CN102103332A - 高速数字扫描直写光刻装置 - Google Patents
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- CN102103332A CN102103332A CN2011100595738A CN201110059573A CN102103332A CN 102103332 A CN102103332 A CN 102103332A CN 2011100595738 A CN2011100595738 A CN 2011100595738A CN 201110059573 A CN201110059573 A CN 201110059573A CN 102103332 A CN102103332 A CN 102103332A
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- 238000001259 photo etching Methods 0.000 title abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 49
- 238000003384 imaging method Methods 0.000 claims abstract description 45
- 238000012545 processing Methods 0.000 claims abstract description 18
- 238000003491 array Methods 0.000 claims abstract description 17
- 238000013461 design Methods 0.000 claims abstract description 11
- 230000005540 biological transmission Effects 0.000 claims abstract description 10
- 230000033001 locomotion Effects 0.000 claims description 22
- 230000003287 optical effect Effects 0.000 claims description 19
- 230000011514 reflex Effects 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052753 mercury Inorganic materials 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 12
- 238000003754 machining Methods 0.000 abstract description 8
- 238000000034 method Methods 0.000 description 37
- 230000008569 process Effects 0.000 description 13
- 238000005516 engineering process Methods 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 6
- 238000012546 transfer Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000000018 DNA microarray Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 230000009885 systemic effect Effects 0.000 description 1
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Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104570331A (zh) * | 2015-01-31 | 2015-04-29 | 哈尔滨工业大学 | 一种基于光学拼接手段实现dmd的分辨率提高的方法 |
CN105242495A (zh) * | 2014-05-26 | 2016-01-13 | 上海微电子装备有限公司 | 光刻曝光装置 |
CN106647181A (zh) * | 2016-12-19 | 2017-05-10 | 电子科技大学 | 一种用于dmd无掩膜光刻机的高速图像曝光方法 |
CN107390458A (zh) * | 2017-09-07 | 2017-11-24 | 山东乐讯光电有限公司 | 一种高清晰度投影装置 |
CN108972156A (zh) * | 2018-09-05 | 2018-12-11 | 天津大学 | 一种机床导轨直线度误差测量方法 |
CN109186503A (zh) * | 2018-09-05 | 2019-01-11 | 天津大学 | 基于四面锥形直角等腰反射棱镜的直线度误差测量系统 |
CN109375479A (zh) * | 2018-12-26 | 2019-02-22 | 广东台名智能设备有限公司 | 一种pcb板的uv led冷光源投影光刻机及工艺 |
CN109491215A (zh) * | 2018-12-06 | 2019-03-19 | 金华飞光科技有限公司 | 一种提高dmd无掩膜光刻图像精度的方法 |
CN112394619A (zh) * | 2019-08-13 | 2021-02-23 | 苏州源卓光电科技有限公司 | 一种直写光刻机的曝光系统 |
CN113099625A (zh) * | 2021-04-21 | 2021-07-09 | 深圳市祺利电子有限公司 | 一种电路板阻焊曝光方法 |
CN113805439A (zh) * | 2021-09-23 | 2021-12-17 | 上海度宁科技有限公司 | 一种投影光刻机、照明系统、控制系统及方法 |
CN114509918A (zh) * | 2020-11-17 | 2022-05-17 | 江苏迪盛智能科技有限公司 | 一种激光直写图形的补偿方法和激光曝光机 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2005501270A (ja) * | 2001-04-12 | 2005-01-13 | テーザ スクリボス ゲゼルシャフト ミット ベシュレンクテル ハフツング | 1次元トリガマスクを有するリソグラフ及び記憶媒体にデジタルホログラムを生成する方法 |
WO2006138587A2 (en) * | 2005-06-18 | 2006-12-28 | The Regents Of The University Of Colorado, A Body Corporate | Three-dimensional direct-write lithography |
EP1966651A2 (en) * | 2005-12-29 | 2008-09-10 | ASML Holding N.V. | Interferometric lithography system and method used to generate equal path lengths of interfering beams |
US20090268184A1 (en) * | 2008-04-25 | 2009-10-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and Method for Direct Writing to a Wafer |
CN201993577U (zh) * | 2011-03-14 | 2011-09-28 | 张雯 | 高速数字扫描直写光刻装置 |
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2011
- 2011-03-14 CN CN 201110059573 patent/CN102103332B/zh not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005501270A (ja) * | 2001-04-12 | 2005-01-13 | テーザ スクリボス ゲゼルシャフト ミット ベシュレンクテル ハフツング | 1次元トリガマスクを有するリソグラフ及び記憶媒体にデジタルホログラムを生成する方法 |
WO2006138587A2 (en) * | 2005-06-18 | 2006-12-28 | The Regents Of The University Of Colorado, A Body Corporate | Three-dimensional direct-write lithography |
WO2006138587A3 (en) * | 2005-06-18 | 2009-04-16 | Univ Colorado Regents | Three-dimensional direct-write lithography |
EP1966651A2 (en) * | 2005-12-29 | 2008-09-10 | ASML Holding N.V. | Interferometric lithography system and method used to generate equal path lengths of interfering beams |
US20090268184A1 (en) * | 2008-04-25 | 2009-10-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and Method for Direct Writing to a Wafer |
CN201993577U (zh) * | 2011-03-14 | 2011-09-28 | 张雯 | 高速数字扫描直写光刻装置 |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105242495A (zh) * | 2014-05-26 | 2016-01-13 | 上海微电子装备有限公司 | 光刻曝光装置 |
CN105242495B (zh) * | 2014-05-26 | 2017-08-25 | 上海微电子装备(集团)股份有限公司 | 光刻曝光装置 |
CN104570331A (zh) * | 2015-01-31 | 2015-04-29 | 哈尔滨工业大学 | 一种基于光学拼接手段实现dmd的分辨率提高的方法 |
CN106647181A (zh) * | 2016-12-19 | 2017-05-10 | 电子科技大学 | 一种用于dmd无掩膜光刻机的高速图像曝光方法 |
CN106647181B (zh) * | 2016-12-19 | 2018-03-09 | 电子科技大学 | 一种用于dmd无掩膜光刻机的高速图像曝光方法 |
CN107390458A (zh) * | 2017-09-07 | 2017-11-24 | 山东乐讯光电有限公司 | 一种高清晰度投影装置 |
CN108972156A (zh) * | 2018-09-05 | 2018-12-11 | 天津大学 | 一种机床导轨直线度误差测量方法 |
CN109186503A (zh) * | 2018-09-05 | 2019-01-11 | 天津大学 | 基于四面锥形直角等腰反射棱镜的直线度误差测量系统 |
CN109491215A (zh) * | 2018-12-06 | 2019-03-19 | 金华飞光科技有限公司 | 一种提高dmd无掩膜光刻图像精度的方法 |
CN109375479A (zh) * | 2018-12-26 | 2019-02-22 | 广东台名智能设备有限公司 | 一种pcb板的uv led冷光源投影光刻机及工艺 |
CN112394619A (zh) * | 2019-08-13 | 2021-02-23 | 苏州源卓光电科技有限公司 | 一种直写光刻机的曝光系统 |
CN114509918A (zh) * | 2020-11-17 | 2022-05-17 | 江苏迪盛智能科技有限公司 | 一种激光直写图形的补偿方法和激光曝光机 |
CN114509918B (zh) * | 2020-11-17 | 2023-11-07 | 江苏迪盛智能科技有限公司 | 一种激光直写图形的补偿方法和激光曝光机 |
CN113099625A (zh) * | 2021-04-21 | 2021-07-09 | 深圳市祺利电子有限公司 | 一种电路板阻焊曝光方法 |
CN113099625B (zh) * | 2021-04-21 | 2022-03-11 | 深圳市祺利电子有限公司 | 一种电路板阻焊曝光方法 |
CN113805439A (zh) * | 2021-09-23 | 2021-12-17 | 上海度宁科技有限公司 | 一种投影光刻机、照明系统、控制系统及方法 |
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Denomination of invention: High speed digital scanning direct writing lithography device Effective date of registration: 20210517 Granted publication date: 20121212 Pledgee: Bank of Jiangsu Limited by Share Ltd. Shenzhen branch Pledgor: CAIZ OPTRONICS Corp. Registration number: Y2021980003668 |
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