CN102482137B - 二氧化硅粉、二氧化硅容器及该粉或容器的制造方法 - Google Patents

二氧化硅粉、二氧化硅容器及该粉或容器的制造方法 Download PDF

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Publication number
CN102482137B
CN102482137B CN201080036839.0A CN201080036839A CN102482137B CN 102482137 B CN102482137 B CN 102482137B CN 201080036839 A CN201080036839 A CN 201080036839A CN 102482137 B CN102482137 B CN 102482137B
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CN
China
Prior art keywords
aforementioned
powder
internal layer
matrix
silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201080036839.0A
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English (en)
Chinese (zh)
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CN102482137A (zh
Inventor
山形茂
笛吹友美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
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Shin Etsu Quartz Products Co Ltd
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Publication of CN102482137A publication Critical patent/CN102482137A/zh
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
    • C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D1/00—Rigid or semi-rigid containers having bodies formed in one piece, e.g. by casting metallic material, by moulding plastics, by blowing vitreous material, by throwing ceramic material, by moulding pulped fibrous material or by deep-drawing operations performed on sheet material
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
    • Y10T428/1317—Multilayer [continuous layer]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Compositions (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
CN201080036839.0A 2009-10-14 2010-09-01 二氧化硅粉、二氧化硅容器及该粉或容器的制造方法 Expired - Fee Related CN102482137B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009-237686 2009-10-14
JP2009237686A JP4969632B2 (ja) 2009-10-14 2009-10-14 シリカ粉及びシリカ容器並びにそれらの製造方法
PCT/JP2010/005375 WO2011045888A1 (ja) 2009-10-14 2010-09-01 シリカ粉及びシリカ容器並びにそれらの製造方法

Publications (2)

Publication Number Publication Date
CN102482137A CN102482137A (zh) 2012-05-30
CN102482137B true CN102482137B (zh) 2014-09-10

Family

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Family Applications (1)

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CN201080036839.0A Expired - Fee Related CN102482137B (zh) 2009-10-14 2010-09-01 二氧化硅粉、二氧化硅容器及该粉或容器的制造方法

Country Status (7)

Country Link
US (1) US8460769B2 (enExample)
EP (1) EP2489642A4 (enExample)
JP (1) JP4969632B2 (enExample)
KR (1) KR101374545B1 (enExample)
CN (1) CN102482137B (enExample)
TW (1) TWI454425B (enExample)
WO (1) WO2011045888A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4922355B2 (ja) * 2009-07-15 2012-04-25 信越石英株式会社 シリカ容器及びその製造方法
JP4951057B2 (ja) * 2009-12-10 2012-06-13 信越石英株式会社 シリカ容器及びその製造方法
JP5774400B2 (ja) * 2010-08-12 2015-09-09 株式会社Sumco シリカ粉の評価方法、シリカガラスルツボ、シリカガラスルツボの製造方法
EP2712946A4 (en) 2012-05-15 2015-03-25 Shinetsu Quartz Prod QUARTZ GLASS LEAD FOR BREEDING CRYSTALLINE SILICON AND PROCESS FOR ITS MANUFACTURE
WO2013171955A1 (ja) 2012-05-16 2013-11-21 信越石英株式会社 単結晶シリコン引き上げ用シリカ容器及びその製造方法
US9469819B2 (en) * 2013-01-16 2016-10-18 Clearsign Combustion Corporation Gasifier configured to electrodynamically agitate charged chemical species in a reaction region and related methods
CN103584635B (zh) * 2013-11-21 2015-08-26 河海大学 自供电显水温保温杯
CN104068715A (zh) * 2014-06-20 2014-10-01 郭裴哲 一种智能水杯
PL3218317T3 (pl) 2014-11-13 2019-03-29 Gerresheimer Glas Gmbh Filtr cząstek urządzenia do wytwarzania szkła, jednostka tłoka, głowica dmuchu, wspornik głowicy dmuchu i urządzenie do wytwarzania szkła, przystosowane lub zawierające filtr
JP6480827B2 (ja) * 2015-08-03 2019-03-13 信越石英株式会社 水素ドープシリカ粉の保管方法及びシリコン単結晶引上げ用石英ガラスるつぼの製造方法
EP3205630B1 (de) * 2016-02-12 2020-01-01 Heraeus Quarzglas GmbH & Co. KG Diffusormaterial aus synthetisch erzeugtem quarzglas sowie verfahren zur herstellung eines vollständig oder teilweise daraus bestehenden formkörpers
JP6659408B2 (ja) * 2016-03-07 2020-03-04 クアーズテック株式会社 シリコン単結晶引上げ用シリカガラスルツボの製造方法
JP6713382B2 (ja) * 2016-08-30 2020-06-24 クアーズテック株式会社 石英ガラスルツボの製造方法、及び石英ガラスルツボ
JP7692409B2 (ja) * 2020-05-20 2025-06-13 日鉄ケミカル＆マテリアル株式会社 球状結晶質シリカ粒子およびその製造方法
KR102647080B1 (ko) * 2021-11-03 2024-03-13 국립목포대학교산학협력단 비정질 실리카 나노 분말을 이용한 투명한 실리카 소결체의 제조방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002016677A1 (de) * 2000-08-24 2002-02-28 Heraeus Quarzglas Gmbh & Co. Kg Quarzglastiegel sowie verfahren zur herstellung desselben
EP1364912A2 (en) * 2002-05-17 2003-11-26 Heraeus Quarzglas GmbH & Co. KG Hydrogen-doped silica powder, its method of production and a quartz glass crucible made from the powder
US20070051297A1 (en) * 2005-09-08 2007-03-08 Heraeus Shin-Etsu America, Inc. Silica glass crucible with barium-doped inner wall

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4935046A (en) 1987-12-03 1990-06-19 Shin-Etsu Handotai Company, Limited Manufacture of a quartz glass vessel for the growth of single crystal semiconductor
JPH0729871B2 (ja) 1987-12-03 1995-04-05 信越半導体 株式会社 単結晶引き上げ用石英るつぼ
JPH01148718A (ja) 1987-12-03 1989-06-12 Shin Etsu Handotai Co Ltd 石英るつぼの製造方法
JPH0720645A (ja) 1993-06-30 1995-01-24 Ricoh Co Ltd 電子写真感光体及びその製造方法
JPH07206451A (ja) 1993-12-29 1995-08-08 Nippon Steel Corp 合成石英ガラスの製造方法
JPH07277743A (ja) 1994-04-04 1995-10-24 Nippon Steel Corp 合成石英ガラスの製造方法
JP3702904B2 (ja) 1994-04-04 2005-10-05 セイコーエプソン株式会社 合成石英ガラスの製造方法
JP3100836B2 (ja) 1994-06-20 2000-10-23 信越石英株式会社 石英ガラスルツボとその製造方法
JP2001261353A (ja) * 2000-03-17 2001-09-26 Toshiba Ceramics Co Ltd 石英ガラスルツボ用合成シリカガラス粉及びその製造方法、並びに合成シリカガラス粉を用いた石英ガラスルツボの製造方法
DE10114484C2 (de) 2001-03-24 2003-10-16 Heraeus Quarzglas Verfahren für die Herstellung eines Komposit-Werkstoffs mit einem SiO¶2¶-Gehalt von mindestens 99 Gew.-%, und Verwendung des nach dem Verfahren erhaltenen Komposit-Werkstoffs
US20030012899A1 (en) 2001-07-16 2003-01-16 Heraeus Shin-Etsu America Doped silica glass crucible for making a silicon ingot
JP2003095678A (ja) * 2001-07-16 2003-04-03 Heraeus Shin-Etsu America シリコン単結晶製造用ドープ石英ガラスルツボ及びその製造方法
DE10262015B3 (de) 2002-09-20 2004-07-15 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Herstellung eines opaken Quarzglas-Kompositwerkstoffs
JP2005145731A (ja) 2003-11-12 2005-06-09 Kuramoto Seisakusho Co Ltd 結晶化石英ルツボ
US7365037B2 (en) * 2004-09-30 2008-04-29 Shin-Etsu Quartz Products Co., Ltd. Quartz glass having excellent resistance against plasma corrosion and method for producing the same
TWI408259B (zh) * 2006-09-28 2013-09-11 Shinetsu Quartz Prod 具有鋇摻雜內壁的矽玻璃坩堝
JP4702898B2 (ja) 2007-09-18 2011-06-15 信越石英株式会社 シリコン単結晶引上げ用石英ガラスルツボの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002016677A1 (de) * 2000-08-24 2002-02-28 Heraeus Quarzglas Gmbh & Co. Kg Quarzglastiegel sowie verfahren zur herstellung desselben
EP1364912A2 (en) * 2002-05-17 2003-11-26 Heraeus Quarzglas GmbH & Co. KG Hydrogen-doped silica powder, its method of production and a quartz glass crucible made from the powder
US20070051297A1 (en) * 2005-09-08 2007-03-08 Heraeus Shin-Etsu America, Inc. Silica glass crucible with barium-doped inner wall

Also Published As

Publication number Publication date
TW201119943A (en) 2011-06-16
JP2011084428A (ja) 2011-04-28
EP2489642A4 (en) 2013-10-30
EP2489642A1 (en) 2012-08-22
US20110256330A1 (en) 2011-10-20
CN102482137A (zh) 2012-05-30
KR101374545B1 (ko) 2014-03-17
US8460769B2 (en) 2013-06-11
KR20120041223A (ko) 2012-04-30
JP4969632B2 (ja) 2012-07-04
WO2011045888A1 (ja) 2011-04-21
TWI454425B (zh) 2014-10-01

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Granted publication date: 20140910

Termination date: 20160901