CN102630343B - 固态图像拾取装置及其制造方法 - Google Patents

固态图像拾取装置及其制造方法 Download PDF

Info

Publication number
CN102630343B
CN102630343B CN201080054061.6A CN201080054061A CN102630343B CN 102630343 B CN102630343 B CN 102630343B CN 201080054061 A CN201080054061 A CN 201080054061A CN 102630343 B CN102630343 B CN 102630343B
Authority
CN
China
Prior art keywords
type semiconductor
semiconductor region
image pickup
solid
state image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201080054061.6A
Other languages
English (en)
Chinese (zh)
Other versions
CN102630343A (zh
Inventor
渡边高典
板桥政次
小林昌弘
小林秀央
札场哲也
市川武史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN102630343A publication Critical patent/CN102630343A/zh
Application granted granted Critical
Publication of CN102630343B publication Critical patent/CN102630343B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80Constructional details of image sensors
    • H10F39/803Pixels having integrated switching, control, storage or amplification elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011Manufacture or treatment of image sensors covered by group H10F39/12

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
CN201080054061.6A 2009-12-04 2010-11-29 固态图像拾取装置及其制造方法 Active CN102630343B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009276834A JP5546222B2 (ja) 2009-12-04 2009-12-04 固体撮像装置及び製造方法
JP2009-276834 2009-12-04
PCT/JP2010/006947 WO2011067916A1 (en) 2009-12-04 2010-11-29 Solid-state image pickup device and method for manufacturing the same

Publications (2)

Publication Number Publication Date
CN102630343A CN102630343A (zh) 2012-08-08
CN102630343B true CN102630343B (zh) 2015-09-30

Family

ID=43534367

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080054061.6A Active CN102630343B (zh) 2009-12-04 2010-11-29 固态图像拾取装置及其制造方法

Country Status (4)

Country Link
US (1) US20120267747A1 (enExample)
JP (1) JP5546222B2 (enExample)
CN (1) CN102630343B (enExample)
WO (1) WO2011067916A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8742309B2 (en) 2011-01-28 2014-06-03 Aptina Imaging Corporation Imagers with depth sensing capabilities
US10015471B2 (en) * 2011-08-12 2018-07-03 Semiconductor Components Industries, Llc Asymmetric angular response pixels for single sensor stereo
US9554115B2 (en) * 2012-02-27 2017-01-24 Semiconductor Components Industries, Llc Imaging pixels with depth sensing capabilities
TWI595637B (zh) * 2012-09-28 2017-08-11 新力股份有限公司 半導體裝置及電子機器
JP6355311B2 (ja) 2013-10-07 2018-07-11 キヤノン株式会社 固体撮像装置、その製造方法及び撮像システム
JP2016051896A (ja) * 2014-08-29 2016-04-11 キヤノン株式会社 固体撮像装置及びその製造方法ならびにカメラ
JP2019102494A (ja) * 2017-11-28 2019-06-24 キヤノン株式会社 光電変換装置およびその製造方法、機器
JP2018139328A (ja) * 2018-06-05 2018-09-06 キヤノン株式会社 固体撮像装置および撮像システム
WO2020095689A1 (ja) * 2018-11-06 2020-05-14 ソニーセミコンダクタソリューションズ株式会社 撮像素子、および電子機器

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5405803A (en) * 1992-09-25 1995-04-11 Sony Corporation Method of manufacturing a semiconductor device
DE10306295A1 (de) * 2003-02-14 2004-09-02 Infineon Technologies Ag Photosensor-Anordnung und Verfahren zum Herstellen einer Photosensor-Anordnung
CN1675771A (zh) * 2002-08-09 2005-09-28 浜松光子学株式会社 光电二极管阵列、其制造方法和放射线检测器
CN1716628A (zh) * 2004-06-30 2006-01-04 索尼株式会社 固态成像装置、相机及制造固态成像装置的方法
CN101312204A (zh) * 2007-05-24 2008-11-26 索尼株式会社 固态成像装置及其生产方法以及成像设备

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3759435B2 (ja) * 2001-07-11 2006-03-22 ソニー株式会社 X−yアドレス型固体撮像素子
JP4269033B2 (ja) * 2002-03-05 2009-05-27 シャープ株式会社 受光素子及びその製造方法、並びに、回路内蔵型受光素子及びその製造方法
US7230247B2 (en) * 2002-03-08 2007-06-12 Hamamatsu Photonics K.K. Detector
JP3840203B2 (ja) * 2002-06-27 2006-11-01 キヤノン株式会社 固体撮像装置及び固体撮像装置を用いたカメラシステム
JP4208559B2 (ja) * 2002-12-03 2009-01-14 キヤノン株式会社 光電変換装置
JP4220818B2 (ja) * 2003-03-27 2009-02-04 浜松ホトニクス株式会社 ホトダイオードアレイおよびその製造方法並びに放射線検出器
JP3977285B2 (ja) * 2003-05-15 2007-09-19 キヤノン株式会社 固体撮像素子の製造方法
JP2004047985A (ja) * 2003-06-10 2004-02-12 Sony Corp 固体撮像装置
JP4046067B2 (ja) * 2003-11-04 2008-02-13 ソニー株式会社 固体撮像素子の製造方法
JP2005150521A (ja) * 2003-11-18 2005-06-09 Canon Inc 撮像装置およびその製造方法
US7323731B2 (en) * 2003-12-12 2008-01-29 Canon Kabushiki Kaisha Photoelectric conversion device, method of manufacturing photoelectric conversion device, and image pickup system
WO2005109512A1 (en) * 2004-05-06 2005-11-17 Canon Kabushiki Kaisha Photoelectric conversion device and manufacturing method thereof
JP5167693B2 (ja) 2007-05-24 2013-03-21 ソニー株式会社 固体撮像装置およびカメラ
JP5157259B2 (ja) * 2007-05-29 2013-03-06 ソニー株式会社 固体撮像素子及び撮像装置
JP2009206356A (ja) * 2008-02-28 2009-09-10 Toshiba Corp 固体撮像装置およびその製造方法
US20090242939A1 (en) * 2008-03-25 2009-10-01 Sumco Corporation Wafer for backside illumination type solid imaging device, production method thereof and backside illumination solid imaging device
JP2009276834A (ja) 2008-05-12 2009-11-26 Burein:Kk クラッシュ加工シミュレーション画像生成方法、システム、プログラム及び記録媒体
JP2010114409A (ja) * 2008-10-10 2010-05-20 Sony Corp Soi基板とその製造方法、固体撮像装置とその製造方法、および撮像装置
US8618458B2 (en) * 2008-11-07 2013-12-31 Omnivision Technologies, Inc. Back-illuminated CMOS image sensors

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5405803A (en) * 1992-09-25 1995-04-11 Sony Corporation Method of manufacturing a semiconductor device
CN1675771A (zh) * 2002-08-09 2005-09-28 浜松光子学株式会社 光电二极管阵列、其制造方法和放射线检测器
DE10306295A1 (de) * 2003-02-14 2004-09-02 Infineon Technologies Ag Photosensor-Anordnung und Verfahren zum Herstellen einer Photosensor-Anordnung
CN1716628A (zh) * 2004-06-30 2006-01-04 索尼株式会社 固态成像装置、相机及制造固态成像装置的方法
CN101312204A (zh) * 2007-05-24 2008-11-26 索尼株式会社 固态成像装置及其生产方法以及成像设备

Also Published As

Publication number Publication date
WO2011067916A1 (en) 2011-06-09
CN102630343A (zh) 2012-08-08
JP2011119543A (ja) 2011-06-16
JP5546222B2 (ja) 2014-07-09
US20120267747A1 (en) 2012-10-25

Similar Documents

Publication Publication Date Title
CN102630343B (zh) 固态图像拾取装置及其制造方法
CN102301475B (zh) 光电转换装置和成像系统
JP4211696B2 (ja) 固体撮像装置の製造方法
KR101594927B1 (ko) 후면-조명된 cmos 이미지 센서들
US8546902B2 (en) Photoelectric conversion device and manufacturing method thereof
US8754458B2 (en) Semiconductor device, manufacturing method thereof, solid-state imaging device, manufacturing method thereof, and electronic unit
JP3727639B2 (ja) 固体撮像装置
JP6406585B2 (ja) 撮像装置
US7141836B1 (en) Pixel sensor having doped isolation structure sidewall
US20140191290A1 (en) Solid-state imaging element
US20100148230A1 (en) Trench isolation regions in image sensors
US7713808B2 (en) CMOS image sensor and method for fabricating the same
US20100140668A1 (en) Shallow trench isolation regions in image sensors
JP2013157639A (ja) 固体撮像装置
JP2001007380A (ja) 半導体装置およびその製造方法
JP2006049888A (ja) イメージセンサー及びその製造方法
US7968358B2 (en) Digital radiographic flat-panel imaging array with dual height semiconductor and method of making same
US7776638B2 (en) Two epitaxial layers to reduce crosstalk in an image sensor
CN115732521A (zh) 具有竖直转移栅极的图像传感器
US20050253214A1 (en) Solid-state imaging device
US20060033127A1 (en) Pinned photodiode integrated with trench isolation and fabrication method
US20080160731A1 (en) Method for fabricating cmos image sensor
KR20040065332A (ko) 이온주입영역을 소자분리막으로 사용한 시모스 이미지센서및 그 제조방법
KR100326267B1 (ko) 큰정전용량의포토다이오드를갖는이미지센서및그제조방법
JP2005209673A (ja) 光電変換装置および光電変換装置の製造方法および固体撮像装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant