JPH1048811A - Mask protecting device and pellicle frame - Google Patents

Mask protecting device and pellicle frame

Info

Publication number
JPH1048811A
JPH1048811A JP20750396A JP20750396A JPH1048811A JP H1048811 A JPH1048811 A JP H1048811A JP 20750396 A JP20750396 A JP 20750396A JP 20750396 A JP20750396 A JP 20750396A JP H1048811 A JPH1048811 A JP H1048811A
Authority
JP
Japan
Prior art keywords
pellicle frame
mask
handle
frame
protection device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20750396A
Other languages
Japanese (ja)
Inventor
Minoru Fujita
稔 藤田
Masahiro Kondo
正浩 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Petrochemical Industries Ltd
Original Assignee
Mitsui Petrochemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Petrochemical Industries Ltd filed Critical Mitsui Petrochemical Industries Ltd
Priority to JP20750396A priority Critical patent/JPH1048811A/en
Publication of JPH1048811A publication Critical patent/JPH1048811A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To easily grasp a pellicle frame or a mask protecting device from a distant place and to prevent contamination by providing a frame with handles so that the frame can be caught by mechanical hands. SOLUTION: The both sides of a pellicle frame 5 are provided with wide handles 6. The handles are required to have only a function to be caught by mechanical hands, and therefore, such accuracy as required for processing or production of insertion holes or fine grooves on a pellicle frame 5 is not required for the handle. Otherwise, accurate control of tools to engage insertion holes or fine grooves is not required. The pellicle frame 5 can be grasp and held on both sides or one side. The only function required for the handle is that the handle can be grasp from one side, and therefore, the structure is simple and the automatic production line can be made more compact. By supporting the pellicle frame with engaged handles on the mount placed at a specified distance on a conveyer, the pellicle frame 5 or a mask protecting device can be carried in a noncontact state from the conveyer so that contamination by the belt can be prevented.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明が属する技術分野】本発明は、LSI等の集積回
路の製造工程におけるフォトリソグラフィ工程で用いら
れるマスクやレチクル(以下「マスク」という)上に塵
埃等が付着するのを防止する目的で用いられるマスク保
護装置、すなわちマスクパターンを囲う大きさのペリク
ル枠と、該枠の一側面に張設される透明な薄膜からな
り、マスクパターンを囲うようにしてマスクに貼着され
るマスク保護装置と該装置のペリクル枠に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is used for the purpose of preventing dust and the like from adhering to a mask or a reticle (hereinafter, referred to as "mask") used in a photolithography process in a manufacturing process of an integrated circuit such as an LSI. A mask protection device, that is, a pellicle frame of a size surrounding the mask pattern, and a mask protection device formed of a transparent thin film stretched on one side of the frame and attached to the mask so as to surround the mask pattern. The present invention relates to a pellicle frame of the device.

【0002】[0002]

【従来技術】マスク保護装置の生産ラインにおけるペリ
クル枠やマスク保護装置の移動は、人によるハンドリン
グを排除し、生産における自動化を進めるために治具を
取り付けたハンドによって行うか、ベルトコンベア等の
搬送によって行われている。このうち、ベルトコンベア
による搬送は、ベルトによる汚染を生じ易い問題がある
のに対し、ハンドによる持ち運びは、こうした問題を生
じにくい利点がある。
2. Description of the Related Art Movement of a pellicle frame and a mask protection device in a production line of a mask protection device is performed by a hand with a jig attached thereto or a belt conveyor or the like in order to eliminate the handling by humans and to promote automation in production. Has been done by Among them, the conveyance by the belt conveyor has a problem that the contamination by the belt easily occurs, while the carrying by the hand has an advantage that such a problem is hardly caused.

【0003】ハンドによる持ち運びは従来、マスクに貼
着されたマスク保護装置を引剥がすときに用いるペリク
ル枠に形成の治具差込み孔、或いはペリクル枠の周囲に
形成の細溝を利用してピン状の治具を取り付けたハンド
でペリクル枠の両側より治具を差込み孔に差込んだり、
細溝に係合させてペリクル枠を把持していた。
Conventionally, a hand-held device is used to remove a mask protection device attached to a mask by using a jig insertion hole formed in a pellicle frame or a narrow groove formed around a pellicle frame. Insert the jig into the insertion hole from both sides of the pellicle frame with the hand with the jig attached,
The pellicle frame was gripped by engaging with the narrow groove.

【0004】[0004]

【発明が解決しようとする課題】ハンドでペリクル枠を
掴むときには、複雑な機構を持つハンドがペリクル枠の
近くを行き来するためにペリクル枠やマスク保護装置へ
異物が付着するおそれがある。異物の付着を防止するた
めに長い治具を用いて遠くから枠を把持しようとして
も、ペリクル枠の差込み孔は小さく、溝も巾が狭いため
治具を精度よく制御して差込み孔に差込んだり、細溝に
係合させるのは困難である。この問題に対処するため差
込み孔を大きくしたり、溝巾を広げるのはペリクル枠の
強度を損ない好ましくない。
When the pellicle frame is gripped by the hand, foreign objects may adhere to the pellicle frame and the mask protection device because the hand having a complicated mechanism moves back and forth near the pellicle frame. Even if you try to grip the frame from a distance using a long jig to prevent foreign matter from adhering, the insertion hole of the pellicle frame is small and the groove is narrow, so the jig is accurately controlled and inserted into the insertion hole However, it is difficult to engage with the narrow groove. Enlarging the insertion hole or widening the groove width to cope with this problem is not preferable because the strength of the pellicle frame is impaired.

【0005】本発明は、ペリクル枠やマスク保護装置を
ハンドを用いて移動させる際の上記の問題を解消するこ
とを目的とする。
[0005] It is an object of the present invention to solve the above-mentioned problem when moving a pellicle frame or a mask protection device using a hand.

【0006】[0006]

【課題の解決手段】本発明はそのため、マスク保護装置
のペリクル枠、或いはペリクル枠単体にハンドで掴むこ
とのできる取手を突設したものである。本発明の取手
は、ハンドで掴むことのできる機能を有しているもので
あればよく、舌片状や柄状その他どのような形状や構造
のものでも差し支えないが、舌片状のものが構造が簡単
で、スペースを取らないため好ましい。
Therefore, the present invention provides a pellicle frame or a pellicle frame of a mask protection device which has a handle which can be gripped by a hand. The handle of the present invention may have any function that can be grasped with a hand, and may have any shape or structure such as a tongue-like shape or a handle shape. This is preferable because the structure is simple and no space is required.

【0007】本発明の取手には、ハンドで掴んだときし
っかりと確実に保持できるように、凹凸を設けたり、孔
を設けておいてもよい。
The handle of the present invention may be provided with irregularities or holes so that it can be held firmly and securely when grasped with a hand.

【0008】[0008]

【発明の実施の形態】図1は、マスク保護装置1のペリ
クル枠2の左右両側に一対づゝ舌片状の取手3を突設し
たものであり、図2は、ペリクル枠5の左右に幅広の取
手6を突設したものである。本実施形態のマスク保護装
置は次のような効果を有する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows a mask protection device 1 in which a pair of tongue-shaped handles 3 are protrudingly provided on the left and right sides of a pellicle frame 2, and FIG. A wide handle 6 is protruded. The mask protection device of the present embodiment has the following effects.

【0009】(1)ハンドで取手を掴むだけであるか
ら、マスク保護装置の把持が遠くからでも簡単に行え、
ペリクル枠やマスク保護装置の汚染を生じにくい。 (2)取手はハンドで掴むことのできる機能のみを有し
ていればよく、その形成には差込み孔や細溝を形成する
ときのようなペリクル枠への加工や製作上の精度を必要
とせす、また差込み孔や細溝に治具を係合させるときの
ように治具を精度よく制御する必要がない。
(1) Since the handle is merely grasped by the hand, the mask protection device can be easily grasped even from a distance.
Pollicle frame and mask protection device are less likely to be contaminated. (2) The handle only needs to have a function that can be gripped by a hand, and the formation of the handle requires processing precision to a pellicle frame and manufacturing accuracy, such as when forming an insertion hole or a narrow groove. In addition, there is no need to control the jig with high precision as when the jig is engaged with the insertion hole or the narrow groove.

【0010】(3)ペリクル枠を両側から把持すること
もできるし、片側をいづれの側からでも把持することが
できる。 (4)片持把持により任意の場所に持っていくのが容易
にできるようになり、またハンドは取手を片側から掴む
ことのできる機能のみを有していればよく、精度よく制
御する必要もないから構造が簡単で、自動化ラインをよ
りコンパクトなものとすることができる。
(3) The pellicle frame can be gripped from both sides, and one side can be gripped from either side. (4) The cantilever grip makes it easy to bring it to an arbitrary place, and the hand only needs to have a function that can grip the handle from one side, and it is also necessary to control precisely. Because of this, the structure is simple and the automation line can be made more compact.

【0011】(5)コンベアで搬送する場合も、コンベ
ア上に一定の間隔を存して置いた台に両側の取手を掛け
て支持することにより、ペリクル枠やマスク保護装置を
コンベアと非接触状態で搬送することができ、ベルトに
よる汚染を防止することができる。 (6)異物検査等で人が介在せざるを得ないような場合
でも、取手を片手で掴むことによりマスク保護装置やペ
リクル枠を持ち運びすることができ、枠を直接掴んで持
ち運びする必要がないため汚染を生じにくい。
(5) Even when the pellicle frame and the mask protection device are not brought into contact with the conveyor, the pellicle frame and the mask protection device are supported by holding the handles on both sides on a table placed at a predetermined interval on the conveyor. , And contamination by the belt can be prevented. (6) Even when a person has to intervene in a foreign substance inspection or the like, the mask protection device and the pellicle frame can be carried by grasping the handle with one hand, and there is no need to directly grasp and carry the frame. Therefore, contamination hardly occurs.

【0012】[0012]

【発明の効果】本発明は以上のように構成され、次のよ
うな効果を奏する。請求項1及び2記載のペリクル及び
マスク保護装置によれば、取手を掴むことにより遠くか
らでもペリクル枠やマスク保護装置の把持を簡単に行う
ことができ、汚染も生じにくい。しかもハンドも同様、
取手を掴む機能を有していればよく、制御も精度よく行
う必要がないうえ、ペリクル枠やマスク保護装置を片側
から把持するようにすれば、構造が簡単で、コンパクト
にすることができる。
The present invention is configured as described above and has the following effects. According to the pellicle and mask protection device according to the first and second aspects, the pellicle frame and the mask protection device can be easily gripped even from a long distance by gripping the handle, and contamination hardly occurs. And the hand is the same,
It is only necessary to have a function of gripping the handle, and it is not necessary to perform control with high precision. If the pellicle frame and the mask protection device are gripped from one side, the structure can be simplified and made compact.

【0013】請求項3記載のものゝように、取手を突片
状のものとすれば、取手の構造が簡単で、スペースを取
らず嵩張らない。請求項4記載のものゝように、突片に
凹凸又は孔を設ければ、ハンドで掴むとき、しっかりと
確実に把持することができる。
According to the third aspect of the present invention, if the handle is formed in a protruding shape, the structure of the handle is simple, and it does not take up space and is not bulky. According to the fourth aspect of the present invention, if the projections are provided with irregularities or holes, they can be firmly and reliably gripped when gripping with a hand.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係わるマスク保護装置の平面図。FIG. 1 is a plan view of a mask protection device according to the present invention.

【図2】本発明に係わるマスク保護装置の別の例の平面
図。
FIG. 2 is a plan view of another example of the mask protection device according to the present invention.

【符号の説明】[Explanation of symbols]

1・・マスク保護装置 2、5・・ペリクル枠 3、6・・取手 1. Mask protection device 2, 5, Pellicle frame 3, 6, ... Handle

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】マスクパターンを囲う大きさのペリクル枠
と、該枠の一側面に張設される透明な薄膜からなり、マ
スクパターンを囲うようにしてマスクに貼着されるマス
ク保護装置のペリクル枠において、ハンドで掴むことの
できる取手を突設してなるペリクル枠。
1. A pellicle for a mask protection device, comprising a pellicle frame having a size surrounding a mask pattern, and a transparent thin film stretched on one side of the frame, and attached to a mask so as to surround the mask pattern. A pellicle frame with a handle that can be gripped by hand.
【請求項2】マスクパターンを囲う大きさのペリクル枠
と、該枠の一側面に張設される透明な薄膜からなり、マ
スクパターンを囲うようにしてマスクに貼着されるマス
ク保護装置において、ペリクル枠にハンドで掴むことの
できる取手を突設したマスク保護装置。
2. A mask protection device comprising a pellicle frame having a size surrounding a mask pattern and a transparent thin film stretched on one side of the frame, the mask protection device being attached to the mask so as to surround the mask pattern. A mask protection device with a handle that can be gripped by hand on the pellicle frame.
【請求項3】請求項1記載のペリクル枠或いは請求項2
記載のマスク保護装置のペリクル枠に突設される取手
は、舌片状である。
3. A pellicle frame according to claim 1 or claim 2.
The handle protruding from the pellicle frame of the mask protection device described above has a tongue shape.
【請求項4】請求項1記載のペリクル枠或いは請求項2
記載のマスク保護装置のペリクル枠に突設される取手
は、凹凸又は孔を有する舌片状である。
4. A pellicle frame according to claim 1 or claim 2.
The handle protruding from the pellicle frame of the mask protection device described above has a tongue shape having irregularities or holes.
JP20750396A 1996-08-07 1996-08-07 Mask protecting device and pellicle frame Pending JPH1048811A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20750396A JPH1048811A (en) 1996-08-07 1996-08-07 Mask protecting device and pellicle frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20750396A JPH1048811A (en) 1996-08-07 1996-08-07 Mask protecting device and pellicle frame

Publications (1)

Publication Number Publication Date
JPH1048811A true JPH1048811A (en) 1998-02-20

Family

ID=16540804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20750396A Pending JPH1048811A (en) 1996-08-07 1996-08-07 Mask protecting device and pellicle frame

Country Status (1)

Country Link
JP (1) JPH1048811A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014085433A (en) * 2012-10-22 2014-05-12 Shin Etsu Chem Co Ltd Container for housing pellicle
JP2014098913A (en) * 2007-07-06 2014-05-29 Asahi Kasei E-Materials Corp Method for withdrawing large-sized pellicle from housing container
JP2017161749A (en) * 2016-03-10 2017-09-14 日本特殊陶業株式会社 Pellicle frame and manufacturing method of pellicle frame
US10429730B2 (en) * 2016-05-26 2019-10-01 Shin-Etsu Chemical Co., Ltd. Pellicle

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014098913A (en) * 2007-07-06 2014-05-29 Asahi Kasei E-Materials Corp Method for withdrawing large-sized pellicle from housing container
JP2014085433A (en) * 2012-10-22 2014-05-12 Shin Etsu Chem Co Ltd Container for housing pellicle
JP2017161749A (en) * 2016-03-10 2017-09-14 日本特殊陶業株式会社 Pellicle frame and manufacturing method of pellicle frame
US10429730B2 (en) * 2016-05-26 2019-10-01 Shin-Etsu Chemical Co., Ltd. Pellicle

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