CN101925616A - 用于氧化还原固化可自由基固化的配制剂的光潜脒碱 - Google Patents

用于氧化还原固化可自由基固化的配制剂的光潜脒碱 Download PDF

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Publication number
CN101925616A
CN101925616A CN2009801032825A CN200980103282A CN101925616A CN 101925616 A CN101925616 A CN 101925616A CN 2009801032825 A CN2009801032825 A CN 2009801032825A CN 200980103282 A CN200980103282 A CN 200980103282A CN 101925616 A CN101925616 A CN 101925616A
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CN
China
Prior art keywords
alkyl
phenyl
substituted
halogen
composition
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CN2009801032825A
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English (en)
Chinese (zh)
Inventor
K·施图德尔
K·迪耶特里克
T·容
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BASF SE
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BASF SE
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Publication of CN101925616A publication Critical patent/CN101925616A/zh
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Dental Preparations (AREA)
  • Polymerization Catalysts (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN2009801032825A 2008-01-28 2009-01-06 用于氧化还原固化可自由基固化的配制剂的光潜脒碱 Pending CN101925616A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08150721.2 2008-01-28
EP08150721 2008-01-28
PCT/EP2009/050066 WO2009095282A2 (en) 2008-01-28 2009-01-06 Photolatent amidine bases for redox curing of radically curable formulations

Publications (1)

Publication Number Publication Date
CN101925616A true CN101925616A (zh) 2010-12-22

Family

ID=39522044

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009801032825A Pending CN101925616A (zh) 2008-01-28 2009-01-06 用于氧化还原固化可自由基固化的配制剂的光潜脒碱

Country Status (5)

Country Link
US (1) US20110190412A1 (enExample)
EP (1) EP2238178B1 (enExample)
JP (1) JP5697992B2 (enExample)
CN (1) CN101925616A (enExample)
WO (1) WO2009095282A2 (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110036342A (zh) * 2016-12-05 2019-07-19 阿科玛股份有限公司 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物
CN111040644A (zh) * 2018-10-15 2020-04-21 烟台德邦科技有限公司 一种可光催化聚合的丙烯酸酯结构胶
CN111417693A (zh) * 2017-10-09 2020-07-14 汉高知识产权控股有限责任公司 用于可厌氧固化组合物的固化促进剂
TWI885621B (zh) * 2023-11-30 2025-06-01 國家中山科學研究院 乙烯基酯樹脂之固化方法

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JP5809780B2 (ja) * 2010-04-02 2015-11-11 Ｄｉｃグラフィックス株式会社 紫外線硬化性コーティングニス
KR101867093B1 (ko) 2011-09-14 2018-06-14 덴카 주식회사 조성물 및 이를 이용한 부재의 가고정 방법
PL2882808T3 (pl) 2012-08-09 2017-04-28 Basf Se Radiacyjnie utwardzalne preparaty o wysokiej przyczepności
JP5725515B2 (ja) * 2012-11-15 2015-05-27 学校法人東京理科大学 光塩基発生剤及び当該光塩基発生剤を含有する感光性樹脂組成物
US9650526B2 (en) * 2014-09-09 2017-05-16 3D Systems, Inc. Method of printing a three-dimensional article
EP3204434A1 (en) * 2014-10-06 2017-08-16 Dow Global Technologies Llc Using organic photoredox catalysts to achieve metal free photoregulated controlled radical polymerization
FR3030526B1 (fr) * 2014-12-18 2018-06-15 Arkema France Polymerisation radicalaire d'alcoxyamines a basse temperature
CN107531886B (zh) 2015-04-29 2020-08-07 3M创新有限公司 由多硫醇和聚环氧化合物制备聚合物网络的方法
CA3042860A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
KR20190082219A (ko) 2016-11-03 2019-07-09 쓰리엠 이노베이티브 프로퍼티즈 컴파니 실란트를 항공기 구성요소에 적용하는 방법
US11198757B2 (en) 2016-11-03 2021-12-14 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and coumarin and related methods
JP6873417B2 (ja) * 2016-11-10 2021-05-19 学校法人東京理科大学 光反応性組成物
WO2018160667A1 (en) * 2017-02-28 2018-09-07 Basf Se Curable sealant composition
WO2018160691A1 (en) * 2017-02-28 2018-09-07 Basf Se Curable sealant composition
US20210371667A1 (en) 2018-09-27 2021-12-02 3M Innovative Properties Company Composition including amino-functional silanes and method of applying a sealant to a substrate
EP3895681A4 (en) * 2019-01-21 2022-01-26 Mitsui Chemicals, Inc. PHOTOPOLYMERIZATION INITIATOR, PHOTO-CURING COMPOSITION, CURING PRODUCT AND DENTAL MATERIAL
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
WO2023167201A1 (ja) * 2022-03-02 2023-09-07 株式会社カネカ 活性エネルギー線硬化性組成物、及び硬化物の製造方法
JPWO2024204487A1 (enExample) * 2023-03-30 2024-10-03

Citations (3)

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EP0245639A2 (de) * 1986-04-12 1987-11-19 Bayer Ag Verfahren zur Herstellung von UV-gehärteten deckend pigmentierten Beschichtungen
EP0898202A1 (en) * 1997-08-22 1999-02-24 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones
CN1988956A (zh) * 2004-07-21 2007-06-27 西巴特殊化学品控股有限公司 通过倒置的两阶段工序光活化催化剂的方法及其应用

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US3018266A (en) * 1960-07-29 1962-01-23 American Cyanamid Co Polymerizable elastomer-vinyl aromatic compound composition containing a catalyst promoter system and method of polymerizing same
JPH1149835A (ja) * 1997-08-05 1999-02-23 Showa Highpolymer Co Ltd コンクリート構築物用プライマー組成物及びその硬化方法
TW436491B (en) * 1997-08-22 2001-05-28 Ciba Sc Holding Ag Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions
JP4906221B2 (ja) * 2000-05-26 2012-03-28 アクゾ ノーベル ナムローゼ フェンノートシャップ 光活性化可能なコーティング組成物
CA2459374C (en) * 2001-10-17 2011-02-08 Ciba Specialty Chemicals Holding Inc. Photoactivable nitrogen bases
US6664357B1 (en) * 2003-01-21 2003-12-16 National Starch And Chemical Investment Holding Corporation Method for the preparation of a stable anaerobic/UV/visible light curable adhesive
DE102005010327A1 (de) * 2005-03-03 2006-09-07 Basf Ag Ratikalisch härtbare Beschichtungsmassen
JP4967276B2 (ja) * 2005-08-09 2012-07-04 日立化成工業株式会社 回路接続材料並びに回路端子の接続構造体及び接続方法
BRPI0717655B1 (pt) * 2006-09-29 2018-12-18 Basf Se bases fotolatentes para sistema à base de isocianatos bloqueados

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0245639A2 (de) * 1986-04-12 1987-11-19 Bayer Ag Verfahren zur Herstellung von UV-gehärteten deckend pigmentierten Beschichtungen
EP0898202A1 (en) * 1997-08-22 1999-02-24 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones
CN1988956A (zh) * 2004-07-21 2007-06-27 西巴特殊化学品控股有限公司 通过倒置的两阶段工序光活化催化剂的方法及其应用

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110036342A (zh) * 2016-12-05 2019-07-19 阿科玛股份有限公司 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物
CN111417693A (zh) * 2017-10-09 2020-07-14 汉高知识产权控股有限责任公司 用于可厌氧固化组合物的固化促进剂
CN111417693B (zh) * 2017-10-09 2022-05-27 汉高知识产权控股有限责任公司 用于可厌氧固化组合物的固化促进剂
CN111040644A (zh) * 2018-10-15 2020-04-21 烟台德邦科技有限公司 一种可光催化聚合的丙烯酸酯结构胶
TWI885621B (zh) * 2023-11-30 2025-06-01 國家中山科學研究院 乙烯基酯樹脂之固化方法

Also Published As

Publication number Publication date
US20110190412A1 (en) 2011-08-04
WO2009095282A4 (en) 2010-01-14
WO2009095282A3 (en) 2009-11-12
WO2009095282A2 (en) 2009-08-06
JP2011514393A (ja) 2011-05-06
EP2238178B1 (en) 2014-09-10
EP2238178A2 (en) 2010-10-13
JP5697992B2 (ja) 2015-04-08

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Application publication date: 20101222