JPS6334548A - Substrate for photomask - Google Patents

Abstract

PURPOSE:To permit operation with a single hand even with substrate sizes larger than 6 inches and to facilitate the use of jigs by providing at least one recess for grasping the substrate from the side faces thereof to the sides of the substrate. CONSTITUTION:The recesses 2 are provided to the sides of the substrate 1 for a photomask. An operator pinches the substrate by putting his fingers into the recesses 2 or by fitting the jigs into the recesses 2 to hold the photomask with the single hand. The depth of the recesses to be provided to the substrate 1 for the photomask may be about the depth at which the photomask can be held. The shape of the recess may be any shape if the photomask is easily pinchable with the finger and easily supportable with the jigs. The recesses 2 may be provided at any points on the sides of the substrate. The pinching of the side faces of the substrate with the single hand is thus permitted and the holding and transporting are facilitated even with the substrate sizes larger than 6 inches.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a photomask substrate used in a semiconductor photolithography process.

[Conventional technology]

In the manufacturing process of semiconductor devices such as integrated circuits, a pattern formed on a photomask is transferred onto a semiconductor wafer, but as the diameter of semiconductor wafers becomes larger, the size of the photomask used in the wafer process also needs to be further increased. There is.

Conventional photomask substrates of this type have a quadrilateral or wafer-like shape, as shown in top view in FIG.

Further, in the process of transferring onto a wafer or manufacturing a photomask, some of the holding and transportation of the photomask is performed by automatic equipment, but a considerable part of it is performed by human hands or by jigs. Moreover, when holding and transporting photomasks.

It is necessary to avoid dust from adhering to the front or back surface of the photomask, and therefore it is necessary to clamp the peripheral side surfaces of the mask.

However, if the photomask substrate size is up to about 6 inches, it is possible to hold it with one hand by holding the peripheral sides, but if the photomask is larger than 6 inches, it is not possible to hold it with one hand, but it is difficult to operate the photomask. Using both hands to do this is extremely inefficient, results in unnatural movements, and significantly reduces work speed.

This invention was made to solve the above-mentioned problems, and aims to provide a photomask substrate that can be operated with one hand even when the substrate size is larger than 6 inches, and that makes it easy to use a jig. purpose.

[Means for solving problems]

The photomask substrate according to the present invention is provided with at least one recess on the side of the substrate so that the substrate can be held between the sides.

[Effect]

In this invention, by providing a recessed portion on the side of the substrate, even if the size of the substrate is larger than 6 inches, the side surface can be held and manipulated with one hand, and conventional jigs can be easily used.

〔Example〕

An embodiment of the present invention will be described below with reference to the drawings. 1st
The figure is a top view showing a photomask substrate according to an embodiment of the present invention. Reference numeral 1 designates the photomask substrate, and a recess 2 is provided on the side of the photomask substrate.

In the substrate 1 of this embodiment, in order to hold the photomask with one hand, the photomask can be held by inserting a finger into the recess 2 or by fitting a jig into the recess 2.

Note that the depth of the recess provided in the photomask substrate 1 may be as long as it can hold the photomask.

Further, the shape of the recess 2 may be any shape as long as the photomask can be easily held between fingers and supported with a jig. Furthermore, the recess 2 may be provided at any number of locations on the side of the substrate.

Further, in the above embodiment, the shape of the photomask substrate is quadrilateral, but it may be wafer-like.

Further, in the above embodiments, the case of a photomask substrate has been described, but a wafer or a glass wafer may be used, and the same effects as in the above embodiments can be obtained.

〔Effect of the invention〕

As described above, according to the present invention, since the recessed portion is provided on the side of the photomask substrate, it is possible to hold the side of the substrate with one hand even if the size of the substrate is larger than 6 inches.
This has the effect of making it easier to hold and transport.

[Brief explanation of drawings]

FIG. 1 is a top view showing a photomask substrate according to an embodiment of the present invention, and FIG. 2 is a top view showing a conventional photomask substrate. 1 is a photomask substrate, and 2 is a recess. Note that the same reference numerals in the figures indicate the same or equivalent parts.

Claims (1)

[Claims] (1) A photomask substrate used in a semiconductor photolithography process, characterized in that at least one recess is provided on a side of the substrate for holding it from the side.