CN102106001A - 发光器件及其制造方法 - Google Patents
发光器件及其制造方法 Download PDFInfo
- Publication number
- CN102106001A CN102106001A CN2009801191501A CN200980119150A CN102106001A CN 102106001 A CN102106001 A CN 102106001A CN 2009801191501 A CN2009801191501 A CN 2009801191501A CN 200980119150 A CN200980119150 A CN 200980119150A CN 102106001 A CN102106001 A CN 102106001A
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- layer
- semiconductor layer
- support substrates
- luminescent device
- light emitting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000000758 substrate Substances 0.000 claims abstract description 139
- 239000004065 semiconductor Substances 0.000 claims abstract description 99
- 238000002161 passivation Methods 0.000 claims abstract description 62
- 239000011230 binding agent Substances 0.000 claims description 82
- 239000002131 composite material Substances 0.000 claims description 31
- 238000010276 construction Methods 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 14
- 230000004048 modification Effects 0.000 claims description 8
- 238000012986 modification Methods 0.000 claims description 8
- 229910002704 AlGaN Inorganic materials 0.000 claims description 6
- 238000000605 extraction Methods 0.000 claims description 6
- 239000012535 impurity Substances 0.000 claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 239000013078 crystal Substances 0.000 claims description 2
- 238000000926 separation method Methods 0.000 description 16
- 229910052782 aluminium Inorganic materials 0.000 description 12
- 229910052737 gold Inorganic materials 0.000 description 12
- 229910052709 silver Inorganic materials 0.000 description 11
- 229910052763 palladium Inorganic materials 0.000 description 10
- 229910052719 titanium Inorganic materials 0.000 description 10
- 238000000354 decomposition reaction Methods 0.000 description 9
- 229910052759 nickel Inorganic materials 0.000 description 9
- 239000006104 solid solution Substances 0.000 description 9
- 229910052804 chromium Inorganic materials 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 229910052758 niobium Inorganic materials 0.000 description 8
- 229910052697 platinum Inorganic materials 0.000 description 8
- 238000001039 wet etching Methods 0.000 description 8
- 229910052703 rhodium Inorganic materials 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 6
- 229910052741 iridium Inorganic materials 0.000 description 6
- 229910052748 manganese Inorganic materials 0.000 description 6
- 229910052750 molybdenum Inorganic materials 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 229910052761 rare earth metal Inorganic materials 0.000 description 6
- 150000002910 rare earth metals Chemical class 0.000 description 6
- 229910052702 rhenium Inorganic materials 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 229910052720 vanadium Inorganic materials 0.000 description 6
- 229910052726 zirconium Inorganic materials 0.000 description 6
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 239000011810 insulating material Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229910000962 AlSiC Inorganic materials 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910002601 GaN Inorganic materials 0.000 description 2
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 229910017982 Ag—Si Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910001020 Au alloy Inorganic materials 0.000 description 1
- 229910019819 Cr—Si Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910018098 Ni-Si Inorganic materials 0.000 description 1
- 229910018529 Ni—Si Inorganic materials 0.000 description 1
- 229910001252 Pd alloy Inorganic materials 0.000 description 1
- 229910021074 Pd—Si Inorganic materials 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- 229910000629 Rh alloy Inorganic materials 0.000 description 1
- 229910019596 Rh—Si Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
Claims (18)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2008-0030919 | 2008-04-02 | ||
KR1020080030919A KR101428066B1 (ko) | 2008-04-02 | 2008-04-02 | 수직구조 그룹 3족 질화물계 반도체 발광다이오드 소자 및이의 제조 방법 |
KR10-2008-0031900 | 2008-04-04 | ||
KR20080031900A KR101480551B1 (ko) | 2008-04-04 | 2008-04-04 | 수직구조 그룹 3족 질화물계 반도체 발광다이오드 소자 및이의 제조 방법 |
PCT/KR2009/001710 WO2009145483A2 (ko) | 2008-04-02 | 2009-04-02 | 발광 소자 및 그 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102106001A true CN102106001A (zh) | 2011-06-22 |
CN102106001B CN102106001B (zh) | 2014-02-12 |
Family
ID=41377727
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200980119150.1A Active CN102106001B (zh) | 2008-04-02 | 2009-04-02 | 发光器件及其制造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8829554B2 (zh) |
EP (1) | EP2262012B1 (zh) |
JP (1) | JP5220916B2 (zh) |
CN (1) | CN102106001B (zh) |
WO (1) | WO2009145483A2 (zh) |
Cited By (5)
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CN104584214A (zh) * | 2012-09-05 | 2015-04-29 | 皇家飞利浦有限公司 | 载体晶片从器件晶片的激光去键合 |
CN104867859A (zh) * | 2014-02-18 | 2015-08-26 | 英飞凌科技股份有限公司 | 包括电介质材料的半导体器件 |
CN110323314A (zh) * | 2018-03-28 | 2019-10-11 | 日亚化学工业株式会社 | 氮化物半导体发光元件 |
CN110383509A (zh) * | 2016-12-06 | 2019-10-25 | Lg 伊诺特有限公司 | 发光器件 |
CN117174802A (zh) * | 2023-11-02 | 2023-12-05 | 江西兆驰半导体有限公司 | 发光二极管的外延结构及其制备方法 |
Families Citing this family (24)
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TWI403003B (zh) * | 2009-10-02 | 2013-07-21 | Chi Mei Lighting Tech Corp | 發光二極體及其製造方法 |
KR101007137B1 (ko) * | 2010-03-08 | 2011-01-10 | 엘지이노텍 주식회사 | 발광 소자, 발광 소자 제조방법 및 발광 소자 패키지 |
KR101039988B1 (ko) * | 2010-03-09 | 2011-06-09 | 엘지이노텍 주식회사 | 발광 소자 및 그 제조방법 |
US8686461B2 (en) * | 2011-01-03 | 2014-04-01 | SemiLEDs Optoelectronics Co., Ltd. | Light emitting diode (LED) die having stepped substrates and method of fabrication |
US9324905B2 (en) * | 2011-03-15 | 2016-04-26 | Micron Technology, Inc. | Solid state optoelectronic device with preformed metal support substrate |
KR101795037B1 (ko) * | 2011-06-10 | 2017-12-01 | 엘지이노텍 주식회사 | 발광 소자 및 발광 소자 패키지 |
KR101795038B1 (ko) * | 2011-06-10 | 2017-11-07 | 엘지이노텍 주식회사 | 발광 소자 및 발광 소자 패키지 |
US8787418B2 (en) * | 2011-08-11 | 2014-07-22 | Sensor Electronic Technology, Inc. | Emitting device with compositional and doping inhomogeneities in semiconductor layers |
US9385271B2 (en) | 2011-08-11 | 2016-07-05 | Sensor Electronic Technology, Inc. | Device with transparent and higher conductive regions in lateral cross section of semiconductor layer |
US8879598B2 (en) | 2011-08-11 | 2014-11-04 | Sensor Electronic Technology, Inc. | Emitting device with compositional and doping inhomogeneities in semiconductor layers |
US9595634B2 (en) | 2011-08-11 | 2017-03-14 | Sensor Electronic Technology, Inc. | Device with transparent and higher conductive regions in lateral cross section of semiconductor layer |
US10411156B2 (en) | 2011-08-11 | 2019-09-10 | Sensor Electronic Technology, Inc. | Device with transparent and higher conductive regions in lateral cross section of semiconductor layer |
JP5891436B2 (ja) * | 2012-06-21 | 2016-03-23 | パナソニックIpマネジメント株式会社 | 縦型構造発光素子の製造方法 |
JP5891437B2 (ja) * | 2012-06-21 | 2016-03-23 | パナソニックIpマネジメント株式会社 | 縦型構造発光素子の製造方法 |
JP2014187325A (ja) * | 2013-03-25 | 2014-10-02 | Toshiba Corp | 半導体発光装置及びその製造方法 |
DE102013107531A1 (de) * | 2013-07-16 | 2015-01-22 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
DE102013221788B4 (de) | 2013-10-28 | 2021-05-27 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zum Herstellen eines Kontaktelements und eines optoelektronischen Bauelements |
DE102015104138A1 (de) * | 2015-03-19 | 2016-09-22 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung von optoelektronischen Halbleiterbauelementen und optoelektronisches Halbleiterbauelement |
KR102431750B1 (ko) * | 2016-03-04 | 2022-08-12 | 삼성디스플레이 주식회사 | 플렉서블 표시장치 및 그의 제조방법 |
US10840405B2 (en) * | 2017-10-31 | 2020-11-17 | Sivananthan Laboratories, Inc. | Inductively coupled plasma for hydrogenation of type II superlattices |
US11056611B2 (en) * | 2018-09-11 | 2021-07-06 | Facebook Technologies, Llc | Mesa formation for wafer-to-wafer bonding |
US11342479B2 (en) | 2018-09-11 | 2022-05-24 | Facebook Technologies, Llc | Reducing bowing of materials before wafer-to-wafer bonding for LED manufacturing |
US11145786B2 (en) | 2018-09-11 | 2021-10-12 | Facebook Technologies, Llc | Methods for wafer-to-wafer bonding |
US11164844B2 (en) * | 2019-09-12 | 2021-11-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Double etch stop layer to protect semiconductor device layers from wet chemical etch |
Citations (4)
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JP2004281863A (ja) * | 2003-03-18 | 2004-10-07 | Nichia Chem Ind Ltd | 窒化物半導体素子及びその製造方法 |
US6841802B2 (en) * | 2002-06-26 | 2005-01-11 | Oriol, Inc. | Thin film light emitting diode |
KR20070038272A (ko) * | 2005-10-05 | 2007-04-10 | 삼성전기주식회사 | 수직구조 발광 다이오드의 제조 방법 |
JP2007511065A (ja) * | 2003-11-04 | 2007-04-26 | 松下電器産業株式会社 | 半導体発光装置、照明モジュール、照明装置、および半導体発光装置の製造方法 |
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JPH10209569A (ja) * | 1997-01-16 | 1998-08-07 | Hewlett Packard Co <Hp> | p型窒化物半導体装置とその製造方法 |
JP3723434B2 (ja) * | 1999-09-24 | 2005-12-07 | 三洋電機株式会社 | 半導体発光素子 |
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JP5162909B2 (ja) * | 2006-04-03 | 2013-03-13 | 豊田合成株式会社 | 半導体発光素子 |
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-
2009
- 2009-04-02 JP JP2011502858A patent/JP5220916B2/ja active Active
- 2009-04-02 EP EP09754948.9A patent/EP2262012B1/en active Active
- 2009-04-02 US US12/936,090 patent/US8829554B2/en active Active
- 2009-04-02 CN CN200980119150.1A patent/CN102106001B/zh active Active
- 2009-04-02 WO PCT/KR2009/001710 patent/WO2009145483A2/ko active Application Filing
Patent Citations (4)
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US6841802B2 (en) * | 2002-06-26 | 2005-01-11 | Oriol, Inc. | Thin film light emitting diode |
JP2004281863A (ja) * | 2003-03-18 | 2004-10-07 | Nichia Chem Ind Ltd | 窒化物半導体素子及びその製造方法 |
JP2007511065A (ja) * | 2003-11-04 | 2007-04-26 | 松下電器産業株式会社 | 半導体発光装置、照明モジュール、照明装置、および半導体発光装置の製造方法 |
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Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104584214A (zh) * | 2012-09-05 | 2015-04-29 | 皇家飞利浦有限公司 | 载体晶片从器件晶片的激光去键合 |
CN104584214B (zh) * | 2012-09-05 | 2018-08-03 | 亮锐控股有限公司 | 载体晶片从器件晶片的激光去键合 |
US10741718B2 (en) | 2012-09-05 | 2020-08-11 | Lumileds, LLC | Laser de-bond carrier wafer from device wafer |
CN104867859A (zh) * | 2014-02-18 | 2015-08-26 | 英飞凌科技股份有限公司 | 包括电介质材料的半导体器件 |
CN104867859B (zh) * | 2014-02-18 | 2018-01-09 | 英飞凌科技股份有限公司 | 包括电介质材料的半导体器件 |
CN110383509A (zh) * | 2016-12-06 | 2019-10-25 | Lg 伊诺特有限公司 | 发光器件 |
CN110323314A (zh) * | 2018-03-28 | 2019-10-11 | 日亚化学工业株式会社 | 氮化物半导体发光元件 |
CN117174802A (zh) * | 2023-11-02 | 2023-12-05 | 江西兆驰半导体有限公司 | 发光二极管的外延结构及其制备方法 |
CN117174802B (zh) * | 2023-11-02 | 2024-02-20 | 江西兆驰半导体有限公司 | 发光二极管的外延结构及其制备方法 |
Also Published As
Publication number | Publication date |
---|---|
EP2262012B1 (en) | 2017-12-27 |
JP2011517086A (ja) | 2011-05-26 |
US20110140076A1 (en) | 2011-06-16 |
WO2009145483A2 (ko) | 2009-12-03 |
US8829554B2 (en) | 2014-09-09 |
EP2262012A4 (en) | 2014-12-31 |
EP2262012A2 (en) | 2010-12-15 |
CN102106001B (zh) | 2014-02-12 |
WO2009145483A3 (ko) | 2010-01-21 |
JP5220916B2 (ja) | 2013-06-26 |
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Effective date of registration: 20170912 Address after: Seoul, South Kerean Patentee after: IG Innotek Co., Ltd. Address before: Seoul, South Kerean Patentee before: Song Junwu |
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Effective date of registration: 20210813 Address after: 168 Changsheng North Road, Taicang City, Suzhou City, Jiangsu Province Patentee after: Suzhou Leyu Semiconductor Co.,Ltd. Address before: Seoul, South Kerean Patentee before: LG INNOTEK Co.,Ltd. |