CN101974119B - 含纳米硅深紫外正性光刻胶及其成膜树脂 - Google Patents
含纳米硅深紫外正性光刻胶及其成膜树脂 Download PDFInfo
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CN101974119A CN101974119A (zh) | 2011-02-16 |
CN101974119B true CN101974119B (zh) | 2012-10-03 |
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Families Citing this family (5)
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CN103941544A (zh) | 2014-01-26 | 2014-07-23 | 京东方科技集团股份有限公司 | 一种光刻胶及其制作方法、使用方法 |
CN104403048B (zh) * | 2014-11-25 | 2018-05-08 | 昆山西迪光电材料有限公司 | 含倍半萜内酯的成膜树脂及其正性浸没式曝光193nm光刻胶 |
US10990012B2 (en) | 2016-05-03 | 2021-04-27 | Dow Silicones Corporation | Silsesquioxane resin and oxaamine composition |
CN108314785B (zh) * | 2017-01-16 | 2020-12-11 | 中国科学院理化技术研究所 | 八苯基取代笼形倍半硅氧烷衍生物分子玻璃及其应用 |
CN109298596A (zh) * | 2018-08-17 | 2019-02-01 | 西陇科学股份有限公司 | 一种耐高温黄变的碱可溶性oc负性光刻胶 |
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DE10259057A1 (de) * | 2002-12-17 | 2004-07-15 | Infineon Technologies Ag | Fotoresistzusammensatzung, enthaltend ein Silizium-haltiges organisches Polymer, mit verbesserter Ätzstabilität |
CN1818782A (zh) * | 2006-03-13 | 2006-08-16 | 苏州华飞微电子材料有限公司 | 深紫外正性光刻胶及其成膜树脂 |
CN101750895A (zh) * | 2008-12-16 | 2010-06-23 | 华东理工大学 | 紫外纳米压印用含硅(甲基)丙烯酸酯型光固化压印胶及其应用 |
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KR101113141B1 (ko) * | 2004-11-01 | 2012-02-15 | 재단법인서울대학교산학협력재단 | 에틸렌 옥사이드 단량체 및 이를 포함하는 포토레지스트용 중합체 |
KR101113149B1 (ko) * | 2004-11-01 | 2012-02-13 | 재단법인서울대학교산학협력재단 | 실록산 단량체 및 이를 포함하는 포토레지스트용 중합체 |
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DE10259057A1 (de) * | 2002-12-17 | 2004-07-15 | Infineon Technologies Ag | Fotoresistzusammensatzung, enthaltend ein Silizium-haltiges organisches Polymer, mit verbesserter Ätzstabilität |
CN1818782A (zh) * | 2006-03-13 | 2006-08-16 | 苏州华飞微电子材料有限公司 | 深紫外正性光刻胶及其成膜树脂 |
CN101750895A (zh) * | 2008-12-16 | 2010-06-23 | 华东理工大学 | 紫外纳米压印用含硅(甲基)丙烯酸酯型光固化压印胶及其应用 |
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