CN101911319B - 辐射发射体及制造辐射发射体的方法 - Google Patents
辐射发射体及制造辐射发射体的方法 Download PDFInfo
- Publication number
- CN101911319B CN101911319B CN2008801229538A CN200880122953A CN101911319B CN 101911319 B CN101911319 B CN 101911319B CN 2008801229538 A CN2008801229538 A CN 2008801229538A CN 200880122953 A CN200880122953 A CN 200880122953A CN 101911319 B CN101911319 B CN 101911319B
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- CN
- China
- Prior art keywords
- layer
- intermediate layer
- emission body
- radiated emission
- active layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
- H10H20/819—Bodies characterised by their shape, e.g. curved or truncated substrates
- H10H20/82—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/84—Coatings, e.g. passivation layers or antireflective coatings
- H10H20/841—Reflective coatings, e.g. dielectric Bragg reflectors
Landscapes
- Led Devices (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102007062790 | 2007-12-27 | ||
| DE102007062790.6 | 2007-12-27 | ||
| DE102008024517.8 | 2008-05-21 | ||
| DE102008024517A DE102008024517A1 (de) | 2007-12-27 | 2008-05-21 | Strahlungsemittierender Körper und Verfahren zur Herstellung eines strahlungsemittierenden Körpers |
| PCT/DE2008/002136 WO2009083001A2 (de) | 2007-12-27 | 2008-12-19 | Strahlungsemittierender körper und verfahren zur herstellung eines strahlungsemittierenden körpers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101911319A CN101911319A (zh) | 2010-12-08 |
| CN101911319B true CN101911319B (zh) | 2012-10-10 |
Family
ID=40690884
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008801229538A Expired - Fee Related CN101911319B (zh) | 2007-12-27 | 2008-12-19 | 辐射发射体及制造辐射发射体的方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8723199B2 (enExample) |
| EP (1) | EP2225782B1 (enExample) |
| JP (1) | JP5781766B2 (enExample) |
| KR (1) | KR101652531B1 (enExample) |
| CN (1) | CN101911319B (enExample) |
| DE (1) | DE102008024517A1 (enExample) |
| WO (1) | WO2009083001A2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102008027045A1 (de) * | 2008-02-29 | 2009-09-03 | Osram Opto Semiconductors Gmbh | Halbleiterleuchtdiode und Verfahren zur Herstellung einer Halbleiterleuchtdiode |
| DE102011012298A1 (de) * | 2010-12-28 | 2012-06-28 | Osram Opto Semiconductors Gmbh | Verbundsubstrat, Halbleiterchip mit Verbundsubstrat und Verfahren zur Herstellung von Verbundsubstraten und Halbleiterchips |
| JP5661660B2 (ja) | 2012-02-07 | 2015-01-28 | 株式会社東芝 | 半導体発光素子 |
| CN103367555B (zh) * | 2012-03-28 | 2016-01-20 | 清华大学 | 发光二极管的制备方法 |
| DE102018131411A1 (de) | 2018-12-07 | 2020-06-10 | Osram Opto Semiconductors Gmbh | Optoelektronischer halbleiterchip und verfahren zur herstellung eines optoelektronischen halbleiterchips |
| CN112350072A (zh) * | 2019-08-06 | 2021-02-09 | 广州方邦电子股份有限公司 | 散射膜及包含散射膜的电子装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006006822A1 (en) * | 2004-07-12 | 2006-01-19 | Gwangju Institute Of Science And Technology | Flip-chip light emitting diodes and method of manufacturing thereof |
| CN1905219A (zh) * | 2005-07-29 | 2007-01-31 | 璨圆光电股份有限公司 | 发光二极管结构 |
| WO2007105626A1 (ja) * | 2006-03-10 | 2007-09-20 | Matsushita Electric Works, Ltd. | 発光素子 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU4951299A (en) | 1999-07-09 | 2001-01-30 | Osram Opto Semiconductors Gmbh And Co. Ohg | Encapsulation of a device |
| JP4431925B2 (ja) * | 2000-11-30 | 2010-03-17 | 信越半導体株式会社 | 発光素子の製造方法 |
| JP4055503B2 (ja) | 2001-07-24 | 2008-03-05 | 日亜化学工業株式会社 | 半導体発光素子 |
| US6784462B2 (en) | 2001-12-13 | 2004-08-31 | Rensselaer Polytechnic Institute | Light-emitting diode with planar omni-directional reflector |
| JP4121551B2 (ja) * | 2002-10-23 | 2008-07-23 | 信越半導体株式会社 | 発光素子の製造方法及び発光素子 |
| US7041529B2 (en) | 2002-10-23 | 2006-05-09 | Shin-Etsu Handotai Co., Ltd. | Light-emitting device and method of fabricating the same |
| DE10339772B4 (de) | 2003-08-27 | 2006-07-13 | Novaled Gmbh | Licht emittierendes Bauelement und Verfahren zu seiner Herstellung |
| TW200520266A (en) | 2003-11-21 | 2005-06-16 | Sanken Electric Co Ltd | Semiconductor luminous element and manufacturing method of the same |
| JP2005158904A (ja) | 2003-11-21 | 2005-06-16 | Toyoda Gosei Co Ltd | Iii−v族窒化物半導体素子及び発光装置 |
| JP4164689B2 (ja) | 2003-11-21 | 2008-10-15 | サンケン電気株式会社 | 半導体発光素子 |
| EP1735838B1 (en) | 2004-04-15 | 2011-10-05 | Trustees of Boston University | Optical devices featuring textured semiconductor layers |
| DE102005013894B4 (de) * | 2004-06-30 | 2010-06-17 | Osram Opto Semiconductors Gmbh | Elektromagnetische Strahlung erzeugender Halbleiterchip und Verfahren zu dessen Herstellung |
| DE102004061865A1 (de) * | 2004-09-29 | 2006-03-30 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines Dünnfilmhalbleiterchips |
| DE102004057802B4 (de) | 2004-11-30 | 2011-03-24 | Osram Opto Semiconductors Gmbh | Strahlungemittierendes Halbleiterbauelement mit Zwischenschicht |
| JP2006269807A (ja) | 2005-03-24 | 2006-10-05 | Sony Corp | 半導体発光ダイオード |
| KR100682877B1 (ko) * | 2005-07-12 | 2007-02-15 | 삼성전기주식회사 | 발광다이오드 및 그 제조방법 |
| TWI270222B (en) * | 2005-10-07 | 2007-01-01 | Formosa Epitaxy Inc | Light emitting diode chip |
| EP1786050B1 (de) | 2005-11-10 | 2010-06-23 | Novaled AG | Dotiertes organisches Halbleitermaterial |
| KR100640497B1 (ko) * | 2005-11-24 | 2006-11-01 | 삼성전기주식회사 | 수직 구조 질화갈륨계 발광다이오드 소자 |
| KR101241477B1 (ko) * | 2006-01-27 | 2013-03-08 | 엘지이노텍 주식회사 | 질화물 반도체 발광소자 및 그 제조 방법 |
| JP2007266577A (ja) * | 2006-03-03 | 2007-10-11 | Matsushita Electric Ind Co Ltd | 窒化物半導体装置及びその製造方法 |
| DE102006017573A1 (de) * | 2006-04-13 | 2007-10-18 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterkörper und Verfahren zu dessen Herstellung |
| DE102007002416A1 (de) | 2006-04-13 | 2007-10-18 | Osram Opto Semiconductors Gmbh | Strahlungsemittierender Körper und Verfahren zur Herstellung eines strahlungsemittierenden Körpers |
| JP2007305909A (ja) | 2006-05-15 | 2007-11-22 | Kyocera Corp | 窒化ガリウム系化合物半導体の製造方法及び発光素子の製造方法 |
| WO2007136097A1 (ja) * | 2006-05-23 | 2007-11-29 | Meijo University | 半導体発光素子 |
| TW200807760A (en) * | 2006-05-23 | 2008-02-01 | Alps Electric Co Ltd | Method for manufacturing semiconductor light emitting element |
| US7501295B2 (en) * | 2006-05-25 | 2009-03-10 | Philips Lumileds Lighting Company, Llc | Method of fabricating a reflective electrode for a semiconductor light emitting device |
| US8026527B2 (en) * | 2007-12-06 | 2011-09-27 | Bridgelux, Inc. | LED structure |
-
2008
- 2008-05-21 DE DE102008024517A patent/DE102008024517A1/de not_active Withdrawn
- 2008-12-19 US US12/811,030 patent/US8723199B2/en active Active
- 2008-12-19 JP JP2010540027A patent/JP5781766B2/ja not_active Expired - Fee Related
- 2008-12-19 KR KR1020107016854A patent/KR101652531B1/ko not_active Expired - Fee Related
- 2008-12-19 EP EP08868217.4A patent/EP2225782B1/de not_active Not-in-force
- 2008-12-19 CN CN2008801229538A patent/CN101911319B/zh not_active Expired - Fee Related
- 2008-12-19 WO PCT/DE2008/002136 patent/WO2009083001A2/de not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006006822A1 (en) * | 2004-07-12 | 2006-01-19 | Gwangju Institute Of Science And Technology | Flip-chip light emitting diodes and method of manufacturing thereof |
| CN1905219A (zh) * | 2005-07-29 | 2007-01-31 | 璨圆光电股份有限公司 | 发光二极管结构 |
| WO2007105626A1 (ja) * | 2006-03-10 | 2007-09-20 | Matsushita Electric Works, Ltd. | 発光素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009083001A3 (de) | 2009-09-24 |
| WO2009083001A2 (de) | 2009-07-09 |
| US20110198639A1 (en) | 2011-08-18 |
| EP2225782A2 (de) | 2010-09-08 |
| KR101652531B1 (ko) | 2016-08-30 |
| US8723199B2 (en) | 2014-05-13 |
| CN101911319A (zh) | 2010-12-08 |
| EP2225782B1 (de) | 2019-07-03 |
| JP5781766B2 (ja) | 2015-09-24 |
| DE102008024517A1 (de) | 2009-07-02 |
| KR20100107026A (ko) | 2010-10-04 |
| JP2011508441A (ja) | 2011-03-10 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121010 |
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| CF01 | Termination of patent right due to non-payment of annual fee |