TWI454425B - Silica, silica containers and the manufacture of such powders or containers - Google Patents
Silica, silica containers and the manufacture of such powders or containers Download PDFInfo
- Publication number
- TWI454425B TWI454425B TW099130347A TW99130347A TWI454425B TW I454425 B TWI454425 B TW I454425B TW 099130347 A TW099130347 A TW 099130347A TW 99130347 A TW99130347 A TW 99130347A TW I454425 B TWI454425 B TW I454425B
- Authority
- TW
- Taiwan
- Prior art keywords
- cerium oxide
- inner layer
- forming
- powder
- molded body
- Prior art date
Links
- 239000000843 powder Substances 0.000 title claims description 250
- 238000004519 manufacturing process Methods 0.000 title claims description 97
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title description 28
- 239000000377 silicon dioxide Substances 0.000 title description 4
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 267
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 267
- 239000002994 raw material Substances 0.000 claims description 117
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 94
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 94
- 238000010438 heat treatment Methods 0.000 claims description 73
- 239000000758 substrate Substances 0.000 claims description 71
- 239000007789 gas Substances 0.000 claims description 68
- 238000000034 method Methods 0.000 claims description 62
- 238000002844 melting Methods 0.000 claims description 57
- 230000008018 melting Effects 0.000 claims description 56
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 54
- 239000002245 particle Substances 0.000 claims description 45
- 239000011521 glass Substances 0.000 claims description 43
- 239000000463 material Substances 0.000 claims description 41
- 229910052739 hydrogen Inorganic materials 0.000 claims description 32
- 230000002093 peripheral effect Effects 0.000 claims description 32
- 239000001257 hydrogen Substances 0.000 claims description 31
- 229910052788 barium Inorganic materials 0.000 claims description 25
- 229910052700 potassium Inorganic materials 0.000 claims description 24
- 229910052708 sodium Inorganic materials 0.000 claims description 24
- 229910052791 calcium Inorganic materials 0.000 claims description 23
- 229910052712 strontium Inorganic materials 0.000 claims description 23
- 239000000075 oxide glass Substances 0.000 claims description 22
- 229910052744 lithium Inorganic materials 0.000 claims description 21
- 230000006837 decompression Effects 0.000 claims description 19
- 239000011261 inert gas Substances 0.000 claims description 19
- 238000002834 transmittance Methods 0.000 claims description 10
- 239000011159 matrix material Substances 0.000 claims description 9
- 239000006060 molten glass Substances 0.000 claims description 8
- 238000007872 degassing Methods 0.000 claims description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 229910001882 dioxygen Inorganic materials 0.000 claims description 2
- 238000005507 spraying Methods 0.000 claims description 2
- 238000009849 vacuum degassing Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 159
- 239000002585 base Substances 0.000 description 111
- 239000013078 crystal Substances 0.000 description 31
- 239000012535 impurity Substances 0.000 description 30
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 22
- 238000009792 diffusion process Methods 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 20
- 229910052799 carbon Inorganic materials 0.000 description 19
- 239000011575 calcium Substances 0.000 description 18
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 17
- 230000003405 preventing effect Effects 0.000 description 16
- 230000000694 effects Effects 0.000 description 14
- 235000012239 silicon dioxide Nutrition 0.000 description 14
- 150000001342 alkaline earth metals Chemical class 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 12
- 238000002425 crystallisation Methods 0.000 description 12
- 230000008025 crystallization Effects 0.000 description 12
- 239000010453 quartz Substances 0.000 description 12
- 238000010891 electric arc Methods 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 239000002344 surface layer Substances 0.000 description 9
- 238000005530 etching Methods 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 230000009467 reduction Effects 0.000 description 8
- 238000005245 sintering Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 229910052906 cristobalite Inorganic materials 0.000 description 7
- 239000010419 fine particle Substances 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910002091 carbon monoxide Inorganic materials 0.000 description 6
- 238000007791 dehumidification Methods 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 6
- 238000009423 ventilation Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 5
- 230000002411 adverse Effects 0.000 description 5
- 229910052783 alkali metal Inorganic materials 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 229910052707 ruthenium Inorganic materials 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000001307 helium Substances 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 229910052727 yttrium Inorganic materials 0.000 description 4
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 4
- 229910002651 NO3 Inorganic materials 0.000 description 3
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000001479 atomic absorption spectroscopy Methods 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000010248 power generation Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000010298 pulverizing process Methods 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- 230000007847 structural defect Effects 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- -1 cerium tetrachloride Chemical class 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 210000003298 dental enamel Anatomy 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000009415 formwork Methods 0.000 description 2
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011859 microparticle Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 230000037361 pathway Effects 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- WJMXTYZCTXTFJM-UHFFFAOYSA-N 1,1,1,2-tetraethoxydecane Chemical compound C(C)OC(C(OCC)(OCC)OCC)CCCCCCCC WJMXTYZCTXTFJM-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- YZCKVEUIGOORGS-IGMARMGPSA-N Protium Chemical compound [1H] YZCKVEUIGOORGS-IGMARMGPSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- BBLKWSIOIYLDHV-UHFFFAOYSA-J cerium(4+);tetrachloride Chemical compound Cl[Ce](Cl)(Cl)Cl BBLKWSIOIYLDHV-UHFFFAOYSA-J 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000003837 high-temperature calcination Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011022 opal Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 1
- 238000000918 plasma mass spectrometry Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 238000007569 slipcasting Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052902 vermiculite Inorganic materials 0.000 description 1
- 239000010455 vermiculite Substances 0.000 description 1
- 235000019354 vermiculite Nutrition 0.000 description 1
- 239000011240 wet gel Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C49/00—Blow-moulding, i.e. blowing a preform or parison to a desired shape within a mould; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D1/00—Rigid or semi-rigid containers having bodies formed in one piece, e.g. by casting metallic material, by moulding plastics, by blowing vitreous material, by throwing ceramic material, by moulding pulped fibrous material or by deep-drawing operations performed on sheet material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
- Y10T428/1317—Multilayer [continuous layer]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Ceramic Engineering (AREA)
- Glass Melting And Manufacturing (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009237686A JP4969632B2 (ja) | 2009-10-14 | 2009-10-14 | シリカ粉及びシリカ容器並びにそれらの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201119943A TW201119943A (en) | 2011-06-16 |
| TWI454425B true TWI454425B (zh) | 2014-10-01 |
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| TW099130347A TWI454425B (zh) | 2009-10-14 | 2010-09-08 | Silica, silica containers and the manufacture of such powders or containers |
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| EP (1) | EP2489642A4 (enExample) |
| JP (1) | JP4969632B2 (enExample) |
| KR (1) | KR101374545B1 (enExample) |
| CN (1) | CN102482137B (enExample) |
| TW (1) | TWI454425B (enExample) |
| WO (1) | WO2011045888A1 (enExample) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4922355B2 (ja) * | 2009-07-15 | 2012-04-25 | 信越石英株式会社 | シリカ容器及びその製造方法 |
| JP4951057B2 (ja) * | 2009-12-10 | 2012-06-13 | 信越石英株式会社 | シリカ容器及びその製造方法 |
| JP5774400B2 (ja) * | 2010-08-12 | 2015-09-09 | 株式会社Sumco | シリカ粉の評価方法、シリカガラスルツボ、シリカガラスルツボの製造方法 |
| KR101497385B1 (ko) | 2012-05-15 | 2015-03-03 | 신에쯔 세끼에이 가부시키가이샤 | 단결정 실리콘 인상용 실리카 용기 및 그 제조 방법 |
| US20140150715A1 (en) | 2012-05-16 | 2014-06-05 | Shin-Etsu Quartz Products Co., Ltd. | Single-crystal silicon pulling silica container and producing method thereof |
| US9469819B2 (en) * | 2013-01-16 | 2016-10-18 | Clearsign Combustion Corporation | Gasifier configured to electrodynamically agitate charged chemical species in a reaction region and related methods |
| CN103584635B (zh) * | 2013-11-21 | 2015-08-26 | 河海大学 | 自供电显水温保温杯 |
| CN104068715A (zh) * | 2014-06-20 | 2014-10-01 | 郭裴哲 | 一种智能水杯 |
| PL3218317T3 (pl) | 2014-11-13 | 2019-03-29 | Gerresheimer Glas Gmbh | Filtr cząstek urządzenia do wytwarzania szkła, jednostka tłoka, głowica dmuchu, wspornik głowicy dmuchu i urządzenie do wytwarzania szkła, przystosowane lub zawierające filtr |
| JP6480827B2 (ja) * | 2015-08-03 | 2019-03-13 | 信越石英株式会社 | 水素ドープシリカ粉の保管方法及びシリコン単結晶引上げ用石英ガラスるつぼの製造方法 |
| EP3205630B1 (de) * | 2016-02-12 | 2020-01-01 | Heraeus Quarzglas GmbH & Co. KG | Diffusormaterial aus synthetisch erzeugtem quarzglas sowie verfahren zur herstellung eines vollständig oder teilweise daraus bestehenden formkörpers |
| JP6659408B2 (ja) * | 2016-03-07 | 2020-03-04 | クアーズテック株式会社 | シリコン単結晶引上げ用シリカガラスルツボの製造方法 |
| JP6713382B2 (ja) * | 2016-08-30 | 2020-06-24 | クアーズテック株式会社 | 石英ガラスルツボの製造方法、及び石英ガラスルツボ |
| WO2021235530A1 (ja) * | 2020-05-20 | 2021-11-25 | 日鉄ケミカル＆マテリアル株式会社 | 球状結晶質シリカ粒子およびその製造方法 |
| KR102647080B1 (ko) * | 2021-11-03 | 2024-03-13 | 국립목포대학교산학협력단 | 비정질 실리카 나노 분말을 이용한 투명한 실리카 소결체의 제조방법 |
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| JP2003335513A (ja) * | 2002-05-17 | 2003-11-25 | Shinetsu Quartz Prod Co Ltd | 水素ドープシリカ粉及びその製造方法、並びにそれを用いた石英ガラスルツボ及びその製造方法 |
| TW200610743A (en) * | 2004-09-30 | 2006-04-01 | Shinetsu Quartz Prod | Quartz glass having excellent resistance against plasma corrosion and method for producing the same |
| TW200815629A (en) * | 2006-09-28 | 2008-04-01 | Heraeus Shin Etsu America Inc | Silica glass crucible with barium-doped inner wall |
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| JPH0729871B2 (ja) | 1987-12-03 | 1995-04-05 | 信越半導体 株式会社 | 単結晶引き上げ用石英るつぼ |
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| US4935046A (en) | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
| JPH0720645A (ja) | 1993-06-30 | 1995-01-24 | Ricoh Co Ltd | 電子写真感光体及びその製造方法 |
| JPH07206451A (ja) | 1993-12-29 | 1995-08-08 | Nippon Steel Corp | 合成石英ガラスの製造方法 |
| JPH07277743A (ja) | 1994-04-04 | 1995-10-24 | Nippon Steel Corp | 合成石英ガラスの製造方法 |
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| JP3100836B2 (ja) | 1994-06-20 | 2000-10-23 | 信越石英株式会社 | 石英ガラスルツボとその製造方法 |
| JP2001261353A (ja) * | 2000-03-17 | 2001-09-26 | Toshiba Ceramics Co Ltd | 石英ガラスルツボ用合成シリカガラス粉及びその製造方法、並びに合成シリカガラス粉を用いた石英ガラスルツボの製造方法 |
| DE10041582B4 (de) * | 2000-08-24 | 2007-01-18 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglastiegel sowie Verfahren zur Herstellung desselben |
| DE10114484C2 (de) | 2001-03-24 | 2003-10-16 | Heraeus Quarzglas | Verfahren für die Herstellung eines Komposit-Werkstoffs mit einem SiO¶2¶-Gehalt von mindestens 99 Gew.-%, und Verwendung des nach dem Verfahren erhaltenen Komposit-Werkstoffs |
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| DE10262015B3 (de) | 2002-09-20 | 2004-07-15 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren für die Herstellung eines opaken Quarzglas-Kompositwerkstoffs |
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2009
- 2009-10-14 JP JP2009237686A patent/JP4969632B2/ja active Active
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2010
- 2010-09-01 US US13/140,982 patent/US8460769B2/en not_active Expired - Fee Related
- 2010-09-01 WO PCT/JP2010/005375 patent/WO2011045888A1/ja not_active Ceased
- 2010-09-01 KR KR1020127004097A patent/KR101374545B1/ko not_active Expired - Fee Related
- 2010-09-01 EP EP10823157.2A patent/EP2489642A4/en not_active Withdrawn
- 2010-09-01 CN CN201080036839.0A patent/CN102482137B/zh not_active Expired - Fee Related
- 2010-09-08 TW TW099130347A patent/TWI454425B/zh not_active IP Right Cessation
Patent Citations (3)
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| JP2003335513A (ja) * | 2002-05-17 | 2003-11-25 | Shinetsu Quartz Prod Co Ltd | 水素ドープシリカ粉及びその製造方法、並びにそれを用いた石英ガラスルツボ及びその製造方法 |
| TW200610743A (en) * | 2004-09-30 | 2006-04-01 | Shinetsu Quartz Prod | Quartz glass having excellent resistance against plasma corrosion and method for producing the same |
| TW200815629A (en) * | 2006-09-28 | 2008-04-01 | Heraeus Shin Etsu America Inc | Silica glass crucible with barium-doped inner wall |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102482137A (zh) | 2012-05-30 |
| WO2011045888A1 (ja) | 2011-04-21 |
| KR101374545B1 (ko) | 2014-03-17 |
| JP4969632B2 (ja) | 2012-07-04 |
| CN102482137B (zh) | 2014-09-10 |
| TW201119943A (en) | 2011-06-16 |
| US20110256330A1 (en) | 2011-10-20 |
| EP2489642A4 (en) | 2013-10-30 |
| EP2489642A1 (en) | 2012-08-22 |
| US8460769B2 (en) | 2013-06-11 |
| KR20120041223A (ko) | 2012-04-30 |
| JP2011084428A (ja) | 2011-04-28 |
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