CN101911319B - 辐射发射体及制造辐射发射体的方法 - Google Patents

辐射发射体及制造辐射发射体的方法 Download PDF

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Publication number
CN101911319B
CN101911319B CN2008801229538A CN200880122953A CN101911319B CN 101911319 B CN101911319 B CN 101911319B CN 2008801229538 A CN2008801229538 A CN 2008801229538A CN 200880122953 A CN200880122953 A CN 200880122953A CN 101911319 B CN101911319 B CN 101911319B
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China
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layer
intermediate layer
emission body
radiated emission
active layer
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Expired - Fee Related
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CN2008801229538A
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English (en)
Chinese (zh)
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CN101911319A (zh
Inventor
F·埃伯哈德
R·温迪希
R·沃尔特
M·施马尔
M·阿尔斯泰特
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Ams Osram International GmbH
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Osram Opto Semiconductors GmbH
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • H10H20/819Bodies characterised by their shape, e.g. curved or truncated substrates
    • H10H20/82Roughened surfaces, e.g. at the interface between epitaxial layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/84Coatings, e.g. passivation layers or antireflective coatings
    • H10H20/841Reflective coatings, e.g. dielectric Bragg reflectors

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  • Led Devices (AREA)
CN2008801229538A 2007-12-27 2008-12-19 辐射发射体及制造辐射发射体的方法 Expired - Fee Related CN101911319B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE102007062790 2007-12-27
DE102007062790.6 2007-12-27
DE102008024517.8 2008-05-21
DE102008024517A DE102008024517A1 (de) 2007-12-27 2008-05-21 Strahlungsemittierender Körper und Verfahren zur Herstellung eines strahlungsemittierenden Körpers
PCT/DE2008/002136 WO2009083001A2 (de) 2007-12-27 2008-12-19 Strahlungsemittierender körper und verfahren zur herstellung eines strahlungsemittierenden körpers

Publications (2)

Publication Number Publication Date
CN101911319A CN101911319A (zh) 2010-12-08
CN101911319B true CN101911319B (zh) 2012-10-10

Family

ID=40690884

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CN2008801229538A Expired - Fee Related CN101911319B (zh) 2007-12-27 2008-12-19 辐射发射体及制造辐射发射体的方法

Country Status (7)

Country Link
US (1) US8723199B2 (enExample)
EP (1) EP2225782B1 (enExample)
JP (1) JP5781766B2 (enExample)
KR (1) KR101652531B1 (enExample)
CN (1) CN101911319B (enExample)
DE (1) DE102008024517A1 (enExample)
WO (1) WO2009083001A2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008027045A1 (de) * 2008-02-29 2009-09-03 Osram Opto Semiconductors Gmbh Halbleiterleuchtdiode und Verfahren zur Herstellung einer Halbleiterleuchtdiode
DE102011012298A1 (de) * 2010-12-28 2012-06-28 Osram Opto Semiconductors Gmbh Verbundsubstrat, Halbleiterchip mit Verbundsubstrat und Verfahren zur Herstellung von Verbundsubstraten und Halbleiterchips
JP5661660B2 (ja) 2012-02-07 2015-01-28 株式会社東芝 半導体発光素子
CN103367555B (zh) * 2012-03-28 2016-01-20 清华大学 发光二极管的制备方法
DE102018131411A1 (de) 2018-12-07 2020-06-10 Osram Opto Semiconductors Gmbh Optoelektronischer halbleiterchip und verfahren zur herstellung eines optoelektronischen halbleiterchips
CN112350072A (zh) * 2019-08-06 2021-02-09 广州方邦电子股份有限公司 散射膜及包含散射膜的电子装置

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WO2006006822A1 (en) * 2004-07-12 2006-01-19 Gwangju Institute Of Science And Technology Flip-chip light emitting diodes and method of manufacturing thereof
CN1905219A (zh) * 2005-07-29 2007-01-31 璨圆光电股份有限公司 发光二极管结构
WO2007105626A1 (ja) * 2006-03-10 2007-09-20 Matsushita Electric Works, Ltd. 発光素子

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JP4431925B2 (ja) * 2000-11-30 2010-03-17 信越半導体株式会社 発光素子の製造方法
JP4055503B2 (ja) 2001-07-24 2008-03-05 日亜化学工業株式会社 半導体発光素子
US6784462B2 (en) 2001-12-13 2004-08-31 Rensselaer Polytechnic Institute Light-emitting diode with planar omni-directional reflector
JP4121551B2 (ja) * 2002-10-23 2008-07-23 信越半導体株式会社 発光素子の製造方法及び発光素子
US7041529B2 (en) 2002-10-23 2006-05-09 Shin-Etsu Handotai Co., Ltd. Light-emitting device and method of fabricating the same
DE10339772B4 (de) 2003-08-27 2006-07-13 Novaled Gmbh Licht emittierendes Bauelement und Verfahren zu seiner Herstellung
TW200520266A (en) 2003-11-21 2005-06-16 Sanken Electric Co Ltd Semiconductor luminous element and manufacturing method of the same
JP2005158904A (ja) 2003-11-21 2005-06-16 Toyoda Gosei Co Ltd Iii−v族窒化物半導体素子及び発光装置
JP4164689B2 (ja) 2003-11-21 2008-10-15 サンケン電気株式会社 半導体発光素子
EP1735838B1 (en) 2004-04-15 2011-10-05 Trustees of Boston University Optical devices featuring textured semiconductor layers
DE102005013894B4 (de) * 2004-06-30 2010-06-17 Osram Opto Semiconductors Gmbh Elektromagnetische Strahlung erzeugender Halbleiterchip und Verfahren zu dessen Herstellung
DE102004061865A1 (de) * 2004-09-29 2006-03-30 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines Dünnfilmhalbleiterchips
DE102004057802B4 (de) 2004-11-30 2011-03-24 Osram Opto Semiconductors Gmbh Strahlungemittierendes Halbleiterbauelement mit Zwischenschicht
JP2006269807A (ja) 2005-03-24 2006-10-05 Sony Corp 半導体発光ダイオード
KR100682877B1 (ko) * 2005-07-12 2007-02-15 삼성전기주식회사 발광다이오드 및 그 제조방법
TWI270222B (en) * 2005-10-07 2007-01-01 Formosa Epitaxy Inc Light emitting diode chip
EP1786050B1 (de) 2005-11-10 2010-06-23 Novaled AG Dotiertes organisches Halbleitermaterial
KR100640497B1 (ko) * 2005-11-24 2006-11-01 삼성전기주식회사 수직 구조 질화갈륨계 발광다이오드 소자
KR101241477B1 (ko) * 2006-01-27 2013-03-08 엘지이노텍 주식회사 질화물 반도체 발광소자 및 그 제조 방법
JP2007266577A (ja) * 2006-03-03 2007-10-11 Matsushita Electric Ind Co Ltd 窒化物半導体装置及びその製造方法
DE102006017573A1 (de) * 2006-04-13 2007-10-18 Osram Opto Semiconductors Gmbh Optoelektronischer Halbleiterkörper und Verfahren zu dessen Herstellung
DE102007002416A1 (de) 2006-04-13 2007-10-18 Osram Opto Semiconductors Gmbh Strahlungsemittierender Körper und Verfahren zur Herstellung eines strahlungsemittierenden Körpers
JP2007305909A (ja) 2006-05-15 2007-11-22 Kyocera Corp 窒化ガリウム系化合物半導体の製造方法及び発光素子の製造方法
WO2007136097A1 (ja) * 2006-05-23 2007-11-29 Meijo University 半導体発光素子
TW200807760A (en) * 2006-05-23 2008-02-01 Alps Electric Co Ltd Method for manufacturing semiconductor light emitting element
US7501295B2 (en) * 2006-05-25 2009-03-10 Philips Lumileds Lighting Company, Llc Method of fabricating a reflective electrode for a semiconductor light emitting device
US8026527B2 (en) * 2007-12-06 2011-09-27 Bridgelux, Inc. LED structure

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006006822A1 (en) * 2004-07-12 2006-01-19 Gwangju Institute Of Science And Technology Flip-chip light emitting diodes and method of manufacturing thereof
CN1905219A (zh) * 2005-07-29 2007-01-31 璨圆光电股份有限公司 发光二极管结构
WO2007105626A1 (ja) * 2006-03-10 2007-09-20 Matsushita Electric Works, Ltd. 発光素子

Also Published As

Publication number Publication date
WO2009083001A3 (de) 2009-09-24
WO2009083001A2 (de) 2009-07-09
US20110198639A1 (en) 2011-08-18
EP2225782A2 (de) 2010-09-08
KR101652531B1 (ko) 2016-08-30
US8723199B2 (en) 2014-05-13
CN101911319A (zh) 2010-12-08
EP2225782B1 (de) 2019-07-03
JP5781766B2 (ja) 2015-09-24
DE102008024517A1 (de) 2009-07-02
KR20100107026A (ko) 2010-10-04
JP2011508441A (ja) 2011-03-10

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