JP5697992B2 - ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 - Google Patents

ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 Download PDF

Info

Publication number
JP5697992B2
JP5697992B2 JP2010544653A JP2010544653A JP5697992B2 JP 5697992 B2 JP5697992 B2 JP 5697992B2 JP 2010544653 A JP2010544653 A JP 2010544653A JP 2010544653 A JP2010544653 A JP 2010544653A JP 5697992 B2 JP5697992 B2 JP 5697992B2
Authority
JP
Japan
Prior art keywords
alkyl
phenyl
composition
substituted
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010544653A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011514393A (ja
JP2011514393A5 (enExample
Inventor
ステュデ カティア
ステュデ カティア
ディートリカー クルト
ディートリカー クルト
ユング トゥンヤ
ユング トゥンヤ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of JP2011514393A publication Critical patent/JP2011514393A/ja
Publication of JP2011514393A5 publication Critical patent/JP2011514393A5/ja
Application granted granted Critical
Publication of JP5697992B2 publication Critical patent/JP5697992B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Dental Preparations (AREA)
  • Polymerization Catalysts (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2010544653A 2008-01-28 2009-01-06 ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基 Expired - Fee Related JP5697992B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP08150721.2 2008-01-28
EP08150721 2008-01-28
PCT/EP2009/050066 WO2009095282A2 (en) 2008-01-28 2009-01-06 Photolatent amidine bases for redox curing of radically curable formulations

Publications (3)

Publication Number Publication Date
JP2011514393A JP2011514393A (ja) 2011-05-06
JP2011514393A5 JP2011514393A5 (enExample) 2013-03-14
JP5697992B2 true JP5697992B2 (ja) 2015-04-08

Family

ID=39522044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010544653A Expired - Fee Related JP5697992B2 (ja) 2008-01-28 2009-01-06 ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基

Country Status (5)

Country Link
US (1) US20110190412A1 (enExample)
EP (1) EP2238178B1 (enExample)
JP (1) JP5697992B2 (enExample)
CN (1) CN101925616A (enExample)
WO (1) WO2009095282A2 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5809780B2 (ja) * 2010-04-02 2015-11-11 Dicグラフィックス株式会社 紫外線硬化性コーティングニス
JP6030560B2 (ja) * 2011-09-14 2016-11-24 デンカ株式会社 組成物及びそれを用いた部材の仮固定方法
ES2611966T3 (es) 2012-08-09 2017-05-11 Basf Se Formulaciones endurecibles por radiación con alta adhesión
JP5725515B2 (ja) * 2012-11-15 2015-05-27 学校法人東京理科大学 光塩基発生剤及び当該光塩基発生剤を含有する感光性樹脂組成物
US9650526B2 (en) * 2014-09-09 2017-05-16 3D Systems, Inc. Method of printing a three-dimensional article
EP3204434A1 (en) * 2014-10-06 2017-08-16 Dow Global Technologies Llc Using organic photoredox catalysts to achieve metal free photoregulated controlled radical polymerization
FR3030526B1 (fr) * 2014-12-18 2018-06-15 Arkema France Polymerisation radicalaire d'alcoxyamines a basse temperature
WO2016176548A1 (en) 2015-04-29 2016-11-03 3M Innovative Properties Company Composition including a polythiol and a polyepoxide and methods relating to the composition
WO2018085190A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Polythiol sealant compositions
WO2018085534A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
JP2019534363A (ja) 2016-11-03 2019-11-28 スリーエム イノベイティブ プロパティズ カンパニー シーラントを航空機用部品に適用する方法
JP6873417B2 (ja) * 2016-11-10 2021-05-19 学校法人東京理科大学 光反応性組成物
CN110036342A (zh) * 2016-12-05 2019-07-19 阿科玛股份有限公司 引发剂共混物和可用于3d打印的含有此类引发剂共混物的可光固化组合物
WO2018160667A1 (en) * 2017-02-28 2018-09-07 Basf Se Curable sealant composition
WO2018160691A1 (en) * 2017-02-28 2018-09-07 Basf Se Curable sealant composition
GB2567242B (en) * 2017-10-09 2021-08-11 Henkel IP & Holding GmbH Anaerobically curable compositions comprising 1, 2, 3, 4-tetrahydro benzo(h)quinolin-3-ol or derivatives thereof
CN112752803A (zh) 2018-09-27 2021-05-04 3M创新有限公司 包含氨基官能硅烷的组合物以及将密封剂施用到基材的方法
CN111040644A (zh) * 2018-10-15 2020-04-21 烟台德邦科技有限公司 一种可光催化聚合的丙烯酸酯结构胶
WO2020153269A1 (ja) * 2019-01-21 2020-07-30 三井化学株式会社 光重合開始剤、光硬化性組成物、硬化物、及び、歯科材料
WO2020202076A1 (en) 2019-04-04 2020-10-08 3M Innovative Properties Company Method of irradiating a composition through a substrate
WO2023167201A1 (ja) * 2022-03-02 2023-09-07 株式会社カネカ 活性エネルギー線硬化性組成物、及び硬化物の製造方法
CN120858151A (zh) * 2023-03-30 2025-10-28 日东新兴有限公司 涂布用固化性组合物及其固化物
TWI885621B (zh) * 2023-11-30 2025-06-01 國家中山科學研究院 乙烯基酯樹脂之固化方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018266A (en) * 1960-07-29 1962-01-23 American Cyanamid Co Polymerizable elastomer-vinyl aromatic compound composition containing a catalyst promoter system and method of polymerizing same
DE3612442A1 (de) * 1986-04-12 1987-10-22 Bayer Ag Verfahren zur herstellung von uv-gehaerteten deckend pigmentierten beschichtungen
JPH1149835A (ja) * 1997-08-05 1999-02-23 Showa Highpolymer Co Ltd コンクリート構築物用プライマー組成物及びその硬化方法
TW436491B (en) * 1997-08-22 2001-05-28 Ciba Sc Holding Ag Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions
EP0898202B1 (en) * 1997-08-22 2000-07-19 Ciba SC Holding AG Photogeneration of amines from alpha-aminoacetophenones
AU6032501A (en) * 2000-05-26 2001-12-11 Akzo Nobel Nv Photoactivatable coating composition
MXPA04003564A (es) * 2001-10-17 2004-07-23 Ciba Sc Holding Ag Bases de nitrogeno fotoactivables.
US6664357B1 (en) * 2003-01-21 2003-12-16 National Starch And Chemical Investment Holding Corporation Method for the preparation of a stable anaerobic/UV/visible light curable adhesive
US20070249484A1 (en) * 2004-07-21 2007-10-25 Johannes Benkhoff Process for the Photoactivation and use of a Catalyst by an Inverted Two-Stage Procedure
DE102005010327A1 (de) * 2005-03-03 2006-09-07 Basf Ag Ratikalisch härtbare Beschichtungsmassen
JP4967276B2 (ja) * 2005-08-09 2012-07-04 日立化成工業株式会社 回路接続材料並びに回路端子の接続構造体及び接続方法
EP2066721B1 (en) * 2006-09-29 2017-12-27 Basf Se Photolatent bases for systems based on blocked isocyanates

Also Published As

Publication number Publication date
WO2009095282A4 (en) 2010-01-14
WO2009095282A2 (en) 2009-08-06
CN101925616A (zh) 2010-12-22
WO2009095282A3 (en) 2009-11-12
JP2011514393A (ja) 2011-05-06
EP2238178A2 (en) 2010-10-13
EP2238178B1 (en) 2014-09-10
US20110190412A1 (en) 2011-08-04

Similar Documents

Publication Publication Date Title
JP5697992B2 (ja) ラジカル硬化性配合物のレドックス硬化のための光潜在性アミジン塩基
KR101059703B1 (ko) 광개시제의 저장 안정성 증진방법
KR100979660B1 (ko) 혼입 가능한 광개시제
JP5345537B2 (ja) ブロックイソシアネートをベースとする系のための光潜在性塩基
JP5606308B2 (ja) 光活性窒素塩基
US20060160915A1 (en) Photocurable compositions
US20100022676A1 (en) Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
JP7697458B2 (ja) Led光硬化用のクマリングリオキシレート
KR20240089414A (ko) 신규한 광개시제
JP2023546018A (ja) 光重合開始剤としてのケトキノロン

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20120104

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130125

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130904

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130917

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20131217

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20131225

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20140117

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20140804

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20141204

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20141215

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20150113

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20150212

R150 Certificate of patent or registration of utility model

Ref document number: 5697992

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees