CN102307851B - 酰胺连接的全氟聚醚硫醇化合物及其制备方法和用途 - Google Patents
酰胺连接的全氟聚醚硫醇化合物及其制备方法和用途 Download PDFInfo
- Publication number
- CN102307851B CN102307851B CN200980156199.4A CN200980156199A CN102307851B CN 102307851 B CN102307851 B CN 102307851B CN 200980156199 A CN200980156199 A CN 200980156199A CN 102307851 B CN102307851 B CN 102307851B
- Authority
- CN
- China
- Prior art keywords
- compound
- pfpe
- perfluoropolyether
- compounds
- thiolactone
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D303/00—Compounds containing three-membered rings having one oxygen atom as the only ring hetero atom
- C07D303/02—Compounds containing oxirane rings
- C07D303/48—Compounds containing oxirane rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms, e.g. ester or nitrile radicals
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
- C07C323/39—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton at least one of the nitrogen atoms being part of any of the groups, X being a hetero atom, Y being any atom
- C07C323/40—Y being a hydrogen or a carbon atom
- C07C323/41—Y being a hydrogen or an acyclic carbon atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/52—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being acyclic and saturated
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
- C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
- C07C323/51—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
- C07C323/60—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton with the carbon atom of at least one of the carboxyl groups bound to nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
- C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
- C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/334—Polymers modified by chemical after-treatment with organic compounds containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
- C09D171/02—Polyalkylene oxides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Polyethers (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12160508P | 2008-12-11 | 2008-12-11 | |
| US12159808P | 2008-12-11 | 2008-12-11 | |
| US61/121,605 | 2008-12-11 | ||
| US61/121,598 | 2008-12-11 | ||
| PCT/US2009/066337 WO2010068531A1 (en) | 2008-12-11 | 2009-12-02 | Amide-linked perfluoropolyether thiol compounds and processes for their preparation and use |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102307851A CN102307851A (zh) | 2012-01-04 |
| CN102307851B true CN102307851B (zh) | 2015-05-06 |
Family
ID=42243038
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200980156199.4A Expired - Fee Related CN102307851B (zh) | 2008-12-11 | 2009-12-02 | 酰胺连接的全氟聚醚硫醇化合物及其制备方法和用途 |
| CN200980156190.3A Expired - Fee Related CN102307734B (zh) | 2008-12-11 | 2009-12-02 | 图案化方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200980156190.3A Expired - Fee Related CN102307734B (zh) | 2008-12-11 | 2009-12-02 | 图案化方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (4) | US8858813B2 (enExample) |
| EP (2) | EP2370401B1 (enExample) |
| JP (1) | JP5864259B2 (enExample) |
| CN (2) | CN102307851B (enExample) |
| WO (2) | WO2010068531A1 (enExample) |
Families Citing this family (25)
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| US8747599B2 (en) * | 2008-05-29 | 2014-06-10 | Chidella Krishna Sastry | Process for making self-patterning substrates and the product thereof |
| EP2370401B1 (en) | 2008-12-11 | 2018-01-24 | 3M Innovative Properties Company | Amide-linked perfluoropolyether thiol compounds and processes for their preparation and use |
| JP5643774B2 (ja) | 2009-02-26 | 2014-12-17 | スリーエム イノベイティブ プロパティズ カンパニー | 低視認性の重ね合わせられた微小パターンを有する、タッチスクリーンセンサ及びパターン基材 |
| EP2446067B1 (en) | 2009-06-25 | 2019-11-20 | 3M Innovative Properties Company | Methods of wet etching a self-assembled monolayer patterned substrate and metal patterned articles |
| EP2449547B1 (en) | 2009-06-30 | 2016-09-21 | 3M Innovative Properties Company | Electronic displays and metal micropatterned substrates having a graphic |
| US8258341B2 (en) * | 2009-07-10 | 2012-09-04 | E.I. Du Pont De Nemours And Company | Polyfluorosulfonamido amine and intermediate |
| US8950324B2 (en) | 2009-12-22 | 2015-02-10 | 3M Innovative Properties Company | Apparatus and method for microcontact printing using a pressurized roller |
| EP2655577B1 (fr) * | 2010-12-23 | 2014-04-23 | Rolex S.A. | Composition pour augmenter la lipophobicite d'un composant horloger |
| FR2969663B1 (fr) * | 2010-12-23 | 2013-01-18 | Surfactis Technologies | Composition hydrophobe et lipophobe de molecules bisphosphoniques et thiols |
| WO2012115151A1 (ja) * | 2011-02-22 | 2012-08-30 | 国立大学法人北海道大学 | 粒子集積体、粒子集積体の製造方法、光増強素子及び光化学反応を利用する装置 |
| CN103477728B (zh) * | 2011-03-30 | 2016-05-18 | 富士胶片株式会社 | 印刷配线基板及其制造方法、印刷配线基板用的金属表面处理液以及集成电路封装基板 |
| US9449630B2 (en) * | 2014-06-02 | 2016-09-20 | Seagate Technology Llc | Sliders having at least two regions on the trailing edge surface |
| KR102399569B1 (ko) * | 2015-10-28 | 2022-05-19 | 삼성디스플레이 주식회사 | 마스크 어셈블리, 표시 장치의 제조 장치 및 표시 장치의 제조 방법 |
| EP3663087A4 (en) | 2017-08-04 | 2021-04-21 | Daikin Industries, Ltd. | SUBSTRATE FOR PATTERN FORMATION |
| CN107459641B (zh) * | 2017-08-30 | 2019-08-09 | 龙岩思康新材料有限公司 | 一种全氟聚醚改性烯丙氧基体的制备方法 |
| CN109928891B (zh) * | 2017-12-18 | 2022-12-06 | 乳源东阳光氟有限公司 | 一种聚酰胺连接的全氟聚醚及其制备方法和应用 |
| TWI837203B (zh) * | 2018-11-02 | 2024-04-01 | 日商東京威力科創股份有限公司 | 膜形成方法及膜形成裝置 |
| US10934454B2 (en) * | 2019-01-22 | 2021-03-02 | Amazon Technologies, Inc. | Coating composition for a metal substrate |
| CN112724403B (zh) * | 2019-10-14 | 2022-10-04 | 中国科学院上海有机化学研究所 | 聚(γ-硫代丁内酯)及其制备方法 |
| US20210350879A1 (en) * | 2020-05-11 | 2021-11-11 | Massachusetts Institute Of Technology | Dna canvas for information storage and nanofabrication |
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| JP2023081626A (ja) * | 2021-12-01 | 2023-06-13 | 株式会社東芝 | ヘッドサスペンションアッセンブリ、及び磁気記録再生装置 |
| CN118871504A (zh) * | 2022-02-22 | 2024-10-29 | 大金工业株式会社 | 含有氟代聚醚基的硫醇化合物 |
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| WO2009108771A2 (en) * | 2008-02-28 | 2009-09-03 | 3M Innovative Properties Company | Methods of patterning a conductor on a substrate |
| EP2370401B1 (en) * | 2008-12-11 | 2018-01-24 | 3M Innovative Properties Company | Amide-linked perfluoropolyether thiol compounds and processes for their preparation and use |
-
2009
- 2009-12-02 EP EP09832393.4A patent/EP2370401B1/en not_active Not-in-force
- 2009-12-02 CN CN200980156199.4A patent/CN102307851B/zh not_active Expired - Fee Related
- 2009-12-02 EP EP09832396.7A patent/EP2370269B1/en not_active Not-in-force
- 2009-12-02 US US13/130,320 patent/US8858813B2/en not_active Expired - Fee Related
- 2009-12-02 CN CN200980156190.3A patent/CN102307734B/zh not_active Expired - Fee Related
- 2009-12-02 WO PCT/US2009/066337 patent/WO2010068531A1/en not_active Ceased
- 2009-12-02 WO PCT/US2009/066358 patent/WO2010068535A1/en not_active Ceased
- 2009-12-02 JP JP2011540782A patent/JP5864259B2/ja not_active Expired - Fee Related
- 2009-12-02 US US13/132,673 patent/US8901263B2/en not_active Expired - Fee Related
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2014
- 2014-10-30 US US14/527,877 patent/US9688649B2/en not_active Expired - Fee Related
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2017
- 2017-05-24 US US15/603,495 patent/US20170253570A1/en not_active Abandoned
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1476449A (zh) * | 2001-07-25 | 2004-02-18 | ��Ļ���Ű˾ | 卤代光学聚合物组合物 |
| CN101146840A (zh) * | 2005-03-23 | 2008-03-19 | 3M创新有限公司 | 具有(甲基)丙烯酰基的全氟聚醚聚氨酯添加剂以及硬涂料 |
| WO2007146855A1 (en) * | 2006-06-14 | 2007-12-21 | 3M Innovative Properties Company | Optical article having an antistatic fluorochemical surface layer |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010068531A1 (en) | 2010-06-17 |
| JP2012511635A (ja) | 2012-05-24 |
| US8901263B2 (en) | 2014-12-02 |
| EP2370401B1 (en) | 2018-01-24 |
| US20110226733A1 (en) | 2011-09-22 |
| CN102307851A (zh) | 2012-01-04 |
| US8858813B2 (en) | 2014-10-14 |
| EP2370269A1 (en) | 2011-10-05 |
| US9688649B2 (en) | 2017-06-27 |
| JP5864259B2 (ja) | 2016-02-17 |
| US20110237765A1 (en) | 2011-09-29 |
| CN102307734A (zh) | 2012-01-04 |
| CN102307734B (zh) | 2015-06-03 |
| US20170253570A1 (en) | 2017-09-07 |
| EP2370401A1 (en) | 2011-10-05 |
| EP2370401A4 (en) | 2014-05-28 |
| WO2010068535A1 (en) | 2010-06-17 |
| EP2370269A4 (en) | 2013-05-08 |
| US20150051362A1 (en) | 2015-02-19 |
| EP2370269B1 (en) | 2015-08-05 |
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