TW200540577A - Pattern writing apparatus and pattern writing method - Google Patents

Abstract

An arrangement of irradiation regions (61) which correspond to micromirros of a DMD is tilted relatively to an arrangement of writing cells (620). Writing of a pattern is performed by relative movement of a irradiation region group to a writing cell group in a main scanning direction. A center-to-center distance along a sub-scanning direction between two adjacent irradiation regions (61) arranged almost in the main scanning direction is made equal to a writing pitch of writing cells (620), and a center-to-center distance along main scanning direction between them is made "a times" the writing pitch. ON/OFF control of light irradiation is performed once during relative movement of the irradiation region group by a distance equal to "n times" the writing pitch (n is an integer larger than 2). Appropriate pattern writing with high resolution at a high speed is realized where(a2+1) and n are relatively prime.

Description

200540577 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to a pattern drawing device for drawing a pattern on a photosensitive material by irradiating light modulated in space. [Prior art]

A technique for drawing a daylight pattern on a photosensitive material using a spatial light modulation device has been proposed before. Such a technique, for example, is disclosed in Japanese Patent Laid-Open Publication No. 2000- 3 3 2 2 2 1 (Document 1). It is disclosed that a projected light irradiated field group by DMD (Digi tal micromirror device) is in its field. The arrangement direction is inclined to the scanning direction and scanning on the photosensitive material, and the writing pattern of the writing unit group is set on the photosensitive material at a higher density than the light irradiation field group. In addition, Patent Document 1 discloses a method of performing 0 N / 0 FF control of light irradiation on each light irradiation field by using a light irradiation field group at a distance of two copies of each pattern cell of each day of the movement. . However, it is important to increase the daytime drawing speed of a pattern by miniaturizing a semiconductor substrate or a printed circuit board. In the method of Patent Document 1, it is also desired to realize pattern drawing at a speed of more than 2 times. However, simply increasing the moving speed of the light-irradiated field group does not necessarily achieve high-speed tracing appropriately. [Summary of the Invention] The present invention is a pattern drawing device suitable for drawing a daylight pattern by irradiating light on a photosensitive material. The purpose of the present invention is to scan a group of light irradiated fields in a two-dimensional array in a scanning direction inclined in the array direction and to the south. When performing day-tracing, high-speed and appropriate day-tracing can be achieved. 6 3] 2XP / Invention Manual (Supplement) / 94-08 / 94112212

200540577 The pattern drawing device of the present invention is provided with: two mutually-aligned rows on the photosensitive material, aligned in a U-direction, and arranged at a certain pitch, and the light irradiation field group irradiates the modulated light The irradiating section; and the light irradiating field group is described on the sensing material with a scanning direction inclined to the arrangement direction, and the scanning that is fixedly arranged on the photosensitive material in the scanning direction and a direction perpendicular to the scanning direction is respectively A scanning mechanism that allows a plurality of irradiated fields to pass relatively in the day field group; and synchronizes with the light irradiation field group to control 0 N / 0 FF of the light irradiation field by individually controlling the light irradiation field, to make each day field irradiated on the photosensitive material In the two arranging directions of the light irradiation area group of the light irradiation area group, the distance between the centers perpendicular to the scanning direction in the light irradiation areas adjacent to each other along the scanning direction is equal to the tracing pitch. The center distance to the scanning direction is a times the tracing pitch (however, a is an integer of 2 or more); η is an integer of 3 or more) for irradiating the primary light 0 N / 0 F F control and (a2 + l) and η are coprime (relatively prime). According to the present invention, daylight can be rapidly traced with high resolution using spatially modulated light. Preferably, in the light irradiation field group, the light irradiation field arranged in the direction leading to the scanning direction among the two arrangement directions is M, and M is an integer multiple of (a X). Repeated exposure at the same number of times. In one form of the invention, after the light in the light irradiation field is irradiated to 0 N, the light irradiation field group has a η multiple of the drawing pitch, and the light irradiation in the light irradiation field is relatively completed before the end. OFF. It is better to control and control the 312 × P / Invention Specification (Supplement) / 94-08 / 94112212, the light material that is perpendicular to the W, and scan the light with a pitch, and control the f space in the middle of the square. Doubled, Shi Nan's light of great η). Become Mobile Illumination 7 200540577 The light irradiation in the shooting area ranges from 0 N to 0 F F. The light irradiation area group only moves relatively to draw the pitch. This can suppress a reduction in the drawing resolution in the scanning direction. When this drawing control is implemented, it is preferable that the light irradiating part is provided with a light source capable of controlling ON / OFF and a spatial light modulation device capable of spatially modulating the light of the light source. By controlling 0 N / 0 FF of the light source, It is easy to suppress a decrease in the resolution in the scanning direction. The present invention is also applicable to a pattern drawing method in which a pattern is drawn by irradiating light on a photosensitive material.

The above objects, features, aspects and advantages of the present invention will be described in detail below with reference to the drawings. [Embodiment] Fig. 1 is a diagram showing a configuration of a pattern tracing device 1 according to an embodiment of the present invention. Fig. 1 shows the internal structure of the device and a part of the device is shown in dotted lines. The pattern tracer device 1 includes a stage 2 capable of holding a substrate 9 forming a photoresist film, and a φ stage moving device 31 that can move the Y-direction movable table 2 in FIG. 1 and can project toward the substrate 9. The light irradiation unit 4 of the light beam, the head movement mechanism 3 2 for the head 40 of the X-direction movable light irradiation unit 4 in FIG. 1, and, connected to the light irradiation unit 4 and the head movement mechanism 3 2 Controller 5. The light irradiating unit 4 has a light source unit 41 connected to the head 40, and the light source unit 41 has a high-output LED 411 and a lens group 412, which are transparent. The light from the lens group 4 1 2 is incident on the optical fiber 4 1 3 Instead, it is imported into the head 40. The head 40 has a DMD42 arranged with a small mirror group arranged in a grid. The light beam from the light source unit 41 is reflected by the small mirror group to derive a two-dimensional spatial modulation 8 312XP / Invention Specification (Supplement) / 94-08 / 941] 2212 200540577 beam. Specifically, the light emitted from the optical fiber 4 1 3 is guided to a mirror 436 by a rod integrator 433, a lens 434, and a mirror 435, and the mirror 436 collects the light beam and guides it to the DMD 42. The light beam incident on the DMD42 is a small mirror group that uniformly irradiates the D M D 4 2 at a certain incident angle. As described above, the scale integrator 433, the lens 434, the mirror 435, and the mirror 436 cause the light from the light source unit 41 to be introduced into the DMD 42 to constitute the illumination optical system 43.

Modified light beams formed by the reflected light from the micromirrors in the DMD42 mirrors in a predetermined posture (in the description of light irradiation by the DMD42 described later, the posture corresponding to the ON state) (That is, the light beam modulated by space) is incident on the cube beam splitter 441 and reflected, and the magnification is adjusted by the zoom lens 442 and introduced to the projection lens 4 4 3. The variable focal length lens 4 4 2 is variable magnification by an actuator 442a for focal length, and the projection lens 443 is an actuator (actuat 〇r) 4 4 3 a for auto focus (AF). Focus. In addition, the light beam from the projection lens 4 3 9 is a region that is introduced into the optically conjugated (c ο njugate) substrate 9 to the micro-mirror group, and is irradiated with each micro-mirror to be modulated (that is, becomes a modulation Changing factors) of the light irradiation area corresponding to the light beam. Therefore, the 'pattern tracer device 1' uses a cube beam splitter 4 41, a variable focal length lens 4 4 2, and a projection lens 4 4 3 to reduce the projection of light from each micromirror to the corresponding light irradiation area on the substrate 9 and The projection optical system 4 4 〇 is' above the cube-shaped beam splitter 441, a semi-transparent lens is arranged. (Mirror half-mirr) 45 1. Laser diode (LD) 4 5 2 and AF for AF Inspection and outline (supply) 2222 9

200540577 The sensor 4 5 3 is used. The light from LD 4 5 2 passes through the semi-transparent mirror cube light splitter 4 4 1. The variable focal length lens 4 4 2. Projects the scene and shines on the substrate 9 from the substrate. The light of 9 enters the reverse direction and the mirror 4 5 1 is reflected and detected by the sensor 4 5 3. The actuator 2 (actuat 0r) used in the AF sensor 4 4 3 a is fixed to the stage-moving machine side of the table-moving machine of the in-line motor, and is controlled by the control unit 5 Stage moving mechanism 3: The light irradiated field group (one small mirror irradiated light field) is irradiated with light from the mirror group, and the Y direction on the photoresist film is continuously moved in FIG. 1. That is, the light irradiation area group moves the substrate 9 which is opposed to the head 40, so that the light irradiation area group moves on the substrate 9. The head 40 is fixed to the moving body side of the head moving mechanism 32, and the main scanning direction (Y direction in FIG. 1) is intermittently moved in the sub scanning direction (X direction). That is, each time the main scanning section moving mechanism 32 moves the horse to the X direction at the start position of the next main scanning. Figure 2 shows DMD42. DMD42 is a small spatial light modulation device in which a plurality of micro mirrors (micr 〇- mirr 〇r) are arranged in a grid pattern on a silicon substrate 421 (illustrated by arranging M rows and N rows in two perpendicular directions). Corresponding to the data in which the micro-mirrors are written (mem ryce 1 1), each micro-mirror is tilted at an angle by the action of an electrostatic field. In addition, the light is incident on a surface that is at an angle of 45 degrees to the DMD42 perpendicular to the row direction at an incident angle of 24 degrees, and can be illuminated by a small mirror. DMD42 is actually used with 7 6 8 歹 | J (row 312XP / Invention Specification (Supplement) / 94-08 / 941122] 2 451 through the multi-lens 443 with a translucent 4 5 3 output. .31 的 移 ί It is determined by the relative displacement of one minute, and by the end, the head 40 is moved to the same level at the end of the vertical to the mutual mirror group 4 2 2 in the memory sheet and only one along the ground. For each micro) 10,204 rows of 10 200540577 (c0um η) micro mirrors, and only 192 rows are illuminated from the top row. As shown in FIG. 1, when reset pulses (resetpu 1 se) are input to the DMD 4 2 from the control unit 5, each micromirror uses the diagonal of the reflecting surface as an axis according to the data written in the corresponding memory unit. Tilt together in a certain posture. Thereby, the light beam irradiated by D M D 4 2 is reflected in accordance with the inclination direction of each micromirror, and the light irradiation in the light irradiation field is performed with 0 N / 0 F F. That is, when a reset pulse is received when a micro-mirror showing data of ON is written in the memory unit, the light incident on the micro-mirror is reflected toward the variable focal length lens 4 3 7 and is reflected in the corresponding light. The irradiation area is irradiated with light (small beam). In addition, when the micromirror is in the 0 F F state, the micromirror reflects the incident light to a predetermined position different from the variable focal length lens 4 3 7, so that the corresponding light irradiation area cannot be guided by light.

FIG. 3 is a diagram showing a light irradiation area 61 and a daylight unit pattern cell (w r i t i n g c e 1 1) 6 2 0 on the substrate 9 in the pattern drawing device 1. The light irradiation area 61 is an area where the head 40 is fixed, and the daytime unit pattern cell 620 is an area equivalent to the minimum unit of the drawing control fixed on the substrate 9 (for example, 2 μm four sides). By the relative movement of the head 40 to the substrate 9, the light irradiation area 61 can be relatively moved on the tracing unit pattern cell 6 2 0. The drawing unit cell 6 2 0 is the center position of the light irradiation field 61 by D M D 4 2 (correctly the center position of the light irradiation field 61 in the middle of continuous movement) as the exposure area of the field on the reference division substrate 9. In FIG. 3, a two-dot chain line represents a grid-shaped light irradiation area group corresponding to the light of each micromirror corresponding to D M D 4 2, and a solid line represents a day-unit pattern cell group on the substrate 9. In FIG. 3, only the day unit pattern cell 6 2 0 and the light irradiation collar 11 312XP / Invention Specification (Supplement) / 94-08 / 94112212 are illustrated.

200540577 Part of domain 61. Draw a unit pattern cell 6 2 0 in the X direction (sub-system Y direction (main scanning direction) in Fig. 3, each with a fixed pitch (in order to draw the pitch)) PW rectangular exposure area, Unit pattern cell data (data written in DM D42) The center of the light emission area 6 1 is drawn. Unit pattern cell 6 2 0 (Additional. Implemented as a center. The reflected light of each micromirror of DMD 4 2 emits light. 6 1 corresponds to the shape of the micromirror and becomes approximately a domain. As shown in FIG. 4, the light irradiation area 6 1 corresponds to DMD 4 2 with a certain pitch in 2 directions perpendicular to each other (hereinafter referred to as “photos arranged in PI Column M, row N, the arrangement direction of the light irradiation area 61 is inclined and DMD 4 2 is set to be inclined within the head 40. As shown in FIG. 3, the main scanning direction of the light irradiation area group is 2 Among the two alignment directions, the direction of the general scanning direction (the direction that forms a small angle with the main scanning direction) in the two light irradiation areas 61, L 1 in the sub-scanning direction (X direction), and the unit of tracing day pattern 6 2 0 tracing pitch PW (Middle of the tracing diurnal unit pattern cell 6 2 0 Intercardiac distance) becomes the phase-tracing direction (） direction), and the center distance L 2 becomes inclined as the tracing pitch. In the following description, the direction substantially along the Υ direction is called the row direction, and the other along the X direction is substantially One direction is called as shown by an additional parallel oblique line in FIG. 4, and it is correctly aligned along the two light irradiation fields 6 1 arranged in the row direction, and is irradiated by ten times the distance in the row direction, and the irradiation pitch PI is distanced in the column direction. (Supplement) / 94-08 / 94112212 (P * direction), and below, it is called "tracing according to the corresponding tracing and irradiating with the light drop 6 2 1) as the irradiating tiny mirror of the square collar and shooting pitch". ) The tilt of the direction to the main scan is the same as the distance between the centers adjacent to each other in the main scan direction, and 4 times the PW of the main scan is the column direction in DMD42. Main scanning direction

200540577 Next, the operation of the pattern drawing device 1 when performing pattern drawing on a substrate will be described with reference to FIG. 5. In the following description of the pattern drawing, the light irradiation area group of the daylight unit pattern cell is moved in the sub-scanning direction. First, at the beginning of the day, the light corresponding to the initial drawing of the unit pattern is irradiated to the area 61 (for example, the daytime unit map with the central symbol 6 2 1 in the area 61 in FIG. 3). The bit pattern cell data is self-controlled. The unit 5 sends to the corresponding memory element of the small mirror (step S 1 1). Secondly, the light scanning is started (step S 1 2), and when the daylight scanning unit pattern cell group is illuminated, the daylight scanning start position (step S 1 3) The control unit 5 then rushes to DMD4 2, and each micromirror becomes exposed to the memory potential, and exposes the original daylight unit pattern cell 6 2 1. The correct one is that the above-mentioned exposure refers to the action of controlling light irradiation. Although it includes the case where the light is not irradiated, it is only called "exposure" in the control of exposure. After the reset pulse is sent, it corresponds to the next case cell 6 2 0 (in this embodiment, it is shown in the figure). The (-Y) side of each of the strokes 6 2 1 in 3 is only separated from the stroke unit of 4 strokes of the day pitch to trace the data of the day unit patterns to the memory cells of each micromirror, and the data is written into the data (step S 1 6). Reset pulse to DMD 4 2 and table moving mechanism 3 1 The main scanning action is implemented synchronously. Since the first reset pulse, the tracer has moved only 4 times the pitch P in the main scanning direction. 312XP / Invention Manual (Supplement) / 94-08 / 94112212 9 Photoresist The main scanning field direction of the membrane day device 1 and the light irradiation cells in the cell 6 2 0) are located in each of the micro-radiation field groups of the tracing single DMD 4 2 and arrive by sending the reset pulse. The position fc of the data (step S 1 4). In the description under the action of 0N / 0FF, the sending of the memory is performed by drawing the day unit map, the day unit pattern, the cell pattern, and the cell 6 2 2). At the point of the pattern cell group, the next 13 200540577 reset pulses are sent to DMD 4 2 (steps S 1 7 and S 1 4), and each micromirror becomes a posture that follows the pattern cell data of the unit of the day. Therefore, the 0 N / 0 F F state of the light irradiated to each light irradiation area after the initial reset pulse is maintained to move between the drawing unit pattern cell group and the distance of 4 times the drawing day pitch. When the control unit 5 controls the 0 N / 0 FF of the light irradiation to the light irradiation field group by synchronizing with the scanning of the light irradiation field group 31 and the scanning of the light irradiation field group, the reset pulse is repeated at the eighteenth time ( Including the first reset pulse) The second exposure is performed centering on the daylight unit pattern cell 6 2 1 where the first exposure is performed. In the state immediately before the 18th reset pulse (that is, the state after the 17th reset pulse), the day-by-day unit pattern cells exposed from the first exposure are juxtaposed in a (-Y) direction by 1 There are 7 astronomical unit pattern cells (including the first astronomical unit pattern cell) as the center, and only one exposure is performed. The above-mentioned day-to-day operation will be described in detail with reference to FIGS. 6 to 9.

Fig. 6 is a diagram showing a daylight unit pattern cell group and a light irradiation field group. The blackened daylight unit pattern cell 6 2 0 (symbol 6 2 a) is used as the center to perform exposure during the initial reset pulse. In FIG. 6, in the light irradiation area 61 of the drawing unit pattern cell 6 2 a located on the (+ Y) side, that is, a plurality of light irradiation pitches in the row direction 4 and separation distances in the column direction 1 only. The light irradiation area 6 1 is attached with a parallel oblique line, and is sequentially attached from the (-Y) side to the opening 6 1 a, 6 1 b, 61c, 61d, 61eo. The following description is located in the light irradiation area 6 1 when the pulse is reset. The daytime unit pattern cells in the center of a to 6 1 e are assigned the symbols 6 2 a to 6 2 e. In addition, for the sake of understanding, the position of the daytime unit pattern cell 6 2 a located at the center of the light irradiation field 6 1 a at the time of the initial exposure is expressed using coordinates (C (0,0)). 14 312XP / Invention Specification ( (Supplement) / 94-08 / 94112212 200540577.) Indicates the position of the case cell adjacent to the (-Y) side of the drawing unit pattern cell 6 2 a. In addition, the coordinates of the position in the row direction of the light irradiation area 6 1 a to 6 1 e are represented by R (0,0), R (1, 4), (3,12) " R (4,1 6) To represent. These coordinates are represented by the local auxiliary force π.

When drawing the unit diagram with c (ο,], the columns and R (2, 8) and R are used as shown in Figure 7. After the unit pattern cells are shown in FIG. 7, the light irradiation times are ON or OFF. The unit pattern cell distance is 4 times the distance of exposure. The single day field of the side is 6 1 a square • 62a (C (0, 0 cell 62b (C (0 exposure). At this distance, the light leaves only 3 exposures.-Figure 9 shows the state. Day unit pattern The second reset pulse is sent 1 彳 DMD 4 at 2 o'clock, the drawing group and the light irradiation field group. In the first reset pulse field group, the unit pattern cell group is moved to trace the day pitch of 4, and Each light irradiation area is maintained in an exposure state (at the time of the second reset pulse at the time of light irradiation, from the initial drawing 6 2 a (C (0,0)) in the (-Y) direction so as to leave only the drawing The description of the diurnal diurnal unit pattern cell 6 2 a (C (0,4)) is the center, and FIG. 8 shows the case of the sixth reset pulse, with the (-Y) bit pattern cell 6 2 a (C (0, 2 0)) as the center to irradiate the light with the collar color exposure, and at the same time, the drawing unit pattern from the most (+ Y) side drawing unit pattern)) is drawn only 3 away from the drawing unit (-Y) side of the drawing unit pattern, 3)) After the light irradiation area 6 1 b (R (1, 4)) is also taken as the center, the light irradiation area group draws a unit pattern cell from the irradiation area 6 1 b at each time the drawing pitch is 4 times. 6 2 a As shown in FIG. 9 after the eighteenth reset pulse is performed centering on the drawing unit pattern cell on the day pitch (-Y) side, as shown in FIG. 9, the light irradiation field group pair (-Υ) Direction and relative movement of the tracing cell group, irradiate the field with the light at the most (-Υ) side 15 3] 2XP / Invention Specification (Supplement) / 94-08 / 941] 2212 200540577

6 1 a is a plurality of drawing unit pattern cells which become the center of exposure. Daylight unit pattern cells between 6 2 a are used as the center, and exposure is performed by light irradiating the area 6 1 b to 6 1 d. As a result, when the part on the (+ X) side of the most (-X) side row of the unit pattern cell group is drawn as shown in View 9, the area 6 1 a, 6 1 d, 6 1 c, 61b is irradiated with light. On the other hand, the four daytime unit pattern cells 62a, 62d, 62c, and 62d that are exposed are sequentially arranged in the direction of (-Y), and they are the scans that have been exposed since the 18th reset pulse. Day unit pattern cells 6 2 a (C (0,0)) from the 17 drawing unit pattern cells (including the first day pattern unit cells) arranged in the direction of (_ Y). Only 1 is implemented. Stage of exposure. In addition, in synchronization with the 18th reset pulse, the drawing unit pattern cell 6 2 a (C (0,0)) on the most (+ Y) side is used as the center to irradiate the area 6 1 e (R (4, 1 6)) Perform exposure. Later, in synchronization with the reset pulse, the second exposure is performed sequentially with the same daylight unit pattern cell as the center by using a light irradiation area that is more on the (+ Y) side than the light irradiation area shown in FIG. 9, Furthermore, the third and subsequent exposures are performed on the same daylight unit pattern cells. The cycle of repeated exposure becomes the 17th reset pulse. For example, when using the coordinate expression to explain the above-mentioned repeated exposure, when resetting the pulse, C (0,4 K) (where K is an integer of 0 or more), the unit of drawing day unit 6 2 0 is located at R (m, 4 m) (m = 0, 4, 8, 1 2 · · · · 4 4) irradiates the center of the field 6 1, and C (0,4 K + 1) traces the unit pattern cell 6 2 0 at (m , 4 m) (m = 3, 7, 1 1, 1 5 · · · · 4 7) irradiates the center of the field 6 1, and the C (0,4K + 2) tracing unit pattern cell 620 is located at R (m, 4m) (m = 2, 6, 1 0, 1 4 · · · · 4 6) irradiates the center of the field 6 1, and C (0, 4 K + 3) traces the unit pattern cell 6 2 0 is in the light irradiation field of R (m, 4 m) (m = 1, 5, 9, 1 3 · 16 312XP / Invention Specification (Supplement) / 94-08 / 94112212 200540577 ••• 45) 61 Center.

By repeating the above operations, when the pattern drawing device 1 uses DMD 4 2 with micromirrors (micr 0mirr 0r) of M rows, the table moving mechanism 3 1 is used to trace each pattern unit on the substrate 9 6 2 0 Passing a plurality of light irradiated areas 61 1 through can make repeated (M / 16) exposure operations, and each drawing unit pattern cell 6 2 0 as the central control (M / 16) level ( gradati ο η). Actually, M is 192, and the control of the repeated exposure can be performed 12 times. As shown in FIG. 3, one light irradiation area 61 can cover a plurality of daylight unit pattern cells 6 2 0. Further, since the exposure state is maintained between the two reset pulses, the group of daylight unit pattern cells will be in The tracing pitch moves at a distance of 4 times, so it cannot correctly perform (M / 16) level light irradiation. However, the minimum line width of the traced pattern (that is, the pattern resolution ability) is much larger than the minimum control unit of the line width (that is, the line width accuracy). The pattern cell 6 2 0 is irradiated with light, and the pattern cells 6 2 0 that are continuously present are not irradiated with light. Therefore, practically no problem occurs. For example, the line width or the space between adjacent lines in a pattern becomes 20 μm, and the minimum control unit for line width or space width is 2 μm. When the scan performed between the main scans of the light irradiation field group once is over (Fig. 5 ··· Step S 1 5), the main scan is stopped (Step S 1 6). When performing another main scan, the head movement mechanism 32 is used, and the light irradiation field group is sub-scanned in the X direction, and the process returns to step S1. The table movement mechanism 31 is used to make the table 2 in the reverse direction ( (-Y) direction) while performing one trace at a time. 17 312XP / Invention Manual (Supplement) / 94-08 / 94112212

200540577 As above, the pattern drawing device 1 resets the drawing unit cell so that the drawing unit cell moves only 4 times the distance of the daytime pitch. Therefore, the pattern drawing device 1 moves only the drawing unit pattern cell group between the pulses and moves the daytime pitch. In this case, drawing is performed at a speed of 4 times (hereinafter, this action is referred to as "4 times speed day".). Thereby, it is possible to perform the tracing at a high speed while controlling the line width of the pattern. However, as shown in FIG. 9, in order to separate the drawing unit maps between 2 day unit pattern cells 6 2 a (blackened part) that are only 4 times the day pitch, the light irradiation area 6 1 b is the center. ~ 6 1 d can be carried out more reliably. In other words, in order to perform the centering of each patterning unit pattern cell as the center, the number of tracing pitches in the 61 exposure areas and the moving distance of the resetting pulse tracing unit group are reset. The number of day-to-day pitches must be prime numbers (the common divisor of the two parties is 1). In the case of FIG. 9, the number of traces between 61 areas of light irradiation is 17 and the unit pattern cell group moving distance is drawn between reset pulses. The number of day-to-day pitches is 4, and both sides are prime numbers. In addition, since the number of tracing pitches in the light irradiation area i is 17, the number of columns in the light irradiating area 61 can be changed, and the tracing speed can be arbitrarily changed between 2 times and 16 times < FIG. 1 0 to 13 are diagrams showing the relationship between the tilt of the light irradiation field group and the size of the light irradiation collar. Fig. 10 shows the two shot areas 61 arranged along the scanning direction, leaving the irradiation pitch PI twice in the row direction and leaving only the irradiation pitch PI in the column. Fig. 1, 1, 2, 1 3 shows The two light irradiation areas 61 arranged along the direction are separated by 3, 4, and 5 times the pitch PI in the row direction, and are irradiated only by the pitch PI state in the column direction. In Fig. 10 to Fig. 13, the light irradiation area 61 and the daylight unit pattern cell 312XP / Invention Specification (Supplement) / 94-08 / 94112212 reset the bitmap to describe each cell light, light. , The largest day of the bitmap is 61, and the area is 61. The scanning direction of the illumination direction is 620 18 200540577. It is a square, and it is roughly along the scanning direction (row direction) in the two alignment directions of the light irradiation field group. In the adjacent light irradiation areas 61, the distance between the centers perpendicular to the scanning direction and the drawing pitch PW are equal, and the distance between the centers to the scanning direction is equal to 2, 3, 4, or 5 times (hereinafter referred to as "a times". However, a is an integer of 2 or more).

On the other hand, in Figure 10 to Figure 13, the distance between the two light irradiation areas 61, which are juxtaposed along the scanning direction, becomes 5, 10, 17, 26 times the drawing pitch PW (generally (a2 + l) times). Therefore, in FIG. 10 to FIG. 13, the tracing is performed between 5, 10, 17, 7, and 6 at a speed that is an integral multiple of a prime number that is mutually positive. The situation in FIG. 10 is 2, 3, Days with multiples of 4 are in the case of Figure 11 as multiples of 3, 5, 7, 9 times, and cases in Figure 12 are 2, 3, 4, 5 · · · · Figures with multiple times are shown in Figure 1 3 It can be drawn in multiples of 3, 5, 7, 9 ···. That is, when (a 2 +1) and η are prime numbers to each other, the control unit 5 can appropriately perform a single light irradiation when the light irradiation field group is relatively moved by a distance of η times the tracing pitch PW. 0 Ν / 0 FF control to perform high-resolution η-speed tracing. At this time, at each (a 2 +1) reset pulse, each day unit pattern cell 6 2 0 is made to pass (a X η) times the pitch PI in the row direction and the pitch in the column direction. The center of the separate light irradiated field 61 that is n times the PI. Therefore, the light irradiation area group is an M column, that is, when the number of light irradiation areas 61 arranged substantially along the main scanning direction of the person is M, for example, when M is an integer multiple of (axn), the light irradiation area group is When the cell group passing the daylight unit pattern is passed, the exposure is repeated as many times as the number of daytime unit cell cells that are juxtaposed in the row direction is 6 2 0 (however, the (± X) side of the light irradiation field group is 19 312XP. / Invention specification (Supplement) / 94-08 / 94112212 200540577 Except for the drawing unit pattern cell passing through the end.). In addition, in the case where the number of times of scanning is exceeded when multiples are performed, η becomes an integer of 3 or more. When daylighting is performed on a photoresist film on a substrate, a suitable value of η can be given in consideration of material characteristics and the size of the light irradiation area 6 1 4.

Moreover, when performing η double-speed tracing day, the number of repeated exposures is (M / (a X η)) (rounded off the decimal point). In contrast, when the tracing unit pattern cell group moves at each drawing pitch PW, it is reset. When the pulse is sent to DMD 4 2 to draw at 1x speed, the exposure can be repeated (M / a) times. In fact, since it generally does not require (M / a) repeated exposures, the η-speed exposure can be said to have DMD42 and use the majority of the micro mirrors to minimize the number of necessary repeated exposures to speed up To implement the technique of tracing the day. However, as shown in FIG. 10 to FIG. 13, the smaller the inclination of the main scanning direction in the row direction of the light irradiation field group is, the smaller the light irradiation field 6 1 is when the unit pattern cell 6 2 0 is drawn. Get bigger. Conversely, when the size of the light irradiation area 61 is constant, the tilt from the main scanning direction in the row direction of the light irradiation area group can be made smaller and a smaller unit of daylight unit 620 can be set. The length of one side of the light irradiation area 6 1 becomes the square root multiple of (a 2 + 1) of the drawing pitch PW. For example, when a is 4 and the speed is 4 times, one light irradiation area is reset between reset pulses. When light irradiation is performed, the accumulated light amount on the lines 6 3 1 and 6 3 2 in FIG. 14 becomes the distribution shown by the lines 6 4 1 and 6 4 2. That is, the size of the drawing unit pattern cell 6 2 0 is irradiated with a wide range of light, and particularly the main scanning direction is irradiated with a wide range of light. In addition, the 0 N / 0 FF irradiated by light is superimposed on the light amount distribution shown in FIG. 14 and becomes a distribution of light energy accumulated on the photosensitive material on the substrate 9. With this, a distribution is 20 312XP / Invention Specification (Supplement) / 94-08 / 94112212

200540577 The drawing of patterns can be implemented. Fig. 15A is a graph showing the amount of light accumulated on the main scanning side when the light irradiation area group alternately applies 0 N and 0 F F to the light irradiation area 6 in the drawing area every 1 drawing pitch movement. Figs. 15B to 15G show the cumulative light quantity when the light is irradiated at 2N, 3, 4, 5, 6, and 8 times when the drawing pitch of each light irradiation group is shifted. The longer the distance of 0N or OFF is, the larger the line width of the work is when the daytime extension line is drawn in the sub-scanning direction, and it can be seen that the apex of the light quantity distribution becomes higher and the valley becomes deeper. In addition, since the light is irradiated with light of a certain amount or more, the line width of the pattern can be controlled even by controlling (optical power). However, the photosensitive material must emit sufficient light. In this case, the intensity of the light from the light source is adjusted, and at the same time, the pattern of the predetermined line width is drawn by adjusting the timing of the illumination of 0 N and 0 F F. For example, when drawing a day pattern on a material such as silver salt in an image setter, the purpose of the pattern is achieved by sensitizing the photosensitive material. Therefore, as long as the photosensitive material is irradiated with the minimum light necessary for photosensitivity That is enough. In contrast, when patterning on a photoresist on a substrate such as a semiconductor, it is necessary to irradiate the photoresist with an amount of light that is more than the photoresist in order to peel off the photoresist during the post-process etching without causing excessive photoresist.

In this case, as shown in FIG. 16, by illuminating 8 strokes of day pitch light and 8 strokes of day pitch 0 FF thus obtained, the distribution of the amount of accumulated light represented by the thin line 7 1 1 is given to the photosensitive material, even if When (thresh ο 1 d) T Η can be used as a limit to be sensitive with a line width of W, the light is increased to illuminate 0 Ν with 6 strokes of daytime light, and 10 strokes of daytime 0 FF 312XP / Invention Specification ( (Supplement) / 94-08 / 94112212 When the light direction is OFF every time, that is, the accumulated material light quantity, the image of the image that can be shot, and the daytime map of daylight limit are removed by 0N, [the value of the intensity, 21

200540577 The distribution of the accumulated light amount represented by the thick line 7 1 2 is given to the sensor, and a pattern having a line width W sufficiently illuminated by light can be obtained. Here, the case of the pattern drawing device 1 is to irradiate the area 61 with light larger than the pattern cell 6 2 0 as described above, so that the amount of distributed light is widely distributed in the main direction and the sub-scanning direction to some extent. In addition, by performing high-speed drawing, the light quantity distribution shown in FIG. 14 can be further extended in the main scanning direction. When the line width of the traced pattern is sufficiently large, although the line width in the main scanning direction can be maintained by the combination of intensity and 0 N / 0 FF control, the line width of the day can be traced, that is, the resolution is It is lower than the main scanning direction than the sub scanning direction. Therefore, the pattern tracer device 1 is configured to make the LED 4 1 1 of the light source instantaneously turn off the light while the pattern cell of the unit of the tracer moves η to trace the pitch. The LED 4 1 1 0 NR / 0 FF control (also That is, in the case of modulation, steps S21 to S23 shown in FIG. 17 are performed in steps S 1 4 and S 1 5 during the operation of the pattern drawing device 1 in FIG. 5. When the LED411 is implemented, after the postures of the micro mirrors are updated in step S1 4, the LED 4 1 1 (step S 2 1) is turned on, and when the drawing unit pattern cell group moves only by the pitch PW (step S 2 2 ), The LED 4 1 1 is turned off (step S 2 3). $ Write the next daylighting data on the memory cell (step S 1 6). When the pulse is reset previously to make the daylighting unit pattern cell move only η times the daylighting pitch PW (step S 1 7), it returns Go to step S 1 4. With the above actions, the light irradiation area 61 is irradiated with light from 0 Ν to so far, the light irradiation area group is relatively moved to draw the pitch PW, and the light irradiation area 61 is limited to the interval between reset pulses. Every 1 / η 312XP / Invention Specification (Supplement) / 94-08 / 941] 2212 Scanning of light painting picture, the light can not be moved only as described in the picture. The distance between the faces can be adjusted to adjust the distance of the surface after drawing I, and the light is off. As a result, it is possible to perform high-speed scanning while suppressing the spread of light irradiation in the main scanning direction to the same degree as that in the sub-scanning direction. When L E D or L D is used as the light source, the light source can be controlled by 0 Ν / 0 F F for a time below 1/10 of the modulation limit speed of D M D 4 2. Therefore, for example, even when it is 8 times the scanning speed (η = 8), it is possible to easily perform the scanning while suppressing the decrease in the resolution in the main scanning direction. In this case, since the light energy imparted to the photosensitive material between the reset pulses is reduced to 1/8, the light intensity from the light source can be increased, and a photosensitive material with high sensitivity can be used.

As mentioned above, although the embodiment of this invention was described, this invention is not limited to the said embodiment, It can have various deformation | transformation. The spatial light modulation device provided in the pattern drawing device 1 is not limited to the DMD 42 used in the above embodiment. For example, a spatial light modulation device such as a liquid crystal shutter may be used. In addition, a plurality of light emitting diodes as a light source may be arranged in a two-dimensional array, corresponding to the arrangement direction of the light irradiation field group of the light emitting diode group is inclined to the scanning direction by φ, and the 0 N / The 0 FF control is synchronized with the relative movement in the light irradiation field, so that pattern drawing can be performed in this way. When 0 N / 0 F F control of the light source is not implemented, ultra-high pressure mercury may be used as the light source. In the 0 N / 0 FF control of the light source shown in Fig. 17, the light source does not necessarily turn off at the time when the day-to-day pitch PW moves in the light irradiation area group. For example, if sufficient accumulation is required In the case of light intensity, it may be turned off at the time when the tracing pitch is twice as long as the pitch PW. That is, after irradiating the light in the light irradiation field 61 with 0 N, the day-to-day pitch in the light irradiation field group is 23 312XP / Invention Specification (Supplement) / 94_08 / 941] 22] 2 200540577 η times the PW Before the relative movement of the distance is ended, as long as the light irradiation in the light irradiation area 61 becomes 0 FF, the timing of 0 FF is appropriately set, and this may be the case. It is also possible to use an element other than the light source to turn off the light irradiation faster than the control of the spatial light modulation device. The relative movement of the worktable 2 and the head 40 to the main scanning direction and the sub-scanning direction (that is, the relative movement of the tracing unit pattern cell group and the light irradiation field group on the substrate 9) are only borrowed from the worktable 2 or the head 4 Any move of 0 is true

Yes, that's fine. Furthermore, although the light irradiation area 6 1 (for example, the (-X) side and (+ Y) side in FIG. 4) is not mentioned in the embodiment described above, the light irradiation area 6 1 is located at the end in the sub-scanning direction in the light irradiation area group. Light irradiation control in the light irradiation area 6 1), but in order to easily perform the control, it may not be necessary to perform light irradiation in the light irradiation area 61, and the light is also irradiated on the side of the day after the sub-scan. Light Irradiation Field 61 1 Controlling light irradiation is also possible. Although the description of the present invention has been described in detail above, the above description is merely exemplary and is not restrictive. Therefore, as long as it does not depart from the scope of the present invention, it can be modified or changed in many ways. [Brief Description of the Drawings] FIG. 1 shows a configuration diagram of a pattern drawing device. Figure 2 shows a diagram of DMD. FIG. 3 is a diagram illustrating a light irradiation area and a pattern cell depicting a day unit. • Figure 4 shows the entire light irradiation area group and the cell group depicting the daytime unit pattern. ^ Figure 5 shows the flow chart of pattern drawing. Figures 6 to 9 show the areas of light irradiation and the pattern of the unit during the day. 24 312XP / Invention Specification (Supplement) / 94-08 / 94112212 200540577 Cells. Fig. 10 to Fig. 13 are graphs showing the relationship between the tilt of the light irradiation area group and the size of the light irradiation area group. FIG. 14 is a graph showing the amount of accumulated light. FIG. 15A is a graph showing the cumulative light amount of 0 N / 0 F F per daytime pitch. FIG. 15B is a graph showing the cumulative light quantity of 0 N / 0 F F every two day pitches. Fig. 1 5C shows a graph of the cumulative light quantity of 0 N / 0 F F every 3 days. FIG. 15D is a graph showing the cumulative light quantity of 0N / 0FF for every 4 drawing pitches. FIG. 1E shows the cumulative light quantity of 0 N / 0 F F every 5 days. Fig. 1 5 F is a graph showing the cumulative light quantity of 0 N / 0 F F every 6 daytime pitches. Fig. 15G is a graph showing the cumulative light quantity of 0 N / 0 F F every 8 daytime pitches. FIG. 16 is a graph showing cumulative light amounts at different light intensities. Figure 17 shows a flowchart of 0 N / 0 F F control of the light source. [Description of main component symbols]

1 Schematic drawing device 2 Workbench 4 Light irradiation section 5 Control section 9 Base plate 31 Workbench moving mechanism 32 Head movement mechanism 40 Head section 4 1 Light source unit 42 DMD 312XP / Invention manual (Supplement) / 94-08 / 94112212

25 200540577 group

Splitter beam splitter distance lens mirror

4 3 Illumination light 44 Projection light 61, 6 1 a to 6 1 e Light irradiation 62a to 62e Trace day 4 11 LED 4 12 Lens group 4 13 Optical fiber 422 Micro-mirror 433 Scale product 434 Lens 4 3 5 > 436 Mirror 44 1 Cube 4 4 2 > 437 Zoom 4 4 2 a, 4 4 3 a Actuator 4 4 3, 449 Projection through 451 Translucent 452 Laser II 453 Sensor 6 2 0, 621, 622 631, 6 3 2, 64 1, 642 7 11 thin line 7 12 thick line system system system field bit pattern cytoscopy polar tube tracing unit pattern cell line, 26 312XP / Invention Specification (Supplement) / 94-08 / 94112212

Claims (1)

200540577 10. Scope of patent application: 1. A pattern drawing device, which is a pattern drawing device that irradiates light on a photosensitive material to draw a day pattern. The device is provided with: two mutually perpendicular arrangement directions on the photosensitive material. Irradiating a modulated light irradiated portion with a group of light irradiated areas arranged at a certain pitch; and, scanning the light irradiated area group on a photosensitive material in a scanning direction inclined to the arrangement direction, and scanning in the scanning direction And a scanning mechanism that passes through a plurality of light irradiation fields with a plurality of light irradiation fields that are fixedly arranged on the photosensitive material, respectively, with a certain tracing pitch perpendicular to the scanning direction; and, and the light irradiation field groups The control unit that controls the 0 N / 0 FF of the light irradiation and controls the light amount of each of the daylight areas irradiated on the photosensitive material for the aforementioned light irradiation field groups in synchronization with the scanning; In the two light arranging directions of the light irradiating field group, which are adjacent to each other in the direction substantially along the scanning direction, the distance between the centers perpendicular to the scanning direction is equal to the tracing pitch, and The distance between the centers in the scanning direction is a times the aforesaid tracing pitch (however, a is an integer of 2 or more), and the control section moves relative to the light irradiating group only at a distance equal to the tracing pitch. Η times (however, η is an integer of 3 or more), the aforementioned 0 N / 0 FF control of light irradiation is performed once, and (a 2 + 1) and η are prime numbers to each other. 2. The pattern tracing device according to item 1 of the scope of patent application, wherein, in the aforementioned two arrangement directions in the aforementioned light irradiation field group, it is approximately along 27 312XP / Invention Specification (Supplement) / 94-08 / 94112212 200540577 The number of light irradiation areas arranged in the foregoing scanning direction is M, and M is an integer multiple of (axn). 3. The pattern drawing device according to item 1 of the scope of patent application, wherein after the light irradiation in the light irradiation area becomes 0N, the relative movement of the distance n times the aforementioned drawing pitch in the light irradiation area group is completed before The light irradiation in the light irradiation area is turned off. 4. The pattern drawing device according to item 3 of the scope of patent application, wherein the light irradiation in the aforementioned light irradiation area is from 0N to OFF. In the meantime, the aforementioned light irradiation field group only relatively moves the aforementioned tracing pitch. 5. The pattern drawing device according to item 3 of the scope of patent application, wherein the light irradiating unit includes: a light source that can be controlled on / off; and a spatial light modulation device that can spatially modulate light from the light source. 6. A pattern-tracing method, a pattern-tracing method for tracing a day pattern by irradiating light on a photosensitive material, comprising: two mutually perpendicular arrangement directions on the photosensitive material, each of which is arranged at a certain pitch. The arrayed light irradiating field group irradiates modulated light, and scans the scanning direction in which the light irradiating field group is tilted in the arrangement direction, and the respective scanning directions are perpendicular to the scanning direction and the scanning direction is perpendicular to the scanning direction. A scanning step in which the daylight field group fixedly arranged on the photosensitive material passes a plurality of light irradiation fields; and, in synchronization with the scanning of the light irradiation field group, the light irradiation field group controls the light irradiation 0 N / 0 FF, while controlling the amount of light in each daylight field irradiated on the photosensitive material, 28 312XP / Invention Manual (Supplement) / 94-08 / 94112212 200540577 The distance between the centers of the two adjacent light irradiation areas adjacent to each other in a direction substantially perpendicular to the scanning direction among the alignment directions In order to be equal to the above-mentioned drawing pitch, and the distance between the centers of the scanning direction becomes a times of the above-mentioned drawing pitch (however, a is an integer of 2 or more), in the foregoing control step, only the light irradiation area group is relatively Move it at a distance of η times the aforementioned tracing pitch (however, η is an integer of 3 or more) to make a 0 NR / 0 FF control of the aforementioned light irradiation once, and (a 2 +1) and η are prime numbers to each other . 7. The pattern tracing method according to item 6 of the scope of patent application, wherein the number of light irradiation areas arranged along the scanning direction out of the two alignment directions in the light irradiation area group is M, and M is an integer multiple of (axn). 8. The pattern tracing method according to item 6 of the patent application scope, wherein after the light irradiation in the light irradiation field becomes 0N, the relative movement of the distance n times the drawing pitch of the light irradiation field group is terminated before The light irradiation in the light irradiation area is turned off. 9. The pattern tracing method according to item 8 of the scope of patent application, wherein the light irradiating area group only moves the tracing pitch relative to the light irradiating area group since the light is irradiated from 0N to OFF. 10. The pattern tracing method according to item 8 of the scope of patent application, wherein the light from the ON / 0FF controllable light source is spatially modulated by the spatial light modulation device to the aforementioned light irradiation field group. 29 312XP / Invention Manual (Supplement) / 94-08 / 94112212