or hole or the leading section of teat held; The peristome of the groove of 7b, holding; 7c, the most deep of groove held; 9, photomask; 10,20, framework; 11, diaphragm; 11a, pressing part; 11b, pressing part; 15, another component; 16, component is held; 21, groove; 30, framework (in the past product).
Embodiment
With reference to accompanying drawing, embodiments of the present invention are described.The embodiment below illustrated is configuration example of the present invention, and the present invention is not limited to following embodiment.As long as play effect of the present invention, the change of various mode also can be carried out.
The framework of large pellicle component of the present invention is the framework with the polygonal shape be made up of many limits, this framework can comprise the pellicle in the upper limb face being adhered to this framework and be coated on the jointing material in lower edge face of this framework, be in the above-mentioned framework of the large pellicle component of more than 1m in the length of the longest edge of above-mentioned framework, above-mentioned framework has the protuberance or recess that keep respectively in all edge.At this, the polygonal shape of framework normally roughly quadrilateral shape, but also can be the polygonal shape in bight with breach, arc sections (R portion).
Figure 1A is the stereographic map of an embodiment of the framework of large pellicle component for illustration of present embodiment, Figure 1A and Fig. 1 D represents the large pellicle component being adhered to photomask, Figure 1B and Fig. 1 E represents the partial enlargement longitudinal section comprising framework, and Fig. 1 C and Fig. 1 F represents the framework of large pellicle component.Fig. 2 is the stereographic map of the embodiment (such as the type of patent documentation 2) for illustration of mini table film structural component framework in the past, Fig. 2 A represents the pellicle component being adhered to photomask, Fig. 2 B represents the partial enlargement longitudinal section of the groove comprising framework, and Fig. 2 C represents the framework of pellicle component.
Such as, as shown in Figure 1, large pellicle component is made up of framework 10, the pellicle 1 being adhered to the upper limb face 3 of framework 10, the jointing material 2 in lower edge face 4 that is coated on framework 10.At this, pellicle 1 is adhered to the upper limb face 3 of framework 10 by bonding agent (not shown).In addition, in Figure 1A and Figure 1B, pellicle component framework 10 is adhered to photomask 9 by jointing material 2.Large pellicle component, before being adhered to photomask 9, has the structure being bonded with diaphragm (not shown) in the lower edge face 4 of framework 10 by jointing material 2.
The material of the material of pellicle 1, the material of jointing material 2, shape, bonding agent, the material of diaphragm, shape can use the material, the shape that usually adopt in the past.
As pellicle, transparent polymeric membrane, such as cellulose nitrate, cellulose derivative or fluorine-based polymer can be used.The thickness of pellicle considers light transmittance, film strength sets, such as, be preferably 0.1 μm ~ 10 μm.When pellicle being adhered to the upper limb face of framework, the fluorine-based polymers such as bonding agent, such as acryl resin bonding agent, epoxy resin adhesive, silicone adhesive or fluorine-containing silicon bonding agent can be used.
As jointing material, the hot-melt adhesive material of styrene ethylene butylene styrene, styrene ethylene propylene styrene or olefines etc., silicon class jointing material, acrylic adhesive material can be used or take foaming body as the adhesive strip of base material.The thickness of bonding material layer is, set in the scope that framework thickness and jointing material thickness are aggregated in the distance be no more than between the film of regulation and mask, such as preferably 0.01mm ~ 10mm.
As diaphragm, the film be made up of polyethylene terephthalate or polyvinyl resin can be used.In addition, also can according to the bounding force of jointing material by release agent, such as silicon class release agent or fluorine class release agent on the surface of diaphragm.The thickness of diaphragm is such as preferably 0.01mm ~ 1mm.
As long as the material of framework 10 can keep physical strength, there is no particular limitation.Include, for example metal, resin, compound substance, more particularly, preferably adopt aluminium or its alloy such as duralumin, iron or iron class alloy, such as stainless steel, engineering plastics, fiber-reinforced plastic (FRP) and carbon fiber reinforced plastic (CFRP).In addition, consider and cause deadweight to increase by maximization, preferred light weight and there is the material of rigidity, such as preferably aluminium or its alloy.
Framework 10 is the method for makings of in the past usually carrying out.Such as, the plate of one thing is cut off, cut.In addition, when being difficult to the plate preparing one thing in the maximization along with pellicle component, except cut-out, cut, also can enumerate welding processing, processing and forming (if metal is then die cast, if resin is then injection-molded shaping).Now, preferably by hold protuberance or recess one-body molded, as described later, when for protuberance, be also preferably moulded as detachable part, install again afterwards.
In addition, in order to prevent reflection, also the blackened process such as black chromium plating, black alumite, black application can be implemented to the surface of framework.In addition, in order to catch foreign matter, also can at the medial surface coating jointing material of framework.
The framework 10 of the large pellicle component of present embodiment by the longest edge of framework 10 (below also referred to as " long limit ".Equally using the most minor face of framework also referred to as " minor face ") length be that the framework of the large pellicle component of more than 1m is as object.The width (w of Figure 1B and Fig. 1 E) of framework, highly (h of Figure 1B and Fig. 1 E) are less relative to the ratio of the length on the limit (the long edge lengths L of Figure 1A and Fig. 1 D, bond length S) of such framework, framework, and its rigidity is had to lower than the framework of mini table film structural component.
When the long edge lengths L of framework 10 is more than 1m, see the tendency that rigidity reduces significantly.In the framework 30 of the mini table film structural component of the LSI in the past shown in Fig. 2, long edge lengths L mostly is below 15cm most, and bond length S mostly is below 13cm most, and the width w of framework 30 is (w/h)=0.3 ~ 0.8 with the ratio of height h.But in the framework of the present invention as the large pellicle component of object, long edge lengths L is more than 1m, also there is the situation reaching 2m, also may there is situation about more maximizing from now on.In addition, in minor face, bond length S is also such as more than 75cm.In addition, because the width w of the framework in the framework of large pellicle component and the ratio of height h arrive greatly such as (w/h)=1.5 ~ 4.0, therefore, the reduction of rigidity is comparatively large, and in the framework of (w/h)=2.3 ~ 4.0, the reduction of rigidity is large especially.In addition, owing to more maximizing, the situation that (w/h) is greater than 4 also may be there is.
Thus, in the framework of the present invention as the large pellicle component of object, compared with framework in the past, the deflection in the normal direction of pellicle surface is very large.Like this, the flexure mode of the framework of large pellicle component is completely different from the flexure mode of mini table film structural component in the past.And, be greater than on the width w of framework in the past and the basis of the ratio (w/h) of height h at the width w of framework and the ratio (w/h) of height h, the limit of framework is inherently very long, therefore, different according to the tension force of pellicle, the deflection in the direction parallel with surface of pellicle also can become large.In the framework of the large pellicle component of present embodiment, the protuberance of holding or recess also can be utilized to correct the distortion of the framework caused by the tension force of pellicle.This point sees below.
The rectangle that framework of the present invention is normally similar to mask shape, but corresponding with the various shapes of mask etc., and as long as polygonal framework, there is no particular limitation.In addition, in the present invention, be that the framework of more than 1m is as object using long edge lengths, but when framework shape is (1) rectangle, using long edge lengths be the framework of more than 1m as object, under framework shape is (2) foursquare situation, be that the framework of more than 1m is as object using an edge lengths, under framework shape is (3) polygonal situation, be that the framework of more than 1m is as object using longest edge length.In the present invention, if meet the following condition illustrated just can play larger effect, therefore, be below described.
The first, be that the mode of framework having the recess held respectively in all edge is described to above-mentioned framework.As this recess, there is groove or hole.In addition, in the present invention, groove refers to that lateral surface, medial surface, upper limb face or the recess in lower edge face and the circumferencial direction length of the peristome of this recess in these faces being formed in framework is more than 1.5 times of the short transverse length of this peristome, and hole refers to that the circumferencial direction length of this peristome is less than 1.5 times of the short transverse length of this peristome.
The groove of the holding be formed in framework or hole are described.Fig. 3 is the partial enlargement longitudinal section of the various mode examples of the large pellicle component framework representing present embodiment, and Fig. 3 A ~ G is the mode example excavating groove or the hole held from framework lateral surface.Fig. 4 is the partial enlargement longitudinal section of the various mode examples of the large pellicle component framework representing present embodiment, and Fig. 4 A ~ B is the mode example excavating groove or the hole held from the upper limb face of framework.Fig. 5 is the partial enlargement longitudinal section of the various mode examples of the large pellicle component framework representing present embodiment, and Fig. 5 A ~ B is the mode example excavating groove or the hole held from the lower edge face of framework.Fig. 6 is the partial enlargement longitudinal section of the various mode examples of the large pellicle component framework representing present embodiment, and Fig. 6 A ~ G is the mode example excavating groove or the hole held from the medial surface of framework.
As shown in Figure 3, the framework 10 of the large pellicle component of present embodiment has from the lateral surface 5 of framework towards the groove of the holding in direction, inner side or hole 7.Below, when there is no special suggestion, not distinguishing groove and hole and illustrating as the groove held or hole 7.
In addition, as shown in Figure 4, the framework 10 of the large pellicle component of present embodiment also can have groove from upper limb face 3 holding downward of framework or hole 7.In addition, as shown in Figure 5, the framework 10 of the large pellicle component of present embodiment also can have groove from lower edge face 4 holding upward of framework or hole 7.In addition, as shown in Figure 6, the framework 10 of the large pellicle component of present embodiment also can have from the medial surface 6 of the framework groove of the holding in direction or hole 7 toward the outer side.
Which face that the groove held or hole are arranged on framework can both be in the position corresponding to the design of the fixture being used for holding or device, but consider preferably to be arranged on lateral surface at the design aspect of fixture or device.In addition, when the groove held or hole are arranged on lateral surface or the medial surface of framework, in order to not apply extra power to the bonding material layer that the bond layer of pellicle or pellicle and mask bond when holding, be preferably arranged on the position left from upper limb face and lower edge face.Thus, the groove held or hole are more preferably arranged on position on the lateral surface of framework, that leave from upper limb face and lower edge face.
From the groove of upper limb face 3 holding downward of framework or hole 7 except the mode excavated along the normal direction in upper limb face 3, also can make the mode excavated along the direction tilted relative to normal direction.From the groove of lower edge face 4 holding upward of framework or hole 7 except the mode excavated along the normal direction in lower edge face 4, also can make the mode excavated along the direction tilted relative to normal direction.From the medial surface 6 of framework, the mode excavated along the direction tilted relative to normal direction, except the mode excavated along the normal direction of medial surface 6, also can be made in the groove of the holding in direction or hole 7 toward the outer side.When with the surface of framework for benchmark and the groove that excavates from lateral surface or medial surface or hole 7, the groove held or the degree of depth in hole 7 are preferably 0.01 ~ 0.9 times of frame width, more preferably 0.01 ~ 0.5 times, further the preferred degree of depth of 0.01 ~ 0.3 times.In addition, when the groove excavated from upper limb face or lower edge face or hole 7, the groove held or the degree of depth in hole 7 are preferably 0.1 ~ 1 times (in addition, 1 times is situation about running through) of framework height, more preferably 0.1 ~ 0.5 times, preferably 0.1 ~ 0.3 times further.
Further, as shown in Figure 7, the framework 10 of the large pellicle component of present embodiment also can have groove or the hole 7 of multiple holding in each edge of framework.Fig. 7 is the partial enlargement longitudinal section of the various mode examples of the large pellicle component framework representing present embodiment, and Fig. 7 A ~ C is provided with the groove of multiple holding or the mode example in hole.As combination, exist have from the upper limb of framework facing to the groove of the holding of below or hole and from the lower edge of framework facing to the groove of the holding of top or these two kinds of grooves of hole or hole situation, have from the upper limb of framework facing to the groove of the holding of below or hole and the medial surface groove of the holding in direction or the situation (such as Fig. 7 A) in these two kinds of grooves of hole or hole toward the outer side from framework.In addition, also exist and have from the lower edge of framework facing to the groove of the holding of top or hole and the medial surface groove of the holding in direction or the situation (such as Fig. 7 C) in these two kinds of grooves of hole or hole toward the outer side from framework.
In the framework 10 of the large pellicle component of present embodiment, also can relative to from the upper limb of framework facing to the groove of the holding of below or hole, from the lower edge of framework facing to the groove of the holding of top or hole or from the medial surface of the framework groove of the holding in direction or hole toward the outer side, combine respectively from the lateral surface of framework towards the groove of the holding in direction, inner side or hole.Such as, exist have from the lateral surface of framework towards the groove of the holding in direction, inner side or hole and from the upper limb of framework facing to the groove of the holding of below or these two kinds of grooves of hole or hole situation (such as Fig. 7 B), have from the lateral surface of framework towards the groove of the holding in direction, inner side or hole and from the lower edge of framework facing to the groove of the holding of top or these two kinds of grooves of hole or hole situation, have from the lateral surface of framework towards the groove of the holding in direction, inner side or hole and the medial surface groove of the holding in direction or the situation in these two kinds of grooves of hole or hole toward the outer side from framework.
Further, also there is the mode in groove or the hole held from 3 surface excavations 4 surfaces of framework or all excavate the mode in groove or the hole held from 4 surfaces of framework.By arranging the groove or hole that hold on multiple surfaces of framework, to hold, fixing more reliable.In addition, relative to two or more holding tool of the different surfaces of holding framework, also have and can deal with such advantage with same framework.
In addition, except the groove of above-mentioned holding or hole 7, the framework 10 of the large pellicle component of present embodiment also can have hole for other purposes such as ventilative holes (pellicle Components installation being used for the hole of breathing freely with outside for the space closed by pellicle component and mask when the mask) or groove.In order to arrange such hole for other purposes or groove, the recess held or protuberance are groove or the holes that local is arranged on framework edge, process degree of freedom like this and raise, even more ideal.
The groove held or the cross sectional shape in hole 7 are rectangle (such as Fig. 6 A), trapezoidal (such as Fig. 4 A, Fig. 5 A, Fig. 6 E), polygon, circle, semicircle or ellipse (such as Fig. 6 B) etc., not special requirement.In addition, such as, shown in Fig. 4 A, it also can be the mode that the width of groove or the internal diameter in hole diminish along the direction that groove or hole deepen.Also as required curvature R, C face can be set in the bight in groove or hole.
In the framework of the large pellicle component of present embodiment, the groove held or hole 7 preferably have the spatial portion 7a inwardly broadened.Such as L-shaped (such as Fig. 3 C, Fig. 4 B, Fig. 5 B, Fig. 6 C and G, Fig. 7 C), T-shaped (such as Fig. 3 D, Fig. 6 D).Compared with there is not the situation of the spatial portion 7a inwardly broadened, can hooking in holding component, therefore, to hold, fixing more reliable.In addition, as the shape of the spatial portion inwardly broadened, as mentioned above, can be that the cross sectional shape of Width of framework inwardly broadens, can be that the cross sectional shape of the short transverse of framework inwardly broadens, also can be that the cross sectional shape of the length direction of framework inwardly broadens.
In addition, the groove also preferably held or hole have the spatial portion inwardly narrowed.In this case, when inserting the holding component less than the entrance in groove or hole, located by this holding component and the part contact inwardly narrowed, can prevent from holding component relative to groove or hole dislocation while hold.As the shape of the spatial portion inwardly narrowed, as shown in Fig. 3 B, Fig. 4 A, Fig. 5 A, can be that the cross sectional shape of the Width of framework inwardly narrows, can be that the cross sectional shape of the short transverse of framework inwardly narrows, also can be that the cross sectional shape of the length direction of framework inwardly narrows.
Cross sectional shape as the length direction of framework is the example inwardly narrowed, can be set forth in the groove of circumferencial direction that edge local exists, namely the circumferencial direction length of the peristome of this groove is greater than the groove (reference Figure 12) of the degree of depth (referring to the bee-line in the most deep of the peristome of groove and groove) of this groove.In addition, the circumferencial direction length also can enumerating the peristome of this groove is less than the situation of the degree of depth of this groove.If have the framework of the handle part of this shape, then the holding tool of the tabular that front end can be narrowed is positioned to utilize this holding tool to hold in this groove.In addition, the circumferencial direction length of the peristome of groove is preferably 0.5 ~ 30 times with the ratio of the degree of depth of groove, is more preferably 2 ~ 20 times, most preferably is 3 ~ 10 times.If this is than being more than 0.5, is easy to insert holding component, if this is than being less than 30, is difficult to pull down holding tool.
As shown in Figure 3, another embodiment of the framework of the large pellicle component of present embodiment has the groove of following holding or the form in hole 7, the groove of above-mentioned holding or hole 7 towards direction, inner side, and have the spatial portion 7a inwardly broadened from the lateral surface 5 of framework 10.At this, from the lateral surface 5 of framework towards the groove of the holding in direction, inner side or hole 7 except the mode that the normal direction along lateral surface 5 is excavated, also can make the mode excavated along the direction tilted relative to normal direction.The framework of the large pellicle component of present embodiment, the shape of spatial portion 7a that inwardly broadens is such as L-shaped (such as Fig. 3 C and G), T-shaped (such as Fig. 3 D).Compared with there is not the situation of the spatial portion 7a inwardly broadened, can hooking in holding component, therefore hold more reliable.
Fig. 8 and Fig. 9 be for illustration of in the framework of the large pellicle component of present embodiment, the configuration in the groove that holds or hole 7, the skeleton diagram in the direction of seeing pellicle.As shown in Fig. 8 A, C and D and Fig. 9, as long as the groove held or the configuration in hole 7 all have the recess held on 4 limits, can be configured in (Fig. 8 A) on the edge complete cycle of framework 10, also can local configuration in the edge (Fig. 8 C ~ D, Fig. 9 A ~ C) of framework 10.When local configuration, the position that also can hold component with instrument, device etc. correspondingly configures the groove or hole that hold in the appointed part of framework.When the groove that local configuration holds, be preferably pre-configured in any one edge of framework.When holding the framework of pellicle component, the load deflection produced by deadweight can be disperseed equably, thus the generation of flexure can be suppressed.On the other hand, as shown in comparative example described later, in the mode (Fig. 8 B) only on relative 2 limits with protuberance or the recess held, fully cannot suppress the generation bent.
Recess in the framework of the large pellicle component of present embodiment, that hold is groove, length shared by the recess of this holding is respectively more than 10% relative to the length on each limit, the load deflection produced by deadweight can be disperseed equably, more preferably.More preferably more than 20%, most preferably be more than 30%.In addition, when framework needing leave the leeway utilizing the part being processed to form the function had except holding, the length shared by the recess of preferably this holding is respectively less than 90% relative to the length on each limit.Be more preferably less than 80%, most preferably be less than 70%.If the recess of this holding is in each centrosymmetric mode be configured to relative to each edge of each edge, then can disperse the load deflection produced by deadweight equably, ideal.
Recess in the framework of the large pellicle component of present embodiment, that hold is hole, its configuration preferably all configures multiple in advance in each edge of framework.When holding the framework of pellicle component, the load deflection produced by deadweight can be disperseed equably, thus the generation of flexure can be suppressed.
In the framework of the large pellicle component of present embodiment, the groove 7 held also can be the groove of the staged cutting shape of the side of cutting slot sidewall.In addition, the hole 7 held also can be the hole of the rip cutting tubular of the side of the side wall surface of cutting hole.That is, the groove held or the side wall surface of groove in hole 7 or the side wall surface in hole also can form the part on framework 10 surface.As such mode, the side wall surface that such as there is groove or hole arrives the surface of framework, excavates groove or the hole of the shape of the side wall surface in groove or hole from the surface of framework.In addition, in the hole of rip cutting cylinder, with cut by the longitudinal section of main shaft, hole that xsect is semicircle is unnecessary to mention, and also comprises the hole of cutting with the longitudinal section not by main shaft.If represent the example of its cross sectional shape, such as, be Fig. 3 F and G, Fig. 6 F and G, Fig. 7 B.Particularly preferably the side wall surface of groove or the side wall surface in hole form the mode (such as Fig. 3 F and G, Fig. 6 F and G, Fig. 7 B) of a lower edge face part for framework 10.Be pasted with jointing material 2 in the lower edge face 4 of framework 10, but the distance between the surface of lower edge face 4 and photomask 9 only expands the amount of the thickness of jointing material 2, be easy to insert holding component, and, can reduce the diameter in groove or hole, therefore, the possibility that framework intensity reduces is less.But, when using the framework of aforesaid way, need to pay attention to not apply unnecessary power to the adhesive portion of jointing material, pellicle when holding.
In the framework of the large pellicle component of present embodiment, in order to prevent dirt, also can to the contact site of groove or hole and holding component, groove or hole or at least one party that holds component implement certain surface treatment.Include, for example padded coamings such as utilizing silica gel coated.
Skeleton diagram that Figure 10 is the configuration of groove 7 for illustration of the holding in the framework of the large pellicle component of present embodiment, that see from the side surface direction of framework.As shown in Figure 10 A, from the side surface direction of framework, the groove 7 held also can roll from side direction lower edge face, upper limb face and tiltedly configure on edge direction.Further, as shown in Figure 10 B, from the side surface direction of framework, also can from side, side direction lower edge face, upper limb face, so repeatedly configure from side, side direction upper limb face, lower edge face on edge direction.
In addition, on the lateral surface of framework, also the hole run through along the vergence direction shown in Figure 13 can be set 4 angle parts.By arranging such through hole, also bar-shaped instrument can be held through in this through hole.
In the framework of the large pellicle component of present embodiment, the width of each groove or the internal diameter in hole are less than width W or the height h of the framework being provided with this groove or hole, such as, when being arranged on upper limb face 3 or lower edge face 4, the width of each groove or the internal diameter in hole are preferably 0.01 ~ 1 times of frame width, be more preferably 0.01 ~ 0.5 times, more preferably 0.01 ~ 0.2 times.Such as, when being arranged on lateral surface 5 or medial surface 6, the width of each groove or the internal diameter in hole are preferably 0.01 ~ 1 times of framework height, are more preferably 0.01 ~ 0.5 times, more preferably 0.01 ~ 0.2 times.In addition, when the degree of depth in groove or hole is larger, in order to avoid the rigidity of framework reduces, the width of preferred groove or the internal diameter in hole less.When being provided with the space 7a broadened to the groove of holding or the inside in hole 7, the width of the space 7a broadened or internal diameter are less than width W or the height h of framework.
The groove held or hole 7 can be used for the framework (comprising the framework held before bonding pellicle and the framework these two kinds held after bonding pellicle) holding pellicle component, can effectively utilize when processing list film structural component, by pellicle members contain in time holding container, when accommodation container takes out pellicle component.
The method utilizing holding component to hold, fix groove or the hole held is described.Figure 11 holds component for illustration of utilization to hold, the partial enlargement longitudinal section of the situation during framework of the large pellicle component of fixing present embodiment, Figure 11 A represent be the groove of T-shaped holding or hole 7 to cross section in insert and hold, fixedly have the mode of the holding component 16 of the locking mechanism formed by elastic bodys such as plastics, Figure 11 B represents to being arranged on framework upper limb face, cross section is insert in the groove of the holding of L-shaped or hole 7 and hold, fixedly have a mode of the holding component 16 of the hang part of L-shaped, Figure 11 C represents to being arranged on framework lateral surface, cross section is L-shaped, side wall surface forms in the groove of holding of a surface part for framework or hole 7 and inserts and hold, fixedly have the mode of the holding component 16 of the hang part of L-shaped, Figure 11 D represents to being arranged on framework lower edge face, cross section is insert in the groove of trapezoidal holding or hole 7 and hold, the mode of the leading section of the holding component 16 of fixed L font, Figure 11 E represents to being arranged on framework medial surface, cross section is insert in the groove of the holding of rectangle or hole 7 and hold, the fixing mode holding component 16.In Figure 11 A ~ E, hold component 16 reliably hold, be fixed on hold groove or hole in.
In the present invention, for the framework of above-mentioned large pellicle component, hold the protuberance of holding at more than at least 1 place respectively by each edge in framework or the mode of recess reduces flexure, therefore preferably simultaneously.More preferably hold protuberance or the recess of all holdings in each edge of the framework of large pellicle component simultaneously.
In addition, when peeling off pellicle component from photomask, can peeling off after the groove held or hole, when peeling off, reliably can transmit peeling force.
The second, the form above-mentioned framework respectively in all edge to the protuberance of holding is described.As this protuberance, there is the form of tabular or bar-shaped form.In addition, in the present invention, the protuberance of tabular refer to be formed in framework lateral surface, medial surface, upper limb face or lower edge face protuberance, and the circumferencial direction length of this protuberance in these faces is more than 1.5 times of short transverse length, bar-shaped protuberance refers to that the length of the circumferencial direction of this protuberance is less than 1.5 times of the short transverse length of this protuberance.
First, the protuberance (below also referred to as " teat ") be formed in framework is described.Figure 14 is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, and Figure 14 A ~ G is the mode example being provided with teat at the lateral surface of framework.Figure 15 is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, and Figure 15 A ~ D is the mode example being provided with teat in the upper limb face of framework.Figure 16 is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, and Figure 16 A ~ D is the mode example being provided with teat in the lower edge face of framework.Figure 17 is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, and Figure 17 A ~ G is the mode example being provided with teat at the medial surface of framework.
As shown in figure 14, the framework 10 of the large pellicle component of present embodiment has lateral surface 5 teat 7 that direction is outstanding toward the outer side from framework.In addition, as shown in figure 15, the framework 10 of the large pellicle component of present embodiment also can have the teat 7 given prominence to upward from the upper limb face 3 of framework.In addition, as shown in figure 16, the framework 10 of the large pellicle component of present embodiment also can have the teat 7 given prominence to downward from the lower edge face 4 of framework.In addition, as shown in figure 17, the framework 10 of the large pellicle component of present embodiment also can have from the medial surface 6 of the framework teat 7 outstanding towards direction, inner side.
At this, except the lateral surface 5 of the framework mode that the teat 7 given prominence to of direction is outstanding except the normal direction along lateral surface 5 toward the outer side, also can make along the outstanding mode in the direction tilted relative to normal direction.The teat given prominence to upward from the upper limb face 3 of framework, except the mode of giving prominence to along the normal direction in upper limb face 3, also can be made along the outstanding mode in the direction tilted relative to normal direction.The teat 7 given prominence to downward from the lower edge face 4 of framework, except the mode of giving prominence to along the normal direction in lower edge face 4, also can be made along the outstanding mode in the direction tilted relative to normal direction.The teat 7 given prominence to towards direction, inner side from the medial surface 6 of framework, except the outstanding mode of the normal direction along medial surface 6, also can be made along the outstanding mode in the direction tilted relative to normal direction.From the lateral surface of framework toward the outer side the teat given prominence to of direction and the overhang of teat of giving prominence to towards direction, inner side from the medial surface of framework with the surface of outstanding framework for benchmark, outstanding length is 0.1 ~ 10 times of frame width, be preferably 0.1 ~ 5 times, be more preferably 0.1 ~ 3 times.In addition, the teat given prominence to facing to top from the upper limb of framework and the overhang of teat of giving prominence to facing to below from the lower edge of framework with the surface of outstanding framework for benchmark, outstanding length is 0.1 ~ 10 times of frame width, is preferably 0.1 ~ 5 times, is more preferably 0.1 ~ 3 times.
When being provided with the situation of the teat 7 given prominence to upward from the upper limb face 3 of framework and being provided with give prominence to downward from the lower edge face 4 of framework teat 7, except holding, except fixing reliabilization, teat 7 plays the effect of stiffening rib for the flexure in the normal to a surface direction of pellicle 1.
On the other hand, when be provided with from the lateral surface 5 of framework toward the outer side the direction situation of teat 7 of giving prominence to and be provided with from the medial surface 6 of framework give prominence to towards direction, inner side teat 7, except the reliabilization holding, fix, the flexure making framework to center direction is played to the effect of stiffening rib when sprawling pellicle 1 due to the tension force applied to the direction parallel with pellicle 1 surface.
Further, as shown in figure 18, the framework 10 of the large pellicle component of present embodiment also can have multiple teat 7 in framework.Figure 18 is the partial enlargement longitudinal section of the various mode examples of the framework of the large pellicle component representing present embodiment, and Figure 18 A ~ G is the mode example being provided with multiple teat.As combination, exist have from the lateral surface of framework toward the outer side the teat given prominence to of direction and these two kinds of teats of teat of giving prominence to facing to top from the upper limb of framework situation, have from the lateral surface of framework toward the outer side the teat given prominence to of direction and these two kinds of teats of teat of giving prominence to facing to below from the lower edge of framework situation, have from the lateral surface of the framework teat given prominence to of direction and the situation of these two kinds of teats of teat of giving prominence to towards direction, inner side from the medial surface of framework toward the outer side.In addition, the situation of these the two kinds of teats of teat that also there is the teat having and give prominence to facing to top from the upper limb of framework and give prominence to facing to below from the lower edge of framework, the situation of these two kinds of teats of teat that there is the teat given prominence to facing to top from the upper limb of framework and give prominence to towards direction, inner side from the medial surface of framework.The situation of these the two kinds of teats of teat that also there is the teat that has and give prominence to facing to below from the lower edge of framework and give prominence to towards direction, inner side from the medial surface of framework.Further, 3 surfaces also existed in 4 surfaces of framework arrange the mode of teat or all arrange the mode of teat on 4 surfaces of framework.Making holding by arranging teat on multiple surfaces of framework, fixing more reliably, and, the reinforcement direction of framework can be increased.In addition, relative to two or more holding tool of the different surfaces of holding framework, also have and can deal with such advantage with same framework.
The cross sectional shape of teat 7 is rectangle (such as Figure 14 A and B, Figure 15 A, Figure 16 A, Figure 17 A and B), trapezoidal (such as Figure 14 F, Figure 15 D, Figure 16 A, Figure 17 F), polygon, circle, semicircle (such as Figure 15 B, Figure 15 C) or ellipse (such as Figure 14 G, Figure 17 G) etc., not special requirement.Also curvature R, C face can be set as required in bight.
Figure 19 and Figure 20 be for illustration of in the framework of the large pellicle component of present embodiment, the configuration of teat, the skeleton diagram in the direction of seeing pellicle.As shown in Figure 19 A, C and D and Figure 20, as long as the configuration of teat 7 all has the protuberance held on 4 limits, can be configured in (Figure 19 A) on the edge complete cycle of framework 10, also can local configuration in the edge (Figure 19 C ~ D, Figure 20 A ~ E) of framework 10.When local configuration, also can with the alignment mark position of holding when processing the photomask pasted, fixed position, photomask, photomask is fixed on exposure machine time holding, fixed position configure teat in the appointed part of framework accordingly.When local configuration teat, be preferably pre-configured in any one edge of framework.Intensity is strengthened relative to the flexure of framework.
The protuberance held in the framework of the large pellicle component of present embodiment is tabular, length shared by the protuberance of this holding is respectively more than 10% relative to the length on each limit, the load deflection produced by deadweight can be disperseed equably, more preferably.More preferably more than 20%, most preferably be more than 30%.In addition, when framework needing the leeway of the part left by being processed to form the function had except holding, the length shared by the protuberance of preferably this holding is respectively less than 90% relative to the length on each limit.Be more preferably less than 80%, most preferably be less than 70%.The protuberance of this holding, in each centrosymmetric mode be configured to relative to each edge of each edge, can disperse the load deflection produced by deadweight equably, ideal.
The protuberance held in the framework of the large pellicle component of present embodiment is bar-shaped, its configuration preferably all configures multiple in advance in each edge of framework.When holding the framework of pellicle component, the load deflection produced by deadweight can be disperseed equably, thus the generation of flexure can be suppressed.
Figure 10 be for illustration of in the framework of the large pellicle component of present embodiment, the configuration of teat, the skeleton diagram seen from the side surface direction of framework.As shown in Figure 10 A, from the side surface direction of framework, teat 7 also can roll from side direction lower edge face, upper limb face and tiltedly configure on edge direction.Further, as shown in Figure 10 B, from the side surface direction of framework, also can from side, side direction lower edge face, upper limb face, so repeatedly configure from side, side direction upper limb face, lower edge face on edge direction.
Figure 21 is the partial enlargement longitudinal section that the teat be arranged in the framework of large pellicle component loads and unloads when being freely fixed on the mode of framework edge, Figure 21 A represents that screw thread is fixed, Figure 21 B represent by unitor carry out fixing, Figure 21 C be represent by elastic body carry out fixing, Figure 21 D be represent by clamping carry out fixing.As shown in figure 21, in the framework of the large pellicle component of present embodiment, the preferred handling of teat 7 of framework 10 are freely fixed on the edge of framework 10.After the framework of pellicle component is glued to the rigidity photomask higher than the framework of pellicle component, due to the rigidity of the framework of pellicle component need not be worried, therefore, also can pull down with teat that is fixing, that hold for improving rigidity.By such operation, also can avoid being subject to the restriction of holding when processing photomask, fixed position, holding when photomask being fixed on exposure machine, fixed position.
In addition, when peeling off pellicle component from photomask, also in advance teat can be installed.By such operation, seeking the rigidity of the framework improving pellicle component, can hold, fixed salient, therefore, when peeling off, reliably can transmit peeling force.
As long as the fixing means of the machinery that handling method can load and unload.Such as shown in Figure 21, screw thread, unitor, elastomeric insertion can be enumerated, sandwich.In order to prevent dirt, preferably also certain surface treatment can be implemented in advance to contact site.Such as, can enumerate and undertaken coated by padded coamings such as silicon rubber.When teat can load and unload, teat also can be formed by the raw material that rigidity is higher than framework.When the lateral surface of framework or medial surface are with teat, 0.01 ~ 1 times that the size (internal diameter) for the hole or groove of installing teat is framework height, are preferably 0.01 ~ 0.5 times of framework height, are more preferably 0.01 ~ 0.2 times of framework height.In addition, when teat has been worn in the upper limb face of framework or lower edge, 0.01 ~ 1 times that size (internal diameter) for the hole or groove of installing teat is frame width, be preferably 0.01 ~ 0.5 times of framework height, be more preferably 0.01 ~ 0.2 times of framework height.In order to avoid the rigidity of framework reduces, preferably apertures or groove less.
In the framework of the large pellicle component of present embodiment, such as, shown in Figure 19 or Figure 20, the teat shape of framework 10 is preferably tabular.The thickness of plate is less than width W or the height h of the framework arranging this plate, such as, be preferably the thickness of more than 0.01 times of the overhang of teat 7, be more preferably the thickness of more than 0.1 times.When making teat 7 for hook-type, the bending leading section 7a of hook-type also can be greater than width W or the height h of the framework arranging plate.At this, as shown in Figure 20 (c), when teat 7 is tabular, also can increase the overhang of teat continuously towards the central portion on limit from four of a framework bight.By like this, the rigidity near the edge central authorities that rigidity is more weak can be strengthened, the rigidity in framework four bights and the rigid uniform of edge.
In the framework of the large pellicle component of present embodiment, such as, shown in Figure 22, also can the shape of the teat 7 of framework 20 be made bar-shaped.Figure 22 is the stereographic map of the another way (teat is bar-shaped) of the framework of large pellicle component for illustration of present embodiment, and Figure 22 A represents the large pellicle component being adhered to photomask, and Figure 22 B represents the framework of large pellicle component.The cross sectional shape of bar-shaped teat 7 is rectangle, trapezoidal, polygon, circle, ellipse etc., not special requirement.Also curvature R, C face can be set as required in bight.Teat 7 also can be arranged on any one face in the upper limb face of framework 20, lower edge face, lateral surface or medial surface.Figure 22 is the mode example being provided with teat at lateral surface.Such as, when being arranged at upper limb face 3 or lower edge face 4, the diameter of rod is preferably the length of 0.1 ~ 2 times of frame width, is more preferably the length of 0.1 ~ 0.5 times.Such as when being arranged at lateral surface 5 or medial surface 6, the diameter of rod is preferably the length of 0.1 ~ 3 times of framework height, is more preferably the length of 0.1 ~ 1 times.Figure 23 be for illustration of in the framework of the large pellicle component of present embodiment, the configuration of bar-shaped teat, the skeleton diagram in the direction of seeing pellicle, the mode of Figure 23 A and Figure 22 is identical, it is the situation being respectively provided with 3 teats at minor face and long limit respectively, Figure 23 B is respectively provided with 1 teat respectively at minor face and long limit and is respectively provided with the situation of 1 teat at 4 angles, and Figure 23 C is the situation of the teat integration made on each limit in Figure 23 A.In Figure 23 C, due to 3 bar-shaped teat 7 integrations, therefore, except expectation improves intensity, during dismounting, workability is also better.
In the framework of the large pellicle component of present embodiment, teat preferably makes hook-type in its front end.Be such as L-shaped (such as Figure 14 C and E, Figure 15 C, Figure 16 D, Figure 17 C and E), T-shaped (such as Figure 14 D, Figure 17 D).Compared with the situation not having key, can hooking in holding component, therefore, to hold, fixing more reliable.
In the framework of the large pellicle component of present embodiment, when pellicle component is pasted on photomask, the teat of framework also can be formed as contacting with the circumferential lateral surface of photomask.Or in the framework of the large pellicle component of present embodiment, when pellicle component is pasted on photomask, the teat of framework also can be formed as contacting with the groove be formed on photomask.Figure 24 is the partial enlargement longitudinal section of the teat comprised in the framework being arranged at large pellicle component, Figure 24 A represents that the mode that the edge that teat is L-shaped, front end bends contacts with photomask, Figure 24 B represent that teat is L-shaped, front end penetrates into mode in the groove be arranged on photomask.As shown in fig. 24 a, the lower surface of the leading section 7a self adhesive material 2 of the L-shaped teat on the direction vertical with lower edge face 4 is outstanding, the leading section 7a of L-shaped teat is configured to the lateral surface substantial contact with photomask 9.Or, as shown in fig. 24b, when the leading section 7a of the L-shaped teat on the direction vertical with lower edge face 4 must be configured in than photomask 9 lateral surface in the inner part, can be also the shape identical with leading section 7a by the surfacing cut of photomask 9.In any one situation of Figure 24 A and B, when pellicle component is pasted on photomask, all play the effect making the contraposition of pellicle component simplify, improve the paste position precision of pellicle component.
Further, in the framework of the large pellicle component of present embodiment, when pellicle component is pasted on photomask, the teat of framework also can be formed as contacting with the circumferential lateral surface of photomask and the groove be formed on photomask.Such as, be the teat of in the teat of the left and right of framework is formed as contact with the circumferential lateral surface of photomask, another teat is formed as the mode that contacts with the groove be formed on photomask.Or, be the teat of framework is made F font, the part that bent front is formed as contacting with the circumferential lateral surface of photomask, the part of front lateral bend is formed as the mode that contacts with the groove be formed on photomask.Like this, as long as play the effect making the contraposition of pellicle component simplify, improve the paste position precision of pellicle component when pellicle component is pasted on photomask, also mode can be out of shape.
Combine in the teat of Figure 25 in the framework being arranged at large pellicle component another part and fixing large pellicle component time partial enlargement longitudinal section.As shown in figure 25, in the framework of the large pellicle component of present embodiment, be preferably when pellicle component is pasted on photomask 9, teat 7 and another part 15 of framework combine, thus are formed as utilizing physical method that framework 10 is fixed on photomask 9.By like this, pellicle component reliably can be installed on photomask, can prevent from coming off.As the method for teat 7 another part 15 being installed on framework, the various fixing means such as can use that screw thread is locking, unitor, employing elastic body carry out is fitted together to, sandwich.
Teat also can be used for holding, fixing, can when processing list film structural component, be contained in when holding container, effectively utilized when accommodation container takes out pellicle component.Illustrate that component holds, the method for fixed salient by holding.Figure 26 holds for illustration of by holding component, the partial enlargement longitudinal section of the situation during framework of the large pellicle component of fixing present embodiment, Figure 26 A represents holding, constant cross-section is the mode of the teat of rectangle, Figure 26 B represents holding, be fixedly installed on the teat of framework lateral surface, namely cross section is the mode of the teat of L-shaped, Figure 26 C represents holding, be fixedly installed on the teat in framework upper limb face, namely cross section is the mode of the teat of L-shaped, Figure 26 D represents holding, be fixedly installed on the teat of framework medial surface, the mode of the teat of 2 rectangles.In Figure 26 A and C, holding component 16 reliably holds, fixed salient.In Figure 26 B, L word leading section (hook portion) hooking of teat is held more reliably in holding component 16, is fixed.In addition, in Figure 26 D, between the teat of 2 rectangles hooking hold component 16 and reliably held, fixing.For the above-described, framework has in all edge the form of recess and framework that hold to have the protuberance held respectively form in all edge respectively, self-evident, also can combine the recess held and protuberance use in a framework.When emphasizing space efficiency, being preferably recess, when emphasizing the stiffening effect of framework, being preferably protuberance, but in the scope of above-mentioned various form, can design in combination with the design holding component.
For the framework holding large pellicle component of the present invention, preferably hold protuberance or the recess of the holding at more than at least 1 place respectively in each edge of framework simultaneously, more preferably hold protuberance or the recess of the holding at more than at least 2 places in each edge of framework respectively simultaneously, most preferably hold protuberance or the recess of all holdings in each edge of framework simultaneously.
To be bonded with pellicle framework apply by pellicle for shrink tension force produce to inward side to stretch stress.In the present embodiment, when excavating the mode in groove or the hole held from the medial surface of framework, the stress in outside can be applied to the edge of framework by being inserted into holding component in the groove or hole that hold.Thereby, it is possible to correct the microdeformation of the framework produced by above-mentioned stress.And, excavating in the mode in groove or the hole held, the mode excavating groove or the hole held from the lower edge face of framework or any one mode excavated in the mode in groove or the hole held from the lateral surface of framework from the upper limb face of framework, such as by spatial portion that the inside arranged to groove or hole broadens, and locking mechanism is set in the leading section of the insertion holding component, all can correct the distortion to the inside that framework is produced by pellicle.Equally, for the protuberance be formed in framework, by holding protuberance, the Direction distortion to the inside that framework is produced by pellicle also can be corrected.In addition, self-evident, correct method that above-mentioned framework is out of shape to the inside except can being applied to the situation of being out of shape to the inside of correcting and being caused by the shrink tension of pellicle, also can be applied to the situation of the distortion caused by the deadweight of framework, the external force except layer tension.
When correcting the framework shape of large pellicle component, preferably hold protuberance or the recess of the holding at more than at least 1 place respectively in each edge of the framework of above-mentioned large pellicle component simultaneously, stress is applied at least 1 place of the framework of above-mentioned large pellicle component, thus reduces the distortion of this framework.
embodiment
The present inventor etc. use the framework with the large pellicle component of the present invention of above-mentioned structure to test, and result can obtain the good result shown in following examples.
embodiment 1
Prepare that long edge lengths is 1600mm, bond length is 1400mm, width is 14mm, be highly the framework of the aluminum alloy of the quadrilateral of 6mm.Be the position of 3mm at the height of each limit lateral surface, centered by 3 of the two ends 250mm apart from the central authorities on each limit and each limit, utilize the groove that the circumferencial direction length each limit of cut in all 4 limits of framework being formed respectively 3 place's peristomes is 200mm, the height of peristome is 1.5mm, the degree of depth of groove is 3mm.
In the lower edge face of framework, as bonding material layer, adhesive surface is coated with the foam polyethylene base material (thickness is 1mm) of acrylic-based adhesives.Then; the diaphragm of the frame-shaped that stacked and above-mentioned framework is identical on this bonding material layer; namely have the diaphragm of the pet resin of silicon class release agent at surface application, this diaphragm be set to the central portion on long limit to the lateral direction of framework stretch out be of a size of wide 10mm × long 900mm pressing part, stretch out the pressing part being of a size of wide 10mm × long 750mm, the pressing part (with reference to Figure 27) stretching out radius 10mm on the summit of corner centered by summit to the lateral direction of framework at the central portion of minor face to the lateral direction of framework.
The framework of the large pellicle component with diaphragm obtained in this wise is mounted on the pallet of the accommodation container utilizing ABS resin material vacuum to be shaped, by adhesive strip (band size: long limit 15mm × 940mm, minor face 15mm × 790mm, corner 15mm × 60mm), 8 places of above-mentioned pressing part is adhesively fixed on pallet.
embodiment 2
Except long edge lengths be 1800mm, bond length is 1600mm, width is except 16mm, prepare the framework same with above-described embodiment 1, be fixed in similarly to Example 1 on pallet.
embodiment 3
Except long edge lengths be 2000mm, bond length is 1800mm, width is except 18mm, prepare the framework same with above-described embodiment 1, be fixed in similarly to Example 1 on pallet.
embodiment 4
Except the diameter each limit in 3 points of the two ends 150mm apart from the central authorities on each limit and each limit, the lateral surface in framework, all 4 limits in framework being formed respectively 3 place's peristomes be 3mm, the degree of depth is except the hole of the circle of 3mm, prepare the framework same with above-described embodiment 2, be fixed in similarly to Example 1 on pallet.
comparative example 1
Except the height forming peristome on the complete cycle of minor face lateral surface be 1.5mm, the degree of depth of groove is the groove of 3mm, do not formed except handle part on long limit, prepare the framework same with above-described embodiment 2, be fixed in similarly to Example 1 on pallet.
embodiment 5
Except the position of the central authorities on distance limit and two ends 150mm, the diameter that respectively forms 3 place's peristomes at the lateral surface of framework be 3mm, the degree of depth is the hole of the circle of 3mm, the diameter that respectively forms 1 place's peristome at the lateral surface of the framework of minor face central authorities is 3mm, the degree of depth is except the hole of the circle of 3mm, prepare the framework same with above-described embodiment 2, be fixed in similarly to Example 1 on pallet.
To represent the evaluation result of above-described embodiment 1 ~ 5 and comparative example 1 in following table 1.
The framework his-and-hers watches film structural component framework before being bonded and fixed on pallet is utilized to hold evaluation reliably.When embodiment 1 ~ 3, as holding component, prepare to have be made up of reinforced plastics width 100mm, thickness 0.75mm 12 groups of instruments of holding component of tabular, this holding component is inserted in the groove of all holdings on each limit of framework and holds simultaneously, flatly lift framework.In addition, in the case of comparative example 1, identical instrument is inserted into by apart from the central authorities of two minor faces and the two ends 250mm of two minor faces amount at 6 centered by 6 places, flatly lift framework.In addition, when embodiment 4 ~ 5, as holding component, prepare the rod of the diameter 2mm be made up of reinforced plastics, this holding component is inserted in the hole of all holdings on each limit of framework and holds simultaneously, flatly lift framework.After flatly lifting, its at the height of 300mm upper and lower 5 times are made with the ratio of every 1 second 1 time under horizontality, represent that all holding component is not all from the situation that groove or the hole of all holdings are deviate from by "○", represent that a part holds groove that component holds from a part for correspondence or the situation that hole is deviate from " △ ", represent that all holding component is deviate from and situation the body drop of pellicle component frame from the groove of all holdings or hole by "×".
In addition, utilize the framework be bonded and fixed on the pallet of horizontal positioned across diaphragm to carry out flexure to this pellicle component framework to prevent from evaluating.When embodiment 1 ~ 3, as holding component, prepare to have be made up of reinforced plastics width 100mm, thickness 0.75mm 12 groups of instruments of holding component of tabular, this holding component is inserted in the groove of all holdings on each limit of framework and holds simultaneously, flatly lift framework.In addition, in the case of comparative example 1, identical instrument is inserted into by apart from the central authorities of two minor faces and the two ends 250mm of two minor faces amount at 6 centered by 6 places, flatly lift framework.In addition, when embodiment 4 ~ 5, as holding component, prepare the rod of the diameter 2mm be made up of reinforced plastics, this holding component is inserted in the hole of all holdings on each limit of framework and holds simultaneously, flatly lift framework.The speed lifted is 1cm per second, the deflection on the limit of the pellicle component framework before representing by the interface of complete strip off diaphragm and jointing material with " ◎ " is less than the situation of 10mm, the deflection on the limit of the pellicle component framework before representing by the interface of complete strip off diaphragm and jointing material by "○" is more than or equal to 10mm and is less than the situation of 15mm, the deflection on the limit of the pellicle component framework before representing by the interface of complete strip off diaphragm and jointing material by " △ " (threshold level no problem in actual applications) is more than or equal to 15mm and is less than the situation of 20mm, the deflection on the limit of the pellicle component framework before representing by the interface of complete strip off diaphragm and jointing material by "×" (in actual applications in-problem level) is more than or equal to the situation of 20mm.
table 1

Claims (1)

1. one kind is taken out the removing method of large pellicle component from accommodation container, the framework of this large pellicle component has the polygonal shape be made up of many limits, can at the bonding pellicle in upper limb face of this framework, at the lower edge face of this framework coating jointing material, the length of the longest edge of above-mentioned framework is more than 1m, wherein
Above-mentioned framework has protuberance or the recess of multiple holding respectively in all edge;
All edge of above-mentioned framework hold the protuberance of all holdings or recess and takes out.
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Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5051840B2 (en) * 2007-11-22 2012-10-17 信越化学工業株式会社 Method for storing a pellicle in a pellicle storage container
JP5134436B2 (en) * 2008-05-27 2013-01-30 信越化学工業株式会社 Pellicle for lithography
KR101390007B1 (en) * 2008-09-12 2014-04-29 아사히 가세이 이-매터리얼즈 가부시키가이샤 Pellicle frame, pellicle and method for using pellicle frame
JP5411596B2 (en) * 2009-06-24 2014-02-12 信越化学工業株式会社 Pellicle frame and lithography pellicle
JP5411595B2 (en) * 2009-06-24 2014-02-12 信越化学工業株式会社 Pellicle frame and lithography pellicle
JP2011034020A (en) * 2009-08-06 2011-02-17 Shin-Etsu Chemical Co Ltd Pellicle storage container
US8685598B2 (en) 2009-10-07 2014-04-01 Mitsui Chemicals, Inc. Pellicle and mask adhesive therefor
JP4879308B2 (en) * 2009-10-29 2012-02-22 信越化学工業株式会社 Pellicle stripping jig and stripping method
JP4951051B2 (en) * 2009-10-30 2012-06-13 信越化学工業株式会社 Pellicle frame and pellicle
JP5731147B2 (en) * 2010-09-01 2015-06-10 旭化成イーマテリアルズ株式会社 Pellicle frame and pellicle
JP5579545B2 (en) * 2010-09-03 2014-08-27 旭化成イーマテリアルズ株式会社 Large pellicle frame, large pellicle, and method for manufacturing large pellicle frame
JP2012093595A (en) * 2010-10-28 2012-05-17 Shin Etsu Chem Co Ltd Pellicle frame and pellicle
JP5649134B2 (en) * 2011-02-08 2015-01-07 信越化学工業株式会社 Pellicle frame
JP5722760B2 (en) * 2011-02-08 2015-05-27 信越化学工業株式会社 Pellicle manufacturing kit
JP5663376B2 (en) * 2011-04-04 2015-02-04 信越化学工業株式会社 Pellicle frame, manufacturing method thereof, and pellicle
JP5618888B2 (en) * 2011-04-04 2014-11-05 信越化学工業株式会社 Method for producing pellicle and pellicle film
JP5940283B2 (en) * 2011-11-04 2016-06-29 信越化学工業株式会社 Pellicle
JP2013195950A (en) * 2012-03-22 2013-09-30 Toppan Printing Co Ltd Pellicle and photomask
JP5795747B2 (en) * 2012-04-04 2015-10-14 信越化学工業株式会社 Pellicle frame and pellicle
WO2014020912A1 (en) * 2012-08-02 2014-02-06 三井化学株式会社 Pellicle
JP5864399B2 (en) * 2012-10-22 2016-02-17 信越化学工業株式会社 Pellicle storage container
JP5984187B2 (en) * 2013-04-22 2016-09-06 信越化学工業株式会社 Pellicle and photomask assembly
US10207459B2 (en) * 2013-06-21 2019-02-19 Mitsuiya Industrial Co., Ltd Working method for end portion of plate member, manufacturing method for plate member, working apparatus for end portion of plate member, and plate member
JP6389353B2 (en) * 2013-08-15 2018-09-12 旭化成株式会社 Pellicle frame and pellicle
KR101918687B1 (en) 2014-01-28 2018-11-14 삼성전자주식회사 Pellicle
WO2015166927A1 (en) * 2014-05-02 2015-11-05 三井化学株式会社 Pellicle frame, pellicle and manufacturing method thereof, exposure original plate and manufacturing method thereof, exposure device, and semiconductor device manufacturing method
DE102014111995B4 (en) * 2014-08-21 2022-10-13 Infineon Technologies Ag METHODS OF GRASPING, MOVING AND ELECTRICAL TESTING OF A SEMICONDUCTOR MODULE
KR101915912B1 (en) * 2014-09-19 2018-11-06 미쯔이가가꾸가부시끼가이샤 Pellicle, production method thereof, exposure method
CN106796391B (en) 2014-09-19 2020-02-11 三井化学株式会社 Pellicle, method for manufacturing pellicle, and exposure method using pellicle
JP6304884B2 (en) * 2014-09-22 2018-04-04 信越化学工業株式会社 Pellicle pasting method
US10539886B2 (en) 2014-11-17 2020-01-21 Asml Netherlands B.V. Pellicle attachment apparatus
KR102082784B1 (en) * 2014-12-11 2020-03-02 삼성디스플레이 주식회사 Mask frame assembly, manufacturing method of the same and manufacturing method of organic light emitting display device there used
JP6347741B2 (en) * 2014-12-25 2018-06-27 信越化学工業株式会社 Pellicle
JP6519190B2 (en) * 2015-01-16 2019-05-29 日本軽金属株式会社 Support frame for pellicle
JP2016139103A (en) * 2015-01-29 2016-08-04 日本軽金属株式会社 Supporting frame for pellicle
WO2016133054A1 (en) * 2015-02-19 2016-08-25 株式会社ブイ・テクノロジー Pellicle frame gripping device and pellicle frame gripping method
JP6376601B2 (en) * 2015-05-18 2018-08-22 信越化学工業株式会社 Pellicle support means, pellicle support apparatus and pellicle mounting method using the same
JP7242299B2 (en) * 2015-12-14 2023-03-20 エーエスエムエル ネザーランズ ビー．ブイ． membrane assembly
JP6858777B2 (en) 2015-12-14 2021-04-14 エーエスエムエル ネザーランズ ビー．ブイ． Membrane for EUV lithography
JP6559585B2 (en) * 2016-01-25 2019-08-14 日本特殊陶業株式会社 Pellicle frame and method for manufacturing pellicle frame
JP6604651B2 (en) * 2016-02-22 2019-11-13 信越化学工業株式会社 Pellicle storage container
JP6526588B2 (en) * 2016-03-10 2019-06-05 日本特殊陶業株式会社 Method of manufacturing pellicle frame and pellicle frame
JP6532428B2 (en) * 2016-05-26 2019-06-19 信越化学工業株式会社 Pellicle
JP7017900B2 (en) * 2016-11-11 2022-02-09 旭化成株式会社 Pellicle structure, pellicle storage and fixing method
JP6706575B2 (en) * 2016-12-22 2020-06-10 信越化学工業株式会社 Pellicle frame and pellicle using the same
JP7357432B2 (en) 2017-10-10 2023-10-06 信越化学工業株式会社 EUV pellicle frame, pellicle, exposure original plate with pellicle, exposure method, and semiconductor manufacturing method
JP7307054B2 (en) * 2017-10-27 2023-07-11 エーエスエムエル ネザーランズ ビー．ブイ． Pellicle frame and pellicle assembly
JP6899759B2 (en) * 2017-12-12 2021-07-07 日本軽金属株式会社 Pellicle frame for FPD (flat panel display) and its manufacturing method
EP3764161A4 (en) * 2018-03-05 2021-12-01 Mitsui Chemicals, Inc. Pellicle, exposure master, exposure device and method for manufacturing semiconductor device
US10768534B2 (en) 2018-08-14 2020-09-08 Taiwan Semiconductor Manufacturing Co., Ltd. Photolithography apparatus and method and method for handling wafer
JP7103252B2 (en) 2019-02-01 2022-07-20 信越化学工業株式会社 Pellicle frame, pellicle, pellicle frame with mask adhesive, exposure original plate with pellicle, exposure method and semiconductor manufacturing method
JP7347789B2 (en) * 2019-07-09 2023-09-20 三井化学株式会社 Pellicle frame and pellicle
TW202129404A (en) * 2020-01-21 2021-08-01 日商信越化學工業股份有限公司 Pellicle frame, pellicle, exposure original plate with pellicle, exposure method, and semiconductor or liquid-crystal-display manufacturing method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005308901A (en) * 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd Pellicle frame and pellicle for photo lithography using it
CN1854891A (en) * 2005-04-25 2006-11-01 信越化学工业株式会社 Pellicle frame

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4833051A (en) * 1984-08-20 1989-05-23 Nippon Kogaku K.K. Protective device for photographic masks
JP2595993B2 (en) * 1987-10-09 1997-04-02 株式会社ニコン Apparatus and method for producing original plate for exposure
JP3242693B2 (en) * 1992-05-15 2001-12-25 富士通株式会社 Pellicle sticking device
JPH095982A (en) * 1995-06-17 1997-01-10 Mitsui Petrochem Ind Ltd Method for peeling mask protective device
JPH09106066A (en) * 1995-10-09 1997-04-22 Nikon Corp Pericle liner separating method
JPH1048811A (en) * 1996-08-07 1998-02-20 Mitsui Petrochem Ind Ltd Mask protecting device and pellicle frame
JP4007752B2 (en) * 1999-07-30 2007-11-14 旭化成エレクトロニクス株式会社 Large pellicle frame and large pellicle
JP2002131892A (en) * 2000-10-27 2002-05-09 Asahi Kasei Electronics Co Ltd Method for removing pellicle and apparatus for it
US6524754B2 (en) * 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
JP2003222990A (en) * 2001-11-21 2003-08-08 Asahi Glass Co Ltd Loading structure of photomask with pellicle
US7205074B2 (en) * 2002-12-31 2007-04-17 Intel Corporation Venting of pellicle cavity for a mask
JP2004240010A (en) * 2003-02-04 2004-08-26 Asahi Kasei Electronics Co Ltd Method of housing pellicle
JP4030888B2 (en) * 2003-02-05 2008-01-09 Ｓｍｋ株式会社 Module socket
JP4330377B2 (en) * 2003-05-15 2009-09-16 旭化成イーマテリアルズ株式会社 Large pellicle assembly method and large pellicle assembly apparatus
JP4497845B2 (en) * 2003-06-04 2010-07-07 旭化成イーマテリアルズ株式会社 Large pellicle storage method
JP2005202011A (en) * 2004-01-14 2005-07-28 Mitsui Chemicals Inc Pellicle
JP2005326634A (en) * 2004-05-14 2005-11-24 Mitsui Chemicals Inc Method for housing pellicle
JP2006146064A (en) * 2004-11-24 2006-06-08 Asahi Kasei Electronics Co Ltd Temporary frame for stripping large pellicle
JP4391435B2 (en) * 2005-03-22 2009-12-24 信越化学工業株式会社 Pellicle storage container
US20060246234A1 (en) * 2005-04-20 2006-11-02 Yazaki Corporation Photomask assembly incorporating a metal/scavenger pellicle frame
JP2006323178A (en) * 2005-05-19 2006-11-30 Shin Etsu Chem Co Ltd Pellicle for lithography, and its manufacturing method
JP4677632B2 (en) * 2005-07-08 2011-04-27 レーザーテック株式会社 Pellicle liner or pellicle peeling apparatus, peeling method, and pattern substrate manufacturing method
JP2008083166A (en) * 2006-09-26 2008-04-10 Toppan Printing Co Ltd Pellicle frame
JP5052106B2 (en) * 2006-11-22 2012-10-17 旭化成イーマテリアルズ株式会社 How to store the pellicle

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005308901A (en) * 2004-04-19 2005-11-04 Shin Etsu Chem Co Ltd Pellicle frame and pellicle for photo lithography using it
CN1854891A (en) * 2005-04-25 2006-11-01 信越化学工业株式会社 Pellicle frame

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KR101191055B1 (en) 2012-10-15
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TWI498671B (en) 2015-09-01
JP2014098913A (en) 2014-05-29

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